DE102006015714B4 - Lichtunterstütztes Testen eines optoelektronischen Moduls - Google Patents
Lichtunterstütztes Testen eines optoelektronischen Moduls Download PDFInfo
- Publication number
- DE102006015714B4 DE102006015714B4 DE102006015714.1A DE102006015714A DE102006015714B4 DE 102006015714 B4 DE102006015714 B4 DE 102006015714B4 DE 102006015714 A DE102006015714 A DE 102006015714A DE 102006015714 B4 DE102006015714 B4 DE 102006015714B4
- Authority
- DE
- Germany
- Prior art keywords
- optoelectronic module
- source
- voltage
- illumination
- module
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005693 optoelectronics Effects 0.000 title claims abstract description 126
- 238000012360 testing method Methods 0.000 title claims abstract description 80
- 230000007547 defect Effects 0.000 claims abstract description 58
- 238000005259 measurement Methods 0.000 claims abstract description 54
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 49
- 238000005286 illumination Methods 0.000 claims abstract description 33
- 239000002245 particle Substances 0.000 claims abstract description 22
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 6
- 239000010703 silicon Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 48
- 230000002950 deficient Effects 0.000 claims description 28
- 239000010409 thin film Substances 0.000 claims description 20
- 239000011163 secondary particle Substances 0.000 claims description 19
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 13
- 239000004973 liquid crystal related substance Substances 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 10
- 238000010998 test method Methods 0.000 claims description 10
- 239000003990 capacitor Substances 0.000 claims description 9
- 230000005670 electromagnetic radiation Effects 0.000 claims description 3
- 238000001429 visible spectrum Methods 0.000 claims description 3
- 230000008901 benefit Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 6
- 230000010287 polarization Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 208000010201 Exanthema Diseases 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 201000009310 astigmatism Diseases 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 201000005884 exanthem Diseases 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 206010037844 rash Diseases 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/305—Contactless testing using electron beams
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136254—Checking; Testing
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Liquid Crystal (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Electric Properties And Detecting Electric Faults (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Photovoltaic Devices (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006015714.1A DE102006015714B4 (de) | 2006-04-04 | 2006-04-04 | Lichtunterstütztes Testen eines optoelektronischen Moduls |
| TW096111586A TWI383133B (zh) | 2006-04-04 | 2007-04-02 | 用以測試光電模組之裝置與方法 |
| CN200780020797XA CN101460857B (zh) | 2006-04-04 | 2007-04-04 | 光电模块的光辅助测试 |
| JP2009503487A JP5519271B2 (ja) | 2006-04-04 | 2007-04-04 | オプトエレクトロニックモジュールの光補助試験 |
| US12/296,055 US8222911B2 (en) | 2006-04-04 | 2007-04-04 | Light-assisted testing of an optoelectronic module |
| PCT/EP2007/003063 WO2007115774A1 (de) | 2006-04-04 | 2007-04-04 | Lichtunterstütztes testen eines optoelektronischen moduls |
| KR1020087026897A KR101342460B1 (ko) | 2006-04-04 | 2008-11-03 | 광전자 모듈의 광-보조 테스팅 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006015714.1A DE102006015714B4 (de) | 2006-04-04 | 2006-04-04 | Lichtunterstütztes Testen eines optoelektronischen Moduls |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102006015714A1 DE102006015714A1 (de) | 2007-10-18 |
| DE102006015714B4 true DE102006015714B4 (de) | 2019-09-05 |
Family
ID=38283920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102006015714.1A Expired - Fee Related DE102006015714B4 (de) | 2006-04-04 | 2006-04-04 | Lichtunterstütztes Testen eines optoelektronischen Moduls |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8222911B2 (enExample) |
| JP (1) | JP5519271B2 (enExample) |
| KR (1) | KR101342460B1 (enExample) |
| CN (1) | CN101460857B (enExample) |
| DE (1) | DE102006015714B4 (enExample) |
| TW (1) | TWI383133B (enExample) |
| WO (1) | WO2007115774A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5520289B2 (ja) * | 2008-05-21 | 2014-06-11 | フォトン・ダイナミクス・インコーポレイテッド | 前方照明(frontlighting)を用いてディスプレイパネル上の欠陥の検出を向上させること |
| KR101052361B1 (ko) * | 2008-07-31 | 2011-07-27 | 한국표준과학연구원 | 중에너지 이온빔 산란을 이용한 분광분석기 |
| WO2010140236A1 (ja) * | 2009-06-03 | 2010-12-09 | 三菱電機株式会社 | 粒子線照射装置 |
| US10373998B1 (en) * | 2013-03-14 | 2019-08-06 | Wavefront Research, Inc. | Compact annular field imager optical interconnect |
| CN103353790B (zh) * | 2013-06-26 | 2016-09-14 | 林大伟 | 光线寻迹方法与装置 |
| CN103324304B (zh) * | 2013-06-26 | 2016-05-11 | 林大伟 | 光传感器阵列装置 |
| US9804000B2 (en) * | 2013-09-25 | 2017-10-31 | Yun-Shan Chang | Optical sensor array apparatus |
| US9804688B2 (en) * | 2013-09-25 | 2017-10-31 | Yun-Shan Chang | Light tracing method and apparatus thereof |
| US9804695B2 (en) * | 2014-01-08 | 2017-10-31 | Yun-Shan Chang | Cursor control apparatus and method for the same |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4875004A (en) * | 1988-06-01 | 1989-10-17 | The United States Of America As Represented By The Secretary Of The Army | High speed semiconductor characterization technique |
| DE4003983C1 (en) * | 1990-02-09 | 1991-08-29 | Abos Automation, Bildverarbeitung, Optische Systeme Gmbh, 8057 Eching, De | Automated monitoring of space=shape data for mfg. semiconductors - compares image signals for defined illumination angle range with master signals, to determine defects |
| US5057773A (en) | 1989-03-21 | 1991-10-15 | International Business Machines Corporation | Method for opens/shorts testing of capacitively coupled networks in substrates using electron beams |
| EP0523594A1 (de) | 1991-07-15 | 1993-01-20 | ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH | Verfahren zur Korpuskularstrahl-Prüfung von Substraten für Flüssigkeitskristallanzeigen (LCD) |
| DE3879541T2 (de) * | 1987-04-21 | 1993-09-30 | Philips Nv | Prüfverfahren für LCD-Elemente. |
| EP0943951A1 (en) | 1998-03-20 | 1999-09-22 | Nec Corporation | Optical surface inspection apparatus and inspecting method |
| DE19901767A1 (de) * | 1999-01-18 | 2000-07-20 | Etec Ebt Gmbh | Verfahren und Vorrichtung zum Testen der Funktion einer Vielzahl von Mikrostrukturelementen |
| US20040223140A1 (en) | 2003-05-09 | 2004-11-11 | Shimadzu Corporation | TFT array inspection apparatus |
| WO2004109375A1 (ja) | 2003-06-06 | 2004-12-16 | Toshiba Matsushita Display Technology Co., Ltd. | 基板の検査方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH073446B2 (ja) * | 1988-05-18 | 1995-01-18 | 松下電器産業株式会社 | スイッチング素子を有したアクティブ基板の欠陥検査装置および欠陥検査方法 |
| US4902967A (en) * | 1989-05-18 | 1990-02-20 | The United States Of America As Represented By The Secretary Of The Navy | Scanning electron microscopy by photovoltage contrast imaging |
| US5150043A (en) * | 1991-02-11 | 1992-09-22 | The United States Of America As Represented By The Secretary Of The Navy | Apparatus and method for non-contact surface voltage probing by scanning photoelectron emission |
| US5943125A (en) * | 1997-02-26 | 1999-08-24 | Acuity Imaging, Llc | Ring illumination apparatus for illuminating reflective elements on a generally planar surface |
| US5828449A (en) * | 1997-02-26 | 1998-10-27 | Acuity Imaging, Llc | Ring illumination reflective elements on a generally planar surface |
| US5982190A (en) * | 1998-02-04 | 1999-11-09 | Toro-Lira; Guillermo L. | Method to determine pixel condition on flat panel displays using an electron beam |
| EP1271605A4 (en) * | 2000-11-02 | 2009-09-02 | Ebara Corp | ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING SAID APPARATUS |
| JP2003331774A (ja) * | 2002-05-16 | 2003-11-21 | Toshiba Corp | 電子ビーム装置およびその装置を用いたデバイス製造方法 |
| CN101107534B (zh) * | 2005-05-02 | 2012-04-25 | 株式会社岛津制作所 | Tft阵列基板检查装置 |
-
2006
- 2006-04-04 DE DE102006015714.1A patent/DE102006015714B4/de not_active Expired - Fee Related
-
2007
- 2007-04-02 TW TW096111586A patent/TWI383133B/zh not_active IP Right Cessation
- 2007-04-04 US US12/296,055 patent/US8222911B2/en not_active Expired - Fee Related
- 2007-04-04 WO PCT/EP2007/003063 patent/WO2007115774A1/de not_active Ceased
- 2007-04-04 CN CN200780020797XA patent/CN101460857B/zh active Active
- 2007-04-04 JP JP2009503487A patent/JP5519271B2/ja active Active
-
2008
- 2008-11-03 KR KR1020087026897A patent/KR101342460B1/ko active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3879541T2 (de) * | 1987-04-21 | 1993-09-30 | Philips Nv | Prüfverfahren für LCD-Elemente. |
| US4875004A (en) * | 1988-06-01 | 1989-10-17 | The United States Of America As Represented By The Secretary Of The Army | High speed semiconductor characterization technique |
| US5057773A (en) | 1989-03-21 | 1991-10-15 | International Business Machines Corporation | Method for opens/shorts testing of capacitively coupled networks in substrates using electron beams |
| DE4003983C1 (en) * | 1990-02-09 | 1991-08-29 | Abos Automation, Bildverarbeitung, Optische Systeme Gmbh, 8057 Eching, De | Automated monitoring of space=shape data for mfg. semiconductors - compares image signals for defined illumination angle range with master signals, to determine defects |
| EP0523594A1 (de) | 1991-07-15 | 1993-01-20 | ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH | Verfahren zur Korpuskularstrahl-Prüfung von Substraten für Flüssigkeitskristallanzeigen (LCD) |
| EP0943951A1 (en) | 1998-03-20 | 1999-09-22 | Nec Corporation | Optical surface inspection apparatus and inspecting method |
| DE19901767A1 (de) * | 1999-01-18 | 2000-07-20 | Etec Ebt Gmbh | Verfahren und Vorrichtung zum Testen der Funktion einer Vielzahl von Mikrostrukturelementen |
| US20040223140A1 (en) | 2003-05-09 | 2004-11-11 | Shimadzu Corporation | TFT array inspection apparatus |
| WO2004109375A1 (ja) | 2003-06-06 | 2004-12-16 | Toshiba Matsushita Display Technology Co., Ltd. | 基板の検査方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US8222911B2 (en) | 2012-07-17 |
| JP5519271B2 (ja) | 2014-06-11 |
| DE102006015714A1 (de) | 2007-10-18 |
| TW200745530A (en) | 2007-12-16 |
| US20090179656A1 (en) | 2009-07-16 |
| CN101460857B (zh) | 2012-07-18 |
| TWI383133B (zh) | 2013-01-21 |
| KR20090060215A (ko) | 2009-06-11 |
| WO2007115774A1 (de) | 2007-10-18 |
| JP2009532687A (ja) | 2009-09-10 |
| KR101342460B1 (ko) | 2013-12-17 |
| CN101460857A (zh) | 2009-06-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2007115774A1 (de) | Lichtunterstütztes testen eines optoelektronischen moduls | |
| DE102013016113B4 (de) | Verfahren zum Detektieren von Elektronen, Elektronendetektor und Inspektionssystem | |
| DE10329383B4 (de) | Ionenstrahldetektor für Ionenimplantationsanlagen, Faraday-Behälter dafür und Verfahren zur Steuerung der Eigenschaften eines Ionenstrahls mittels des Ionenstrahldetektors | |
| DE112014004151B4 (de) | Verfahren zur Korrektur der Neigung eines Strahls geladener Teilchen und mit einem Strahl geladener Teilchen arbeitende Vorrichtung | |
| DE10253717B4 (de) | Vorrichtung zum Kontaktieren für den Test mindestens eines Testobjekts, Testsystem und Verfahren zum Testen von Testobjekten | |
| DE102021205394A1 (de) | Verfahren zum Betrieb eines Vielstrahlmikroskops mit an eine Inspektionsstelle angepassten Einstellungen | |
| DE102021118561A1 (de) | Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskopes mit schneller Strahlstromregelung, Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop | |
| DE102019218315B3 (de) | Verfahren zur Spannungskontrastbildgebung mit einem Korpuskularvielstrahlmikroskop, Korpuskularvielstrahlmikroskop für Spannungskontrastbildgebung und Halbleiterstrukturen zur Spannungskontrastbildgebung mit einem Korpuskularvielstrahlmikroskop | |
| EP0932182A2 (de) | Verfahren und Vorrichtung zum Testen eines Substrats | |
| DE10134755B4 (de) | Verfahren zur Messung einer charakteristischen Abmessung wenigstens einer Struktur auf Halbleiterwafern | |
| DE102022114923B4 (de) | Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskops, Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop | |
| DE102004025890B4 (de) | Substratinspektionsvorrichtung, Substratinspektionsverfahren und Verwendung des Verfahrens zum Herstellen einer Halbleitereinrichtung | |
| DE102005014793B4 (de) | Verfahren und Inspektionssystem zur CD-Messung auf der Grundlage der Bestimmung von Flächenanteilen | |
| DE102021116969B3 (de) | Verfahren zur bereichsweisen Probeninspektion mittels eines Vielstrahl-Teilchenmikroskopes, Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop zur Halbleiterprobeninspektion | |
| DE112019006527T5 (de) | Defektprüfvorrichtung und Defektprüfverfahren | |
| WO2004001706A2 (de) | Ansteuervorrichtung eines optoelektronischen gerätes mit verbesserten testeigenschaften | |
| DE112017006885B4 (de) | Ladungsträgerstrahlvorrichtung und Verfahren zum Einstellen der Ladungsträgerstrahlvorrichtung | |
| DE102023119451B4 (de) | Vielstrahl-Teilchenstrahlsystem mit elektrostatischer Boosterlinse, Verfahren zum Betreiben eines Vielstrahl-Teilchenstrahlsystems und zugehöriges Computerprogrammprodukt | |
| DE10302794A1 (de) | Verfahren und Vorrichtung zur Herstellung von Korpuskularstrahlsystemen | |
| DE102024128162B3 (de) | Verfahren zum Einstellen einer Vielkanal-Detektionseinheit eines Vielstrahl-Teilchenmikroskops bei einer Inspektion aufladbarer Proben, zugehöriges Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop | |
| DE60309579T2 (de) | Einrichtung zur messung der emission von röntgenstrahlen, die durch ein objekt erzeugt werden, das einem elektronenstrahl ausgesetzt ist | |
| DE102019101750B4 (de) | Elektronenstrahlvorrichtung | |
| DE112020001773T5 (de) | Verwendung absoluter werte der z-höhe für synergie zwischen werkzeugen | |
| DE102021118684B4 (de) | Verfahren zur Analyse von Störeinflüssen bei einem Vielstrahl-Teilchenmikroskop, zugehöriges Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop | |
| DE102004030122B4 (de) | Verfahren zum Charakterisieren einer auf einem Tägersubstrat ausgebildeten regelmäßigen Struktur |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| R018 | Grant decision by examination section/examining division | ||
| R020 | Patent grant now final | ||
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |