KR101101210B1 - 패널 검사 및 리페어 장치용 히팅 필름 접착 스테이지를 구비한 패널 검사 및 리페어 장치 - Google Patents
패널 검사 및 리페어 장치용 히팅 필름 접착 스테이지를 구비한 패널 검사 및 리페어 장치 Download PDFInfo
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- KR101101210B1 KR101101210B1 KR1020090033630A KR20090033630A KR101101210B1 KR 101101210 B1 KR101101210 B1 KR 101101210B1 KR 1020090033630 A KR1020090033630 A KR 1020090033630A KR 20090033630 A KR20090033630 A KR 20090033630A KR 101101210 B1 KR101101210 B1 KR 101101210B1
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- panel
- inspection
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- repair
- film
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- 238000012360 testing method Methods 0.000 title description 4
- 238000007689 inspection Methods 0.000 claims abstract description 111
- 239000000758 substrate Substances 0.000 claims abstract description 53
- 239000000853 adhesive Substances 0.000 claims abstract description 13
- 230000001070 adhesive effect Effects 0.000 claims abstract description 13
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims abstract description 3
- 230000002159 abnormal effect Effects 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 abstract description 65
- 239000011521 glass Substances 0.000 abstract description 2
- 230000008021 deposition Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 113
- 238000000034 method Methods 0.000 description 24
- 238000004519 manufacturing process Methods 0.000 description 16
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- 230000001678 irradiating effect Effects 0.000 description 9
- 239000007788 liquid Substances 0.000 description 8
- 239000011344 liquid material Substances 0.000 description 7
- 238000005286 illumination Methods 0.000 description 5
- 238000011179 visual inspection Methods 0.000 description 4
- 230000020169 heat generation Effects 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
- H01L31/022475—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers composed of indium tin oxide [ITO]
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electromagnetism (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
Claims (8)
- 상면에 검사하고자 하는 패널이 로딩되는 투명한 스테이지 기판을 갖는 스테이지와, 상기 스테이지에 로딩된 패널의 정상 여부를 검사하는 검사부와, 상기 검사부의 검사 결과에 상응하여 비정상 패널을 리페어하는 리페어기를 포함하는 패널 검사 및 리페어 장치에 있어서,상기 스테이지 기판은,100~200㎛의 두께로 절연성, 고광택성, 투명성 및 내열성을 갖는 절연필름 상면에 전압 인가시 상기 스테이지 기판을 30~50℃로 가열하도록 50~150Ω의 선저항값을 갖는 투명성 및 전기 전도성의 액상 ITO를 전면에 고르게 도포하고 경화시켜 발열층을 형성한 후, 상기 스테이지 기판의 저면에 무결정성 및 투명성을 갖는 접착제를 도포하여, 상기 발열층이 형성된 상기 절연필름의 상면을 접착시키고, 상기 발열층에 소정 전압을 인가하는 전극을 형성한 것을 특징으로 하는 패널 검사 및 리페어 장치용 히팅 필름 접착 스테이지를 구비한 패널 검사 및 리페어 장치.
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020090033630A KR101101210B1 (ko) | 2009-04-17 | 2009-04-17 | 패널 검사 및 리페어 장치용 히팅 필름 접착 스테이지를 구비한 패널 검사 및 리페어 장치 |
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KR1020090033630A KR101101210B1 (ko) | 2009-04-17 | 2009-04-17 | 패널 검사 및 리페어 장치용 히팅 필름 접착 스테이지를 구비한 패널 검사 및 리페어 장치 |
Publications (2)
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KR20090119945A KR20090119945A (ko) | 2009-11-23 |
KR101101210B1 true KR101101210B1 (ko) | 2012-01-04 |
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KR1020090033630A KR101101210B1 (ko) | 2009-04-17 | 2009-04-17 | 패널 검사 및 리페어 장치용 히팅 필름 접착 스테이지를 구비한 패널 검사 및 리페어 장치 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170057900A (ko) * | 2015-11-17 | 2017-05-26 | (주)세온 | 발열 플랫폼 및 이를 포함하는 3 차원 프린팅 장치 |
KR20170077027A (ko) * | 2015-12-25 | 2017-07-05 | 엘지디스플레이 주식회사 | 플렉서블 디스플레이 및 그 사용 방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070009724A (ko) * | 2004-05-07 | 2007-01-18 | 유겐가이샤 에이치에스 플래닝 | 터치패널용 도전성 필름 및 터치패널용 도전성 필름제조방법 |
KR100703029B1 (ko) * | 2004-12-24 | 2007-04-05 | (주) 유니플라텍 | 저항특성이 우수한 면상발열체 |
KR100816682B1 (ko) * | 2006-12-20 | 2008-03-27 | 참앤씨(주) | 평판디스플레이 패널의 검사 장치 |
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- 2009-04-17 KR KR1020090033630A patent/KR101101210B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070009724A (ko) * | 2004-05-07 | 2007-01-18 | 유겐가이샤 에이치에스 플래닝 | 터치패널용 도전성 필름 및 터치패널용 도전성 필름제조방법 |
KR100703029B1 (ko) * | 2004-12-24 | 2007-04-05 | (주) 유니플라텍 | 저항특성이 우수한 면상발열체 |
KR100816682B1 (ko) * | 2006-12-20 | 2008-03-27 | 참앤씨(주) | 평판디스플레이 패널의 검사 장치 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170057900A (ko) * | 2015-11-17 | 2017-05-26 | (주)세온 | 발열 플랫폼 및 이를 포함하는 3 차원 프린팅 장치 |
KR101863080B1 (ko) * | 2015-11-17 | 2018-06-01 | (주)세온 | 발열 플랫폼 및 이를 포함하는 3 차원 프린팅 장치 |
KR20170077027A (ko) * | 2015-12-25 | 2017-07-05 | 엘지디스플레이 주식회사 | 플렉서블 디스플레이 및 그 사용 방법 |
KR101921234B1 (ko) * | 2015-12-25 | 2018-11-22 | 엘지디스플레이 주식회사 | 플렉서블 디스플레이 및 그 사용 방법 |
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KR20090119945A (ko) | 2009-11-23 |
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