JP2009532245A5 - - Google Patents

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Publication number
JP2009532245A5
JP2009532245A5 JP2009504231A JP2009504231A JP2009532245A5 JP 2009532245 A5 JP2009532245 A5 JP 2009532245A5 JP 2009504231 A JP2009504231 A JP 2009504231A JP 2009504231 A JP2009504231 A JP 2009504231A JP 2009532245 A5 JP2009532245 A5 JP 2009532245A5
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JP
Japan
Prior art keywords
template
substrate
creating
nanoimprint mold
vacuum environment
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JP2009504231A
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English (en)
Japanese (ja)
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JP4536148B2 (ja
JP2009532245A (ja
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Priority claimed from PCT/US2007/008075 external-priority patent/WO2007123805A2/en
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Publication of JP2009532245A5 publication Critical patent/JP2009532245A5/ja
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JP2009504231A 2006-04-03 2007-04-02 リソグラフィ・インプリント・システム Active JP4536148B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78877906P 2006-04-03 2006-04-03
PCT/US2007/008075 WO2007123805A2 (en) 2006-04-03 2007-04-02 Lithography imprinting system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010063842A Division JP4917159B2 (ja) 2006-04-03 2010-03-19 リソグラフィ・インプリント・システム

Publications (3)

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JP2009532245A JP2009532245A (ja) 2009-09-10
JP2009532245A5 true JP2009532245A5 (enExample) 2010-05-06
JP4536148B2 JP4536148B2 (ja) 2010-09-01

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JP2009504231A Active JP4536148B2 (ja) 2006-04-03 2007-04-02 リソグラフィ・インプリント・システム
JP2010063842A Active JP4917159B2 (ja) 2006-04-03 2010-03-19 リソグラフィ・インプリント・システム

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JP2010063842A Active JP4917159B2 (ja) 2006-04-03 2010-03-19 リソグラフィ・インプリント・システム

Country Status (8)

Country Link
US (1) US7462028B2 (enExample)
EP (1) EP2001602B1 (enExample)
JP (2) JP4536148B2 (enExample)
KR (1) KR20080114681A (enExample)
CN (1) CN101405087A (enExample)
AT (1) ATE513625T1 (enExample)
TW (1) TWI432311B (enExample)
WO (1) WO2007123805A2 (enExample)

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DE112015000816T5 (de) 2014-02-14 2016-11-03 Gentherm Incorporated Leitfähiger, konvektiver klimatisierter Sitz
DE112015002175T5 (de) 2014-05-09 2017-01-19 Gentherm Incorporated Klimatisierungseinrichtung
WO2015181924A1 (ja) * 2014-05-29 2015-12-03 キヤノン株式会社 塗布装置、インプリント装置および物品の製造方法
JP6361303B2 (ja) * 2014-06-13 2018-07-25 大日本印刷株式会社 インプリント用モールドおよびインプリント装置
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US11033058B2 (en) 2014-11-14 2021-06-15 Gentherm Incorporated Heating and cooling technologies
US11857004B2 (en) 2014-11-14 2024-01-02 Gentherm Incorporated Heating and cooling technologies
JP6525567B2 (ja) * 2014-12-02 2019-06-05 キヤノン株式会社 インプリント装置及び物品の製造方法
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PL3256906T3 (pl) * 2015-02-13 2019-10-31 Morphotonics Holding Bv Sposób teksturowania dyskretnych podłoży i elastyczny stempel
CN107364057A (zh) * 2017-07-10 2017-11-21 天津工业大学 一种不同粗糙度模板的制备方法
JP6992331B2 (ja) * 2017-09-05 2022-01-13 大日本印刷株式会社 インプリントモールド
US10895806B2 (en) * 2017-09-29 2021-01-19 Canon Kabushiki Kaisha Imprinting method and apparatus
JP7077754B2 (ja) * 2018-05-08 2022-05-31 大日本印刷株式会社 インプリントモールド用基板、インプリントモールド及びそれらの製造方法
US11075331B2 (en) 2018-07-30 2021-07-27 Gentherm Incorporated Thermoelectric device having circuitry with structural rigidity
CN113167510B (zh) 2018-11-30 2025-10-03 金瑟姆股份公司 热电调节系统和方法
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