JP2009532245A5 - - Google Patents

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Publication number
JP2009532245A5
JP2009532245A5 JP2009504231A JP2009504231A JP2009532245A5 JP 2009532245 A5 JP2009532245 A5 JP 2009532245A5 JP 2009504231 A JP2009504231 A JP 2009504231A JP 2009504231 A JP2009504231 A JP 2009504231A JP 2009532245 A5 JP2009532245 A5 JP 2009532245A5
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JP
Japan
Prior art keywords
template
substrate
creating
nanoimprint mold
vacuum environment
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JP2009504231A
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English (en)
Japanese (ja)
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JP2009532245A (ja
JP4536148B2 (ja
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Priority claimed from PCT/US2007/008075 external-priority patent/WO2007123805A2/en
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Publication of JP2009532245A5 publication Critical patent/JP2009532245A5/ja
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JP2009504231A 2006-04-03 2007-04-02 リソグラフィ・インプリント・システム Active JP4536148B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78877906P 2006-04-03 2006-04-03
PCT/US2007/008075 WO2007123805A2 (en) 2006-04-03 2007-04-02 Lithography imprinting system

Related Child Applications (1)

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JP2010063842A Division JP4917159B2 (ja) 2006-04-03 2010-03-19 リソグラフィ・インプリント・システム

Publications (3)

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JP2009532245A JP2009532245A (ja) 2009-09-10
JP2009532245A5 true JP2009532245A5 (enExample) 2010-05-06
JP4536148B2 JP4536148B2 (ja) 2010-09-01

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JP2009504231A Active JP4536148B2 (ja) 2006-04-03 2007-04-02 リソグラフィ・インプリント・システム
JP2010063842A Active JP4917159B2 (ja) 2006-04-03 2010-03-19 リソグラフィ・インプリント・システム

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JP2010063842A Active JP4917159B2 (ja) 2006-04-03 2010-03-19 リソグラフィ・インプリント・システム

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US (1) US7462028B2 (enExample)
EP (1) EP2001602B1 (enExample)
JP (2) JP4536148B2 (enExample)
KR (1) KR20080114681A (enExample)
CN (1) CN101405087A (enExample)
AT (1) ATE513625T1 (enExample)
TW (1) TWI432311B (enExample)
WO (1) WO2007123805A2 (enExample)

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KR102566639B1 (ko) * 2015-02-13 2023-08-16 모포토닉스 홀딩 비.브이. 이산 기판들 ⅱ의 텍스쳐링을 위한 방법
CN107364057A (zh) * 2017-07-10 2017-11-21 天津工业大学 一种不同粗糙度模板的制备方法
JP6992331B2 (ja) * 2017-09-05 2022-01-13 大日本印刷株式会社 インプリントモールド
US10895806B2 (en) * 2017-09-29 2021-01-19 Canon Kabushiki Kaisha Imprinting method and apparatus
JP7077754B2 (ja) * 2018-05-08 2022-05-31 大日本印刷株式会社 インプリントモールド用基板、インプリントモールド及びそれらの製造方法
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