JP2009527023A5 - - Google Patents
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- JP2009527023A5 JP2009527023A5 JP2008555264A JP2008555264A JP2009527023A5 JP 2009527023 A5 JP2009527023 A5 JP 2009527023A5 JP 2008555264 A JP2008555264 A JP 2008555264A JP 2008555264 A JP2008555264 A JP 2008555264A JP 2009527023 A5 JP2009527023 A5 JP 2009527023A5
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- 239000002253 acid Substances 0.000 claims 3
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims 3
- 239000003999 initiator Substances 0.000 claims 3
- -1 triazine compound Chemical class 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 239000000178 monomer Substances 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 229920005596 polymer binder Polymers 0.000 claims 2
- 239000002491 polymer binding agent Substances 0.000 claims 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 2
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-Triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 claims 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N Maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims 1
- SQDFHQJTAWCFIB-UHFFFAOYSA-N N-methylidenehydroxylamine Chemical compound ON=C SQDFHQJTAWCFIB-UHFFFAOYSA-N 0.000 claims 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 claims 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000004423 acyloxy group Chemical group 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 239000011230 binding agent Substances 0.000 claims 1
- 150000001638 boron Chemical class 0.000 claims 1
- 125000002837 carbocyclic group Chemical group 0.000 claims 1
- 150000007942 carboxylates Chemical group 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 239000000539 dimer Substances 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 claims 1
- 125000001475 halogen functional group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 150000002978 peroxides Chemical class 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 230000001235 sensitizing Effects 0.000 claims 1
- 231100000202 sensitizing Toxicity 0.000 claims 1
- 239000011780 sodium chloride Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims 1
- XTXRWKRVRITETP-UHFFFAOYSA-N vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/356,518 | 2006-02-17 | ||
| US11/356,518 US7175949B1 (en) | 2006-02-17 | 2006-02-17 | Radiation-sensitive compositions and imageable materials |
| PCT/US2007/003077 WO2007097907A2 (en) | 2006-02-17 | 2007-02-06 | Radiation-sensitive compositions and imageable materials |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009527023A JP2009527023A (ja) | 2009-07-23 |
| JP2009527023A5 true JP2009527023A5 (US20080242721A1-20081002-C00053.png) | 2011-04-07 |
| JP5155885B2 JP5155885B2 (ja) | 2013-03-06 |
Family
ID=37719626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008555264A Expired - Fee Related JP5155885B2 (ja) | 2006-02-17 | 2007-02-06 | 輻射線感光性組成物及び画像形成性材料 |
Country Status (5)
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10356847B4 (de) * | 2003-12-05 | 2005-10-06 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| EP1868766A1 (de) * | 2005-04-07 | 2007-12-26 | Alstom Technology Ltd | Verfahren zum reparieren oder erneuern von kühllöchern einer beschichteten komponente einer gasturbine |
| US7524614B2 (en) * | 2006-05-26 | 2009-04-28 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US7332253B1 (en) * | 2006-07-27 | 2008-02-19 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US7326521B1 (en) * | 2006-08-31 | 2008-02-05 | Eastman Kodak Company | Method of imaging and developing negative-working elements |
| US20090208865A1 (en) * | 2008-02-19 | 2009-08-20 | International Business Machines Corporation | Photolithography focus improvement by reduction of autofocus radiation transmission into substrate |
| EP2098367A1 (en) | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| US8084182B2 (en) | 2008-04-29 | 2011-12-27 | Eastman Kodak Company | On-press developable elements and methods of use |
| US20100151385A1 (en) | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
| US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
| US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
| US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
| US8293451B2 (en) | 2009-08-18 | 2012-10-23 | International Business Machines Corporation | Near-infrared absorbing film compositions |
| US8772376B2 (en) | 2009-08-18 | 2014-07-08 | International Business Machines Corporation | Near-infrared absorbing film compositions |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
| US8426104B2 (en) | 2009-10-08 | 2013-04-23 | Eastman Kodak Company | Negative-working imageable elements |
| US8329383B2 (en) | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US20110177456A1 (en) * | 2010-01-21 | 2011-07-21 | Mathias Jarek | Method of making lithographic printing plates |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| JP5705584B2 (ja) * | 2011-02-24 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| WO2012133382A1 (ja) * | 2011-03-28 | 2012-10-04 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2762973B1 (en) * | 2011-09-26 | 2017-11-29 | Fujifilm Corporation | Method for producing lithographic printing plate |
| JP5732012B2 (ja) * | 2011-09-26 | 2015-06-10 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| JP6029558B2 (ja) * | 2013-09-30 | 2016-11-24 | 富士フイルム株式会社 | 光インプリント用硬化性組成物、パターン形成方法、微細パターン、および半導体デバイスの製造方法 |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| CN106313870B (zh) | 2016-08-19 | 2018-06-15 | 浙江康尔达新材料股份有限公司 | 一种可成像涂层、热敏阴图平版印刷版及其制版方法 |
| EP3501837A1 (en) * | 2017-12-21 | 2019-06-26 | Université de Haute Alsace | Thermal amplification of free radical polymerization induced by red to near-infrared irradiation |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| CN113942289B (zh) | 2021-10-26 | 2023-02-28 | 浙江康尔达新材料股份有限公司 | 一种用于光敏阴图型平版印刷版的可成像组合物及其制版方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2363806B2 (de) * | 1973-12-21 | 1979-05-17 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
| JPS62212643A (ja) | 1986-03-14 | 1987-09-18 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| US4994347A (en) * | 1988-01-15 | 1991-02-19 | E. I. Du Pont De Nemours And Company | Storage stable photopolymerizable composition and element for refractive index imaging |
| CA1324015C (en) * | 1988-10-06 | 1993-11-09 | Yasuo Yamagishi | Method of and apparatus for forming volume type phase hologram |
| JPH0488005A (ja) * | 1990-07-31 | 1992-03-19 | Fujitsu Ltd | レジスト組成物およびレジストパターン形成方法 |
| JPH0777922A (ja) * | 1993-09-10 | 1995-03-20 | Toyo Ink Mfg Co Ltd | ホログラム記録用材料及びホログラム記録用媒体 |
| EP0770494B1 (en) * | 1995-10-24 | 2000-05-24 | Agfa-Gevaert N.V. | A method for making a lithographic printing plate involving on press development |
| US6309792B1 (en) | 2000-02-18 | 2001-10-30 | Kodak Polychrome Graphics Llc | IR-sensitive composition and use thereof for the preparation of printing plate precursors |
| US6899994B2 (en) | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
| US6908726B2 (en) | 2003-04-07 | 2005-06-21 | Kodak Polychrome Graphics Llc | Thermally imageable elements imageable at several wavelengths |
| JP2005187678A (ja) | 2003-12-26 | 2005-07-14 | Toyo Ink Mfg Co Ltd | 光重合性組成物 |
| WO2005116766A1 (ja) * | 2004-05-25 | 2005-12-08 | Kodak Polychrome Graphics Japan Ltd. | ネガ型感光性組成物およびネガ型感光性平版印刷版 |
-
2006
- 2006-02-17 US US11/356,518 patent/US7175949B1/en not_active Expired - Fee Related
-
2007
- 2007-02-06 EP EP07749979A patent/EP1984786A2/en not_active Withdrawn
- 2007-02-06 CN CNA2007800056132A patent/CN101384962A/zh active Pending
- 2007-02-06 WO PCT/US2007/003077 patent/WO2007097907A2/en active Application Filing
- 2007-02-06 JP JP2008555264A patent/JP5155885B2/ja not_active Expired - Fee Related
