JP2009525381A - プラズマによる表面処理方法及び表面処理装置 - Google Patents

プラズマによる表面処理方法及び表面処理装置 Download PDF

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Publication number
JP2009525381A
JP2009525381A JP2008553191A JP2008553191A JP2009525381A JP 2009525381 A JP2009525381 A JP 2009525381A JP 2008553191 A JP2008553191 A JP 2008553191A JP 2008553191 A JP2008553191 A JP 2008553191A JP 2009525381 A JP2009525381 A JP 2009525381A
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JP
Japan
Prior art keywords
surface treatment
atmospheric pressure
glow discharge
film
discharge plasma
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Pending
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JP2008553191A
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English (en)
Japanese (ja)
Inventor
フリース ヒンドリク ウィレム デ
Original Assignee
フジフィルム マニュファクチャリング ユーロプ ビー．ブイ．
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Publication of JP2009525381A publication Critical patent/JP2009525381A/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2441—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/123—Treatment by wave energy or particle radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/26—Matching networks

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • Chemical Vapour Deposition (AREA)
JP2008553191A 2006-02-02 2007-02-02 プラズマによる表面処理方法及び表面処理装置 Pending JP2009525381A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06101207.6 2006-02-02
EP06101207 2006-02-02
PCT/NL2007/050040 WO2007089146A1 (fr) 2006-02-02 2007-02-02 Méthode de traitement de surface par plasma et dispositif de traitement de surface

Publications (1)

Publication Number Publication Date
JP2009525381A true JP2009525381A (ja) 2009-07-09

Family

ID=36593747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008553191A Pending JP2009525381A (ja) 2006-02-02 2007-02-02 プラズマによる表面処理方法及び表面処理装置

Country Status (3)

Country Link
EP (1) EP1979400A1 (fr)
JP (1) JP2009525381A (fr)
WO (1) WO2007089146A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011528067A (ja) * 2008-07-16 2011-11-10 エージーシー グラス ユーロップ 支持体の両側上に同時に膜を蒸着するための方法及び装置
JP2011528066A (ja) * 2008-07-16 2011-11-10 エージーシー グラス ユーロップ 支持体の上に膜を蒸着するための方法及び設備
JP2014051593A (ja) * 2012-09-07 2014-03-20 Sumitomo Chemical Co Ltd 基材および光学フィルム

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009538989A (ja) 2006-05-30 2009-11-12 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． パルス化大気圧グロー放電を使用する堆積の方法及び装置
US8338307B2 (en) 2007-02-13 2012-12-25 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
JP5597551B2 (ja) 2008-02-01 2014-10-01 フジフィルム マニュファクチュアリング ヨーロッパ ビー．ヴィ． 移動基材のプラズマ表面処理の装置、方法および当該方法の使用
JP5473946B2 (ja) * 2008-02-08 2014-04-16 フジフィルム マニュファクチュアリング ヨーロッパ ビー．ヴィ． Ｗｖｔｒバリア性を改善した多層スタック構造体の製造方法
EP2528082A3 (fr) * 2008-02-21 2014-11-05 FUJIFILM Manufacturing Europe B.V. Appareil de traitement au plasma avec configuration d'électrode à décharge luminescente à pression atmosphérique
EP2326151A1 (fr) * 2009-11-24 2011-05-25 AGC Glass Europe Procédé et dispositif de polarisation d'une électrode DBD
WO2012004175A1 (fr) * 2010-07-09 2012-01-12 Vito Nv Procédé et dispositif pour le traitement par plasma à la pression atmosphérique
GB201012226D0 (en) 2010-07-21 2010-09-08 Fujifilm Mfg Europe Bv Method for manufacturing a barrier on a sheet and a sheet for PV modules
GB201012225D0 (en) 2010-07-21 2010-09-08 Fujifilm Mfg Europe Bv Method for manufacturing a barrier layer on a substrate and a multi-layer stack
RU191710U1 (ru) * 2018-12-21 2019-08-19 АНО ВО "Белгородский университет кооперации, экономики и права" Устройство для иризации изделий из стекла

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214329A (ja) 1999-01-25 2000-08-04 Sumitomo Chem Co Ltd 直線偏光板
TW200510790A (en) 1999-04-15 2005-03-16 Konishiroku Photo Ind Manufacturing method of protective film for polarizing plate
JP2002155371A (ja) 2000-11-15 2002-05-31 Sekisui Chem Co Ltd 半導体素子の製造方法及びその装置
JP2002322558A (ja) * 2001-04-25 2002-11-08 Konica Corp 薄膜形成方法、光学フィルム、偏光板及び画像表示装置
JP2003121646A (ja) * 2001-10-12 2003-04-23 Nitto Denko Corp 粘着型偏光板の製造方法、粘着型偏光板および液晶表示装置
US6774569B2 (en) 2002-07-11 2004-08-10 Fuji Photo Film B.V. Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
US7288204B2 (en) 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
JP2004272078A (ja) 2003-03-11 2004-09-30 Fuji Photo Film Co Ltd 偏光板連続製造方法及び設備
JP2005005065A (ja) * 2003-06-10 2005-01-06 Kunihide Tachibana プラズマ処理方法およびプラズマ処理装置
TW594271B (en) 2003-09-23 2004-06-21 Optimax Tech Corp Polarization plate capable of increasing LCD contrast of large viewing angle

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011528067A (ja) * 2008-07-16 2011-11-10 エージーシー グラス ユーロップ 支持体の両側上に同時に膜を蒸着するための方法及び装置
JP2011528066A (ja) * 2008-07-16 2011-11-10 エージーシー グラス ユーロップ 支持体の上に膜を蒸着するための方法及び設備
JP2014051593A (ja) * 2012-09-07 2014-03-20 Sumitomo Chemical Co Ltd 基材および光学フィルム

Also Published As

Publication number Publication date
WO2007089146A1 (fr) 2007-08-09
EP1979400A1 (fr) 2008-10-15

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