JP2009515334A - 半導体チップパッケージに用いる接点パッドの表面処理およびそれらの表面処理を施す方法 - Google Patents
半導体チップパッケージに用いる接点パッドの表面処理およびそれらの表面処理を施す方法 Download PDFInfo
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- JP2009515334A JP2009515334A JP2008538486A JP2008538486A JP2009515334A JP 2009515334 A JP2009515334 A JP 2009515334A JP 2008538486 A JP2008538486 A JP 2008538486A JP 2008538486 A JP2008538486 A JP 2008538486A JP 2009515334 A JP2009515334 A JP 2009515334A
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- Prior art keywords
- conversion coating
- conductor
- contact
- solder
- metallized contact
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
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- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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Abstract
Description
Claims (19)
- 実装構造において、
第1の導体で構成した金属化接点(42)、およびこの金属化接点(42)に隣接し、第2の導体で構成した露出領域(44)を担持する接点パッド(17)を有する接続導体(32)を設けたキャリヤ(30)と、および、
前記接続導体(32)の前記露出領域(44)上の無機マスク層(46)であって、前記露出領域(44)における融解はんだによる濡れを有意に減少させ、はんだが固化する際に、金属化接点(42)上にはんだ層(48)を形成するよう機能する該無機マスク層(46)、
を含む実装構造。 - 請求項1に記載の実装構造において、前記第1の導体は金属を有し、前記マスク層(46)は化成被覆を有するものとした実装構造。
- 請求項2に記載の実装構造において、前記化成被覆は、クロム酸塩化成被覆、モリブデン酸塩化成被覆、亜硫酸塩/シュウ酸塩化成被覆、および過硫酸塩化成被覆、よりなる群から選択された化成被覆とした実装構造。
- 請求項1に記載の実装構造において、前記第1の導体は、ニッケル、銅、モリブデン、またはチタンを含み、前記第2の導体は、金またはパラジウム・ゴールドを含むものとした実装構造。
- 請求項1に記載の実装構造において、前記金属化接点(42)は周縁(45)を有し、前記実装構造は、さらに、前記金属化接点(42)を被覆するはんだ層(48)を備え、このはんだ層は、ほぼ前記金属化接点(42)の周縁(45)の内側に画定されるものとした実装構造。
- 電子的アセンブリにおいて、
半導体ダイ(20)と、
前記半導体ダイ(20)と電気的に結合したキャリヤ(30)であって、該キャリヤ(30)が、第1の導体で構成した金属化接点(42)、およびこの金属化接点(42)に隣接して、第2の導体で構成した露出領域(44)を担持する接点パッド(17)を有する接続導体(32)を設けた該キャリヤ(30)と、
接点パッド(52)を有す基板(50)と、
前記金属化接点(42)を前記基板(50)の接点パッド(52)と電気的に結合するはんだ層(48)と、および
前記接続導体(32)の前記露出領域(44)上の無機マスク層(46)であって、前記露出領域(44)における融解はんだによる濡れを有意に減少させ、はんだが固化する際にはんだ層(48)を形成するよう機能する該無機マスク層(46)と、
備えたことを特徴とする電子的アセンブリ。 - 請求項6に記載の電子的アセンブリにおいて、前記第1の導体は金属有し、前記マスク層(46)は化成被覆を有するものとした電子的アセンブリ。
- 請求項6に記載の電子的アセンブリにおいて、前記化成被覆は、クロム酸塩化成被覆、モリブデン酸塩化成被覆、亜硫酸塩/シュウ酸塩化成被覆、および過硫酸塩化成被覆、よりなる群から選択した化成被覆とした電子的アセンブリ。
- 請求項6に記載の電子的アセンブリにおいて、前記第1の導体は、ニッケル、銅、モリブデン、またはチタンを含み、前記第2の導体は金またはパラジウム・ゴールドを含むものとした電子的アセンブリ。
- 請求項6に記載の電子的アセンブリにおいて、前記金属化接点(42)は端縁(45)を有し、前記はんだ層は、ほぼ前記金属化接点(42)の周縁(45)の内側に画定されるものとした電子的アセンブリ。
- 請求項6に記載の電子的アセンブリにおいて、前記基板(50)はプリント配線板を有するものとした電子的アセンブリ。
- チップパッケージ(10)を基板(50)に取り付ける方法において、
前記チップパッケージ(10)の接続導体(32)を金属化接点(42)で部分的にカバーするステップと、
前記接続導体(32)における金属化接点(42)に隣接した露出部分(44)を無機マスク層(46)でマスキングするマスキングステップと、
前記金属化接点(42)に融解はんだを供給するステップと、
前記無機マスク層(46)によって前記接続導体(32)の露出領域(44)のはんだ濡れを防ぐステップと、および
前記金属化接点(42)上で前記融解はんだを固化させてはんだ層(48)を形成し、前記金属化接点(42)と前記基板(50)の接点パッド(52)との間に電気的接続を生ぜしめるステップと、
を有することを特徴とする方法。 - 請求項12に記載の方法において、前記無機マスク層(46)は、さらに化成被覆を有し、前記露出領域(44)のマスキングステップは、さらに前記チップパッケージ(10)の接続導体(32)における露出領域(44)に化成被覆を形成するステップを有するものとした方法。
- 請求項12に記載の方法において、前記化成被覆は、クロム酸塩化成被覆、モリブデン酸塩化成被覆、亜硫酸塩/シュウ酸塩化成被覆、および過硫酸塩化成被覆、よりなる群から選択した化成被覆とした方法。
- 請求項12に記載の方法において、前記接続導体(32)の露出領域(44)は、ニッケル、銅、モリブデン、またはチタンを含み、前記金属化接点(42)は、接続導体(32)の露出領域(44)上に塗布する、金またはパラジウム・ゴールドを含むものとした方法。
- 前記金属化接点(42)により部分的にカバーし、かつ半導体チップ(20)を支持するキャリヤ(30)に担持した接続導体(32)を処理する方法において、
前記接続導体(32)における金属化接点(42)に近接した露出領域(44)を、この露出領域(44)のはんだ濡れを効果的に防止する無機マスク層(46)でマスキングするマスキングステップ、
を有する方法。 - 請求項16に記載の方法において、前記無機マスク層(46)は、さらに化成被覆を有し、前記露出領域(44)のマスキングステップは、さらに、前記露出領域(44)に化成被覆を形成するステップを有するものとした方法。
- 請求項17に記載の方法において、前記化成被覆は、クロム酸塩化成被覆、モリブデン酸塩化成被覆、亜硫酸塩/シュウ酸塩化成被覆、および過硫酸塩化成被覆、よりなる群から選択した化成被覆とした方法。
- 請求項16に記載の方法において、前記接続導体(32)の露出領域(44)は、ニッケル、銅、モリブデン、またはチタンを含み、金属化接点(42)は、前記接続導体(32)の露出領域(44)上に塗布した、金またはパラジウム・ゴールドを含むものとした方法。
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Application Number | Priority Date | Filing Date | Title |
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US73368105P | 2005-11-03 | 2005-11-03 | |
PCT/IB2006/054106 WO2007052234A2 (en) | 2005-11-03 | 2006-11-03 | Surface treatments for contact pads used in semiconductor chip packages and methods of providing such surface treatments |
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JP2009515334A true JP2009515334A (ja) | 2009-04-09 |
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JP2008538486A Pending JP2009515334A (ja) | 2005-11-03 | 2006-11-03 | 半導体チップパッケージに用いる接点パッドの表面処理およびそれらの表面処理を施す方法 |
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US (1) | US8159826B2 (ja) |
EP (1) | EP1946370A2 (ja) |
JP (1) | JP2009515334A (ja) |
CN (1) | CN100555618C (ja) |
TW (1) | TW200737479A (ja) |
WO (1) | WO2007052234A2 (ja) |
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CN113035722A (zh) | 2019-12-24 | 2021-06-25 | 维谢综合半导体有限责任公司 | 具有选择性模制的用于镀覆的封装工艺 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3827918A (en) * | 1972-05-25 | 1974-08-06 | Ibm | Electrical conductors with chromate solder barrier and method of forming |
JPH06120225A (ja) * | 1992-09-30 | 1994-04-28 | Nippon Telegr & Teleph Corp <Ntt> | 光モジュールの製造方法 |
JPH11251505A (ja) * | 1998-03-04 | 1999-09-17 | Matsushita Electron Corp | 半導体装置及びその製造方法 |
JP2005522860A (ja) * | 2002-04-11 | 2005-07-28 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | キャリヤ、キャリヤを製造する方法および電子機器 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6989294B1 (en) * | 1998-06-10 | 2006-01-24 | Asat, Ltd. | Leadless plastic chip carrier with etch back pad singulation |
KR100989007B1 (ko) * | 2002-04-11 | 2010-10-20 | 엔엑스피 비 브이 | 반도체 디바이스 |
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2006
- 2006-10-31 TW TW095140314A patent/TW200737479A/zh unknown
- 2006-11-03 EP EP06821326A patent/EP1946370A2/en not_active Withdrawn
- 2006-11-03 JP JP2008538486A patent/JP2009515334A/ja active Pending
- 2006-11-03 WO PCT/IB2006/054106 patent/WO2007052234A2/en active Application Filing
- 2006-11-03 US US12/092,179 patent/US8159826B2/en not_active Expired - Fee Related
- 2006-11-03 CN CNB2006800406752A patent/CN100555618C/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3827918A (en) * | 1972-05-25 | 1974-08-06 | Ibm | Electrical conductors with chromate solder barrier and method of forming |
JPH06120225A (ja) * | 1992-09-30 | 1994-04-28 | Nippon Telegr & Teleph Corp <Ntt> | 光モジュールの製造方法 |
JPH11251505A (ja) * | 1998-03-04 | 1999-09-17 | Matsushita Electron Corp | 半導体装置及びその製造方法 |
JP2005522860A (ja) * | 2002-04-11 | 2005-07-28 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | キャリヤ、キャリヤを製造する方法および電子機器 |
Also Published As
Publication number | Publication date |
---|---|
EP1946370A2 (en) | 2008-07-23 |
US8159826B2 (en) | 2012-04-17 |
CN100555618C (zh) | 2009-10-28 |
US20080230926A1 (en) | 2008-09-25 |
WO2007052234A3 (en) | 2007-10-25 |
WO2007052234A2 (en) | 2007-05-10 |
CN101300676A (zh) | 2008-11-05 |
TW200737479A (en) | 2007-10-01 |
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