JP2009512223A5 - - Google Patents
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- Publication number
- JP2009512223A5 JP2009512223A5 JP2008535955A JP2008535955A JP2009512223A5 JP 2009512223 A5 JP2009512223 A5 JP 2009512223A5 JP 2008535955 A JP2008535955 A JP 2008535955A JP 2008535955 A JP2008535955 A JP 2008535955A JP 2009512223 A5 JP2009512223 A5 JP 2009512223A5
- Authority
- JP
- Japan
- Prior art keywords
- mirror shell
- illumination
- concentrator
- symmetry
- plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005286 illumination Methods 0.000 claims 17
- 230000003287 optical effect Effects 0.000 claims 9
- 210000001747 pupil Anatomy 0.000 claims 8
- 238000001393 microlithography Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US72789205P | 2005-10-18 | 2005-10-18 | |
| US60/727,892 | 2005-10-18 | ||
| PCT/EP2006/010004 WO2007045434A2 (de) | 2005-10-18 | 2006-10-17 | Kollektor für beleuchtungssysteme mit einer wellenlänge ≤ 193 nm |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009512223A JP2009512223A (ja) | 2009-03-19 |
| JP2009512223A5 true JP2009512223A5 (enExample) | 2009-07-16 |
| JP4990287B2 JP4990287B2 (ja) | 2012-08-01 |
Family
ID=37698183
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008535955A Expired - Fee Related JP4990287B2 (ja) | 2005-10-18 | 2006-10-17 | 波長が193nm以下の照明システム用集光器 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20080225387A1 (enExample) |
| EP (1) | EP1938150B1 (enExample) |
| JP (1) | JP4990287B2 (enExample) |
| DE (1) | DE502006009171D1 (enExample) |
| WO (1) | WO2007045434A2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007045396A1 (de) | 2007-09-21 | 2009-04-23 | Carl Zeiss Smt Ag | Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle |
| EP2083327B1 (en) * | 2008-01-28 | 2017-11-29 | Media Lario s.r.l. | Improved grazing incidence collector optical systems for EUV and X-ray applications |
| DE102008000967B4 (de) * | 2008-04-03 | 2015-04-09 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
| DE102009030501A1 (de) * | 2009-06-24 | 2011-01-05 | Carl Zeiss Smt Ag | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes |
| DE102009054540B4 (de) * | 2009-12-11 | 2011-11-10 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Mikrolithographie |
| WO2011076213A1 (en) * | 2009-12-21 | 2011-06-30 | Martin Professional A/S | Projecting illumination device with multiple light sources |
| KR102397041B1 (ko) | 2010-04-02 | 2022-05-12 | 가부시키가이샤 니콘 | 조명 광학계, 노광 방법 및 디바이스 제조 방법 |
| DE102010029049B4 (de) * | 2010-05-18 | 2014-03-13 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für ein Metrologiesystem für die Untersuchung eines Objekts mit EUV-Beleuchtungslicht sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik |
| DE102011016058B4 (de) * | 2011-04-01 | 2012-11-29 | Xtreme Technologies Gmbh | Verfahren und Vorrichtung zur Einstellung von Eigenschaften eines Strahlenbündels aus einem Plasma emittierter hochenergetischer Strahlung |
| DE102011076297A1 (de) * | 2011-05-23 | 2012-11-29 | Carl Zeiss Smt Gmbh | Blende |
| DE102011076460A1 (de) * | 2011-05-25 | 2012-11-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik |
| DE102013204441A1 (de) | 2013-03-14 | 2014-04-03 | Carl Zeiss Smt Gmbh | Kollektor |
| DE102013218132A1 (de) | 2013-09-11 | 2015-03-12 | Carl Zeiss Smt Gmbh | Kollektor |
| DE102013218128A1 (de) | 2013-09-11 | 2015-03-12 | Carl Zeiss Smt Gmbh | Beleuchtungssystem |
| DE102015201138A1 (de) * | 2015-01-23 | 2016-01-28 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
| DE102018207103A1 (de) | 2018-05-08 | 2019-03-21 | Carl Zeiss Smt Gmbh | Feldfacettenspiegel |
| DE102018214559A1 (de) | 2018-08-28 | 2019-09-12 | Carl Zeiss Smt Gmbh | Optische Anordnung und EUV-Lithographievorrichtung damit |
| US11543753B2 (en) | 2019-10-30 | 2023-01-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Tunable illuminator for lithography systems |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2077740A (en) * | 1934-03-30 | 1937-04-20 | Martha W Caughlan | Reflecting surface |
| DE3340462C1 (de) * | 1983-11-09 | 1985-04-18 | Westfälische Metall Industrie KG Hueck & Co, 4780 Lippstadt | Abgeblendeter Fahrzeugscheinwerfer |
| EP0955641B1 (de) * | 1998-05-05 | 2004-04-28 | Carl Zeiss | Beleuchtungssystem insbesondere für die EUV-Lithographie |
| DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
| DE10053587A1 (de) * | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
| US6195201B1 (en) * | 1999-01-27 | 2001-02-27 | Svg Lithography Systems, Inc. | Reflective fly's eye condenser for EUV lithography |
| US6600552B2 (en) * | 1999-02-15 | 2003-07-29 | Carl-Zeiss Smt Ag | Microlithography reduction objective and projection exposure apparatus |
| US7248667B2 (en) * | 1999-05-04 | 2007-07-24 | Carl Zeiss Smt Ag | Illumination system with a grating element |
| DE19935568A1 (de) * | 1999-07-30 | 2001-02-15 | Zeiss Carl Fa | Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems |
| DE10138284A1 (de) * | 2001-08-10 | 2003-02-27 | Zeiss Carl | Beleuchtungssystem mit genesteten Kollektoren |
| AU2002325359A1 (en) * | 2001-08-10 | 2003-02-24 | Carl Zeiss Smt Ag | Collector with fastening devices for fastening mirror shells |
| DE10208854A1 (de) * | 2002-03-01 | 2003-09-04 | Zeiss Carl Semiconductor Mfg | Beleuchtungssystem mit genestetem Kollektor zur annularen Ausleuchtung einer Austrittspupille |
| US7084412B2 (en) * | 2002-03-28 | 2006-08-01 | Carl Zeiss Smt Ag | Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm |
| DE10214259A1 (de) * | 2002-03-28 | 2003-10-23 | Zeiss Carl Semiconductor Mfg | Kollektoreinheit für Beleuchtungssysteme mit einer Wellenlänge <193 nm |
| DE10219514A1 (de) * | 2002-04-30 | 2003-11-13 | Zeiss Carl Smt Ag | Beleuchtungssystem, insbesondere für die EUV-Lithographie |
| AU2003266975A1 (en) * | 2002-12-19 | 2004-07-14 | Carl Zeiss Smt Ag | Illumination system having a more efficient collector optic |
| US7481544B2 (en) * | 2004-03-05 | 2009-01-27 | Optical Research Associates | Grazing incidence relays |
| JP2006245147A (ja) * | 2005-03-01 | 2006-09-14 | Canon Inc | 投影光学系、露光装置及びデバイスの製造方法 |
-
2006
- 2006-10-17 EP EP06806336A patent/EP1938150B1/de not_active Not-in-force
- 2006-10-17 DE DE502006009171T patent/DE502006009171D1/de active Active
- 2006-10-17 JP JP2008535955A patent/JP4990287B2/ja not_active Expired - Fee Related
- 2006-10-17 WO PCT/EP2006/010004 patent/WO2007045434A2/de not_active Ceased
-
2008
- 2008-03-21 US US12/053,305 patent/US20080225387A1/en not_active Abandoned
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