JP2008544531A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2008544531A5 JP2008544531A5 JP2008517389A JP2008517389A JP2008544531A5 JP 2008544531 A5 JP2008544531 A5 JP 2008544531A5 JP 2008517389 A JP2008517389 A JP 2008517389A JP 2008517389 A JP2008517389 A JP 2008517389A JP 2008544531 A5 JP2008544531 A5 JP 2008544531A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- illumination optical
- field
- facet
- raster
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US69270005P | 2005-06-21 | 2005-06-21 | |
| PCT/EP2006/005857 WO2006136353A1 (en) | 2005-06-21 | 2006-06-19 | A double-facetted illumination system with attenuator elements on the pupil facet mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008544531A JP2008544531A (ja) | 2008-12-04 |
| JP2008544531A5 true JP2008544531A5 (enExample) | 2009-08-06 |
Family
ID=36764368
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008517389A Pending JP2008544531A (ja) | 2005-06-21 | 2006-06-19 | 瞳ファセットミラー上に減衰素子を備えた二重ファセット照明光学系 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20080165925A1 (enExample) |
| EP (1) | EP1894063A1 (enExample) |
| JP (1) | JP2008544531A (enExample) |
| WO (1) | WO2006136353A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006059024A1 (de) * | 2006-12-14 | 2008-06-19 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil |
| US7990520B2 (en) | 2006-12-18 | 2011-08-02 | Carl Zeiss Smt Gmbh | Microlithography illumination systems, components and methods |
| JP5218994B2 (ja) * | 2007-02-20 | 2013-06-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 複数の1次光源を有する光学要素 |
| US7843549B2 (en) * | 2007-05-23 | 2010-11-30 | Asml Holding N.V. | Light attenuating filter for correcting field dependent ellipticity and uniformity |
| US8908151B2 (en) * | 2008-02-14 | 2014-12-09 | Nikon Corporation | Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system |
| JP5182588B2 (ja) * | 2008-04-29 | 2013-04-17 | 株式会社ニコン | オプティカルインテグレータ、照明光学系、露光装置、およびデバイス製造方法 |
| DE102008001511A1 (de) * | 2008-04-30 | 2009-11-05 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| DE102008049586A1 (de) | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
| JP6041304B2 (ja) * | 2009-03-27 | 2016-12-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Euvマイクロリソグラフィ用の照明光学系、この種の照明光学系用のeuv減衰器、及びこの種の照明光学系を有する照明系及び投影露光装置 |
| DE102009045491A1 (de) * | 2009-10-08 | 2010-11-25 | Carl Zeiss Smt Ag | Beleuchtungsoptik |
| NL2005331A (en) * | 2009-11-18 | 2011-05-19 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| WO2011076500A1 (en) * | 2009-12-23 | 2011-06-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2689427B1 (en) | 2011-03-23 | 2017-05-03 | Carl Zeiss SMT GmbH | Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement |
| DE102011077234A1 (de) | 2011-06-08 | 2012-12-13 | Carl Zeiss Smt Gmbh | EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung |
| DE102011005940A1 (de) | 2011-03-23 | 2012-09-27 | Carl Zeiss Smt Gmbh | EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung |
| DE102011076658A1 (de) * | 2011-05-30 | 2012-05-10 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithographie |
| DE102012010093A1 (de) * | 2012-05-23 | 2013-11-28 | Carl Zeiss Smt Gmbh | Facettenspiegel |
| DE102012212453A1 (de) | 2012-07-17 | 2014-01-23 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik |
| DE102012212664A1 (de) * | 2012-07-19 | 2014-01-23 | Carl Zeiss Smt Gmbh | Verfahren zum Einstellen eines Beleuchtungssettings |
| EP2754524B1 (de) | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
| EP2781296B1 (de) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser |
| US10293436B2 (en) | 2013-12-17 | 2019-05-21 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| EP3166895B1 (en) | 2014-07-08 | 2021-11-24 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| EP3169477B1 (en) * | 2014-07-14 | 2020-01-29 | Corning Incorporated | System for and method of processing transparent materials using laser beam focal lines adjustable in length and diameter |
| HUE055461T2 (hu) | 2015-03-24 | 2021-11-29 | Corning Inc | Kijelzõ üveg kompozíciók lézeres vágása és feldolgozása |
| DE102015217603A1 (de) * | 2015-09-15 | 2017-03-16 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| CN113399816B (zh) | 2016-09-30 | 2023-05-16 | 康宁股份有限公司 | 使用非轴对称束斑对透明工件进行激光加工的设备和方法 |
| CN110167891A (zh) | 2016-10-24 | 2019-08-23 | 康宁股份有限公司 | 用于对片状玻璃基材进行基于激光的机械加工的基材处理工位 |
| DE102017203246A1 (de) | 2017-02-28 | 2018-08-30 | Carl Zeiss Smt Gmbh | Verfahren zur Korrektur eines Spiegels für den Wellenlängenbereich von 5 nm bis 20 nm |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3158691B2 (ja) * | 1992-08-07 | 2001-04-23 | 株式会社ニコン | 露光装置及び方法、並びに照明光学装置 |
| AU1891299A (en) * | 1998-01-19 | 1999-08-02 | Nikon Corporation | Illuminating device and exposure apparatus |
| JP4238390B2 (ja) * | 1998-02-27 | 2009-03-18 | 株式会社ニコン | 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法 |
| DE10053587A1 (de) * | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
| US6438199B1 (en) * | 1998-05-05 | 2002-08-20 | Carl-Zeiss-Stiftung | Illumination system particularly for microlithography |
| DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
| EP0955641B1 (de) * | 1998-05-05 | 2004-04-28 | Carl Zeiss | Beleuchtungssystem insbesondere für die EUV-Lithographie |
| US6225027B1 (en) * | 1998-08-06 | 2001-05-01 | Euv Llc | Extreme-UV lithography system |
| US6195201B1 (en) * | 1999-01-27 | 2001-02-27 | Svg Lithography Systems, Inc. | Reflective fly's eye condenser for EUV lithography |
| WO2001009684A1 (de) * | 1999-07-30 | 2001-02-08 | Carl Zeiss | Steuerung der beleuchtungsverteilung in der austrittspupille eines euv-beleuchtungssystems |
| US7209287B2 (en) * | 2000-09-18 | 2007-04-24 | Vincent Lauer | Confocal optical scanning device |
| TW519574B (en) * | 2000-10-20 | 2003-02-01 | Nikon Corp | Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same |
| JP3836418B2 (ja) * | 2001-09-07 | 2006-10-25 | エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ | リソグラフィ装置およびデバイスの製造方法 |
| EP1870772B1 (en) * | 2002-03-18 | 2013-10-23 | ASML Netherlands B.V. | Lithographic apparatus |
| KR100576750B1 (ko) * | 2002-03-18 | 2006-05-03 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피장치 및 디바이스제조방법 |
| JP3720788B2 (ja) * | 2002-04-15 | 2005-11-30 | キヤノン株式会社 | 投影露光装置及びデバイス製造方法 |
| TWI255394B (en) * | 2002-12-23 | 2006-05-21 | Asml Netherlands Bv | Lithographic apparatus with debris suppression means and device manufacturing method |
| ATE502323T1 (de) * | 2003-07-30 | 2011-04-15 | Zeiss Carl Smt Gmbh | Beleuchtungssystem für die mikrolithographie |
| KR20060113919A (ko) * | 2003-10-09 | 2006-11-03 | 머린 테크놀로지 리미티드 라이어빌리티 컴퍼니 | 환경광 안에서 작동하는 프로젝션-수신 표면 |
-
2006
- 2006-06-19 JP JP2008517389A patent/JP2008544531A/ja active Pending
- 2006-06-19 EP EP06762082A patent/EP1894063A1/en not_active Withdrawn
- 2006-06-19 WO PCT/EP2006/005857 patent/WO2006136353A1/en not_active Ceased
-
2007
- 2007-12-20 US US11/961,431 patent/US20080165925A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2008544531A5 (enExample) | ||
| JP3559330B2 (ja) | レチクルマスキングシステムを有する光学系の照明手段 | |
| JP4309980B2 (ja) | 環状面縮小投影光学系 | |
| JP2946950B2 (ja) | 照明装置及びそれを用いた露光装置 | |
| JP4134544B2 (ja) | 結像光学系および露光装置 | |
| JP2016001308A5 (ja) | 露光装置、およびデバイス製造方法 | |
| JP2003114387A5 (enExample) | ||
| JPH07161617A (ja) | 走査型露光装置 | |
| JP2002277742A5 (enExample) | ||
| JP2000091220A (ja) | 投影露光装置及び投影露光方法 | |
| CN108107685B (zh) | 曝光装置、曝光方法、器件制造方法及评价方法 | |
| JP2011517843A5 (enExample) | ||
| TW200949459A (en) | Spatial light modulating unit, illumination optical system, aligner, and device manufacturing method | |
| JP3548464B2 (ja) | 露光方法及び走査型露光装置 | |
| TWI358615B (en) | Illumination system | |
| JP2014534643A5 (enExample) | ||
| JP2011049296A (ja) | マスクレス露光方法 | |
| JP2000021712A (ja) | 照明光学系及びそれを有する露光装置 | |
| JP2002198309A5 (enExample) | ||
| JP5283928B2 (ja) | 照明光学系、露光装置及びデバイス製造方法 | |
| TW200839460A (en) | Exposure apparatus and semiconductor device fabrication method | |
| TW200915014A (en) | Lighting optical apparatus, photolithography equipment and device manufacturing method | |
| CN107239005B (zh) | 照明光学单元 | |
| TW200919108A (en) | Illumination optical apparatus, exposure apparatus, and device manufacturing method | |
| JP2016503186A (ja) | マイクロリソグラフィ投影露光装置の光学系 |