JP2014523136A5 - - Google Patents
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- Publication number
- JP2014523136A5 JP2014523136A5 JP2014519525A JP2014519525A JP2014523136A5 JP 2014523136 A5 JP2014523136 A5 JP 2014523136A5 JP 2014519525 A JP2014519525 A JP 2014519525A JP 2014519525 A JP2014519525 A JP 2014519525A JP 2014523136 A5 JP2014523136 A5 JP 2014523136A5
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- illumination
- optical unit
- ring
- mirror device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005286 illumination Methods 0.000 description 131
- 230000003287 optical effect Effects 0.000 description 71
- 230000010287 polarization Effects 0.000 description 18
- 239000002826 coolant Substances 0.000 description 13
- 238000001816 cooling Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 9
- 230000005405 multipole Effects 0.000 description 8
- 238000003384 imaging method Methods 0.000 description 7
- 210000001747 pupil Anatomy 0.000 description 7
- 238000001459 lithography Methods 0.000 description 6
- 238000001393 microlithography Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161506250P | 2011-07-11 | 2011-07-11 | |
| DE102011078928A DE102011078928A1 (de) | 2011-07-11 | 2011-07-11 | Beleuchtungsoptik für die Projektionslithografie |
| DE102011078928.6 | 2011-07-11 | ||
| US61/506,250 | 2011-07-11 | ||
| PCT/EP2012/063520 WO2013007731A1 (en) | 2011-07-11 | 2012-07-11 | Illumination optical unit for projection lithography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014523136A JP2014523136A (ja) | 2014-09-08 |
| JP2014523136A5 true JP2014523136A5 (enExample) | 2015-08-27 |
Family
ID=47425403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014519525A Pending JP2014523136A (ja) | 2011-07-11 | 2012-07-11 | 投影リソグラフィのための照明光学ユニット |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9507269B2 (enExample) |
| JP (1) | JP2014523136A (enExample) |
| DE (1) | DE102011078928A1 (enExample) |
| TW (1) | TWI574115B (enExample) |
| WO (1) | WO2013007731A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012206153A1 (de) | 2012-04-16 | 2013-10-17 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102013200394A1 (de) | 2013-01-14 | 2014-07-17 | Carl Zeiss Smt Gmbh | Polarisationsmessvorrichtung, Lithographieanlage, Messanordnung, und Verfahren zur Polarisationsmessung |
| DE102014204818A1 (de) | 2014-03-14 | 2015-09-17 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
| US20190017878A1 (en) * | 2017-07-12 | 2019-01-17 | Radiant Innovation Inc. | Non-contact temperature measuring device |
| DE102019200193B3 (de) | 2019-01-09 | 2020-02-06 | Carl Zeiss Smt Gmbh | Optisches System für eine Projektionsbelichtungsanlage |
| US12399431B2 (en) * | 2021-11-15 | 2025-08-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor processing tool and methods of operation |
| CN117471633B (zh) * | 2023-10-17 | 2025-09-30 | 中国科学院合肥物质科学研究院 | 一种红外激光光学镜的调节机构 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL194929C (nl) * | 1992-10-20 | 2003-07-04 | Samsung Electronics Co Ltd | Projectiebelichtingssysteem. |
| JP2866267B2 (ja) * | 1992-12-11 | 1999-03-08 | 三菱電機株式会社 | 光描画装置およびウェハ基板の光描画方法 |
| EP0648348B1 (en) * | 1993-03-01 | 1999-04-28 | General Signal Corporation | Variable annular illuminator for photolithographic projection imager. |
| US6573978B1 (en) * | 1999-01-26 | 2003-06-03 | Mcguire, Jr. James P. | EUV condenser with non-imaging optics |
| US20050099611A1 (en) * | 2002-06-20 | 2005-05-12 | Nikon Corporation | Minimizing thermal distortion effects on EUV mirror |
| JP2005303084A (ja) * | 2004-04-13 | 2005-10-27 | Nikon Corp | 露光装置、露光装置の製造方法、露光装置の調整方法及びマイクロデバイスの製造方法 |
| JP4903691B2 (ja) * | 2004-05-06 | 2012-03-28 | カール ツァイス レーザー オプティクス ゲーエムベーハー | 熱挙動が改良された光学部品 |
| JP5053543B2 (ja) | 2005-02-02 | 2012-10-17 | 東ソー株式会社 | タンタル化合物、その製造方法、タンタル含有薄膜、及びその形成方法 |
| EP1811547A4 (en) * | 2005-02-03 | 2010-06-02 | Nikon Corp | OPTICAL INTEGRATOR, OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD |
| JP5436853B2 (ja) * | 2005-04-20 | 2014-03-05 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 投影露光系及び偏光光学素子 |
| KR101127346B1 (ko) | 2005-09-13 | 2012-03-29 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법 |
| US7591561B2 (en) * | 2005-10-13 | 2009-09-22 | Nikon Corporation | Liquid cooled mirror for use in extreme ultraviolet lithography |
| DE102006039655A1 (de) * | 2006-08-24 | 2008-03-20 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostruktuierten Bauelements mit einer derartigen Projektionsbelichtungsanlage sowie durch dieses Verfahren hergestelltes mikrostrukturiertes Bauelement |
| DE102008021833B4 (de) | 2007-12-19 | 2010-04-22 | Carl Zeiss Smt Ag | Verfahren zur Einstellung einer Beleuchtungswinkelverteilung und gleichzeitig einer Intensitätsverteilung über ein in ein Bildfeld abzubildendes Objektfeld |
| JP5487118B2 (ja) * | 2008-02-15 | 2014-05-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
| DE102009029103A1 (de) | 2008-11-20 | 2010-05-27 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung für eine Mikrolithographische Projektionsbelichtungsanlage |
| DE102012203950A1 (de) * | 2012-03-14 | 2013-09-19 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für eine Projektionsbelichtungsanlage |
| DE102012209132A1 (de) * | 2012-05-31 | 2013-12-05 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie |
-
2011
- 2011-07-11 DE DE102011078928A patent/DE102011078928A1/de not_active Withdrawn
-
2012
- 2012-07-10 TW TW101124746A patent/TWI574115B/zh active
- 2012-07-11 JP JP2014519525A patent/JP2014523136A/ja active Pending
- 2012-07-11 WO PCT/EP2012/063520 patent/WO2013007731A1/en not_active Ceased
-
2013
- 2013-12-19 US US14/135,540 patent/US9507269B2/en not_active Expired - Fee Related
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