JP2016535313A5 - - Google Patents
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- JP2016535313A5 JP2016535313A5 JP2016541865A JP2016541865A JP2016535313A5 JP 2016535313 A5 JP2016535313 A5 JP 2016535313A5 JP 2016541865 A JP2016541865 A JP 2016541865A JP 2016541865 A JP2016541865 A JP 2016541865A JP 2016535313 A5 JP2016535313 A5 JP 2016535313A5
- Authority
- JP
- Japan
- Prior art keywords
- illumination
- facet
- specular
- mirror
- pupil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005286 illumination Methods 0.000 claims description 255
- 210000001747 pupil Anatomy 0.000 claims description 175
- 230000003287 optical effect Effects 0.000 claims description 74
- 230000005540 biological transmission Effects 0.000 claims description 39
- 238000006073 displacement reaction Methods 0.000 claims description 18
- 238000011144 upstream manufacturing Methods 0.000 claims description 10
- 238000003384 imaging method Methods 0.000 claims description 8
- 238000001459 lithography Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 5
- 230000006698 induction Effects 0.000 claims 1
- 238000009826 distribution Methods 0.000 description 26
- 238000007493 shaping process Methods 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000005855 radiation Effects 0.000 description 8
- 230000012447 hatching Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 230000005405 multipole Effects 0.000 description 2
- 238000009304 pastoral farming Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE201310218131 DE102013218131A1 (de) | 2013-09-11 | 2013-09-11 | Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie |
| DE102013218131.0 | 2013-09-11 | ||
| PCT/EP2014/067961 WO2015036226A1 (de) | 2013-09-11 | 2014-08-25 | Beleuchtungsoptik sowie beleuchtungssystem für die euv-projektionslithographie |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020083202A Division JP7071436B2 (ja) | 2013-09-11 | 2020-05-11 | Ｅｕｖ投影リソグラフィのための照明光学系及び照明系 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016535313A JP2016535313A (ja) | 2016-11-10 |
| JP2016535313A5 true JP2016535313A5 (enExample) | 2019-02-14 |
| JP6703944B2 JP6703944B2 (ja) | 2020-06-03 |
Family
ID=51542327
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016541865A Active JP6703944B2 (ja) | 2013-09-11 | 2014-08-25 | Ｅｕｖ投影リソグラフィのための照明光学系及び照明系 |
| JP2020083202A Active JP7071436B2 (ja) | 2013-09-11 | 2020-05-11 | Ｅｕｖ投影リソグラフィのための照明光学系及び照明系 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020083202A Active JP7071436B2 (ja) | 2013-09-11 | 2020-05-11 | Ｅｕｖ投影リソグラフィのための照明光学系及び照明系 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9915874B2 (enExample) |
| JP (2) | JP6703944B2 (enExample) |
| KR (1) | KR102343801B1 (enExample) |
| CN (1) | CN105706003B (enExample) |
| DE (1) | DE102013218131A1 (enExample) |
| WO (1) | WO2015036226A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015217603A1 (de) | 2015-09-15 | 2017-03-16 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| DE102018201457A1 (de) * | 2018-01-31 | 2019-08-01 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie |
| US11543753B2 (en) * | 2019-10-30 | 2023-01-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Tunable illuminator for lithography systems |
| DE102024205226A1 (de) | 2024-06-06 | 2025-02-20 | Carl Zeiss Smt Gmbh | Verfahren zum Betrieb eines optischen Systems einer Lithographie-Projektionsbelichtungsanlage |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5361292A (en) * | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
| US6014252A (en) | 1998-02-20 | 2000-01-11 | The Regents Of The University Of California | Reflective optical imaging system |
| DE10053587A1 (de) * | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
| DE19931848A1 (de) | 1999-07-09 | 2001-01-11 | Zeiss Carl Fa | Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen |
| US7333178B2 (en) * | 2002-03-18 | 2008-02-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US6771352B2 (en) * | 2002-03-18 | 2004-08-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE10317667A1 (de) | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| JP2006108224A (ja) * | 2004-10-01 | 2006-04-20 | Nikon Corp | 照明光学系、露光装置及びマイクロデバイスの製造方法 |
| US7277158B2 (en) * | 2004-12-02 | 2007-10-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7405809B2 (en) * | 2005-03-21 | 2008-07-29 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
| JP2007134464A (ja) * | 2005-11-09 | 2007-05-31 | Canon Inc | 多層膜を有する光学素子及びそれを有する露光装置 |
| DE102006059024A1 (de) * | 2006-12-14 | 2008-06-19 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil |
| DE102007045396A1 (de) | 2007-09-21 | 2009-04-23 | Carl Zeiss Smt Ag | Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle |
| DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| CN101946190B (zh) * | 2008-02-15 | 2013-06-19 | 卡尔蔡司Smt有限责任公司 | 微光刻的投射曝光设备使用的分面镜 |
| DE102008000967B4 (de) | 2008-04-03 | 2015-04-09 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
| DE102008049586A1 (de) * | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
| DE102009032194A1 (de) * | 2008-10-16 | 2010-04-22 | Carl Zeiss Smt Ag | Optischer Spiegel mit einer Mehrzahl benachbarter Spiegelelemente und Verfahren zur Herstellung eines derartigen Spiegels |
| WO2010049076A2 (de) * | 2008-10-20 | 2010-05-06 | Carl Zeiss Smt Ag | Optische baugruppe zur führung eines strahlungsbündels |
| JP6041304B2 (ja) * | 2009-03-27 | 2016-12-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Ｅｕｖマイクロリソグラフィ用の照明光学系、この種の照明光学系用のｅｕｖ減衰器、及びこの種の照明光学系を有する照明系及び投影露光装置 |
| DE102011004615A1 (de) * | 2010-03-17 | 2011-09-22 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| DE102011076145B4 (de) | 2011-05-19 | 2013-04-11 | Carl Zeiss Smt Gmbh | Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik |
-
2013
- 2013-09-11 DE DE201310218131 patent/DE102013218131A1/de not_active Ceased
-
2014
- 2014-08-25 CN CN201480060611.3A patent/CN105706003B/zh active Active
- 2014-08-25 JP JP2016541865A patent/JP6703944B2/ja active Active
- 2014-08-25 WO PCT/EP2014/067961 patent/WO2015036226A1/de not_active Ceased
- 2014-08-25 KR KR1020167009359A patent/KR102343801B1/ko active Active
-
2016
- 2016-03-04 US US15/061,048 patent/US9915874B2/en active Active
-
2020
- 2020-05-11 JP JP2020083202A patent/JP7071436B2/ja active Active
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