JP2009505396A5 - - Google Patents

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Publication number
JP2009505396A5
JP2009505396A5 JP2008526016A JP2008526016A JP2009505396A5 JP 2009505396 A5 JP2009505396 A5 JP 2009505396A5 JP 2008526016 A JP2008526016 A JP 2008526016A JP 2008526016 A JP2008526016 A JP 2008526016A JP 2009505396 A5 JP2009505396 A5 JP 2009505396A5
Authority
JP
Japan
Prior art keywords
laser system
operating point
firing time
differential firing
current operating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008526016A
Other languages
English (en)
Japanese (ja)
Other versions
JP5202315B2 (ja
JP2009505396A (ja
Filing date
Publication date
Priority claimed from US11/199,691 external-priority patent/US7061961B2/en
Priority claimed from US11/323,604 external-priority patent/US7830934B2/en
Application filed filed Critical
Publication of JP2009505396A publication Critical patent/JP2009505396A/ja
Publication of JP2009505396A5 publication Critical patent/JP2009505396A5/ja
Application granted granted Critical
Publication of JP5202315B2 publication Critical patent/JP5202315B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2008526016A 2005-08-09 2006-07-12 放電タイミングによる多室ガス放電レーザの帯域幅制御 Expired - Lifetime JP5202315B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/199,691 2005-08-09
US11/199,691 US7061961B2 (en) 1999-12-10 2005-08-09 Very narrow band, two chamber, high rep-rate gas discharge laser system
US11/323,604 2005-12-29
US11/323,604 US7830934B2 (en) 2001-08-29 2005-12-29 Multi-chamber gas discharge laser bandwidth control through discharge timing
PCT/US2006/027015 WO2007021406A2 (en) 2005-08-09 2006-07-12 Multi-chamber gas discharge laser bandwidth control through discharge timing

Publications (3)

Publication Number Publication Date
JP2009505396A JP2009505396A (ja) 2009-02-05
JP2009505396A5 true JP2009505396A5 (enExample) 2009-09-03
JP5202315B2 JP5202315B2 (ja) 2013-06-05

Family

ID=40403966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008526016A Expired - Lifetime JP5202315B2 (ja) 2005-08-09 2006-07-12 放電タイミングによる多室ガス放電レーザの帯域幅制御

Country Status (2)

Country Link
JP (1) JP5202315B2 (enExample)
TW (1) TWI320619B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012506634A (ja) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド ２チャンバガス放電レーザにおけるレーザ制御の方法及び装置
US9098274B2 (en) * 2009-12-03 2015-08-04 Intel Corporation Methods and apparatuses to improve turbo performance for events handling
US10833471B2 (en) 2017-11-17 2020-11-10 Cymer, Llc Lithography system bandwidth control
WO2021178091A1 (en) * 2020-03-03 2021-09-10 Cymer, Llc Control system for a light source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6590922B2 (en) * 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
JP4169187B2 (ja) * 2002-05-17 2008-10-22 株式会社小松製作所 ２ステージレーザシステム
EP1540783B1 (en) * 2002-07-31 2017-01-18 Cymer, LLC Control system for a two chamber gas discharge laser
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
JP2004335782A (ja) * 2003-05-08 2004-11-25 Komatsu Ltd 注入同期式レーザ装置

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