JP2006505960A5 - - Google Patents

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Publication number
JP2006505960A5
JP2006505960A5 JP2005505645A JP2005505645A JP2006505960A5 JP 2006505960 A5 JP2006505960 A5 JP 2006505960A5 JP 2005505645 A JP2005505645 A JP 2005505645A JP 2005505645 A JP2005505645 A JP 2005505645A JP 2006505960 A5 JP2006505960 A5 JP 2006505960A5
Authority
JP
Japan
Prior art keywords
power amplifier
discharge
pulse
laser light
main oscillator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005505645A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006505960A (ja
JP4393457B2 (ja
Filing date
Publication date
Priority claimed from US10/210,761 external-priority patent/US6690704B2/en
Priority claimed from US10/384,967 external-priority patent/US6904073B2/en
Application filed filed Critical
Priority claimed from PCT/US2003/024146 external-priority patent/WO2004012308A2/en
Publication of JP2006505960A publication Critical patent/JP2006505960A/ja
Publication of JP2006505960A5 publication Critical patent/JP2006505960A5/ja
Application granted granted Critical
Publication of JP4393457B2 publication Critical patent/JP4393457B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2005505645A 2002-07-31 2003-07-30 ２室放電ガスレーザ用制御システム Expired - Lifetime JP4393457B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/210,761 US6690704B2 (en) 2001-04-09 2002-07-31 Control system for a two chamber gas discharge laser
US10/384,967 US6904073B2 (en) 2001-01-29 2003-03-08 High power deep ultraviolet laser with long life optics
US45402903P 2003-03-11 2003-03-11
PCT/US2003/024146 WO2004012308A2 (en) 2002-07-31 2003-07-30 Control system for a two chamber gas discharge laser

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2006208864A Division JP2006344988A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム
JP2006208863A Division JP2006295225A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム

Publications (3)

Publication Number Publication Date
JP2006505960A JP2006505960A (ja) 2006-02-16
JP2006505960A5 true JP2006505960A5 (enExample) 2006-09-21
JP4393457B2 JP4393457B2 (ja) 2010-01-06

Family

ID=31192001

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2005505645A Expired - Lifetime JP4393457B2 (ja) 2002-07-31 2003-07-30 ２室放電ガスレーザ用制御システム
JP2006208863A Pending JP2006295225A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム
JP2006208864A Pending JP2006344988A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2006208863A Pending JP2006295225A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム
JP2006208864A Pending JP2006344988A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム

Country Status (5)

Country Link
EP (1) EP1540783B1 (enExample)
JP (3) JP4393457B2 (enExample)
KR (1) KR101019471B1 (enExample)
AU (1) AU2003261337A1 (enExample)
WO (1) WO2004012308A2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7297911B2 (en) * 2005-07-19 2007-11-20 Asml Netherlands B.V. Lithographic apparatus, illumination system, illumination controller and control method
JP5202315B2 (ja) * 2005-08-09 2013-06-05 サイマー インコーポレイテッド 放電タイミングによる多室ガス放電レーザの帯域幅制御
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7715101B2 (en) * 2007-09-24 2010-05-11 Asml Netherlands B.V. Electromagnetic radiation pulse duration control apparatus and method
JP2012506634A (ja) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド ２チャンバガス放電レーザにおけるレーザ制御の方法及び装置
JP6242917B2 (ja) 2013-02-08 2017-12-06 カール・ツァイス・エスエムティー・ゲーエムベーハー ビーム反転モジュールおよびそのようなビーム反転モジュールを有する光パワー増幅器
WO2017051454A1 (ja) * 2015-09-24 2017-03-30 ギガフォトン株式会社 極端紫外光生成装置
US9762023B2 (en) * 2015-12-21 2017-09-12 Cymer, Llc Online calibration for repetition rate dependent performance variables
US9634455B1 (en) * 2016-02-16 2017-04-25 Cymer, Llc Gas optimization in a gas discharge light source
EP3553902B1 (en) * 2016-12-08 2025-08-06 Gigaphoton Inc. Laser device and laser processing system
WO2019083722A1 (en) * 2017-10-24 2019-05-02 Cymer, Llc METHOD AND APPARATUS FOR LIFTING THE LIFE OF AN ELECTRODE IN A LASER CHAMBER
TWI749546B (zh) * 2019-05-14 2021-12-11 美商希瑪有限責任公司 用於調變光源波長的裝置及方法
WO2021080842A1 (en) * 2019-10-25 2021-04-29 Cymer, Llc Smart gas temperature control in a laser source
DE112020006895T5 (de) * 2020-03-16 2022-12-29 Mitsubishi Electric Corporation Laserverstärkungsvorrichtung und Einrichtung zur Erzeugung von extrem ultraviolettem Licht
KR102698695B1 (ko) * 2020-03-23 2024-08-23 사이머 엘엘씨 펄스형 광 빔의 예측 제어
KR102880036B1 (ko) * 2020-08-31 2025-10-31 사이머 엘엘씨 광학 컴포넌트 정렬 장치 및 방법
WO2022231784A1 (en) * 2021-04-28 2022-11-03 Cymer, Llc Electronic module for a magnetic switching network to produce a pulse of the pulsed output light beam
CN117242656A (zh) * 2021-06-17 2023-12-15 极光先进雷射株式会社 激光装置、激光控制方法以及电子器件的制造方法
CN116097960B (zh) * 2022-12-30 2024-03-22 中电科卫星导航运营服务有限公司 一种播种机排种的控制方法
CN115966422B (zh) * 2023-01-17 2025-06-17 西安交通大学 一种真空间隙微能量智能老炼装置
JPWO2024185147A1 (enExample) * 2023-03-09 2024-09-12

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4410992A (en) * 1980-03-26 1983-10-18 Laser Science, Inc. Generation of pulsed laser radiation at a finely controlled frequency by transient regerative amplification
JPH03215985A (ja) * 1990-01-20 1991-09-20 Mitsubishi Electric Corp レーザ装置
US5416391A (en) 1992-07-31 1995-05-16 Correa; Paulo N. Electromechanical transduction of plasma pulses
US5450436A (en) * 1992-11-20 1995-09-12 Kabushiki Kaisha Komatsu Seisakusho Laser gas replenishing apparatus and method in excimer laser system
JP3824092B2 (ja) * 1993-12-24 2006-09-20 株式会社小松製作所 エキシマレ−ザ装置のガス補給方法
US5778016A (en) * 1994-04-01 1998-07-07 Imra America, Inc. Scanning temporal ultrafast delay methods and apparatuses therefor
US6067311A (en) * 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
JP3879889B2 (ja) * 1998-11-20 2007-02-14 株式会社小松製作所 インジェクションロック型狭帯域化パルスレーザ装置
US6546037B2 (en) * 1999-02-10 2003-04-08 Lambda Physik Ag Molecular fluorine laser with spectral linewidth of less than 1 pm
US6549551B2 (en) * 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6535531B1 (en) * 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
JP4877692B2 (ja) * 2001-03-21 2012-02-15 株式会社小松製作所 注入同期式又はｍｏｐａ方式のレーザ装置

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