JP4393457B2 - ２室放電ガスレーザ用制御システム - Google Patents

２室放電ガスレーザ用制御システム Download PDF

Info

Publication number
JP4393457B2
JP4393457B2 JP2005505645A JP2005505645A JP4393457B2 JP 4393457 B2 JP4393457 B2 JP 4393457B2 JP 2005505645 A JP2005505645 A JP 2005505645A JP 2005505645 A JP2005505645 A JP 2005505645A JP 4393457 B2 JP4393457 B2 JP 4393457B2
Authority
JP
Japan
Prior art keywords
pulse
laser
discharge
control
timing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2005505645A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006505960A (ja
JP2006505960A5 (enExample
Inventor
ジョン ピー ファーロン
ジョン エイ ルール
ロバート エヌ ジャックス
ジェイコブ ピー リプコン
リチャード エル サンドストロム
ウィリアム エヌ パートロ
アレクサンダー アイ アーショフ
俊彦 石原
ジョン メイスナー
リチャード エム ネス
ポール シー メルチャー
Original Assignee
サイマー インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/210,761 external-priority patent/US6690704B2/en
Priority claimed from US10/384,967 external-priority patent/US6904073B2/en
Application filed by サイマー インコーポレイテッド filed Critical サイマー インコーポレイテッド
Publication of JP2006505960A publication Critical patent/JP2006505960A/ja
Publication of JP2006505960A5 publication Critical patent/JP2006505960A5/ja
Application granted granted Critical
Publication of JP4393457B2 publication Critical patent/JP4393457B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2333—Double-pass amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1306—Stabilisation of the amplitude
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2366—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10038—Amplitude control
    • H01S3/10046—Pulse repetition rate control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/1317—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005505645A 2002-07-31 2003-07-30 ２室放電ガスレーザ用制御システム Expired - Lifetime JP4393457B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/210,761 US6690704B2 (en) 2001-04-09 2002-07-31 Control system for a two chamber gas discharge laser
US10/384,967 US6904073B2 (en) 2001-01-29 2003-03-08 High power deep ultraviolet laser with long life optics
US45402903P 2003-03-11 2003-03-11
PCT/US2003/024146 WO2004012308A2 (en) 2002-07-31 2003-07-30 Control system for a two chamber gas discharge laser

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2006208864A Division JP2006344988A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム
JP2006208863A Division JP2006295225A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム

Publications (3)

Publication Number Publication Date
JP2006505960A JP2006505960A (ja) 2006-02-16
JP2006505960A5 JP2006505960A5 (enExample) 2006-09-21
JP4393457B2 true JP4393457B2 (ja) 2010-01-06

Family

ID=31192001

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2005505645A Expired - Lifetime JP4393457B2 (ja) 2002-07-31 2003-07-30 ２室放電ガスレーザ用制御システム
JP2006208863A Pending JP2006295225A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム
JP2006208864A Pending JP2006344988A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2006208863A Pending JP2006295225A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム
JP2006208864A Pending JP2006344988A (ja) 2002-07-31 2006-07-31 ２室放電ガスレーザ用制御システム

Country Status (5)

Country Link
EP (1) EP1540783B1 (enExample)
JP (3) JP4393457B2 (enExample)
KR (1) KR101019471B1 (enExample)
AU (1) AU2003261337A1 (enExample)
WO (1) WO2004012308A2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7297911B2 (en) * 2005-07-19 2007-11-20 Asml Netherlands B.V. Lithographic apparatus, illumination system, illumination controller and control method
JP5202315B2 (ja) * 2005-08-09 2013-06-05 サイマー インコーポレイテッド 放電タイミングによる多室ガス放電レーザの帯域幅制御
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7715101B2 (en) * 2007-09-24 2010-05-11 Asml Netherlands B.V. Electromagnetic radiation pulse duration control apparatus and method
JP2012506634A (ja) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド ２チャンバガス放電レーザにおけるレーザ制御の方法及び装置
JP6242917B2 (ja) 2013-02-08 2017-12-06 カール・ツァイス・エスエムティー・ゲーエムベーハー ビーム反転モジュールおよびそのようなビーム反転モジュールを有する光パワー増幅器
WO2017051454A1 (ja) * 2015-09-24 2017-03-30 ギガフォトン株式会社 極端紫外光生成装置
US9762023B2 (en) * 2015-12-21 2017-09-12 Cymer, Llc Online calibration for repetition rate dependent performance variables
US9634455B1 (en) * 2016-02-16 2017-04-25 Cymer, Llc Gas optimization in a gas discharge light source
EP3553902B1 (en) * 2016-12-08 2025-08-06 Gigaphoton Inc. Laser device and laser processing system
WO2019083722A1 (en) * 2017-10-24 2019-05-02 Cymer, Llc METHOD AND APPARATUS FOR LIFTING THE LIFE OF AN ELECTRODE IN A LASER CHAMBER
TWI749546B (zh) * 2019-05-14 2021-12-11 美商希瑪有限責任公司 用於調變光源波長的裝置及方法
WO2021080842A1 (en) * 2019-10-25 2021-04-29 Cymer, Llc Smart gas temperature control in a laser source
DE112020006895T5 (de) * 2020-03-16 2022-12-29 Mitsubishi Electric Corporation Laserverstärkungsvorrichtung und Einrichtung zur Erzeugung von extrem ultraviolettem Licht
KR102698695B1 (ko) * 2020-03-23 2024-08-23 사이머 엘엘씨 펄스형 광 빔의 예측 제어
KR102880036B1 (ko) * 2020-08-31 2025-10-31 사이머 엘엘씨 광학 컴포넌트 정렬 장치 및 방법
WO2022231784A1 (en) * 2021-04-28 2022-11-03 Cymer, Llc Electronic module for a magnetic switching network to produce a pulse of the pulsed output light beam
CN117242656A (zh) * 2021-06-17 2023-12-15 极光先进雷射株式会社 激光装置、激光控制方法以及电子器件的制造方法
CN116097960B (zh) * 2022-12-30 2024-03-22 中电科卫星导航运营服务有限公司 一种播种机排种的控制方法
CN115966422B (zh) * 2023-01-17 2025-06-17 西安交通大学 一种真空间隙微能量智能老炼装置
JPWO2024185147A1 (enExample) * 2023-03-09 2024-09-12

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4410992A (en) * 1980-03-26 1983-10-18 Laser Science, Inc. Generation of pulsed laser radiation at a finely controlled frequency by transient regerative amplification
JPH03215985A (ja) * 1990-01-20 1991-09-20 Mitsubishi Electric Corp レーザ装置
US5416391A (en) 1992-07-31 1995-05-16 Correa; Paulo N. Electromechanical transduction of plasma pulses
US5450436A (en) * 1992-11-20 1995-09-12 Kabushiki Kaisha Komatsu Seisakusho Laser gas replenishing apparatus and method in excimer laser system
JP3824092B2 (ja) * 1993-12-24 2006-09-20 株式会社小松製作所 エキシマレ−ザ装置のガス補給方法
US5778016A (en) * 1994-04-01 1998-07-07 Imra America, Inc. Scanning temporal ultrafast delay methods and apparatuses therefor
US6067311A (en) * 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
JP3879889B2 (ja) * 1998-11-20 2007-02-14 株式会社小松製作所 インジェクションロック型狭帯域化パルスレーザ装置
US6546037B2 (en) * 1999-02-10 2003-04-08 Lambda Physik Ag Molecular fluorine laser with spectral linewidth of less than 1 pm
US6549551B2 (en) * 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6535531B1 (en) * 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
JP4877692B2 (ja) * 2001-03-21 2012-02-15 株式会社小松製作所 注入同期式又はｍｏｐａ方式のレーザ装置

Also Published As

Publication number Publication date
JP2006505960A (ja) 2006-02-16
WO2004012308A2 (en) 2004-02-05
AU2003261337A8 (en) 2004-02-16
KR20050062519A (ko) 2005-06-23
JP2006344988A (ja) 2006-12-21
EP1540783A4 (en) 2006-04-19
KR101019471B1 (ko) 2011-03-07
JP2006295225A (ja) 2006-10-26
AU2003261337A1 (en) 2004-02-16
EP1540783A2 (en) 2005-06-15
EP1540783B1 (en) 2017-01-18
WO2004012308A3 (en) 2004-07-15

Similar Documents

Publication Publication Date Title
US7596164B2 (en) Control system for a two chamber gas discharge laser
US6690704B2 (en) Control system for a two chamber gas discharge laser
US7039086B2 (en) Control system for a two chamber gas discharge laser
EP1540783B1 (en) Control system for a two chamber gas discharge laser
KR100907299B1 (ko) 초협대역이고 2챔버를 갖는 고반복율 가스 방전 레이저시스템
US6330261B1 (en) Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
JP3971385B2 (ja) ２室ガス放電レーザシステムのタイミング制御
US6128323A (en) Reliable modular production quality narrow-band high REP rate excimer laser
US6882674B2 (en) Four KHz gas discharge laser system
JP2008294477A (ja) 超狭帯域２室式高繰返し率放電ガスレーザシステム
JP2005502210A (ja) ６ｋＨｚから１０ｋＨｚ又はそれ以上の放電ガスレーザシステム
WO1999060674A1 (en) RELIABLE MODULAR PRODUCTION QUALITY NARROW-BAND HIGH REP RATE ArF EXCIMER LASER

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060731

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060731

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081020

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090120

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090127

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090420

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090518

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090817

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090914

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20091013

R150 Certificate of patent or registration of utility model

Ref document number: 4393457

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121023

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121023

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131023

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: R3D02

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term