JP5202315B2 - 放電タイミングによる多室ガス放電レーザの帯域幅制御 - Google Patents

放電タイミングによる多室ガス放電レーザの帯域幅制御 Download PDF

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JP5202315B2
JP5202315B2 JP2008526016A JP2008526016A JP5202315B2 JP 5202315 B2 JP5202315 B2 JP 5202315B2 JP 2008526016 A JP2008526016 A JP 2008526016A JP 2008526016 A JP2008526016 A JP 2008526016A JP 5202315 B2 JP5202315 B2 JP 5202315B2
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laser system
energy
operating point
firing time
laser
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JP2009505396A5 (enExample
JP2009505396A (ja
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ロバート エヌ ジャック
ウィリアム エヌ パートロ
ダニエル ジェイ ダブリュー ブラウン
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サイマー インコーポレイテッド
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Priority claimed from US11/199,691 external-priority patent/US7061961B2/en
Priority claimed from US11/323,604 external-priority patent/US7830934B2/en
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JP2008526016A 2005-08-09 2006-07-12 放電タイミングによる多室ガス放電レーザの帯域幅制御 Expired - Lifetime JP5202315B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/199,691 2005-08-09
US11/199,691 US7061961B2 (en) 1999-12-10 2005-08-09 Very narrow band, two chamber, high rep-rate gas discharge laser system
US11/323,604 2005-12-29
US11/323,604 US7830934B2 (en) 2001-08-29 2005-12-29 Multi-chamber gas discharge laser bandwidth control through discharge timing
PCT/US2006/027015 WO2007021406A2 (en) 2005-08-09 2006-07-12 Multi-chamber gas discharge laser bandwidth control through discharge timing

Publications (3)

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JP2009505396A JP2009505396A (ja) 2009-02-05
JP2009505396A5 JP2009505396A5 (enExample) 2009-09-03
JP5202315B2 true JP5202315B2 (ja) 2013-06-05

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JP2008526016A Expired - Lifetime JP5202315B2 (ja) 2005-08-09 2006-07-12 放電タイミングによる多室ガス放電レーザの帯域幅制御

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JP (1) JP5202315B2 (enExample)
TW (1) TWI320619B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012506634A (ja) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド ２チャンバガス放電レーザにおけるレーザ制御の方法及び装置
US9098274B2 (en) * 2009-12-03 2015-08-04 Intel Corporation Methods and apparatuses to improve turbo performance for events handling
US10833471B2 (en) 2017-11-17 2020-11-10 Cymer, Llc Lithography system bandwidth control
WO2021178091A1 (en) * 2020-03-03 2021-09-10 Cymer, Llc Control system for a light source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6590922B2 (en) * 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
JP4169187B2 (ja) * 2002-05-17 2008-10-22 株式会社小松製作所 ２ステージレーザシステム
EP1540783B1 (en) * 2002-07-31 2017-01-18 Cymer, LLC Control system for a two chamber gas discharge laser
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
JP2004335782A (ja) * 2003-05-08 2004-11-25 Komatsu Ltd 注入同期式レーザ装置

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TW200715674A (en) 2007-04-16
TWI320619B (en) 2010-02-11
JP2009505396A (ja) 2009-02-05

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