TWI320619B - Multi-chamber gas discharge laser bandwidth control through discharge timing - Google Patents

Multi-chamber gas discharge laser bandwidth control through discharge timing

Info

Publication number
TWI320619B
TWI320619B TW95126520A TW95126520A TWI320619B TW I320619 B TWI320619 B TW I320619B TW 95126520 A TW95126520 A TW 95126520A TW 95126520 A TW95126520 A TW 95126520A TW I320619 B TWI320619 B TW I320619B
Authority
TW
Taiwan
Prior art keywords
multi
bandwidth control
chamber gas
discharge
laser bandwidth
Prior art date
Application number
TW95126520A
Other versions
TW200715674A (en
Inventor
Robert N Jacques
William N Partlo
Daniel J W Brown
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US11/199,691 priority Critical patent/US7061961B2/en
Priority to US11/323,604 priority patent/US7830934B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of TW200715674A publication Critical patent/TW200715674A/en
Application granted granted Critical
Publication of TWI320619B publication Critical patent/TWI320619B/en

Links

TW95126520A 1999-12-10 2006-07-20 Multi-chamber gas discharge laser bandwidth control through discharge timing TWI320619B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US11/199,691 US7061961B2 (en) 1999-12-10 2005-08-09 Very narrow band, two chamber, high rep-rate gas discharge laser system
US11/323,604 US7830934B2 (en) 2001-08-29 2005-12-29 Multi-chamber gas discharge laser bandwidth control through discharge timing

Publications (2)

Publication Number Publication Date
TW200715674A TW200715674A (en) 2007-04-16
TWI320619B true TWI320619B (en) 2010-02-11

Family

ID=40403966

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95126520A TWI320619B (en) 1999-12-10 2006-07-20 Multi-chamber gas discharge laser bandwidth control through discharge timing

Country Status (2)

Country Link
JP (1) JP5202315B2 (en)
TW (1) TWI320619B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI389409B (en) * 2008-10-21 2013-03-11 Cymer Inc Method and apparatus for laser control in a two chamber gas discharge laser
US9098274B2 (en) * 2009-12-03 2015-08-04 Intel Corporation Methods and apparatuses to improve turbo performance for events handling

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US6590922B2 (en) * 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
JP4393457B2 (en) * 2002-07-31 2010-01-06 サイマー インコーポレイテッド 2 rooms discharge gas laser control system
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
JP4169187B2 (en) * 2002-05-17 2008-10-22 ウシオ電機株式会社 Two-stage laser system
JP2004335782A (en) * 2003-05-08 2004-11-25 Gigaphoton Inc Injection-locked laser device

Also Published As

Publication number Publication date
JP5202315B2 (en) 2013-06-05
TW200715674A (en) 2007-04-16
JP2009505396A (en) 2009-02-05

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