TW200715674A - Multi-chamber gas discharge laser bandwidth control through discharge timing - Google Patents
Multi-chamber gas discharge laser bandwidth control through discharge timingInfo
- Publication number
- TW200715674A TW200715674A TW095126520A TW95126520A TW200715674A TW 200715674 A TW200715674 A TW 200715674A TW 095126520 A TW095126520 A TW 095126520A TW 95126520 A TW95126520 A TW 95126520A TW 200715674 A TW200715674 A TW 200715674A
- Authority
- TW
- Taiwan
- Prior art keywords
- curve
- laser system
- offset
- timing difference
- bandwidth
- Prior art date
Links
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- Lasers (AREA)
Abstract
A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/199,691 US7061961B2 (en) | 1999-12-10 | 2005-08-09 | Very narrow band, two chamber, high rep-rate gas discharge laser system |
US11/323,604 US7830934B2 (en) | 2001-08-29 | 2005-12-29 | Multi-chamber gas discharge laser bandwidth control through discharge timing |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200715674A true TW200715674A (en) | 2007-04-16 |
TWI320619B TWI320619B (en) | 2010-02-11 |
Family
ID=40403966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW95126520A TWI320619B (en) | 2005-08-09 | 2006-07-20 | Multi-chamber gas discharge laser bandwidth control through discharge timing |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5202315B2 (en) |
TW (1) | TWI320619B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI389409B (en) * | 2008-10-21 | 2013-03-11 | Cymer Inc | Method and apparatus for laser control in a two chamber gas discharge laser |
US9098274B2 (en) * | 2009-12-03 | 2015-08-04 | Intel Corporation | Methods and apparatuses to improve turbo performance for events handling |
US10833471B2 (en) | 2017-11-17 | 2020-11-10 | Cymer, Llc | Lithography system bandwidth control |
KR20220109471A (en) | 2020-03-03 | 2022-08-04 | 사이머 엘엘씨 | Control system for light source |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5898725A (en) * | 1997-01-21 | 1999-04-27 | Cymer, Inc. | Excimer laser with greater spectral bandwidth and beam stability |
US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US6590922B2 (en) * | 1999-09-27 | 2003-07-08 | Cymer, Inc. | Injection seeded F2 laser with line selection and discrimination |
US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US7039086B2 (en) * | 2001-04-09 | 2006-05-02 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
JP4169187B2 (en) * | 2002-05-17 | 2008-10-22 | 株式会社小松製作所 | Two stage laser system |
JP4393457B2 (en) * | 2002-07-31 | 2010-01-06 | サイマー インコーポレイテッド | Control system for two-chamber discharge gas laser |
US7741639B2 (en) * | 2003-01-31 | 2010-06-22 | Cymer, Inc. | Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control |
JP2004335782A (en) * | 2003-05-08 | 2004-11-25 | Komatsu Ltd | Injection-locked laser device |
-
2006
- 2006-07-12 JP JP2008526016A patent/JP5202315B2/en active Active
- 2006-07-20 TW TW95126520A patent/TWI320619B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI320619B (en) | 2010-02-11 |
JP5202315B2 (en) | 2013-06-05 |
JP2009505396A (en) | 2009-02-05 |
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