JP2009527124A5 - - Google Patents

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Publication number
JP2009527124A5
JP2009527124A5 JP2008555241A JP2008555241A JP2009527124A5 JP 2009527124 A5 JP2009527124 A5 JP 2009527124A5 JP 2008555241 A JP2008555241 A JP 2008555241A JP 2008555241 A JP2008555241 A JP 2008555241A JP 2009527124 A5 JP2009527124 A5 JP 2009527124A5
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JP
Japan
Prior art keywords
bandwidth
laser
laser operating
operating parameter
error signal
Prior art date
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Application number
JP2008555241A
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English (en)
Japanese (ja)
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JP2009527124A (ja
JP5420909B2 (ja
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Publication date
Priority claimed from US11/510,037 external-priority patent/US7852889B2/en
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Publication of JP2009527124A publication Critical patent/JP2009527124A/ja
Publication of JP2009527124A5 publication Critical patent/JP2009527124A5/ja
Application granted granted Critical
Publication of JP5420909B2 publication Critical patent/JP5420909B2/ja
Active legal-status Critical Current
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JP2008555241A 2006-02-17 2007-01-22 Ｄｕｖ光源の能動スペクトル制御 Active JP5420909B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US77477006P 2006-02-17 2006-02-17
US60/774,770 2006-02-17
US11/510,037 2006-08-25
US11/510,037 US7852889B2 (en) 2006-02-17 2006-08-25 Active spectral control of DUV light source
PCT/US2007/001667 WO2007097855A2 (en) 2006-02-17 2007-01-22 Active spectral control of duv light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013011451A Division JP5647700B2 (ja) 2006-02-17 2013-01-24 Ｄｕｖ光源の能動スペクトル制御

Publications (3)

Publication Number Publication Date
JP2009527124A JP2009527124A (ja) 2009-07-23
JP2009527124A5 true JP2009527124A5 (enExample) 2010-03-04
JP5420909B2 JP5420909B2 (ja) 2014-02-19

Family

ID=38428147

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008555241A Active JP5420909B2 (ja) 2006-02-17 2007-01-22 Ｄｕｖ光源の能動スペクトル制御
JP2013011451A Active JP5647700B2 (ja) 2006-02-17 2013-01-24 Ｄｕｖ光源の能動スペクトル制御

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013011451A Active JP5647700B2 (ja) 2006-02-17 2013-01-24 Ｄｕｖ光源の能動スペクトル制御

Country Status (6)

Country Link
US (2) US7852889B2 (enExample)
EP (2) EP2388800B1 (enExample)
JP (2) JP5420909B2 (enExample)
KR (1) KR101390217B1 (enExample)
TW (2) TWI347716B (enExample)
WO (1) WO2007097855A2 (enExample)

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US9018561B2 (en) * 2007-05-23 2015-04-28 Cymer, Llc High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier
US7830942B2 (en) * 2007-09-11 2010-11-09 Cymer, Inc. Ultraviolet laser light source pulse energy control system
US7720120B2 (en) * 2008-10-21 2010-05-18 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7751453B2 (en) * 2008-10-21 2010-07-06 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7756171B2 (en) * 2008-10-21 2010-07-13 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
US8254420B2 (en) * 2009-11-18 2012-08-28 Cymer, Inc. Advanced laser wavelength control
NL2006073A (en) * 2010-02-12 2011-08-15 Asml Netherlands Bv Lithographic apparatus and method.
US8837536B2 (en) * 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
US8432944B2 (en) 2010-06-25 2013-04-30 KLA-Technor Corporation Extending the lifetime of a deep UV laser in a wafer inspection tool
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US10395134B2 (en) 2013-07-26 2019-08-27 University Of Utah Research Foundation Extraction of spectral information
US9065248B2 (en) * 2013-11-20 2015-06-23 Cymer, Llc Systems and methods to more accurately estimate a fluorine concentration in a source laser
US9261794B1 (en) * 2014-12-09 2016-02-16 Cymer, Llc Compensation for a disturbance in an optical source
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
US9989866B2 (en) * 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9966725B1 (en) 2017-03-24 2018-05-08 Cymer, Llc Pulsed light beam spectral feature control
US11081852B2 (en) * 2017-04-24 2021-08-03 Cymer, Llc Laser light energy and dose control using repetition rate based gain estimators
US10833471B2 (en) 2017-11-17 2020-11-10 Cymer, Llc Lithography system bandwidth control
US12540850B2 (en) 2020-08-18 2026-02-03 Cymer, Llc Predictive calibration scheduling apparatus and method
CN115332924B (zh) * 2022-09-01 2024-11-01 中国人民解放军国防科技大学 一种用于产生灵巧波形高功率微波的光纤激光器

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