KR101390217B1 - Ｄｕｖ 광원의 액티브 스펙트럼 컨트롤 - Google Patents

Ｄｕｖ 광원의 액티브 스펙트럼 컨트롤 Download PDF

Info

Publication number
KR101390217B1
KR101390217B1 KR1020087021234A KR20087021234A KR101390217B1 KR 101390217 B1 KR101390217 B1 KR 101390217B1 KR 1020087021234 A KR1020087021234 A KR 1020087021234A KR 20087021234 A KR20087021234 A KR 20087021234A KR 101390217 B1 KR101390217 B1 KR 101390217B1
Authority
KR
South Korea
Prior art keywords
bandwidth
laser
delete delete
error signal
laser operating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020087021234A
Other languages
English (en)
Korean (ko)
Other versions
KR20080106215A (ko
Inventor
웨인 제이. 던스탄
로버트 엔. 자크
라자세크하르 엠. 라오
표도르 비. 트린초우크
Original Assignee
사이머 엘엘씨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 사이머 엘엘씨 filed Critical 사이머 엘엘씨
Publication of KR20080106215A publication Critical patent/KR20080106215A/ko
Application granted granted Critical
Publication of KR101390217B1 publication Critical patent/KR101390217B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Spectroscopy & Molecular Physics (AREA)
KR1020087021234A 2006-02-17 2007-01-22 Ｄｕｖ 광원의 액티브 스펙트럼 컨트롤 Active KR101390217B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US77477006P 2006-02-17 2006-02-17
US60/774,770 2006-02-17
US11/510,037 2006-08-25
US11/510,037 US7852889B2 (en) 2006-02-17 2006-08-25 Active spectral control of DUV light source
PCT/US2007/001667 WO2007097855A2 (en) 2006-02-17 2007-01-22 Active spectral control of duv light source

Publications (2)

Publication Number Publication Date
KR20080106215A KR20080106215A (ko) 2008-12-04
KR101390217B1 true KR101390217B1 (ko) 2014-05-27

Family

ID=38428147

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087021234A Active KR101390217B1 (ko) 2006-02-17 2007-01-22 Ｄｕｖ 광원의 액티브 스펙트럼 컨트롤

Country Status (6)

Country Link
US (2) US7852889B2 (enExample)
EP (2) EP2388800B1 (enExample)
JP (2) JP5420909B2 (enExample)
KR (1) KR101390217B1 (enExample)
TW (2) TWI347716B (enExample)
WO (1) WO2007097855A2 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US9018561B2 (en) * 2007-05-23 2015-04-28 Cymer, Llc High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier
US7830942B2 (en) * 2007-09-11 2010-11-09 Cymer, Inc. Ultraviolet laser light source pulse energy control system
US7720120B2 (en) * 2008-10-21 2010-05-18 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7751453B2 (en) * 2008-10-21 2010-07-06 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7756171B2 (en) * 2008-10-21 2010-07-13 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
US8254420B2 (en) * 2009-11-18 2012-08-28 Cymer, Inc. Advanced laser wavelength control
NL2006073A (en) * 2010-02-12 2011-08-15 Asml Netherlands Bv Lithographic apparatus and method.
US8837536B2 (en) * 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
US8432944B2 (en) 2010-06-25 2013-04-30 KLA-Technor Corporation Extending the lifetime of a deep UV laser in a wafer inspection tool
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US10395134B2 (en) 2013-07-26 2019-08-27 University Of Utah Research Foundation Extraction of spectral information
US9065248B2 (en) * 2013-11-20 2015-06-23 Cymer, Llc Systems and methods to more accurately estimate a fluorine concentration in a source laser
US9261794B1 (en) * 2014-12-09 2016-02-16 Cymer, Llc Compensation for a disturbance in an optical source
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
US9989866B2 (en) * 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9966725B1 (en) 2017-03-24 2018-05-08 Cymer, Llc Pulsed light beam spectral feature control
US11081852B2 (en) * 2017-04-24 2021-08-03 Cymer, Llc Laser light energy and dose control using repetition rate based gain estimators
US10833471B2 (en) 2017-11-17 2020-11-10 Cymer, Llc Lithography system bandwidth control
US12540850B2 (en) 2020-08-18 2026-02-03 Cymer, Llc Predictive calibration scheduling apparatus and method
CN115332924B (zh) * 2022-09-01 2024-11-01 中国人民解放军国防科技大学 一种用于产生灵巧波形高功率微波的光纤激光器

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100347426B1 (ko) 1999-08-04 2002-08-03 사이머 인코포레이티드 자동 플루오르 제어 시스템
WO2003021727A2 (en) 2001-08-29 2003-03-13 Cymer, Inc, Line selected f2 two chamber laser system
KR20040111584A (ko) * 2002-05-07 2004-12-31 사이머 인코포레이티드 가스 방전 레이저를 위한 자동 가스 제어 시스템
JP2006024855A (ja) * 2004-07-09 2006-01-26 Komatsu Ltd 狭帯域化レーザ装置

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4823354A (en) 1987-12-15 1989-04-18 Lumonics Inc. Excimer lasers
US4881231A (en) 1988-11-28 1989-11-14 Kantilal Jain Frequency-stabilized line-narrowed excimer laser source system for high resolution lithography
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US6721340B1 (en) * 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6671294B2 (en) 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6493374B1 (en) * 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
JP2000150998A (ja) * 1998-11-06 2000-05-30 Komatsu Ltd エキシマレーザ装置の狭帯域化モジュール
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6882674B2 (en) 1999-12-27 2005-04-19 Cymer, Inc. Four KHz gas discharge laser system
US6625191B2 (en) 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
WO2001028048A2 (en) 1999-10-14 2001-04-19 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6650666B2 (en) * 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6788719B2 (en) * 2000-05-04 2004-09-07 Agility Communications, Inc. Open loop control of SGDBR lasers
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
US6856638B2 (en) * 2000-10-23 2005-02-15 Lambda Physik Ag Resonator arrangement for bandwidth control
DE10054244C2 (de) * 2000-11-02 2002-10-10 Honda Motor Co Ltd Turbinenblattanordnung und Turbinenblatt für eine Axialturbine
GB0027238D0 (en) * 2000-11-08 2000-12-27 Secr Defence Adaptive filter
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
US7830934B2 (en) 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
JP2003172180A (ja) * 2001-11-30 2003-06-20 Hitachi Unisia Automotive Ltd 内燃機関の空燃比制御装置
JP3888673B2 (ja) 2001-12-28 2007-03-07 ウシオ電機株式会社 露光用フッ素分子レーザシステム
JP4094307B2 (ja) * 2002-02-21 2008-06-04 ギガフォトン株式会社 ガスレーザ装置
US7741639B2 (en) 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
US7277464B2 (en) 2003-12-18 2007-10-02 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge laser system
US7352858B2 (en) * 2004-06-30 2008-04-01 Microsoft Corporation Multi-channel echo cancellation with round robin regularization
US7643522B2 (en) 2004-11-30 2010-01-05 Cymer, Inc. Method and apparatus for gas discharge laser bandwidth and center wavelength control
US20060114956A1 (en) 2004-11-30 2006-06-01 Sandstrom Richard L High power high pulse repetition rate gas discharge laser system bandwidth management
US7317536B2 (en) 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US7653095B2 (en) 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
JP2007142052A (ja) * 2005-11-16 2007-06-07 Nikon Corp 露光装置、レーザ光源、露光方法、及びデバイス製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100347426B1 (ko) 1999-08-04 2002-08-03 사이머 인코포레이티드 자동 플루오르 제어 시스템
WO2003021727A2 (en) 2001-08-29 2003-03-13 Cymer, Inc, Line selected f2 two chamber laser system
KR20040111584A (ko) * 2002-05-07 2004-12-31 사이머 인코포레이티드 가스 방전 레이저를 위한 자동 가스 제어 시스템
JP2006024855A (ja) * 2004-07-09 2006-01-26 Komatsu Ltd 狭帯域化レーザ装置

Also Published As

Publication number Publication date
TWI347716B (en) 2011-08-21
EP2388800A1 (en) 2011-11-23
US20110051760A1 (en) 2011-03-03
US20070195836A1 (en) 2007-08-23
TW200735493A (en) 2007-09-16
JP2009527124A (ja) 2009-07-23
TWI470888B (zh) 2015-01-21
EP1994549A4 (en) 2009-08-05
JP2013102206A (ja) 2013-05-23
WO2007097855A2 (en) 2007-08-30
WO2007097855A3 (en) 2008-07-24
EP2388800B1 (en) 2017-12-20
US8098698B2 (en) 2012-01-17
US7852889B2 (en) 2010-12-14
TW201036294A (en) 2010-10-01
JP5647700B2 (ja) 2015-01-07
JP5420909B2 (ja) 2014-02-19
EP1994549A2 (en) 2008-11-26
KR20080106215A (ko) 2008-12-04
EP1994549B1 (en) 2016-12-07

Similar Documents

Publication Publication Date Title
US8098698B2 (en) Active spectral control of DUV laser light source
CN107925214B (zh) 用于光源的波长稳定化
KR101456859B1 (ko) 레이저 광의 대역폭을 안정화하고 튜닝하는 방법 및 장치
KR101346609B1 (ko) 방전 타이밍을 통한 멀티 챔버 가스 방전 레이저 대역폭제어 시스템 및 그 방법
US7057705B2 (en) Lithographic apparatus, device manufacturing method, performance measuring method, calibration method and computer program
US7643522B2 (en) Method and apparatus for gas discharge laser bandwidth and center wavelength control
CN108701954B (zh) 气体放电光源中的气体优化
JP2009527124A5 (enExample)
US20120248341A1 (en) System and method for compensating for thermal effects in an euv light source
JP5264173B2 (ja) レーザ出力光パルスビームパラメータ遷移補正システム
JP3722200B2 (ja) 放電励起ガスレーザ装置の出力制御方法及び放電励起ガスレーザ装置
Dunstan et al. Active Spectral Control of DUV light sources for OPE minimization
JP2003218437A (ja) レーザ装置及びその制御方法

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

PE0801 Dismissal of amendment

St.27 status event code: A-2-2-P10-P12-nap-PE0801

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000