JP2009505396A5 - - Google Patents
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- JP2009505396A5 JP2009505396A5 JP2008526016A JP2008526016A JP2009505396A5 JP 2009505396 A5 JP2009505396 A5 JP 2009505396A5 JP 2008526016 A JP2008526016 A JP 2008526016A JP 2008526016 A JP2008526016 A JP 2008526016A JP 2009505396 A5 JP2009505396 A5 JP 2009505396A5
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- JP
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- laser system
- operating point
- firing time
- differential firing
- current operating
- Prior art date
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- 238000010304 firing Methods 0.000 claims 21
- 238000005259 measurement Methods 0.000 claims 3
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
Claims (15)
測定帯域幅とターゲット帯域幅の関数としてターゲット作動点を調節する段階と、
現在の作動点を推定する段階と、
現在の作動点をターゲット作動点まで進めるために、該現在の作動点及び該ターゲット作動点の関数として差動発射時間を調節する段階と、
を含むことを特徴とする方法。 A method for controlling bandwidth in a multi-part laser system including a first line-narrowed oscillator laser system part that supplies a line narrowing seed pulse to a second gain generator laser system part, the first laser Selection of the differential firing time between generation of the seed pulse in the system portion and generation of the laser gain medium in the second laser system portion reduces the bandwidth of the laser output light pulses from the multi-part laser system. Was to bring
Adjusting the target operating point as a function of the measurement bandwidth and the target bandwidth;
Estimating the current operating point;
Adjusting the differential firing time as a function of the current operating point and the target operating point to advance the current operating point to the target operating point;
A method comprising the steps of:
を更に含むことを特徴とする請求項１に記載の方法。 Adjusting the halogen gas injection as a function of the current operating point and the desired operating point;
The method of claim 1 further comprising:
ことを更に含むことを特徴とする請求項１に記載の方法。 A desired operating point is determined as a function of at least one of target bandwidth, laser system duty cycle, and laser system output pulse energy.
The method of claim 1 further comprising:
ことを更に含むことを特徴とする請求項１に記載の方法。 Said step of estimating the current operating point involves the use of a function that can be easily calculated or estimated from available measurements of the laser system operating parameters and that is also monotonic with respect to the differential firing time over the expected operating range. ,
The method of claim 1 further comprising:
ことを更に含むことを特徴とする請求項４に記載の方法。 Estimating the current operating point comprises utilizing a difference between a current differential firing time and a reference differential firing time;
The method of claim 4 further comprising:
を更に含むことを特徴とする請求項５に記載の方法。 Current differential firing time and reference differential firing as a function of at least one of a derivative of the laser system output pulse energy with respect to the differential firing time at a constant voltage and the laser system output pulse energy at the current operating point. Estimating the difference between times;
The method of claim 5, further comprising:
を更に含むことを特徴とする請求項５に記載の方法。 At least one of a derivative of the laser system discharge voltage with respect to the differential firing time at a constant energy, a derivative of the laser system output pulse energy with respect to the laser system discharge voltage, and the laser system output pulse energy at the current operating point. Estimating the difference between the current differential firing time and the reference differential firing time as a function of
The method of claim 5, further comprising:
前記ディザ信号のスケーリングされたバージョンを電圧に印加する段階と、
エネルギ誤差を最小にするように前記スケールを適応させる段階と、
前記スケーリングの係数としてｄＶ／ｄｔを取る段階と、
を更に含むことを特徴とする請求項８に記載の方法。 Estimating a derivative of the laser system discharge voltage with respect to the differential firing time at a constant energy by applying a dither signal to the differential firing time;
Applying a scaled version of the dither signal to a voltage;
Adapting the scale to minimize energy error;
Taking dV / dt as the scaling factor;
The method of claim 8 further comprising:
を更に含むことを特徴とする請求項４に記載の方法。 Estimating the current operating point as a function of at least one of a derivative of a discharge voltage of the laser system with respect to a differential firing time at a constant energy and the laser system output pulse energy at the current operating point;
The method of claim 4, further comprising:
を更に含むことを特徴とする請求項１０に記載の方法。 The current operating point, when E is the laser system output pulse energy and dV / dt is the derivative of the laser system discharge voltage with respect to the differential firing time at constant energy at the current operating point (1 / E ) * Estimating as dV / dt,
The method of claim 10, further comprising:
前記ディザ信号のスケーリングされたバージョンを電圧に印加する段階と、
エネルギ誤差を最小にするように前記スケールを適応させる段階と、
前記スケーリングの係数としてｄＶ／ｄｔを取る段階と、
を更に含むことを特徴とする請求項１０に記載の方法。 Estimating a derivative of the laser system discharge voltage with respect to the differential firing time at a constant energy by applying a dither signal to the differential firing time;
Applying a scaled version of the dither signal to a voltage;
Adapting the scale to minimize energy error;
Taking dV / dt as the scaling factor;
The method of claim 10, further comprising:
を更に含むことを特徴とする請求項４に記載の方法。 Estimating the current operating point as a function of at least one of a derivative of the laser system output pulse energy with respect to a differential firing time at a constant voltage and the laser system output pulse energy at the current operating point;
The method of claim 4, further comprising:
ことを更に含むことを特徴とする請求項１３に記載の方法。 The step of estimating the current operating point includes: E is the laser system output pulse energy, and dE / dt is the laser system output pulse energy with respect to a differential firing time at a constant voltage at the current operating point. Using the relationship (1 / E) * dE / dt when it is a derivative,
14. The method of claim 13, further comprising:
を更に含むことを特徴とする請求項１に記載の方法。 Adjusting the target operating point as a function of the error between the measurement bandwidth and the target bandwidth;
The method of claim 1 further comprising:
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/199,691 | 2005-08-09 | ||
| US11/199,691 US7061961B2 (en) | 1999-12-10 | 2005-08-09 | Very narrow band, two chamber, high rep-rate gas discharge laser system |
| US11/323,604 | 2005-12-29 | ||
| US11/323,604 US7830934B2 (en) | 2001-08-29 | 2005-12-29 | Multi-chamber gas discharge laser bandwidth control through discharge timing |
| PCT/US2006/027015 WO2007021406A2 (en) | 2005-08-09 | 2006-07-12 | Multi-chamber gas discharge laser bandwidth control through discharge timing |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009505396A JP2009505396A (en) | 2009-02-05 |
| JP2009505396A5 true JP2009505396A5 (en) | 2009-09-03 |
| JP5202315B2 JP5202315B2 (en) | 2013-06-05 |
Family
ID=40403966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008526016A Active JP5202315B2 (en) | 2005-08-09 | 2006-07-12 | Bandwidth control of multi-chamber gas discharge laser by discharge timing |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5202315B2 (en) |
| TW (1) | TWI320619B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI389409B (en) * | 2008-10-21 | 2013-03-11 | Cymer Inc | Method and apparatus for laser control in a two chamber gas discharge laser |
| US9098274B2 (en) * | 2009-12-03 | 2015-08-04 | Intel Corporation | Methods and apparatuses to improve turbo performance for events handling |
| US10833471B2 (en) * | 2017-11-17 | 2020-11-10 | Cymer, Llc | Lithography system bandwidth control |
| CN115210970A (en) * | 2020-03-03 | 2022-10-18 | 西默有限公司 | Control system for light sources |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5898725A (en) * | 1997-01-21 | 1999-04-27 | Cymer, Inc. | Excimer laser with greater spectral bandwidth and beam stability |
| US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6590922B2 (en) * | 1999-09-27 | 2003-07-08 | Cymer, Inc. | Injection seeded F2 laser with line selection and discrimination |
| US7039086B2 (en) * | 2001-04-09 | 2006-05-02 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
| JP4169187B2 (en) * | 2002-05-17 | 2008-10-22 | 株式会社小松製作所 | Two stage laser system |
| JP4393457B2 (en) * | 2002-07-31 | 2010-01-06 | サイマー インコーポレイテッド | Control system for two-chamber discharge gas laser |
| US7741639B2 (en) * | 2003-01-31 | 2010-06-22 | Cymer, Inc. | Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control |
| JP2004335782A (en) * | 2003-05-08 | 2004-11-25 | Komatsu Ltd | Injection-locked laser device |
-
2006
- 2006-07-12 JP JP2008526016A patent/JP5202315B2/en active Active
- 2006-07-20 TW TW95126520A patent/TWI320619B/en active
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