CN109950786A - Excimer laser dosage stability control system and control method - Google Patents
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Abstract
The invention discloses a kind of excimer laser dosage stability control system and control methods, wherein control system includes: electrion component, for receiving trigger signal, and according to trigger signal and preset high-pressure setting value, generates high voltage pulse；Laser, is charged with working gas, and working gas generates laser pulse for receiving high voltage pulse；Laser parameter measurement component, for detecting the energy value of laser pulse, and by pulsed laser output to outside；Energy stabilization controller is electrically connected with electrion component, and energy stabilization controller is used for collecting energy value；The present invention passes through the energy value of laser parameter measurement component detection pulse laser, the electric discharge high pressure of electrion component is controlled by energy stabilization controller when energy value deviates preset energy value, and then the energy value for controlling laser pulse is close or equal with preset energy value, to prevent several serious overshoot of laser pulse before each sequence, the stability of each laser pulse ensure that.
Description
Technical field
The present invention relates to precision instrument control field more particularly to a kind of excimer laser dosage stability control system and
Control method.
Background technique
193nmArF excimer laser is a kind of pulsed gas laser towards the application of deep ultraviolet feature, has height
The characteristics of repetition, big energy, short wavelength, narrow linewidth is outstanding microelectronics lithography system laser light source.
The laser that excimer laser issues is issued with impulse form, due to the variation either working gas of charge
It is rotten, the energy between pulse and pulse is discrepant, while the expectation pulse energy of the energy of laser pulse and setting
There is also certain deviations, this results in the dose stability of laser device laser energy to have very great fluctuation process.In semiconductor lithography work
In skill, the unstable result of dosage shows as overexposure in a photolithographic process or under-exposure, so that the lines processed
It is coarse.In order to make the precision of photoetching, the stability of quasi-molecule laser pulse dosage must be controlled well within the allowable range
System.It is a key in excimer laser R&D process so solving the control of dose stability.
During laser operation, due to gas temperature, gas degeneration or the factors such as update and runing time
It influences, excimer laser always will appear the fluctuation of single pulse energy, the drift of average pulse energy and surpassing for single pulse energy
It adjusts.These phenomenons can all influence the dose stability and energy stability of laser.The overshoot of energy refers in burst mode
Under, in the time interval of a set of pulses and a set of pulses, cause high in identical electric discharge since gas is in not discharge condition
It is more much higher than other pulses to depress each group of preceding several pulses.Single pulse energy fluctuation and energy value over control are quasi- point
The inherent characteristic of sub- laser, it is relatively difficult to improve this phenomenon by changing the optical characteristics of laser itself merely, it must
Necessary control algolithm must be used, dose stability is made to be greatly improved.
Summary of the invention
The object of the present invention is to provide a kind of excimer laser dosage stability control system and control methods, existing to solve
Have in technology that excimer laser is under burst mode, in the time interval of a set of pulses and a set of pulses, since gas is in
Not discharge condition and lead under identical electric discharge high pressure several pulses problem more much higher than other pulses before each group.
To solve the above-mentioned problems, the present invention provides a kind of excimer laser dosage stability control systems comprising:
Electrion component is used to receive from external trigger signal, and is set according to trigger signal and preset high-pressure
Definite value generates high voltage pulse；
Laser, is charged with working gas, and working gas generates laser pulse for receiving high voltage pulse；
Laser parameter measurement component, is used to detect the energy value of laser pulse, and by pulsed laser output to outside；
Energy stabilization controller is electrically connected with electrion component, and energy stabilization controller is described sharp for acquiring
The energy value of light pulse；When energy value is greater than preset energy value, energy stabilization controller controls high according to pre-set control algorithm
Pressing electrical component reduces discharge voltage, and when energy value is less than preset energy value, energy stabilization controller is calculated according to default control
Method controls electrion component and improves discharge voltage, so that energy value is close or equal with preset energy value.
As a further improvement of the present invention, pre-set control algorithm includes a closed loop control algorithm, is controlled and is calculated by PI
Method and formula (1) realize the control to energy value:
Wherein, EsetIt (n+1) is energy value needed for next laser pulse, DKpFor the proportionality coefficient of PI control algolithm,
Δ Dose (n) is the deviation of this laser pulse dose stability, DKiFor the integral coefficient of PI control algolithm, DT is PI control
The periodic coefficient of algorithm,For the deviation summation of history laser pulse dose stability.
As a further improvement of the present invention, pre-set control algorithm further includes an error mutually separated with closed loop control algorithm
Control algolithm is used to control the serious overshoot of 20 laser pulses before pulse train:
Control errors algorithm calculates laser n-th of laser arteries and veins in m-th of Burst sequence in light out according to formula (2)
The energy value of punching and the error of energy setting value:
Eerror(m, n)=Eset-Emeasured(m.n) (2),
Wherein, Emeasured(m, n) is the energy of laser n-th of laser pulse in m-th of Burst sequence in light out
Value, Eerror(m, n) is error；
Energy value needed for calculating n-th of laser pulse in next pulse sequence according to PI control algolithm and formula (3)；
Wherein, HV (m+1, n) is energy value needed for n-th of laser pulse, PK in next pulse sequencepFor PI control
The scale parameter of algorithm, PKiFor the integral parameter of PI control algolithm, T is the control cycle parameter of PI control algolithm,For the integral of history error.
As a further improvement of the present invention, laser is calculated in light out in m-th of Burst sequence according to formula (2)
The energy value of n-th of laser pulse and the error of energy setting value, specifically include:
By way of the increment type of PI feedback control algorithm, as shown in formula (4)；
Wherein Δ HV (m+1, n) indicates the change of the default electric discharge high pressure of n-th of laser pulse in next pulse sequence
Change value, HV (m, n) indicate energy value needed for n-th of laser pulse in this pulse train.
To solve the above-mentioned problems, the present invention also provides a kind of excimer laser dosage stability control method, packets
Include following steps:
Electrion component is received from external trigger signal, and according to trigger signal and preset high-pressure setting value, is produced
Raw high voltage pulse；
Working gas in laser receives high voltage pulse, and generates laser pulse；
The energy value of laser parameter measurement component detection laser pulse, and by pulsed laser output to outside；
The energy value of energy stabilization controller acquisition laser pulse；When energy value is greater than preset energy value, energy stabilization
Controller, which controls electrion component according to pre-set control algorithm, reduces discharge voltage, when energy value is less than preset energy value,
Energy stabilization controller controls electrion component according to pre-set control algorithm and improves discharge voltage.
As a further improvement of the present invention, pre-set control algorithm includes a closed loop control algorithm, is controlled and is calculated by PI
Method and formula (5) realize the control of energy value:
Wherein, EsetIt (n+1) is energy value needed for next laser pulse, DKpFor the proportionality coefficient of PI control algolithm,
Δ Dose (n) is the deviation of this laser pulse dose stability, DKiFor the integral coefficient of PI control algolithm, DT is PI control
The periodic coefficient of algorithm,For the deviation summation of history laser pulse dose stability.
As a further improvement of the present invention, pre-set control algorithm further includes an error mutually separated with closed loop control algorithm
Control algolithm is used to control the serious overshoot of 20 laser pulses before pulse train:
Control errors algorithm calculates laser n-th of laser arteries and veins in m-th of Burst sequence in light out according to formula (6)
The energy value of punching and the error of energy setting value:
Eerror(m, n)=Eset-Emeasured(m.n) (6),
Wherein, Emeasured(m, n) is the energy of laser n-th of laser pulse in m-th of Burst sequence in light out
Value, Eerror(m, n) is error；
Energy value needed for calculating n-th of laser pulse in next pulse sequence according to PI control algolithm and formula (7)；
Wherein, HV (m+1, n) is energy value needed for n-th of laser pulse, PK in next pulse sequencepFor PI control
The scale parameter of algorithm, PKiFor the integral parameter of PI control algolithm, T is the control cycle parameter of PI control algolithm,For the integral of history error.
As a further improvement of the present invention, laser is calculated in light out in m-th of Burst sequence according to formula (6)
The energy value of n-th of laser pulse and the error of energy setting value, specifically include:
By way of the increment type of PI feedback control algorithm, as shown in formula (8)；
Wherein Δ HV (m+1, n) indicates the change of the default electric discharge high pressure of n-th of laser pulse in next pulse sequence
Change value, HV (m, n) indicate energy value needed for n-th of laser pulse in this pulse train.
The present invention passes through the energy value of laser parameter measurement component detection pulse laser, when energy value deviates preset energy value
When the electric discharge high pressure of electrion component is controlled by energy stabilization controller, and then control the energy value of laser pulse and default
Energy value is close or equal, to prevent several serious overshoot of laser pulse before each sequence, ensure that each laser pulse
Stability.
Detailed description of the invention
Fig. 1 is the structural principle block diagram of excimer laser dosage stability control system one embodiment of the present invention；
Fig. 2 is the control effect figure of excimer laser dosage stability control system one embodiment of the present invention；
Fig. 3 is the flow diagram of excimer laser dosage stability control method one embodiment of the present invention.
Specific embodiment
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and
It is not used to limit the present invention.
Fig. 1 illustrates one embodiment of excimer laser dosage stability control system of the present invention, referring to Fig. 1, at this
In embodiment, which includes electrion component, laser, laser parameter measurement component and energy stabilization control
Device.
Wherein, electrion component is used to receive from external trigger signal, and according to trigger signal and preset high-pressure
Setting value generates high voltage pulse；Filled with working gas in laser, working gas generates laser for receiving high voltage pulse
Pulse；Laser parameter measurement component is used to detect the energy value of laser pulse, and by pulsed laser output to outside；Energy stabilization
Controller and electrion component are electrically connected, and energy stabilization controller is used for collecting energy value；When energy value is greater than default energy
When magnitude, energy stabilization controller, which controls electrion component according to pre-set control algorithm, reduces discharge voltage, when energy value is small
When preset energy value, energy stabilization controller controls electrion component according to pre-set control algorithm and improves discharge voltage, with
Enable magnitude is close or equal with preset energy value.
It specifically,, can basis when electrion component receives the trigger signal of an outside in laser works
High pressure setting signal (preset high-pressure setting value) generates a high voltage pulse, the working gas in the laser cavity that shocks by electricity, triggering
Laser generates a laser pulse, and laser pulse will be used for the laser of work after the measurement of laser parameter measurement component
Device pulse output.
Further, the height of laser pulse caused by laser and work laser energy is mainly by electrion group
The high voltage control of part, in the operating voltage range of electrion component, electric discharge high pressure is higher, and the light energy that goes out of laser is got over
Greatly.
Further, the dosage of laser is defined as the summation of the energy of N number of pulse, i.e.,
Wherein j is the pulse number in each Burst sequence, EiFor the energy value of i-th of pulse.
The dose stability of laser is defined as:
Wherein DosetargetFor dosage setting value.
By calculating in Burst sequence after each laser pulse (pulse position sequence number is more than or equal to N) sending
The dose stability of dose stability, each Burst is weighed with the maximum value of the dose stability in each Burst and minimum value
Measure the stability of dosage.
The present embodiment passes through the energy value of laser parameter measurement component detection pulse laser, when energy value deviates preset energy
The electric discharge high pressure of electrion component is controlled when value by energy stabilization controller, and then controls the energy value of laser pulse and pre-
If energy value is close or equal, to prevent several serious overshoot of laser pulse before each sequence, each laser pulse ensure that
Stability.
In order to realize the control to energy value, on the basis of the above embodiments, in the present embodiment, pre-set control algorithm
Including a closed loop control algorithm, the control of energy value is realized by PI control algolithm and formula (1):
Wherein, EsetIt (n+1) is energy value needed for next laser pulse, DKpFor the proportionality coefficient of PI control algolithm,
Δ Dose (n) is the deviation of this laser pulse dose stability, DKiFor the integral coefficient of PI control algolithm, DT is PI control
The periodic coefficient of algorithm,For the deviation summation of history laser pulse dose stability.
Specifically, for first laser pulse of each Burst, energy setting value are as follows:
The number N of the laser pulse needed for the laser pulse position number in some Burst is less than Rapid Dose Calculation
When, the form of the following formula of calculating of dosage indicates that the laser pulse that do not get is carried out by the dosage for meeting energy setting value
It calculates:
After dose stability algorithm closed loop calculates the single pulse energy for needing to set, follow-up work is exactly safeguards system
Control algolithm can ensure the single pulse energy of laser reach needed for set energy value.
Preceding several serious overshoot of laser pulse in a pulse train in order to prevent, on the basis of the above embodiments,
In the present embodiment, pre-set control algorithm further includes a control errors algorithm mutually separated with closed loop control algorithm, is used to control
The serious overshoot of 20 laser pulses before pulse train:
Control errors algorithm calculates laser n-th of laser arteries and veins in m-th of Burst sequence in light out according to formula (2)
The energy value of punching and the error of energy setting value:
Eerror(m, n)=Eset-Emeasured(m.n) (2),
Wherein, Emeasured(m, n) is the energy of laser n-th of laser pulse in m-th of Burst sequence in light out
Value, Eerror(m, n) is error；
Specifically, due in a pulse train, identical electric discharge high pressure, preceding several serious overshoot of pulse, if utilized
Feedback algorithm as succeeding impulse is extremely difficult to the control effect of anticipation.The present embodiment uses the control of the laser pulse of front end
The control method that algorithm processed is mutually separated with the algorithm of subsequent laser pulse.
Further, according to the pulse energy test experiments of a large amount of lasers, the present embodiment chooses a pulse train
Preceding 20 pulses use independent control method, and subsequent pulse uses same control method.
Further, the overshoot of 20 laser pulses before laser pulse sequence, the method that the present embodiment uses are directed to
Be take into account pulse train number where laser pulse and in pulse train the laser pulse position, i.e. electric discharge of this setting
High pressure will refer to the electric discharge high pressure of the laser pulse of identical number in the pulse train of laser pulse place in history pulse train
Light energy is controlled out.
For the error, n-th of laser pulse institute in next pulse sequence is calculated according to PI control algolithm and formula (3)
The energy value needed；
Wherein, HV (m+1, n) is energy value needed for n-th of laser pulse, PK in next pulse sequencepFor PI control
The scale parameter of algorithm, PKiFor the integral parameter of PI control algolithm, T is the control cycle parameter of PI control algolithm,For the integral of history error.
In order to enable formula (2) is easier to realize in engineering, on the basis of the above embodiments, in the present embodiment, root
The laser energy value of n-th of laser pulse and energy setting value in m-th of Burst sequence in light out are calculated according to formula (2)
Error, specifically include:
By way of the increment type of PI feedback control algorithm, as shown in formula (4)；
Wherein Δ HV (m+1, n) indicates the change of the default electric discharge high pressure of n-th of laser pulse in next pulse sequence
Change value, HV (m, n) indicate energy value needed for n-th of laser pulse in this pulse train.
Specifically, during realizing control algolithm, due toPresence, a large amount of memories can be occupied, and
And it is easy to appear integral saturated phenomenon.For the Yi Shixian in engineering, the present embodiment uses the increment type of PI feedback control algorithm
Form is realized, is realized shown in formula such as formula (4).
Further, in order to avoid calculating integral term during realization, the present embodiment still uses PI feedback control to calculate
The increment type representation of method, shown in following formula:
It should be noted that in the actual implementation process, the electric discharge high-voltage value of laser pulse is solid by electrion component
Have the limitation of attribute, have maximum value and minimum value limitation, so, for each pulse settings electric discharge high-voltage value HV (m+1,
N) or HV (n+1) sets maximum value and minimum value.
Under the control of energy stabilization controller in the above-described embodiments, obtained control effect is as shown in Figure 2.One is swashed
Contain 375 pulses in light device pulse train, laser works calculate the laser pulse of dosage under the light frequency out of 4KHz
Number N is set as 30, and the target dose value of control is set as 300mJ.In figure 10 be laser dose stability when without the algorithm
Property, there is accuracy of dose known to figure probably 4% or so；20 displays are using dose stability control algolithm of the invention in figure
When generated dose stability data, accuracy of dose is 0.6% or so, it can be seen that sharp using quasi-molecule of the present invention
The dose stability of light device has obtained good control.
Fig. 3 illustrates one embodiment of excimer laser dosage stability control method of the present invention, referring to figure N, at this
In embodiment, which includes the following steps:
Step S1, electrion component is received from external trigger signal, and is set according to trigger signal and preset high-pressure
Definite value generates high voltage pulse；
Step S2, the working gas in laser receives high voltage pulse, and generates laser pulse；
Step S3, the energy value of laser parameter measurement component detection laser pulse, and by pulsed laser output to outside；
Step S4, energy stabilization controller collecting energy value；When energy value is greater than preset energy value, energy stabilization control
Device, which controls electrion component according to pre-set control algorithm, reduces discharge voltage, when energy value is less than preset energy value, energy
Stability controller controls electrion component according to pre-set control algorithm and improves discharge voltage, so that energy value and preset energy value
It is close or equal.
Specifically, pre-set control algorithm includes a closed loop control algorithm, realizes energy by PI control algolithm and formula (5)
The control of magnitude:
Wherein, EsetIt (n+1) is energy value needed for next laser pulse, DKpFor the proportionality coefficient of PI control algolithm,
Δ Dose (n) is the deviation of this laser pulse dose stability, DKiFor the integral coefficient of PI control algolithm, DT is PI control
The periodic coefficient of algorithm,For the deviation summation of history laser pulse dose stability.
Further, which further includes a control errors algorithm mutually separated with closed loop control algorithm,
For controlling the serious overshoot of 20 laser pulses before pulse train:
Control errors algorithm calculates laser n-th of laser arteries and veins in m-th of Burst sequence in light out according to formula (6)
The energy value of punching and the error of energy setting value:
Eerror(m, n)=Eset-Emeasured(m.n) (6),
Wherein, Emeasured(m, n) is the energy of laser n-th of laser pulse in m-th of Burst sequence in light out
Value, Eerror(m, n) is error；
Energy value needed for calculating n-th of laser pulse in next pulse sequence according to PI control algolithm and formula (7)；
Wherein, HV (m+1, n) is energy value needed for n-th of laser pulse, PK in next pulse sequencepFor PI control
The scale parameter of algorithm, PKiFor the integral parameter of PI control algolithm, T is the control cycle parameter of PI control algolithm,For the integral of history error.
Further, laser n-th laser pulse in m-th of Burst sequence in light out is calculated according to formula (6)
The error of energy value and energy setting value, specifically includes:
By way of the increment type of PI feedback control algorithm, as shown in formula (8)；
Wherein Δ HV (m+1, n) indicates the change of the default electric discharge high pressure of n-th of laser pulse in next pulse sequence
Change value, HV (m, n) indicate energy value needed for n-th of laser pulse in this pulse train.
It should be noted that all the embodiments in this specification are described in a progressive manner, each embodiment weight
Point explanation is the difference from other embodiments, and the same or similar parts between the embodiments can be referred to each other.
For the expansion content of method class embodiment in this manual, since it is similar to the expansion content of Installation practice,
So no longer being repeated, related place illustrates referring to the part that Installation practice expands content.
The specific embodiment of invention is described in detail above, but it is only used as example, the present invention is not intended to limit
In specific embodiments described above.For a person skilled in the art, any equivalent modifications that the invention is carried out
Or substitute also all among scope of the invention, therefore, the made equalization in the case where not departing from the spirit and principles in the present invention range
Transformation and modification, improvement etc., all should be contained within the scope of the invention.
Claims (8)
1. a kind of excimer laser dosage stability control system, characterized in that it comprises:
Electrion component is used to receive from external trigger signal, and is set according to the trigger signal and preset high-pressure
Definite value generates high voltage pulse；
Laser, is charged with working gas, and the working gas generates laser pulse for receiving the high voltage pulse；
Laser parameter measurement component, is used to detect the energy value of the laser pulse, and by the pulsed laser output to outer
Portion；
Energy stabilization controller is electrically connected with the electrion component, and the energy stabilization controller is for acquiring institute
State the energy value of laser pulse；When the energy value is greater than preset energy value, the energy stabilization controller is according to default control
Algorithm processed, which controls the electrion component, reduces discharge voltage, described when the energy value is less than the preset energy value
Energy stabilization controller controls the electrion component according to the pre-set control algorithm and improves the discharge voltage.
2. excimer laser dosage stability control system according to claim 1, which is characterized in that the default control
Algorithm includes a closed loop control algorithm, and the control to the energy value is realized by PI control algolithm and formula (1):
Wherein, EsetIt (n+1) is energy value needed for next laser pulse, DKpFor the proportionality coefficient of the PI control algolithm, Δ
Dose (n) is the deviation of this laser pulse dose stability, DKiFor the integral coefficient of the PI control algolithm, DT is described
The periodic coefficient of PI control algolithm,For the deviation summation of history laser pulse dose stability.
3. excimer laser dosage stability control system according to claim 2, which is characterized in that the default control
Algorithm further includes a control errors algorithm mutually separated with the closed loop control algorithm, is used to control before pulse train 20 and swashs
The serious overshoot of light pulse:
The control errors algorithm calculates the laser in light out according to formula (2) and swashs for n-th in m-th of Burst sequence
The error of the energy value of light pulse and the energy setting value:
Eerror(m, n)=Eset-Emeasured(m.n) (2),
Wherein, Emeasured(m, n) is the energy of the laser n-th of laser pulse in m-th of Burst sequence in light out
Value, Eerror(m, n) is the error；
Energy value needed for calculating n-th of laser pulse in next pulse sequence according to the PI control algolithm and formula (3)；
Wherein, HV (m+1, n) is energy value needed for n-th of laser pulse, PK in the next pulse sequencepFor the PI
The scale parameter of control algolithm, PKiFor the integral parameter of the PI control algolithm, T is the control period of the PI control algolithm
Parameter,For the integral of history error.
4. excimer laser dosage stability control system according to claim 3, which is characterized in that described according to formula
(2) calculating the laser, the energy value of n-th of laser pulse and the energy are set in m-th of Burst sequence in light out
The error of value, specifically includes:
By way of the increment type of PI feedback control algorithm, as shown in formula (4)；
Wherein Δ HV (m+1, n) indicates the changing value of the default electric discharge high pressure of n-th of laser pulse in next pulse sequence,
HV (m, n) indicates energy value needed for n-th of laser pulse in this pulse train.
5. a kind of excimer laser dosage stability control method, which is characterized in that it includes the following steps:
Electrion component is received from external trigger signal, and according to the trigger signal and preset high-pressure setting value, is produced
Raw high voltage pulse；
Working gas in laser receives the high voltage pulse, and generates laser pulse；
The energy value of laser pulse described in laser parameter measurement component detection, and by the pulsed laser output to outside；
Energy stabilization controller acquires the energy value of the laser pulse；It is described when the energy value is greater than preset energy value
Energy stabilization controller, which controls the electrion component according to pre-set control algorithm, reduces discharge voltage, when the energy value is small
When the preset energy value, the energy stabilization controller controls the electrion component according to the pre-set control algorithm
Improve the discharge voltage.
6. the excimer laser dosage stability control method according to weighing and require 5, which is characterized in that the default control is calculated
Method includes a closed loop control algorithm, and the control of the energy value is realized by PI control algolithm and formula (5):
Wherein, EsetIt (n+1) is energy value needed for next laser pulse, DKpFor the proportionality coefficient of the PI control algolithm, Δ
Dose (n) is the deviation of this laser pulse dose stability, DKiFor the integral coefficient of the PI control algolithm, DT is described
The periodic coefficient of PI control algolithm,For the deviation summation of history laser pulse dose stability.
7. the excimer laser dosage stability control method according to weighing and require 6, which is characterized in that the default control is calculated
Method further includes a control errors algorithm mutually separated with the closed loop control algorithm, is used to control 20 laser before pulse train
The serious overshoot of pulse:
The control errors algorithm calculates the laser in light out according to formula (6) and swashs for n-th in m-th of Burst sequence
The error of the energy value of light pulse and the energy setting value:
Eerror(m, n)=Eset-Emeasured(m.n) (6),
Wherein, Emeasured(m, n) is the energy of the laser n-th of laser pulse in m-th of Burst sequence in light out
Value, Eerror(m, n) is the error；
Energy value needed for calculating n-th of laser pulse in next pulse sequence according to the PI control algolithm and formula (7)；
Wherein, HV (m+1, n) is energy value needed for n-th of laser pulse, PK in the next pulse sequencepFor the PI
The scale parameter of control algolithm, PKiFor the integral parameter of the PI control algolithm, T is the control period of the PI control algolithm
Parameter,For the integral of history error.
8. the excimer laser dosage stability control method according to weighing and require 7, which is characterized in that described according to formula
(6) calculating the laser, the energy value of n-th of laser pulse and the energy are set in m-th of Burst sequence in light out
The error of value, specifically includes:
By way of the increment type of PI feedback control algorithm, as shown in formula (8)；
Wherein Δ HV (m+1, n) indicates the changing value of the default electric discharge high pressure of n-th of laser pulse in next pulse sequence,
HV (m, n) indicates energy value needed for n-th of laser pulse in this pulse train.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112490839A (en) * | 2020-11-09 | 2021-03-12 | 中国科学院微电子研究所 | Excimer laser stability control method and excimer laser |
| CN113783099A (en) * | 2021-04-15 | 2021-12-10 | 北京科益虹源光电技术有限公司 | Depth GRU-based excimer laser dose control method and device |
| CN115347447A (en) * | 2022-08-23 | 2022-11-15 | 西北核技术研究所 | Method and device for stably outputting pulse laser energy by adopting voltage regulation and control |
| CN116960716A (en) * | 2022-04-18 | 2023-10-27 | 北京科益虹源光电技术有限公司 | Energy drop recovery method and device for excimer laser |
| CN117791287A (en) * | 2024-02-23 | 2024-03-29 | 深圳市智鼎自动化技术有限公司 | Laser pulse energy control system and method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999019950A1 (en) * | 1997-10-10 | 1999-04-22 | Cymer, Inc. | Pulse energy control for excimer laser |
| US20020154669A1 (en) * | 2000-02-09 | 2002-10-24 | Spangler Ronald L. | Laser wavelength control unit with piezoelectric driver |
| CN102790348A (en) * | 2012-04-10 | 2012-11-21 | 中国科学院安徽光学精密机械研究所 | High pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system |
| CN209860345U (en) * | 2019-03-29 | 2019-12-27 | 北京科益虹源光电技术有限公司 | Excimer laser dose stabilization control system |
-
2019
- 2019-03-29 CN CN201910253024.0A patent/CN109950786B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999019950A1 (en) * | 1997-10-10 | 1999-04-22 | Cymer, Inc. | Pulse energy control for excimer laser |
| US20020154669A1 (en) * | 2000-02-09 | 2002-10-24 | Spangler Ronald L. | Laser wavelength control unit with piezoelectric driver |
| CN102790348A (en) * | 2012-04-10 | 2012-11-21 | 中国科学院安徽光学精密机械研究所 | High pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system |
| CN209860345U (en) * | 2019-03-29 | 2019-12-27 | 北京科益虹源光电技术有限公司 | Excimer laser dose stabilization control system |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112490839A (en) * | 2020-11-09 | 2021-03-12 | 中国科学院微电子研究所 | Excimer laser stability control method and excimer laser |
| CN112490839B (en) * | 2020-11-09 | 2022-02-22 | 中国科学院微电子研究所 | Excimer laser stability control method and excimer laser |
| CN113783099A (en) * | 2021-04-15 | 2021-12-10 | 北京科益虹源光电技术有限公司 | Depth GRU-based excimer laser dose control method and device |
| CN113783099B (en) * | 2021-04-15 | 2024-02-20 | 北京科益虹源光电技术有限公司 | Depth GRU-based excimer laser dose control method and device |
| CN116960716A (en) * | 2022-04-18 | 2023-10-27 | 北京科益虹源光电技术有限公司 | Energy drop recovery method and device for excimer laser |
| CN116960716B (en) * | 2022-04-18 | 2024-03-29 | 北京科益虹源光电技术有限公司 | Energy drop recovery method and device for excimer laser |
| CN115347447A (en) * | 2022-08-23 | 2022-11-15 | 西北核技术研究所 | Method and device for stably outputting pulse laser energy by adopting voltage regulation and control |
| CN115347447B (en) * | 2022-08-23 | 2024-06-11 | 西北核技术研究所 | Method and device for stably outputting pulse laser energy by adopting voltage regulation |
| CN117791287A (en) * | 2024-02-23 | 2024-03-29 | 深圳市智鼎自动化技术有限公司 | Laser pulse energy control system and method |
| CN117791287B (en) * | 2024-02-23 | 2024-04-30 | 深圳市智鼎自动化技术有限公司 | Laser pulse energy control system and method |
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