CN102790348A - High pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system - Google Patents

High pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system Download PDF

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CN102790348A
CN102790348A CN2012101034805A CN201210103480A CN102790348A CN 102790348 A CN102790348 A CN 102790348A CN 2012101034805 A CN2012101034805 A CN 2012101034805A CN 201210103480 A CN201210103480 A CN 201210103480A CN 102790348 A CN102790348 A CN 102790348A
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arf excimer
pulse energy
control system
peak holding
circuit
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CN102790348B (en
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王效顺
方晓东
梁勖
游利兵
尹洪虎
刘毅
王庆胜
赵家敏
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Anhui Institute of Optics and Fine Mechanics of CAS
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Abstract

The invention discloses a high pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system. The system comprises a pyroelectric detector, an operational amplifying circuit, a peak holding circuit, a main control circuit and a PI (proportional integral) control algorithm; the main controller of the main control circuit is a singlechip; the pyroelectric detector converts an optical signal into an electric pulse signal; the electric pulse signal is amplified by the operational amplifying circuit; after the peak holding circuit performs peak holding tracking, the amplified electric pulse signal is converted into a digital signal by an A/D (analogue/digital) conversion module and then is input the singlechip; the singlechip utilizes the PI algorithm to calculate the reference voltage digital signal required by the next pulse discharging; after the reference voltage digital signal is converted into analogue quantity through a DA (digital/analogue) module, the analogue quantity acts on the high voltage direct current power supply or controllable resonant charging module in an all-solid pulse power supply used by a high pulse repetition frequency ArF excimer laser. The PI voltage adjusting algorithm disclosed by the invention can be used for improving the control prevision and reducing the operation cost of the high pulse repetition frequency ArF excimer laser.

Description

Gao Zhongying ArF excimer laser pulse energy control systems
Technical field
The present invention relates to excimer laser field, the Gao Zhongying ArF excimer lasers particularly as photolithography light source（1k~4kHz）, and in particular to a kind of Gao Zhongying ArF excimer lasers pulse energy control system.
Background technology
193nmArF excimer lasers are the main stream light sources of the following integrated-semiconductor device photoetching production of 90nm nodes, and ArF immersion technologies are even more that lithography node is contracted into 22nm.At present, advanced photolithography light source and photoetching machine technique are all rested in the developed country such as Japan and the United States hand in the world, the photoetching production equipment and the substantially all dependence on import of high-end integrated circuit device of China.Also, in the introduction of key technology and device, also face the obstruction of developed country.To change the situation under one's control of integrated circuit production field, China is the Eleventh Five-Year Plan period starting " great scale integrated circuit manufacturing equipment is special with set technique ", wherein just including the development of the high photolithography light source of Gao Zhongying, energy stability.
When Gao Zhongying ArF excimer lasers are continuously run, electric discharge makes halogen gas be changed into stable compound to high pressure soon, and halogen gas concentration is gradually reduced, and laser output energy is decreased obviously.In photoetching process, the pulse energy stability of laser light source directly affects the control of integrated chip circuitry critical size.Photoetching quality is improved, it is required that regulation in real time is carried out to laser pulse energy.Traditional energy stabilization control method is to delay the downward trend of energy by supplementing halogen gas or part ventilation, but very difficult when each pulse energy of laser run in this way to Gao Zhongying adjust in real time.Because：First, tonifying Qi governing response speed is slow, is not suitable for applying under Gao Zhongying；Secondly, single air compensation is difficult to control, and precision is not high；Finally, the laser of Gao Zhongying operation, quickly, frequently tonifying Qi or ventilation will cause the raising of production cost to gas aging speed.
The content of the invention
It is an object of the invention to provide a kind of high speed of Gao Zhongying ArF excimer laser pulse energies, high-precision control system.The present invention devises energy stabilization close loop control circuit, proposes that a kind of discharge voltage adjusts PI control algolithms in real time, and pulse energy stability contorting is carried out from the angle of control power supply.
Technical scheme is as follows：
Gao Zhongying ArF excimer laser pulse energy control systems, it is characterised in that：Include pyroelectric detector, operational amplification circuit, peak holding circuit, governor circuit, PI control algolithms, the master controller of described governor circuit is the single-chip microcomputer of built-in A/D modular converters, described peak holding circuit includes positive peak holding circuit and negative peak holding circuit, described pyroelectric detector is converted optical signal into after electric impulse signal and is amplified through operational amplification circuit, the electric impulse signal after amplification is carried out just respectively through peak holding circuit again, negative peak keeps tracking, data signal is converted into by the A/D modular converters built in single-chip microcomputer again；Single-chip microcomputer obtains the corresponding digital quantity of single pulse energy value after the digital quantity after the conversion of positive and negative peak value is added, single-chip microcomputer is calculated using PI control algolithms after the reference voltage data signal required for next pulsed discharge, and data signal is sent to D/A modular converters by SPI serial communications and is converted into the high-voltage DC power supply or controllable resonant charging module that are acted on after analog quantity in the complete solid state pulse power supply that Gao Zhongying ArF excimer lasers are used by single-chip microcomputer；The expression formula of described PI control algolithms is as follows：
Figure 2012101034805100002DEST_PATH_IMAGE002
Wherein,
Figure 2012101034805100002DEST_PATH_IMAGE004
For DC power output voltage,
Figure 2012101034805100002DEST_PATH_IMAGE006
For single energy deviation（The difference of the pulse energy value surveyed and the target impulse energy value of setting, target impulse energy value is set in SCM program,）,
Figure 2012101034805100002DEST_PATH_IMAGE008
For the integration of energy deviation,
Figure 2012101034805100002DEST_PATH_IMAGE010
For proportionality coefficient,
Figure 2012101034805100002DEST_PATH_IMAGE012
For integral coefficient,For derivative of the output energy of pulse to DC power output voltage.
In described PI control algolithm expression formulas
Figure 632227DEST_PATH_IMAGE010
、
Figure 893445DEST_PATH_IMAGE012
Value learnt by matlab simulation results：
Figure 763922DEST_PATH_IMAGE010
、
Figure 131188DEST_PATH_IMAGE012
Value when being respectively 0.2,0.02 regulating effect preferably, so
Figure 950764DEST_PATH_IMAGE010
=0.2,=0.02。
The response wave length of the probe of described pyroelectric detector is 0.15 ~ 3um, and response frequency is up to 5kHz, measurable range 15uJ ~ 10J.
The operational amplifier of described operational amplification circuit is AD548.
The master chip of described peak holding circuit is PKD01.
Described single-chip microcomputer is PIC16F873A single-chip microcomputers.
The chip of described D/A modular converters is high-speed digital-analog conversion chip DA7731.
It is an advantage of the invention that：
The control system of the present invention requires fast response time, and whole closed loop control process is completed within 1ms.By PI Control Lyapunov functions in the control of Gao Zhongying ArF excimer laser pulse energies, it is proposed that the PI algorithms of regulation laser power supply voltage, the precision of control is improved.The present invention is more suitable for Gao Zhongying excimer laser than tonifying Qi regulation, is conducive to saving gas, the cost of reduction photoetching production.
Brief description of the drawings
Fig. 1 is the structured flowchart of complete solid state pulse power supply of the present invention.
Fig. 2 is pulse energy close loop control circuit schematic diagram of the present invention.
Fig. 3 is circuit diagram of the invention.
Fig. 4 is the matlab simulating, verifying schematic diagrames of the PI algorithms of the present invention.
Embodiment
The complete solid state pulse power supply that photoetching is used with Gao Zhongying ArF excimer lasers is as shown in Figure 1, mainly it is made up of DC high-voltage power supply, controllable resonant charging module, high-tension transformer and magnetic pulse compression module, wherein, DC high-voltage power supply output voltage is determined by its reference voltage, by controlling DC high-voltage power supply reference voltage to realize the regulation to gas discharge driving voltage.In addition, gas discharge driving voltage can also be by controlling resonant capacitance C2Both end voltage is adjusted.By the resonance reference voltage and C of programmable regulating2Sampling voltage is compared, for controlling S1Conducting and disconnection, complete control to resonant charging voltage.
Gao Zhongying ArF excimer laser pulse energy control systems, include pyroelectric detector 1, operational amplification circuit 2, peak holding circuit 3, governor circuit 4, PI control algolithms, the master controller of governor circuit is the single-chip microcomputer 5 of built-in A/D modular converters, peak holding circuit 3 includes positive peak holding circuit and negative peak holding circuit, the optical signal that pyroelectricity probe is detected is converted into after electric impulse signal and electric impulse signal is amplified through operational amplification circuit 2 by pyroelectric detector 1, the electric impulse signal after 3 pairs of amplifications of peak holding circuit is carried out just again, negative peak is converted into data signal after keeping tracking by the A/D modular converters built in single-chip microcomputer 5；Single-chip microcomputer 5 obtains the corresponding digital quantity of single pulse energy value after the digital quantity after the conversion of positive and negative peak value is added, single-chip microcomputer 5 is calculated using PI control algolithms after the reference voltage data signal required for next pulsed discharge, and digital controlled signal is sent to D/A modular converters 6 by SPI serial communications and is converted into the high-voltage DC power supply or controllable resonant charging module that are acted on after analog quantity in the complete solid state pulse power supply 7 that Gao Zhongying ArF excimer lasers 8 are used by single-chip microcomputer 5.
The expression formula of PI control algolithms is as follows：
Figure 460428DEST_PATH_IMAGE002
Wherein,
Figure 952589DEST_PATH_IMAGE004
For DC power output voltage,
Figure 256532DEST_PATH_IMAGE006
For single energy deviation, equal to the difference of each pulse energy and the target energy of setting, target energy value is set in SCM program,
Figure 593972DEST_PATH_IMAGE008
For the integration of energy deviation,
Figure 302690DEST_PATH_IMAGE010
For proportionality coefficient,
Figure 887124DEST_PATH_IMAGE012
For integral coefficient, by matlab simulation results：
Figure 678362DEST_PATH_IMAGE010
、
Figure 881810DEST_PATH_IMAGE012
Value when being respectively 0.2,0.02 regulating effect preferably, so
Figure 694302DEST_PATH_IMAGE010
=0.2,
Figure 528266DEST_PATH_IMAGE012
=0.02；
Figure 541221DEST_PATH_IMAGE014
For derivative of the output energy of pulse to DC power output voltage.
For formula（1）Carrying out practically step in shown PI algorithms, SCM program is as follows：First, after start, gas-condition is good, demarcationCorresponding relation.Single-chip microcomputer improves reference voltage signal automatically from low to high with certain stepping, corresponds to each magnitude of voltage, and single-chip microcomputer is gathered after 64 energy values are averaging and is stored in corresponding registers.When voltage rises to the peak of permission, collection terminates.Second step, single-chip microcomputer setting initial reference voltage and desired target energy ET.3rd step, single-chip microcomputer starts real-time acquisition pulse energy value, calculates the difference of each pulse energy and target energy
Figure DEST_PATH_IMAGE018
, and each difference is added up
Figure DEST_PATH_IMAGE020
.The two amounts are multiplied by proportion integral modulus respectively、
Figure 141323DEST_PATH_IMAGE012
After be added, obtain
Figure DEST_PATH_IMAGE022
.Finally, according toCorresponding relation, is calculated
Figure DEST_PATH_IMAGE024
Value, will
Figure 708756DEST_PATH_IMAGE022
With
Figure 194620DEST_PATH_IMAGE024
Make division, calculate
Figure DEST_PATH_IMAGE026
Value.Again will
Figure DEST_PATH_IMAGE028
With
Figure 41091DEST_PATH_IMAGE026
It is poor to make, and draws the reference voltage that next pulsed discharge needs
Figure DEST_PATH_IMAGE030
。
Gao Zhongying ArF excimer laser running environment, effect of the checking laser under the regulation of PI algorithms are emulated using matlab.As a result it is as shown in Figure 4：
Figure 531371DEST_PATH_IMAGE010
、
Figure 518919DEST_PATH_IMAGE012
Value when being respectively 0.2,0.02 regulating effect preferably, 1010Within individual pulse, laser can be exported under PI algorithms regulation so that target energy is stable, and voltage is in continuous ascendant trend.
The response wave length of the probe of pyroelectric detector 1 is 0.15 ~ 3um, and response frequency is up to 5kHz, measurable range 15uJ ~ 10J.
The operational amplifier of operational amplification circuit 2 is AD548.
The master chip of peak holding circuit 3 is PKD01.
Single-chip microcomputer 5 is PIC16F873A single-chip microcomputers.

Claims (7)

1. a kind of Gao Zhongying ArF excimer lasers pulse energy control system, it is characterised in that：Include pyroelectric detector, operational amplification circuit, peak holding circuit, governor circuit, PI control algolithms, the master controller of described governor circuit is the single-chip microcomputer of built-in A/D modular converters, described peak holding circuit includes positive peak holding circuit and negative peak holding circuit, described pyroelectric detector is converted optical signal into after electric impulse signal and is amplified through operational amplification circuit, the electric impulse signal after amplification is carried out just respectively through peak holding circuit again, negative peak keeps tracking, data signal is converted into by the A/D modular converters built in single-chip microcomputer again；Single-chip microcomputer obtains the corresponding digital quantity of single pulse energy value after the digital quantity after the conversion of positive and negative peak value is added, single-chip microcomputer is calculated using PI control algolithms after the reference voltage data signal required for next pulsed discharge, and data signal is sent to D/A modular converters by SPI serial communications and is converted into the high-voltage DC power supply or controllable resonant charging module that are acted on after analog quantity in the complete solid state pulse power supply that Gao Zhongying ArF excimer lasers are used by single-chip microcomputer；The expression formula of described PI control algolithms is as follows：
Figure DEST_PATH_IMAGE002
Wherein,
Figure DEST_PATH_IMAGE004
For DC power output voltage,
Figure DEST_PATH_IMAGE006
For single energy deviation（The difference of the pulse energy value surveyed and the target impulse energy value of setting, target impulse energy value is set in SCM program；）,
Figure DEST_PATH_IMAGE008
For the integration of energy deviation,
Figure DEST_PATH_IMAGE010
For proportionality coefficient,
Figure DEST_PATH_IMAGE012
For integral coefficient,
Figure DEST_PATH_IMAGE014
For derivative of the output energy of pulse to DC power output voltage.
2. Gao Zhongying ArF excimer lasers pulse energy control system according to claim 1, it is characterised in that：In described PI control algolithm expression formulas、Value learnt by matlab simulation results：
Figure 429464DEST_PATH_IMAGE010
、
Figure 824673DEST_PATH_IMAGE012
Value when being respectively 0.2,0.02 regulating effect preferably, so
Figure 704292DEST_PATH_IMAGE010
=0.2,
Figure 651388DEST_PATH_IMAGE012
=0.02。
3. Gao Zhongying ArF excimer lasers pulse energy control system according to claim 1, it is characterised in that：The response wave length of the probe of described pyroelectric detector is 0.15 ~ 3um, and response frequency is up to 5kHz, measurable range 15uJ ~ 10J.
4. Gao Zhongying ArF excimer lasers pulse energy control system according to claim 1, it is characterised in that：The operational amplifier of described operational amplification circuit is AD548.
5. Gao Zhongying ArF excimer lasers pulse energy control system according to claim 1, it is characterised in that：The master chip of described peak holding circuit is PKD01.
6. Gao Zhongying ArF excimer lasers pulse energy control system according to claim 1, it is characterised in that：Described single-chip microcomputer is PIC16F873A single-chip microcomputers.
7. Gao Zhongying ArF excimer lasers pulse energy control system according to claim 1, it is characterised in that：The chip of described D/A modular converters is high-speed digital-analog conversion chip DAC7731.
CN201210103480.5A 2012-04-10 2012-04-10 High pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system Expired - Fee Related CN102790348B (en)

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CN106058629A (en) * 2016-07-22 2016-10-26 中国电子科技集团公司第三十四研究所 Closed-ring feedback control fiber amplifier and feedback control method thereof
CN109638629A (en) * 2019-02-19 2019-04-16 北京科益虹源光电技术有限公司 A kind of quasi-molecule laser pulse energy stability control method and system
CN109950786A (en) * 2019-03-29 2019-06-28 北京科益虹源光电技术有限公司 Excimer laser dosage stability control system and control method

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106058629A (en) * 2016-07-22 2016-10-26 中国电子科技集团公司第三十四研究所 Closed-ring feedback control fiber amplifier and feedback control method thereof
CN109638629A (en) * 2019-02-19 2019-04-16 北京科益虹源光电技术有限公司 A kind of quasi-molecule laser pulse energy stability control method and system
WO2020168583A1 (en) * 2019-02-19 2020-08-27 北京科益虹源光电技术有限公司 Excimer laser pulse energy stability control method and system
JP2022520563A (en) * 2019-02-19 2022-03-31 北京科益虹源光電技術有限公司 Excimer laser pulse energy stability control method and system
JP7161062B2 (en) 2019-02-19 2022-10-25 北京科益虹源光電技術有限公司 EXCIMER LASER PULSE ENERGY STABILITY CONTROL METHOD AND SYSTEM
CN109950786A (en) * 2019-03-29 2019-06-28 北京科益虹源光电技术有限公司 Excimer laser dosage stability control system and control method
CN109950786B (en) * 2019-03-29 2024-04-19 北京科益虹源光电技术有限公司 Excimer laser dose stabilization control system and control method

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