JP2009202265A - 塗布装置 - Google Patents
塗布装置 Download PDFInfo
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- JP2009202265A JP2009202265A JP2008045908A JP2008045908A JP2009202265A JP 2009202265 A JP2009202265 A JP 2009202265A JP 2008045908 A JP2008045908 A JP 2008045908A JP 2008045908 A JP2008045908 A JP 2008045908A JP 2009202265 A JP2009202265 A JP 2009202265A
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- 239000011248 coating agent Substances 0.000 title claims abstract description 78
- 238000000576 coating method Methods 0.000 title claims abstract description 78
- 239000000758 substrate Substances 0.000 claims abstract description 99
- 239000007788 liquid Substances 0.000 claims abstract description 8
- 238000010248 power generation Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 abstract description 4
- 238000004904 shortening Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
- G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Coating Apparatus (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Materials For Photolithography (AREA)
- Jigs For Machine Tools (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
【解決手段】ステージの表面に形成された吸引孔に吸引力を発生させて基板をステージの表面に吸着させて保持させる基板保持手段と、基板に対して相対的に移動しつつ塗布液を吐出する塗布ユニットと、を備える塗布装置において、基板保持手段の吸引孔には、吸引力を発生させる吸引力発生装置と接続されるメイン配管及びサブ配管が連通して接続されており、メイン配管には、メイン配管経路を開閉するメインバルブが設けられ、サブ配管には、サブ配管経路を開閉するサブバルブが設けられるとともに、このサブバルブよりも吸引力発生装置側に所定容量を有する貯留部を備える貯留タンクが設けられ、貯留部は、一定区間におけるサブ配管の容量と比べて大きい容量を有して構成とする。
【選択図】図3
Description
塗布ユニットの脚部付近を示す図であり、図3は、塗布装置の配管系統を示す図である。
。また、設定圧から保持圧に調節する場合、配管50内が調節されるべき保持圧になっていない場合には、タッチパネル上に警告表示を行ってオペレータに警告を促すようになっている。
21 ステージ
21a 吸引孔
40 基板保持手段
50 配管
51 メイン配管
51a メインバルブ
52 サブ配管
52a サブバルブ
52b バルブ側サブ配管
52c 吸引側サブ配管
53 圧力計
54 貯留タンク
54a 貯留部
55 補助配管
Claims (5)
- 基板を載置するステージと、
前記ステージの表面に形成された吸引孔に吸引力を発生させて基板をステージの表面に吸着させて保持させる基板保持手段と、
前記ステージの表面に保持された基板に対して相対的に移動しつつ塗布液を吐出する塗布ユニットと、
を備える塗布装置において、
前記基板保持手段の吸引孔は、吸引力を発生させる吸引力発生装置と配管を介して連通して接続されており、
前記配管は、メインバルブにより開閉可能なメイン配管と、サブバルブにより開閉可能なサブ配管とを備え、
前記サブ配管には、前記サブバルブよりも吸引力発生装置側に所定容量を有する貯留部を備える貯留タンクが設けられ、その貯留部は、一定区間におけるサブ配管の容量に比べて大きい容量を有していることを特徴とする塗布装置。 - 前記貯留部の容量は、前記サブバルブから前記吸引孔に至る配管の容量の総和よりも大きいことを特徴とする請求項1に記載の塗布装置。
- 前記サブ配管には、補助配管が設けられており、この補助配管は、前記貯留タンクを迂回して、貯留タンクと吸引力発生装置側で接続される吸引側サブ配管と、貯留タンクとサブバルブ側で接続されるバルブ側サブ配管と、に連通して接続されていることを特徴とする請求項1又は2に記載の塗布装置。
- 前記メインバルブ及びサブバルブの開閉動作を制御する制御装置を備えており、この制御装置は、メインバルブ及びサブバルブが閉状態で吸引力発生装置を作動させることにより、前記貯留タンクの貯留部を大気圧よりも小さい圧力に維持させて、ステージの表面に基板が載置された後、メインバルブとサブバルブとを開状態にすることにより、基板をステージ表面に吸着させることを特徴とする請求項1〜3のいずれかに記載の塗布装置。
- 前記制御装置は、メインバルブとサブバルブとを開状態にすることにより基板をステージ表面に吸着させた後、吸引孔の圧力が所定の圧力に達した場合には、サブバルブを閉状態にして前記所定の圧力よりも大きく、かつ、大気圧よりも小さい圧力で、基板がステージの表面上に保持された状態を維持することを特徴とする請求項4に記載の塗布装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008045908A JP5276338B2 (ja) | 2008-02-27 | 2008-02-27 | 塗布装置 |
TW097148381A TWI446973B (zh) | 2008-02-27 | 2008-12-12 | 塗佈裝置 |
KR1020090001879A KR20090092694A (ko) | 2008-02-27 | 2009-01-09 | 도포장치 |
CN2009100068272A CN101518769B (zh) | 2008-02-27 | 2009-02-27 | 涂敷装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008045908A JP5276338B2 (ja) | 2008-02-27 | 2008-02-27 | 塗布装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009202265A true JP2009202265A (ja) | 2009-09-10 |
JP5276338B2 JP5276338B2 (ja) | 2013-08-28 |
Family
ID=41079682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008045908A Expired - Fee Related JP5276338B2 (ja) | 2008-02-27 | 2008-02-27 | 塗布装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5276338B2 (ja) |
KR (1) | KR20090092694A (ja) |
CN (1) | CN101518769B (ja) |
TW (1) | TWI446973B (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102642378A (zh) * | 2012-04-09 | 2012-08-22 | 友达光电(苏州)有限公司 | 吸附装置、贴合治具及贴合方法 |
JP2015533026A (ja) * | 2012-10-31 | 2015-11-16 | 株式会社ダイフク | ウェハパージ可能な天井保管装置(apparatusforstockingandpurgingwaferatceiling) |
JP2016215314A (ja) * | 2015-05-20 | 2016-12-22 | 株式会社ディスコ | 切削装置 |
WO2019054127A1 (ja) * | 2017-09-15 | 2019-03-21 | 日本電気硝子株式会社 | ガラス板の製造方法および製造装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101970183B1 (ko) * | 2012-02-10 | 2019-04-19 | 세메스 주식회사 | 기판 지지 유닛, 기판 처리 장치 및 기판 지지 방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1080887A (ja) * | 1996-09-06 | 1998-03-31 | Nippon Suisan Kaisha Ltd | 吸着式高速ロボットハンドシステム |
JPH11330788A (ja) * | 1998-05-08 | 1999-11-30 | Matsushita Electric Ind Co Ltd | 電子部品実装装置および電子部品実装方法 |
JP2001332609A (ja) * | 2000-03-13 | 2001-11-30 | Nikon Corp | 基板保持装置及び露光装置 |
JP2003062781A (ja) * | 2001-08-27 | 2003-03-05 | Star Seiki Co Ltd | 取出装置の成形品吸着装置及び成形品吸着方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4443353B2 (ja) * | 2004-08-31 | 2010-03-31 | 東京応化工業株式会社 | 基板載置ステージ及び基板の吸着・剥離方法 |
JP4490320B2 (ja) * | 2005-03-31 | 2010-06-23 | 東レエンジニアリング株式会社 | 塗布装置 |
KR100840482B1 (ko) * | 2006-02-27 | 2008-06-20 | 다이니폰 스크린 세이조우 가부시키가이샤 | 도포 장치 및 도포 방법 |
-
2008
- 2008-02-27 JP JP2008045908A patent/JP5276338B2/ja not_active Expired - Fee Related
- 2008-12-12 TW TW097148381A patent/TWI446973B/zh active
-
2009
- 2009-01-09 KR KR1020090001879A patent/KR20090092694A/ko not_active Application Discontinuation
- 2009-02-27 CN CN2009100068272A patent/CN101518769B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1080887A (ja) * | 1996-09-06 | 1998-03-31 | Nippon Suisan Kaisha Ltd | 吸着式高速ロボットハンドシステム |
JPH11330788A (ja) * | 1998-05-08 | 1999-11-30 | Matsushita Electric Ind Co Ltd | 電子部品実装装置および電子部品実装方法 |
JP2001332609A (ja) * | 2000-03-13 | 2001-11-30 | Nikon Corp | 基板保持装置及び露光装置 |
JP2003062781A (ja) * | 2001-08-27 | 2003-03-05 | Star Seiki Co Ltd | 取出装置の成形品吸着装置及び成形品吸着方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102642378A (zh) * | 2012-04-09 | 2012-08-22 | 友达光电(苏州)有限公司 | 吸附装置、贴合治具及贴合方法 |
TWI467268B (zh) * | 2012-04-09 | 2015-01-01 | Au Optronics Suzhou Corp Ltd | 吸附裝置、貼合治具及貼合方法 |
JP2015533026A (ja) * | 2012-10-31 | 2015-11-16 | 株式会社ダイフク | ウェハパージ可能な天井保管装置(apparatusforstockingandpurgingwaferatceiling) |
JP2016215314A (ja) * | 2015-05-20 | 2016-12-22 | 株式会社ディスコ | 切削装置 |
WO2019054127A1 (ja) * | 2017-09-15 | 2019-03-21 | 日本電気硝子株式会社 | ガラス板の製造方法および製造装置 |
JP2019051572A (ja) * | 2017-09-15 | 2019-04-04 | 日本電気硝子株式会社 | ガラス板の製造方法および製造装置 |
Also Published As
Publication number | Publication date |
---|---|
CN101518769A (zh) | 2009-09-02 |
TW200936253A (en) | 2009-09-01 |
JP5276338B2 (ja) | 2013-08-28 |
KR20090092694A (ko) | 2009-09-01 |
TWI446973B (zh) | 2014-08-01 |
CN101518769B (zh) | 2012-08-22 |
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