JP2009186522A - 転写用感光性導体ペーストおよび感光性転写シート - Google Patents
転写用感光性導体ペーストおよび感光性転写シート Download PDFInfo
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- JP2009186522A JP2009186522A JP2008023379A JP2008023379A JP2009186522A JP 2009186522 A JP2009186522 A JP 2009186522A JP 2008023379 A JP2008023379 A JP 2008023379A JP 2008023379 A JP2008023379 A JP 2008023379A JP 2009186522 A JP2009186522 A JP 2009186522A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/151—Matting or other surface reflectivity altering material
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Conductive Materials (AREA)
- Materials For Photolithography (AREA)
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
【解決手段】 感光性導体ペースト12において、アクリル樹脂、ロジン系樹脂、またはフッソ系分散剤を含むことから、感光性樹脂の含有量を減少させても露光・現像性能が確保されるとともに、乾燥後或いは焼成後の導体層の密度が高くなるので、露光・現像性能と乾燥後或いは焼成後の導体層の密度とが両立した転写用感光性導体ペースト12が得られる。
【選択図】図1
Description
12:感光性導体ペースト( 転写用感光性導体ペースト)
14:転写支持体
30:積層型チップコンデンサ
Claims (7)
- 金属粉末、無機材料粉末、感光性樹脂、重合開始剤を含み、転写支持体の一面に塗布される転写用感光性導体ペーストであって、
アクリル樹脂またはロジン系樹脂を含むことを特徴とする転写用感光性導体ペースト。 - 金属粉末、無機材料粉末、感光性樹脂、重合開始剤を含み、転写支持体の一面に塗布される転写用感光性導体ペーストであって、
フッソ系分散剤を含むことを特徴とする転写用感光性導体ペースト。 - 前記感光性樹脂、アクリル樹脂若しくはロジン系樹脂、重合開始剤は、1:0.1〜1.0:1.0〜2.0の割合で混合されていることを特徴とする請求項1の転写用感光性導体ペースト。
- 前記金属粉末は、Ni( ニッケル)粉末であることを特徴とする請求項1乃至3のいずれか1の転写用感光性導体ペースト。
- 前記無機材料粉末は、チタン酸バリウムであることを特徴とする請求項1乃至4のいずれか1の転写用感光性導体ペースト。
- 前記Ni( ニッケル)粉末は0.1〜0.4μmの粒径を有し、前記チタン酸バリウムは0.01〜0.1μmの粒径を有することを特徴とする請求項4または5の転写用感光性導体ペースト。
- 請求項1乃至6のいずれか1の転写用感光性導体ペーストが転写支持体の一面に塗布された感光性転写シート。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008023379A JP5058839B2 (ja) | 2008-02-01 | 2008-02-01 | 転写用感光性導体ペーストおよび感光性転写シート |
TW098101209A TWI457701B (zh) | 2008-02-01 | 2009-01-14 | 轉寫用感光性導體糊及感光性轉寫片 |
US12/320,410 US8021821B2 (en) | 2008-02-01 | 2009-01-26 | Photosensitive conductive paste for transferring and photosensitive transfer sheet |
KR1020090007293A KR20090084731A (ko) | 2008-02-01 | 2009-01-30 | 전사용 감광성 도체 페이스트 및 감광성 전사 시트 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008023379A JP5058839B2 (ja) | 2008-02-01 | 2008-02-01 | 転写用感光性導体ペーストおよび感光性転写シート |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009186522A true JP2009186522A (ja) | 2009-08-20 |
JP5058839B2 JP5058839B2 (ja) | 2012-10-24 |
Family
ID=40932031
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008023379A Active JP5058839B2 (ja) | 2008-02-01 | 2008-02-01 | 転写用感光性導体ペーストおよび感光性転写シート |
Country Status (4)
Country | Link |
---|---|
US (1) | US8021821B2 (ja) |
JP (1) | JP5058839B2 (ja) |
KR (1) | KR20090084731A (ja) |
TW (1) | TWI457701B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016516211A (ja) | 2013-02-18 | 2016-06-02 | オルボテック リミテッド | ツーステップの直接描画レーザ・メタライゼーション |
US10622244B2 (en) | 2013-02-18 | 2020-04-14 | Orbotech Ltd. | Pulsed-mode direct-write laser metallization |
US10537027B2 (en) | 2013-08-02 | 2020-01-14 | Orbotech Ltd. | Method producing a conductive path on a substrate |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000191945A (ja) * | 1998-12-24 | 2000-07-11 | Dainippon Printing Co Ltd | 感光性ペーストおよび転写シート |
JP2001154345A (ja) * | 1999-11-25 | 2001-06-08 | Dainippon Printing Co Ltd | 感光性導電ペーストおよびそれを用いた感光性導電層転写シート |
JP2001264965A (ja) * | 2000-03-15 | 2001-09-28 | Murata Mfg Co Ltd | 感光性導体ペーストならびに電子部品、電子装置 |
JP2002245874A (ja) * | 2001-02-22 | 2002-08-30 | Noritake Co Ltd | 導体ペースト及びその製造方法 |
JP2003248307A (ja) * | 2002-02-26 | 2003-09-05 | Dainippon Printing Co Ltd | ロジン又はロジンアクリレートを用いた感光性導電ペースト及び電極 |
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2008
- 2008-02-01 JP JP2008023379A patent/JP5058839B2/ja active Active
-
2009
- 2009-01-14 TW TW098101209A patent/TWI457701B/zh active
- 2009-01-26 US US12/320,410 patent/US8021821B2/en not_active Expired - Fee Related
- 2009-01-30 KR KR1020090007293A patent/KR20090084731A/ko not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000191945A (ja) * | 1998-12-24 | 2000-07-11 | Dainippon Printing Co Ltd | 感光性ペーストおよび転写シート |
JP2001154345A (ja) * | 1999-11-25 | 2001-06-08 | Dainippon Printing Co Ltd | 感光性導電ペーストおよびそれを用いた感光性導電層転写シート |
JP2001264965A (ja) * | 2000-03-15 | 2001-09-28 | Murata Mfg Co Ltd | 感光性導体ペーストならびに電子部品、電子装置 |
JP2002245874A (ja) * | 2001-02-22 | 2002-08-30 | Noritake Co Ltd | 導体ペースト及びその製造方法 |
JP2003248307A (ja) * | 2002-02-26 | 2003-09-05 | Dainippon Printing Co Ltd | ロジン又はロジンアクリレートを用いた感光性導電ペースト及び電極 |
Also Published As
Publication number | Publication date |
---|---|
TW200941131A (en) | 2009-10-01 |
JP5058839B2 (ja) | 2012-10-24 |
KR20090084731A (ko) | 2009-08-05 |
TWI457701B (zh) | 2014-10-21 |
US20090197203A1 (en) | 2009-08-06 |
US8021821B2 (en) | 2011-09-20 |
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