TW200739253A - Photosensitive composition, display member and process for manufacturing the same - Google Patents

Photosensitive composition, display member and process for manufacturing the same

Info

Publication number
TW200739253A
TW200739253A TW096101089A TW96101089A TW200739253A TW 200739253 A TW200739253 A TW 200739253A TW 096101089 A TW096101089 A TW 096101089A TW 96101089 A TW96101089 A TW 96101089A TW 200739253 A TW200739253 A TW 200739253A
Authority
TW
Taiwan
Prior art keywords
weight
photosensitive composition
manufacturing
same
display member
Prior art date
Application number
TW096101089A
Other languages
Chinese (zh)
Inventor
Takenori Ueoka
Kazuki Goto
Satoshi Matsuba
Original Assignee
Toray Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries filed Critical Toray Industries
Publication of TW200739253A publication Critical patent/TW200739253A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C12/00—Powdered glass; Bead compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Composite Materials (AREA)
  • Medicinal Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Glass Compositions (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Luminescent Compositions (AREA)

Abstract

A photosensitive composition comprising 50 to 5% by weight of a photosensitive organic component and 50 to 95% by weight of a glass powder, wherein the glass powder comprises, as converted into oxides, 70 to 85% by weight of Bi2O3, 3 to 15% by weight of SiO2, 5 to 20% by weight of B2O3, 0 to 3% by weight of ZrO2, and 1 to 10% by weight of ZnO. A photosensitive composition which is useful in a variety of flat panel display the members, a fluorescent emission tube and the like and enables fine pattern process by a photolithography formulation is provided.
TW096101089A 2006-01-12 2007-01-11 Photosensitive composition, display member and process for manufacturing the same TW200739253A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006004464 2006-01-12

Publications (1)

Publication Number Publication Date
TW200739253A true TW200739253A (en) 2007-10-16

Family

ID=38256309

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096101089A TW200739253A (en) 2006-01-12 2007-01-11 Photosensitive composition, display member and process for manufacturing the same

Country Status (7)

Country Link
US (1) US20090004597A1 (en)
EP (1) EP1980910A4 (en)
JP (1) JP5003481B2 (en)
KR (1) KR20080081939A (en)
CN (1) CN101371195A (en)
TW (1) TW200739253A (en)
WO (1) WO2007080904A1 (en)

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JP5058839B2 (en) * 2008-02-01 2012-10-24 株式会社ノリタケカンパニーリミテド Photosensitive conductive paste for transfer and photosensitive transfer sheet
TWI377451B (en) * 2008-12-08 2012-11-21 Everlight Chem Ind Corp Developer composition
JP2011213526A (en) * 2010-03-31 2011-10-27 Nihon Yamamura Glass Co Ltd Glass composition
WO2012137838A1 (en) * 2011-04-08 2012-10-11 太陽インキ製造株式会社 Photosensitive composition, hardened coating films therefrom, and printed wiring boards using same
CN103163744A (en) * 2011-12-16 2013-06-19 江阴润玛电子材料股份有限公司 Novel organic photoresist stripper and preparation process thereof
JP6155823B2 (en) * 2012-07-12 2017-07-05 Jsr株式会社 Organic EL device, radiation-sensitive resin composition, and cured film
WO2014069284A1 (en) * 2012-11-01 2014-05-08 東レ株式会社 Radiation detection device and manufacturing method therefor
JP6087655B2 (en) * 2013-02-18 2017-03-01 東京応化工業株式会社 Developer and method for developing photosensitive resin composition
FR3002533A1 (en) * 2013-02-25 2014-08-29 Saint Gobain SUBSTRATE FOR ORGANIC ELECTROLUMINESCENT DIODE DEVICE
RU2683454C2 (en) 2013-02-25 2019-03-28 Сэн-Гобэн Гласс Франс Substrate for device having organic light-emitting diode
JP6170149B2 (en) * 2013-06-27 2017-07-26 日本ゼオン株式会社 Method for producing electrode for lithium ion battery
KR102201361B1 (en) * 2014-09-26 2021-01-11 동우 화인켐 주식회사 Self emission type photosensitive resin composition, and display device comprising color conversion layer prepared thereby
CN104614939A (en) * 2015-01-09 2015-05-13 苏州瑞红电子化学品有限公司 Negative photoresist composition for being mixed with glass powder in GPP process
CN105824191A (en) * 2015-01-09 2016-08-03 日本化药株式会社 Photo-curable coloring composition, solidification object and article
CN108025533B (en) * 2015-09-29 2022-10-21 富士胶片株式会社 Transfer film, electrostatic capacitance type input device, electrode protection film for electrostatic capacitance type input device, laminate, and method for manufacturing laminate
CN108350296B (en) * 2015-11-25 2020-01-21 东丽株式会社 Ink for offset printing
WO2018037729A1 (en) * 2016-08-26 2018-03-01 株式会社村田製作所 Photosensitive glass paste, electronic component, and method for manufacturing electronic component
JP7169739B2 (en) * 2017-02-23 2022-11-11 日本電気硝子株式会社 Bismuth-based glass powder, sealing material and hermetic packaging

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Also Published As

Publication number Publication date
KR20080081939A (en) 2008-09-10
EP1980910A1 (en) 2008-10-15
US20090004597A1 (en) 2009-01-01
JPWO2007080904A1 (en) 2009-06-11
CN101371195A (en) 2009-02-18
EP1980910A4 (en) 2010-11-24
WO2007080904A1 (en) 2007-07-19
JP5003481B2 (en) 2012-08-15

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