JP2009152187A5 - - Google Patents

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Publication number
JP2009152187A5
JP2009152187A5 JP2008302769A JP2008302769A JP2009152187A5 JP 2009152187 A5 JP2009152187 A5 JP 2009152187A5 JP 2008302769 A JP2008302769 A JP 2008302769A JP 2008302769 A JP2008302769 A JP 2008302769A JP 2009152187 A5 JP2009152187 A5 JP 2009152187A5
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JP
Japan
Prior art keywords
light absorption
absorption layer
support substrate
layer
substrate
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Granted
Application number
JP2008302769A
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English (en)
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JP5394048B2 (ja
JP2009152187A (ja
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Priority to JP2008302769A priority Critical patent/JP5394048B2/ja
Priority claimed from JP2008302769A external-priority patent/JP5394048B2/ja
Publication of JP2009152187A publication Critical patent/JP2009152187A/ja
Publication of JP2009152187A5 publication Critical patent/JP2009152187A5/ja
Application granted granted Critical
Publication of JP5394048B2 publication Critical patent/JP5394048B2/ja
Expired - Fee Related legal-status Critical Current
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Claims (4)

  1. 第1の支持基板上に形成された開口部を有する反射層と、
    前記反射層と裏面が接して配置された第2の支持基板と、
    前記第2の支持基板表面に形成された光吸収層と、
    前記光吸収層上に形成された材料層と、を有し、
    前記光吸収層は、島状またはストライプ状にパターン形成されており、
    前記開口部と前記光吸収層とが重なるように配置されており、
    前記開口部の大きさは、前記光吸収層のパターンの幅よりも小さいことを特徴とする蒸着用基板。
  2. 請求項1において、
    前記反射層は、N箇所(Nは2以上の整数)の前記光吸収層のパターンに対して1箇所の間隔で設けられていることを特徴とする蒸着用基板。
  3. 請求項1または請求項2において、
    前記第1の支持基板及び前記第2の支持基板の少なくとも一方に、位置合わせ用のマーカーが設けられていることを特徴とする蒸着用基板。
  4. 請求項1乃至のいずれか一において、
    前記材料層は有機化合物を含むことを特徴とする蒸着用基板。
JP2008302769A 2007-11-29 2008-11-27 蒸着用基板 Expired - Fee Related JP5394048B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008302769A JP5394048B2 (ja) 2007-11-29 2008-11-27 蒸着用基板

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007308606 2007-11-29
JP2007308606 2007-11-29
JP2008302769A JP5394048B2 (ja) 2007-11-29 2008-11-27 蒸着用基板

Publications (3)

Publication Number Publication Date
JP2009152187A JP2009152187A (ja) 2009-07-09
JP2009152187A5 true JP2009152187A5 (ja) 2011-10-20
JP5394048B2 JP5394048B2 (ja) 2014-01-22

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Family Applications (1)

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JP2008302769A Expired - Fee Related JP5394048B2 (ja) 2007-11-29 2008-11-27 蒸着用基板

Country Status (3)

Country Link
US (1) US8425974B2 (ja)
JP (1) JP5394048B2 (ja)
KR (1) KR20090056920A (ja)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101689519B1 (ko) * 2007-12-26 2016-12-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 증착용 기판, 증착용 기판의 제조방법, 및 발광장치의 제조방법
US8080811B2 (en) 2007-12-28 2011-12-20 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing evaporation donor substrate and light-emitting device
WO2009099002A1 (en) 2008-02-04 2009-08-13 Semiconductor Energy Laboratory Co., Ltd. Deposition method and method for manufacturing light-emitting device
JP2009187810A (ja) * 2008-02-07 2009-08-20 Seiko Epson Corp 発光装置の製造方法
WO2009107548A1 (en) * 2008-02-29 2009-09-03 Semiconductor Energy Laboratory Co., Ltd. Deposition method and manufacturing method of light-emitting device
JP5416987B2 (ja) * 2008-02-29 2014-02-12 株式会社半導体エネルギー研究所 成膜方法及び発光装置の作製方法
US8182863B2 (en) * 2008-03-17 2012-05-22 Semiconductor Energy Laboratory Co., Ltd. Deposition method and manufacturing method of light-emitting device
US7932112B2 (en) * 2008-04-14 2011-04-26 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing light-emitting device
KR101629637B1 (ko) * 2008-05-29 2016-06-13 가부시키가이샤 한도오따이 에네루기 켄큐쇼 성막방법 및 발광장치의 제조방법
WO2009154156A1 (ja) * 2008-06-16 2009-12-23 東レ株式会社 パターニング方法およびこれを用いたデバイスの製造方法ならびにデバイス
JP5177145B2 (ja) * 2008-08-05 2013-04-03 東レ株式会社 デバイスの製造方法
US8486736B2 (en) 2008-10-20 2013-07-16 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing light-emitting device
JP5258666B2 (ja) * 2009-04-22 2013-08-07 株式会社半導体エネルギー研究所 発光装置の作製方法および成膜用基板
KR20120042144A (ko) * 2010-10-22 2012-05-03 삼성모바일디스플레이주식회사 레이저 열전사용 마스크, 이를 포함하는 레이저 조사 장치 및 이를 이용한 유기 발광 소자 제조 방법
WO2013184219A1 (en) * 2012-03-30 2013-12-12 The Trustees Of Columbia University In The City Of New York Systems and methods for patterning samples
EP2660352A1 (en) * 2012-05-02 2013-11-06 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Donor sheet and method for light induced forward transfer manufacturing
US9287522B2 (en) * 2013-07-30 2016-03-15 Global Oled Technology Llc Local seal for encapsulation of electro-optical element on a flexible substrate
US9494792B2 (en) 2013-07-30 2016-11-15 Global Oled Technology Llc Local seal for encapsulation of electro-optical element on a flexible substrate
US9385342B2 (en) 2013-07-30 2016-07-05 Global Oled Technology Llc Local seal for encapsulation of electro-optical element on a flexible substrate
KR20150056112A (ko) * 2013-11-14 2015-05-26 삼성디스플레이 주식회사 막 형성용 마스크, 이를 이용한 막 형성 방법 및 유기 발광 표시 장치의 제조 방법
KR20150109013A (ko) * 2014-03-18 2015-10-01 삼성디스플레이 주식회사 유기막 패턴 형성용 마스크, 이를 이용한 유기막 패턴 형성 방법 및 유기 발광 표시 장치의 제조 방법
DE102014108925A1 (de) * 2014-06-25 2015-12-31 Von Ardenne Gmbh Substratbeschichtungseinrichtung und Bedampfungsverfahren
KR102325208B1 (ko) * 2014-08-12 2021-11-12 삼성디스플레이 주식회사 도너마스크, 이를 이용한 유기발광 디스플레이 장치 제조방법 및 유기발광 디스플레이 장치
DE102016124646A1 (de) * 2016-12-16 2018-06-21 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Halbleiterbauelements
KR102030236B1 (ko) * 2017-06-16 2019-10-08 주식회사 야스 Fmm 없이 컬러 화소를 형성하는 방법 및 장치
KR101985086B1 (ko) * 2017-08-02 2019-06-03 주식회사 야스 Fmm이 없는 재료절감형 컬러 화소 형성 시스템
EP4037442A1 (en) * 2021-02-01 2022-08-03 Nederlandse Organisatie Voor Toegepast- Natuurwetenschappelijk Onderzoek Tno Donor plate, deposition device and deposition method

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4752455A (en) * 1986-05-27 1988-06-21 Kms Fusion, Inc. Pulsed laser microfabrication
JP3801730B2 (ja) * 1997-05-09 2006-07-26 株式会社半導体エネルギー研究所 プラズマcvd装置及びそれを用いた薄膜形成方法
US5937272A (en) * 1997-06-06 1999-08-10 Eastman Kodak Company Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate
US5851709A (en) 1997-10-31 1998-12-22 Eastman Kodak Company Method for selective transfer of a color organic layer
US6165543A (en) * 1998-06-17 2000-12-26 Nec Corporation Method of making organic EL device and organic EL transfer base plate
JP3740557B2 (ja) 1999-03-09 2006-02-01 独立行政法人産業技術総合研究所 有機薄膜作製方法および有機薄膜作製装置
TW527735B (en) * 1999-06-04 2003-04-11 Semiconductor Energy Lab Electro-optical device
US8853696B1 (en) * 1999-06-04 2014-10-07 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
US6695029B2 (en) * 2001-12-12 2004-02-24 Eastman Kodak Company Apparatus for permitting transfer of organic material from a donor to form a layer in an OLED device
SG114589A1 (en) * 2001-12-12 2005-09-28 Semiconductor Energy Lab Film formation apparatus and film formation method and cleaning method
JP4294305B2 (ja) 2001-12-12 2009-07-08 株式会社半導体エネルギー研究所 成膜装置および成膜方法
US6610455B1 (en) * 2002-01-30 2003-08-26 Eastman Kodak Company Making electroluminscent display devices
US6703179B2 (en) * 2002-03-13 2004-03-09 Eastman Kodak Company Transfer of organic material from a donor to form a layer in an OLED device
US6566032B1 (en) * 2002-05-08 2003-05-20 Eastman Kodak Company In-situ method for making OLED devices that are moisture or oxygen-sensitive
US6811938B2 (en) * 2002-08-29 2004-11-02 Eastman Kodak Company Using fiducial marks on a substrate for laser transfer of organic material from a donor to a substrate
JP2004103406A (ja) 2002-09-10 2004-04-02 Sony Corp 薄膜パターン形成方法および装置並びに有機el表示装置の製造方法
US20040191564A1 (en) * 2002-12-17 2004-09-30 Samsung Sdi Co., Ltd. Donor film for low molecular weight full color organic electroluminescent device using laser induced thermal imaging method and method for fabricating low molecular weight full color organic electroluminescent device using the film
JP4325248B2 (ja) 2003-03-31 2009-09-02 凸版印刷株式会社 有機エレクトロルミネッセンス素子の製造方法
JP4325249B2 (ja) 2003-03-31 2009-09-02 凸版印刷株式会社 有機エレクトロルミネッセンス素子の製造方法
JP4493926B2 (ja) * 2003-04-25 2010-06-30 株式会社半導体エネルギー研究所 製造装置
JP2005085830A (ja) 2003-09-05 2005-03-31 Sony Corp 薄膜デバイスの製造方法および薄膜デバイス
US20050145326A1 (en) 2004-01-05 2005-07-07 Eastman Kodak Company Method of making an OLED device
KR100793355B1 (ko) * 2004-10-05 2008-01-11 삼성에스디아이 주식회사 도너 기판의 제조방법 및 유기전계발광표시장치의 제조방법
KR100667069B1 (ko) * 2004-10-19 2007-01-10 삼성에스디아이 주식회사 도너 기판 및 그를 사용한 유기전계발광표시장치의 제조방법
JP2006309995A (ja) 2005-04-27 2006-11-09 Sony Corp 転写用基板および表示装置の製造方法ならびに表示装置
JP2006309994A (ja) 2005-04-27 2006-11-09 Sony Corp 転写用基板および転写方法ならびに表示装置の製造方法
TWI307612B (en) * 2005-04-27 2009-03-11 Sony Corp Transfer method and transfer apparatus
JP4449890B2 (ja) * 2005-11-21 2010-04-14 ソニー株式会社 転写用基板および転写方法ならびに表示装置の製造方法
US7994021B2 (en) * 2006-07-28 2011-08-09 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
KR20090028413A (ko) * 2007-09-13 2009-03-18 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광장치 제작방법 및 증착용 기판
US8153201B2 (en) * 2007-10-23 2012-04-10 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light-emitting device, and evaporation donor substrate
KR20090041314A (ko) * 2007-10-23 2009-04-28 가부시키가이샤 한도오따이 에네루기 켄큐쇼 증착용 기판 및 발광장치의 제조방법

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