JP2009147351A5 - - Google Patents
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- Publication number
- JP2009147351A5 JP2009147351A5 JP2009005598A JP2009005598A JP2009147351A5 JP 2009147351 A5 JP2009147351 A5 JP 2009147351A5 JP 2009005598 A JP2009005598 A JP 2009005598A JP 2009005598 A JP2009005598 A JP 2009005598A JP 2009147351 A5 JP2009147351 A5 JP 2009147351A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- chamber
- magnetic layer
- substrate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 claims 32
- 239000000758 substrate Substances 0.000 claims 16
- 238000000034 method Methods 0.000 claims 13
- 230000000694 effects Effects 0.000 claims 8
- 238000004519 manufacturing process Methods 0.000 claims 8
- 229910044991 metal oxide Inorganic materials 0.000 claims 8
- 150000004706 metal oxides Chemical class 0.000 claims 8
- 230000015572 biosynthetic process Effects 0.000 claims 7
- 230000005290 antiferromagnetic effect Effects 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- 230000003647 oxidation Effects 0.000 claims 4
- 238000007254 oxidation reaction Methods 0.000 claims 4
- 230000001590 oxidative effect Effects 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009005598A JP4891354B2 (ja) | 2009-01-14 | 2009-01-14 | 磁気抵抗デバイスの製造方法及び製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009005598A JP4891354B2 (ja) | 2009-01-14 | 2009-01-14 | 磁気抵抗デバイスの製造方法及び製造装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008205529A Division JP2009010401A (ja) | 2008-08-08 | 2008-08-08 | 磁気抵抗デバイスの製造方法及び製造装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009147351A JP2009147351A (ja) | 2009-07-02 |
| JP2009147351A5 true JP2009147351A5 (enExample) | 2011-09-22 |
| JP4891354B2 JP4891354B2 (ja) | 2012-03-07 |
Family
ID=40917532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009005598A Expired - Lifetime JP4891354B2 (ja) | 2009-01-14 | 2009-01-14 | 磁気抵抗デバイスの製造方法及び製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4891354B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103502504B (zh) | 2011-04-28 | 2016-01-27 | 佳能安内华股份有限公司 | 成膜装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08239765A (ja) * | 1995-02-28 | 1996-09-17 | Hitachi Ltd | マルチチャンバースパッタリング装置 |
| JPH10183347A (ja) * | 1996-12-25 | 1998-07-14 | Ulvac Japan Ltd | 磁気抵抗ヘッド用成膜装置 |
| JP2938012B1 (ja) * | 1998-04-07 | 1999-08-23 | 株式会社日立製作所 | 多層膜形成装置及び多層膜形成方法 |
| JPH11316919A (ja) * | 1998-04-30 | 1999-11-16 | Hitachi Ltd | スピントンネル磁気抵抗効果型磁気ヘッド |
| US6063244A (en) * | 1998-05-21 | 2000-05-16 | International Business Machines Corporation | Dual chamber ion beam sputter deposition system |
| JP2000058941A (ja) * | 1998-08-12 | 2000-02-25 | Read Rite Smi Kk | スピンバルブ膜の製造方法 |
| JP2000076623A (ja) * | 1998-08-26 | 2000-03-14 | Nec Corp | 強磁性トンネル結合素子、磁気センサ及び磁気記憶システム |
-
2009
- 2009-01-14 JP JP2009005598A patent/JP4891354B2/ja not_active Expired - Lifetime
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