JP4891354B2 - 磁気抵抗デバイスの製造方法及び製造装置 - Google Patents

磁気抵抗デバイスの製造方法及び製造装置 Download PDF

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Publication number
JP4891354B2
JP4891354B2 JP2009005598A JP2009005598A JP4891354B2 JP 4891354 B2 JP4891354 B2 JP 4891354B2 JP 2009005598 A JP2009005598 A JP 2009005598A JP 2009005598 A JP2009005598 A JP 2009005598A JP 4891354 B2 JP4891354 B2 JP 4891354B2
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layer
magnetic
film
chamber
substrate
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JP2009147351A (ja
JP2009147351A5 (enExample
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秀二 野村
歩 三好
孝二 恒川
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Canon Anelva Corp
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Canon Anelva Corp
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  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
  • Hall/Mr Elements (AREA)
JP2009005598A 2009-01-14 2009-01-14 磁気抵抗デバイスの製造方法及び製造装置 Expired - Lifetime JP4891354B2 (ja)

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JP2009005598A JP4891354B2 (ja) 2009-01-14 2009-01-14 磁気抵抗デバイスの製造方法及び製造装置

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JP2009005598A JP4891354B2 (ja) 2009-01-14 2009-01-14 磁気抵抗デバイスの製造方法及び製造装置

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JP2008205529A Division JP2009010401A (ja) 2008-08-08 2008-08-08 磁気抵抗デバイスの製造方法及び製造装置

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JP2009147351A JP2009147351A (ja) 2009-07-02
JP2009147351A5 JP2009147351A5 (enExample) 2011-09-22
JP4891354B2 true JP4891354B2 (ja) 2012-03-07

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103502504B (zh) 2011-04-28 2016-01-27 佳能安内华股份有限公司 成膜装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08239765A (ja) * 1995-02-28 1996-09-17 Hitachi Ltd マルチチャンバースパッタリング装置
JPH10183347A (ja) * 1996-12-25 1998-07-14 Ulvac Japan Ltd 磁気抵抗ヘッド用成膜装置
JP2938012B1 (ja) * 1998-04-07 1999-08-23 株式会社日立製作所 多層膜形成装置及び多層膜形成方法
JPH11316919A (ja) * 1998-04-30 1999-11-16 Hitachi Ltd スピントンネル磁気抵抗効果型磁気ヘッド
US6063244A (en) * 1998-05-21 2000-05-16 International Business Machines Corporation Dual chamber ion beam sputter deposition system
JP2000058941A (ja) * 1998-08-12 2000-02-25 Read Rite Smi Kk スピンバルブ膜の製造方法
JP2000076623A (ja) * 1998-08-26 2000-03-14 Nec Corp 強磁性トンネル結合素子、磁気センサ及び磁気記憶システム

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