JP2008544480A5 - - Google Patents

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Publication number
JP2008544480A5
JP2008544480A5 JP2008511180A JP2008511180A JP2008544480A5 JP 2008544480 A5 JP2008544480 A5 JP 2008544480A5 JP 2008511180 A JP2008511180 A JP 2008511180A JP 2008511180 A JP2008511180 A JP 2008511180A JP 2008544480 A5 JP2008544480 A5 JP 2008544480A5
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JP
Japan
Prior art keywords
plasma
frequency
frequencies
mhz
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008511180A
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English (en)
Japanese (ja)
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JP2008544480A (ja
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Publication date
Priority claimed from US11/416,468 external-priority patent/US7510665B2/en
Application filed filed Critical
Publication of JP2008544480A publication Critical patent/JP2008544480A/ja
Publication of JP2008544480A5 publication Critical patent/JP2008544480A5/ja
Pending legal-status Critical Current

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JP2008511180A 2005-05-09 2006-05-04 ２周波のｒｆ信号を用いたプラズマの生成及び制御 Pending JP2008544480A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US67904205P 2005-05-09 2005-05-09
US11/416,468 US7510665B2 (en) 2003-08-15 2006-05-02 Plasma generation and control using dual frequency RF signals
PCT/US2006/017075 WO2006121744A1 (en) 2005-05-09 2006-05-04 Plasma generation and control using dual frequency rf signals

Publications (2)

Publication Number Publication Date
JP2008544480A JP2008544480A (ja) 2008-12-04
JP2008544480A5 true JP2008544480A5 (enExample) 2009-06-25

Family

ID=37396865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008511180A Pending JP2008544480A (ja) 2005-05-09 2006-05-04 ２周波のｒｆ信号を用いたプラズマの生成及び制御

Country Status (5)

Country Link
US (1) US7510665B2 (enExample)
JP (1) JP2008544480A (enExample)
KR (1) KR20070102623A (enExample)
TW (1) TWI344321B (enExample)
WO (1) WO2006121744A1 (enExample)

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US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
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