JP2008530820A - 電流密度増強層(cdel)を有する薄膜抵抗器 - Google Patents
電流密度増強層(cdel)を有する薄膜抵抗器 Download PDFInfo
- Publication number
- JP2008530820A JP2008530820A JP2007556200A JP2007556200A JP2008530820A JP 2008530820 A JP2008530820 A JP 2008530820A JP 2007556200 A JP2007556200 A JP 2007556200A JP 2007556200 A JP2007556200 A JP 2007556200A JP 2008530820 A JP2008530820 A JP 2008530820A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- layer
- film resistor
- cdel
- conductor material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 126
- 239000000463 material Substances 0.000 claims abstract description 66
- 239000004020 conductor Substances 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 34
- 239000004065 semiconductor Substances 0.000 claims description 15
- 238000000231 atomic layer deposition Methods 0.000 claims description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- -1 Ta 2 O 5 Inorganic materials 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 3
- 229910001120 nichrome Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 14
- 230000002708 enhancing effect Effects 0.000 abstract description 4
- 239000012212 insulator Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 136
- 239000003989 dielectric material Substances 0.000 description 18
- 230000035882 stress Effects 0.000 description 14
- 238000001465 metallisation Methods 0.000 description 10
- 230000004888 barrier function Effects 0.000 description 8
- 238000005137 deposition process Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 238000012546 transfer Methods 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 6
- 229920005591 polysilicon Polymers 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000032683 aging Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 229920003209 poly(hydridosilsesquioxane) Polymers 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000000224 chemical solution deposition Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/20—Resistors
- H01L28/24—Resistors with an active material comprising a refractory, transition or noble metal, metal compound or metal alloy, e.g. silicides, oxides, nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/006—Thin film resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0629—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with diodes, or resistors, or capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0688—Integrated circuits having a three-dimensional layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5228—Resistive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Non-Adjustable Resistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
【解決手段】薄膜抵抗器および製造方法は、薄膜導体材料層(20)と電流密度増強層(CDEL)とを含む。CDELは、薄膜導体材料層(20)に付着するように適合された絶縁材料であり、このCDELは、前記薄膜抵抗器が、小さな抵抗シフトで、より高い電流密度を伝達することを可能にする。一実施形態では、薄膜抵抗器が、薄膜導体材料層(20)の片面(上面または下面)に形成された単一のCDEL層(50)を含む。第2の実施形態では、薄膜導体材料層(20)の両面(上面および下面)に2つのCDEL層が形成される。薄膜抵抗器は、BEOLプロセスとFEOLプロセスの両方のプロセスの一部として製造することができる。
【選択図】図7
Description
Claims (13)
- 半導体回路構造用の薄膜抵抗器であって、
抵抗値を有する薄膜導体材料層(20)と、
前記薄膜導体材料層(20)の片面に形成された電流密度増強層(CDEL)(50)であって、前記薄膜抵抗器が、小さな抵抗シフトで、より高い電流密度を伝達することを可能にする電流密度増強層(50)と
を含む薄膜抵抗器。 - 前記薄膜導体材料層(20)が、Ta、TaN、Ti、TiN、W、WN、NiCrまたはSiCrのうちの1つを含む、請求項1に記載の薄膜抵抗器。
- 前記電流密度増強層(50)が金属酸化物を含む、請求項1に記載の薄膜抵抗器。
- 前記金属酸化物が、Al2O3、Ta2O5、HfO2またはZrO2のうちの1つを含む、請求項3に記載の薄膜抵抗器。
- 前記電流密度増強層(50)が、原子層付着プロセスによって付着された、請求項3に記載の薄膜抵抗器。
- 前記電流密度増強層(50)の厚さが50Å以下である、請求項1に記載の薄膜抵抗器。
- バック・エンド・オブ・ライン(BEOL)プロセスにおいて絶縁半導体構造上に形成された、請求項1に記載の薄膜抵抗器。
- 導電性バイア構造によって半導体回路の金属レベルに電気的に結合された、請求項7に記載の薄膜抵抗器。
- フロント・エンド・オブ・ライン(FEOL)プロセスにおいて絶縁半導体構造上に形成された、請求項1に記載の薄膜抵抗器。
- 前記CDEL層(50)が、前記薄膜導体材料層(20)の上に形成された、請求項1に記載の薄膜抵抗器。
- 前記薄膜導体材料層(20)の下に形成された追加のCDEL層(50)をさらに含む、請求項10に記載の薄膜抵抗器。
- 前記CDEL層(50)が、前記薄膜導体材料層(20)への良好な付着を提供するように適合された材料からなる、請求項2に記載の薄膜抵抗器。
- 前記薄膜抵抗器の上に形成されたレベル間誘電層をさらに含む、請求項2に記載の薄膜抵抗器。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/906,365 US7271700B2 (en) | 2005-02-16 | 2005-02-16 | Thin film resistor with current density enhancing layer (CDEL) |
US10/906,365 | 2005-02-16 | ||
PCT/US2006/004436 WO2006088709A2 (en) | 2005-02-16 | 2006-02-08 | Thin film resistors with current density enhancing layer (cdel) |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008530820A true JP2008530820A (ja) | 2008-08-07 |
JP2008530820A5 JP2008530820A5 (ja) | 2009-02-12 |
JP5063365B2 JP5063365B2 (ja) | 2012-10-31 |
Family
ID=36815104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007556200A Expired - Fee Related JP5063365B2 (ja) | 2005-02-16 | 2006-02-08 | 電流密度増強層(cdel)を有する薄膜抵抗器 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7271700B2 (ja) |
EP (1) | EP1849167B1 (ja) |
JP (1) | JP5063365B2 (ja) |
CN (1) | CN101647075B (ja) |
AT (1) | ATE538480T1 (ja) |
TW (1) | TWI384497B (ja) |
WO (1) | WO2006088709A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022517363A (ja) * | 2019-01-18 | 2022-03-08 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 高炭素含有量流動性誘電体膜の低加工損傷での形成 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7381981B2 (en) * | 2005-07-29 | 2008-06-03 | International Business Machines Corporation | Phase-change TaN resistor based triple-state/multi-state read only memory |
US7749896B2 (en) * | 2005-08-23 | 2010-07-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device and method for forming the same |
US8013394B2 (en) * | 2007-03-28 | 2011-09-06 | International Business Machines Corporation | Integrated circuit having resistor between BEOL interconnect and FEOL structure and related method |
JP2011082195A (ja) * | 2008-02-04 | 2011-04-21 | Alps Electric Co Ltd | 半導体装置及びその製造方法 |
US8426745B2 (en) * | 2009-11-30 | 2013-04-23 | Intersil Americas Inc. | Thin film resistor |
US8169811B2 (en) * | 2010-07-13 | 2012-05-01 | Nxp B.V. | Non-volatile re-programmable memory device |
US8455768B2 (en) | 2010-11-15 | 2013-06-04 | International Business Machines Corporation | Back-end-of-line planar resistor |
US8680618B2 (en) * | 2011-10-17 | 2014-03-25 | Texas Instruments Incorporated | Structure and method for integrating front end SiCr resistors in HiK metal gate technologies |
US8890222B2 (en) * | 2012-02-03 | 2014-11-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Meander line resistor structure |
CN103325844B (zh) * | 2012-03-19 | 2017-10-13 | 联华电子股份有限公司 | 薄膜电阻结构 |
US8859386B2 (en) * | 2012-06-08 | 2014-10-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor devices, methods of manufacture thereof, and methods of forming resistors |
WO2014205634A1 (zh) * | 2013-06-24 | 2014-12-31 | 吉瑞高新科技股份有限公司 | 电子烟发热装置及电子烟 |
US9502284B2 (en) * | 2013-12-31 | 2016-11-22 | Texas Instruments Incorporated | Metal thin film resistor and process |
US9773779B2 (en) * | 2015-08-06 | 2017-09-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor structure with resistor layer and method for forming the same |
US10037990B2 (en) * | 2016-07-01 | 2018-07-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of manufacturing interconnect layer and semiconductor device which includes interconnect layer |
US20180019298A1 (en) * | 2016-07-18 | 2018-01-18 | Raytheon Company | METHOD FOR FORMING PATTERNED TANTALUM NITRIDE (TaN) RESISTORS ON DIELECTRIC MATERIAL PASSIVATION LAYERS |
US10211278B2 (en) * | 2017-07-11 | 2019-02-19 | Texas Instruments Incorporated | Device and method for a thin film resistor using a via retardation layer |
US10763324B2 (en) | 2017-07-25 | 2020-09-01 | Microchip Technology Incorporated | Systems and methods for forming a thin film resistor integrated in an integrated circuit device |
US11088024B2 (en) * | 2019-04-11 | 2021-08-10 | Microchip Technology Incorporated | Forming a thin film resistor (TFR) in an integrated circuit device |
TW202125541A (zh) * | 2019-12-18 | 2021-07-01 | 光頡科技股份有限公司 | 薄膜電阻元件 |
US11990257B2 (en) * | 2020-02-27 | 2024-05-21 | Microchip Technology Incorporated | Thin film resistor (TFR) formed in an integrated circuit device using wet etching of a dielectric cap |
US20210305155A1 (en) * | 2020-03-30 | 2021-09-30 | Qualcomm Incorporated | Via zero interconnect layer metal resistor integration |
US20230063793A1 (en) * | 2021-08-26 | 2023-03-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method (and related apparatus) for forming a resistor over a semiconductor substrate |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04221850A (ja) * | 1990-12-20 | 1992-08-12 | Murata Mfg Co Ltd | 薄膜抵抗体 |
JP2001223334A (ja) * | 2000-02-09 | 2001-08-17 | Toshiba Corp | 半導体装置製造方法および半導体装置 |
JP2001267320A (ja) * | 2000-03-14 | 2001-09-28 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2003031689A (ja) * | 2001-07-17 | 2003-01-31 | Toshiba Corp | 半導体装置の製造方法、及び半導体装置 |
JP2003163272A (ja) * | 2001-11-28 | 2003-06-06 | Sony Corp | 半導体装置の製造方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4166279A (en) * | 1977-12-30 | 1979-08-28 | International Business Machines Corporation | Electromigration resistance in gold thin film conductors |
US4217570A (en) * | 1978-05-30 | 1980-08-12 | Tektronix, Inc. | Thin-film microcircuits adapted for laser trimming |
US4232059A (en) * | 1979-06-06 | 1980-11-04 | E-Systems, Inc. | Process of defining film patterns on microelectronic substrates by air abrading |
US5356869A (en) * | 1987-09-28 | 1994-10-18 | Arch Development Corporation | Metal oxide superconducting powder comprised of flake-like single crystal particles |
JPH03132022A (ja) | 1989-10-18 | 1991-06-05 | Hitachi Ltd | 半導体装置の製造方法およびその装置 |
US5783483A (en) * | 1993-02-24 | 1998-07-21 | Intel Corporation | Method of fabricating a barrier against metal diffusion |
US5817574A (en) * | 1993-12-29 | 1998-10-06 | Intel Corporation | Method of forming a high surface area interconnection structure |
JP3510943B2 (ja) | 1995-10-27 | 2004-03-29 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
US6054659A (en) * | 1998-03-09 | 2000-04-25 | General Motors Corporation | Integrated electrostatically-actuated micromachined all-metal micro-relays |
JP2001071499A (ja) * | 1998-09-30 | 2001-03-21 | Canon Inc | インクジェット記録ヘッドとこれを備えるインクジェット装置およびインクジェット記録方法 |
US6545359B1 (en) * | 1998-12-18 | 2003-04-08 | Semiconductor Energy Laboratory Co., Ltd. | Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof |
US6703666B1 (en) * | 1999-07-14 | 2004-03-09 | Agere Systems Inc. | Thin film resistor device and a method of manufacture therefor |
TW471163B (en) * | 2000-08-17 | 2002-01-01 | United Microelectronics Corp | Manufacturing method and structure of thin film resistor having a high resistance value |
US7214295B2 (en) * | 2001-04-09 | 2007-05-08 | Vishay Dale Electronics, Inc. | Method for tantalum pentoxide moisture barrier in film resistors |
US6599827B1 (en) * | 2001-05-02 | 2003-07-29 | Advanced Micro Devices, Inc. | Methods of forming capped copper interconnects with improved electromigration resistance |
US6432822B1 (en) * | 2001-05-02 | 2002-08-13 | Advanced Micro Devices, Inc. | Method of improving electromigration resistance of capped Cu |
US6534374B2 (en) * | 2001-06-07 | 2003-03-18 | Institute Of Microelectronics | Single damascene method for RF IC passive component integration in copper interconnect process |
TW495959B (en) * | 2001-06-26 | 2002-07-21 | Taiwan Semiconductor Mfg | Highly precise semiconductor thin film resistor and the manufacturing method thereof |
US6933186B2 (en) * | 2001-09-21 | 2005-08-23 | International Business Machines Corporation | Method for BEOL resistor tolerance improvement using anodic oxidation |
JP2003243520A (ja) | 2002-02-19 | 2003-08-29 | Alps Electric Co Ltd | 半導体装置及び半導体装置の製造方法 |
JP3969192B2 (ja) * | 2002-05-30 | 2007-09-05 | 株式会社デンソー | 多層配線基板の製造方法 |
DE10224167B4 (de) * | 2002-05-31 | 2007-01-25 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren zur Herstellung einer Kupferleitung mit erhöhter Widerstandsfähigkeit gegen Elektromigration in einem Halbleiterelement |
US6730573B1 (en) * | 2002-11-01 | 2004-05-04 | Chartered Semiconductor Manufacturing Ltd. | MIM and metal resistor formation at CU beol using only one extra mask |
US6872655B2 (en) * | 2003-02-04 | 2005-03-29 | Texas Instruments Incorporated | Method of forming an integrated circuit thin film resistor |
US6858527B2 (en) * | 2003-04-14 | 2005-02-22 | Intel Corporation | Method to increase electromigration resistance of copper using self-assembled organic thiolate monolayers |
TWI224820B (en) * | 2003-10-03 | 2004-12-01 | Mosel Vitelic Inc | Method for manufacturing trench-typed MOSFET |
-
2005
- 2005-02-16 US US10/906,365 patent/US7271700B2/en active Active
-
2006
- 2006-02-07 TW TW095104024A patent/TWI384497B/zh active
- 2006-02-08 EP EP06720491A patent/EP1849167B1/en active Active
- 2006-02-08 CN CN200680004973.6A patent/CN101647075B/zh active Active
- 2006-02-08 JP JP2007556200A patent/JP5063365B2/ja not_active Expired - Fee Related
- 2006-02-08 AT AT06720491T patent/ATE538480T1/de active
- 2006-02-08 WO PCT/US2006/004436 patent/WO2006088709A2/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04221850A (ja) * | 1990-12-20 | 1992-08-12 | Murata Mfg Co Ltd | 薄膜抵抗体 |
JP2001223334A (ja) * | 2000-02-09 | 2001-08-17 | Toshiba Corp | 半導体装置製造方法および半導体装置 |
JP2001267320A (ja) * | 2000-03-14 | 2001-09-28 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2003031689A (ja) * | 2001-07-17 | 2003-01-31 | Toshiba Corp | 半導体装置の製造方法、及び半導体装置 |
JP2003163272A (ja) * | 2001-11-28 | 2003-06-06 | Sony Corp | 半導体装置の製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022517363A (ja) * | 2019-01-18 | 2022-03-08 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 高炭素含有量流動性誘電体膜の低加工損傷での形成 |
US11756786B2 (en) | 2019-01-18 | 2023-09-12 | International Business Machines Corporation | Forming high carbon content flowable dielectric film with low processing damage |
Also Published As
Publication number | Publication date |
---|---|
US20060181388A1 (en) | 2006-08-17 |
WO2006088709A3 (en) | 2009-04-30 |
TWI384497B (zh) | 2013-02-01 |
CN101647075B (zh) | 2011-08-31 |
EP1849167A4 (en) | 2010-06-09 |
EP1849167B1 (en) | 2011-12-21 |
ATE538480T1 (de) | 2012-01-15 |
TW200643992A (en) | 2006-12-16 |
WO2006088709A2 (en) | 2006-08-24 |
JP5063365B2 (ja) | 2012-10-31 |
CN101647075A (zh) | 2010-02-10 |
US7271700B2 (en) | 2007-09-18 |
EP1849167A2 (en) | 2007-10-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5063365B2 (ja) | 電流密度増強層(cdel)を有する薄膜抵抗器 | |
US6890810B2 (en) | Method of fabrication of thin film resistor with zero TCR | |
JP4045216B2 (ja) | 相互接続構造体 | |
JP4906722B2 (ja) | 高性能cmosのためのfeol/meol金属抵抗器 | |
US9613880B2 (en) | Semiconductor structure and fabrication method thereof | |
US6921962B1 (en) | Integrated circuit having a thin film resistor located within a multilevel dielectric between an upper and lower metal interconnect layer | |
US6764774B2 (en) | Structures with improved adhesion to Si and C containing dielectrics and method for preparing the same | |
JP2007329478A (ja) | 超小型電子部品構造体、超小型電子部品構造体を製造する方法 | |
US20070176295A1 (en) | Contact via scheme with staggered vias | |
CN108028253B (zh) | 低薄层电阻meol电阻器的方法与设计 | |
US6737326B2 (en) | Method of integrating a thin film resistor in a multi-level metal tungsten-plug interconnect | |
US11637100B2 (en) | Semiconductor device having capacitor and resistor and a method of forming the same | |
US6548901B1 (en) | Cu/low-k BEOL with nonconcurrent hybrid dielectric interface | |
US11056426B2 (en) | Metallization interconnect structure formation | |
JP2009200256A (ja) | 半導体装置の製造方法 | |
TW202201636A (zh) | 半導體裝置及其形成方法 | |
KR100508538B1 (ko) | 반도체 금속 라인 제조 공정에서의 에어 갭 형성 방법 | |
US20230187341A1 (en) | Barrier liner free interface for metal via | |
US11699589B2 (en) | Method for forming patterned mask layer | |
US20230215802A1 (en) | Conductive structures and methods of fabrication thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081212 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20081212 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120221 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120223 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120430 |
|
RD12 | Notification of acceptance of power of sub attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7432 Effective date: 20120430 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20120501 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120612 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120612 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120717 |
|
RD14 | Notification of resignation of power of sub attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7434 Effective date: 20120717 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120807 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5063365 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150817 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |