JP2008523987A5 - - Google Patents
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- Publication number
- JP2008523987A5 JP2008523987A5 JP2007547451A JP2007547451A JP2008523987A5 JP 2008523987 A5 JP2008523987 A5 JP 2008523987A5 JP 2007547451 A JP2007547451 A JP 2007547451A JP 2007547451 A JP2007547451 A JP 2007547451A JP 2008523987 A5 JP2008523987 A5 JP 2008523987A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- interrupted
- cycloalkyl
- alkenyl
- phenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04106822 | 2004-12-22 | ||
| EP04106822.2 | 2004-12-22 | ||
| PCT/EP2005/056683 WO2006067061A2 (en) | 2004-12-22 | 2005-12-12 | Process for the production of strongly adherent coatings |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008523987A JP2008523987A (ja) | 2008-07-10 |
| JP2008523987A5 true JP2008523987A5 (https=) | 2009-02-05 |
| JP5421533B2 JP5421533B2 (ja) | 2014-02-19 |
Family
ID=34930110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007547451A Expired - Fee Related JP5421533B2 (ja) | 2004-12-22 | 2005-12-12 | 強接着性コーティングの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8414982B2 (https=) |
| EP (1) | EP1836002B1 (https=) |
| JP (1) | JP5421533B2 (https=) |
| TW (1) | TWI392712B (https=) |
| WO (1) | WO2006067061A2 (https=) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100022676A1 (en) * | 2006-10-03 | 2010-01-28 | Jonathan Rogers | Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type |
| US8057852B2 (en) | 2006-11-23 | 2011-11-15 | National Research Council Of Canada | Microdevice for a fluorescence-based assay, and a method for making the microdevice |
| JP5568311B2 (ja) * | 2006-12-06 | 2014-08-06 | チバ ホールディング インコーポレーテッド | 機能化ナノ粒子による表面特性の変更 |
| EP1978038A1 (en) * | 2007-04-02 | 2008-10-08 | Vlaamse Instelling Voor Technologisch Onderzoek (Vito) | A method for producing a coating by atmospheric pressure plasma technology |
| US8623459B2 (en) | 2007-04-25 | 2014-01-07 | Basf Se | Substrates with biopassive coating |
| EP2356082B1 (en) * | 2008-10-17 | 2021-03-17 | Surfix BV | Photochemical modification of solid materials |
| DE102008052586A1 (de) * | 2008-10-21 | 2010-04-22 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Zusammensetzung zur Herstellung optischer Elemente mit Gradientenstruktur |
| KR101996684B1 (ko) * | 2011-07-28 | 2019-07-04 | 도판 인사츠 가부시키가이샤 | 적층체, 가스 배리어 필름, 및 이들의 제조 방법 |
| WO2014078947A1 (en) * | 2012-11-26 | 2014-05-30 | Farnum Bryan Christopher | Powder coating pretreatment compositions, and methods of using and making the same |
| JP2016501719A (ja) | 2012-12-17 | 2016-01-21 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 向上された流束を有する濾過システムおよび膜ならびにそれらの製造方法 |
| KR20160014040A (ko) * | 2013-05-29 | 2016-02-05 | 시마 나노 테크 이스라엘 리미티드 | 광개시제를 사용하는 기재의 전처리 |
| ES2871449T3 (es) * | 2014-05-19 | 2021-10-28 | Ineos Styrolution Group Gmbh | Película de material compuesto de copolímero de estireno |
| CN104610541A (zh) * | 2015-02-10 | 2015-05-13 | 天津墨森科技有限公司 | 新型苯甲酰甲酸酯类引发剂及其制备方法 |
| KR101860188B1 (ko) * | 2016-01-27 | 2018-06-28 | 대진대학교 산학협력단 | 마이크로웨이브를 이용한 3d 프린트물의 표면처리 방법 |
| JP7057058B2 (ja) * | 2016-08-10 | 2022-04-19 | ダイセルポリマー株式会社 | 熱可塑性樹脂組成物の成形体の塗装方法 |
| CN106397815A (zh) * | 2016-09-28 | 2017-02-15 | 南宁市日建塑料包装有限责任公司 | 一种提高塑料印刷品中油墨附着力的方法 |
| CN106905147A (zh) * | 2017-02-21 | 2017-06-30 | 怀化金鑫新材料有限公司 | 光引发剂苯甲酰甲酸二甘醇酯的合成新工艺 |
| EP3601213B1 (en) | 2017-03-31 | 2022-05-11 | Coloplast A/S | Acrylamide photoinitiators |
| US10633550B2 (en) * | 2017-08-31 | 2020-04-28 | Xerox Corporation | Molecular organic reactive inks for conductive silver printing |
| AU2019260116A1 (en) | 2018-04-25 | 2020-10-01 | Basf Se | Process for the production of strongly adherent (embossed) films on flexible substrates |
| EP3784497A1 (en) | 2018-04-25 | 2021-03-03 | Basf Se | Process for the production of strongly adherent liquid crystal films on flexible substrates |
| US10814659B2 (en) | 2018-06-28 | 2020-10-27 | Xerox Corporation | Methods for printing conductive objects |
| CN111804550A (zh) * | 2020-07-07 | 2020-10-23 | 安徽百世佳包装有限公司 | 一种铝制品表面罩光涂层处理工艺 |
| US20260070874A1 (en) * | 2023-04-05 | 2026-03-12 | Kj Chemicals Corporation | Benzoylformic acid amide derivative |
| JP7609210B1 (ja) | 2023-07-14 | 2025-01-07 | artience株式会社 | 水性フレキソインキ及びその印刷物 |
| CN120865049A (zh) * | 2024-04-30 | 2025-10-31 | 常州强力先端电子材料有限公司 | 一种光引发剂及其制备方法和应用 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL290654A (https=) | 1962-03-27 | 1900-01-01 | ||
| US3429852A (en) | 1967-03-30 | 1969-02-25 | Nat Starch Chem Corp | Ethylenically unsaturated derivatives of benzophenone and crosslinkable polymers thereof |
| US3622848A (en) | 1970-03-19 | 1971-11-23 | Du Pont | Capacitor with photocrosslinked dielectric |
| US4304895A (en) | 1973-06-20 | 1981-12-08 | Wesley-Jessen, Inc. | Ultraviolet absorbing corneal contact lenses |
| US4148987A (en) | 1977-05-04 | 1979-04-10 | Rohm And Haas Company | Radiation-curable monomers and polymers thereof |
| DE3534645A1 (de) | 1985-09-28 | 1987-04-02 | Merck Patent Gmbh | Copolymerisierbare fotoinitiatoren |
| DE3815622A1 (de) | 1988-05-07 | 1989-11-16 | Merck Patent Gmbh | Fotoinitiator-dispersionen |
| DE3844444A1 (de) | 1988-12-31 | 1990-08-09 | Basf Ag | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare verbindungen und verfahren zu deren herstellung |
| IT1228982B (it) | 1989-03-07 | 1991-07-11 | Lamberti Flli Spa | Dispersioni acquose di fotoiniziatori e loro impiego. |
| EP0956280B1 (en) * | 1997-01-30 | 2002-10-30 | Ciba SC Holding AG | Non-volatile phenylglyoxalic esters |
| DE19826712A1 (de) * | 1998-06-16 | 1999-12-23 | Basf Ag | Strahlungshärtbare Massen, enthaltend Phenylglyoxylate |
| SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| SK5642001A3 (en) * | 1998-10-28 | 2001-09-11 | Ciba Sc Holding Ag | Method for producing adhesive surface coatings |
| DE19953433A1 (de) | 1999-11-06 | 2001-05-10 | Michael Bauer | Verfahren zur Herstellung haftfester, strukturierbarer Metallbeschichtungen |
| NL1016815C2 (nl) | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
| JP4512281B2 (ja) * | 2001-02-22 | 2010-07-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版 |
| BR0307285B1 (pt) * | 2002-01-29 | 2013-07-23 | processo para a produção de um revestimento fortemente aderente sobre um substrato inorgânico ou orgânico | |
| MXPA04007993A (es) * | 2002-03-06 | 2004-11-26 | Ciba Sc Holding Ag | Proceso enzimatico para la preparacion de fotoiniciadores que contienen grupos de silicio organicos. |
| CN1307207C (zh) * | 2002-04-26 | 2007-03-28 | 西巴特殊化学品控股有限公司 | 可引入的光敏引发剂 |
| BR0315094A (pt) * | 2002-10-09 | 2005-08-16 | Ciba Sc Holding Ag | Processo para a formação de camadas absorvedoras de ultravioleta sobre substratos |
| US20060246291A1 (en) * | 2002-12-20 | 2006-11-02 | Martin Kunz | Method for forming functional layers |
| RU2338760C2 (ru) * | 2002-12-20 | 2008-11-20 | Циба Спешиалти Кемикэлз Холдинг Инк. | Способ формирования реакционноспособных покрытий |
| CN1791473A (zh) * | 2003-05-23 | 2006-06-21 | 西巴特殊化学品控股有限公司 | 强粘合性表面涂料 |
| US20070128441A1 (en) * | 2003-08-04 | 2007-06-07 | Giorgio Macor | Process for the production of strongly adherent coatings |
| KR101100068B1 (ko) * | 2003-08-04 | 2011-12-29 | 시바 홀딩 인크 | 강한 접착성 피막의 제조방법 |
-
2005
- 2005-12-12 US US11/792,747 patent/US8414982B2/en not_active Expired - Fee Related
- 2005-12-12 EP EP05826390A patent/EP1836002B1/en not_active Expired - Lifetime
- 2005-12-12 WO PCT/EP2005/056683 patent/WO2006067061A2/en not_active Ceased
- 2005-12-12 JP JP2007547451A patent/JP5421533B2/ja not_active Expired - Fee Related
- 2005-12-21 TW TW094145631A patent/TWI392712B/zh not_active IP Right Cessation
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