JP2008523987A - 強接着性コーティングの製造方法 - Google Patents
強接着性コーティングの製造方法 Download PDFInfo
- Publication number
- JP2008523987A JP2008523987A JP2007547451A JP2007547451A JP2008523987A JP 2008523987 A JP2008523987 A JP 2008523987A JP 2007547451 A JP2007547451 A JP 2007547451A JP 2007547451 A JP2007547451 A JP 2007547451A JP 2008523987 A JP2008523987 A JP 2008523987A
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- JP
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- Prior art keywords
- alkyl
- interrupted
- alkenyl
- phenyl
- cycloalkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000000518 rheometry Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
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- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
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- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
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- 229940005581 sodium lactate Drugs 0.000 description 1
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- 238000004544 sputter deposition Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- MHSKRLJMQQNJNC-UHFFFAOYSA-N terephthalamide Chemical compound NC(=O)C1=CC=C(C(N)=O)C=C1 MHSKRLJMQQNJNC-UHFFFAOYSA-N 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- 125000005497 tetraalkylphosphonium group Chemical group 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- RKHXQBLJXBGEKF-UHFFFAOYSA-M tetrabutylphosphanium;bromide Chemical compound [Br-].CCCC[P+](CCCC)(CCCC)CCCC RKHXQBLJXBGEKF-UHFFFAOYSA-M 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- HNKJADCVZUBCPG-UHFFFAOYSA-N thioanisole Chemical compound CSC1=CC=CC=C1 HNKJADCVZUBCPG-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- HFFLGKNGCAIQMO-UHFFFAOYSA-N trichloroacetaldehyde Chemical compound ClC(Cl)(Cl)C=O HFFLGKNGCAIQMO-UHFFFAOYSA-N 0.000 description 1
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- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- CNUJLMSKURPSHE-UHFFFAOYSA-N trioctadecyl phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC CNUJLMSKURPSHE-UHFFFAOYSA-N 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
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- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
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- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical class C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/18—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carboxylic acids, or sulfur or nitrogen analogues thereof
- C07D295/182—Radicals derived from carboxylic acids
- C07D295/185—Radicals derived from carboxylic acids from aliphatic carboxylic acids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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Abstract
Description
a)無機又は有機基材上に、低温プラズマ処理、コロナ放電処理、オゾン化、又は紫外線照射、又は火炎処理を行い、
b)1種以上の光開始剤、又は光開始剤と少なくとも1個のエチレン性不飽和基を含有するモノマー若しくは/及びオリゴマーとの混合物、あるいは前述の物質の溶液、懸濁液、又はエマルションを、無機又は有機基材に塗布し、そして
c)場合により、適切な方法を用いて、これら前述の物質を乾燥し、及び/又は電磁波を照射し、
工程b)において、式I又はIa:
Xは、O、S、又はNR5であり;
Zは、O又はSであり;
nが1である場合、R1は、水素、C1〜C50アルキル、C2〜C24アルケニル、C3〜C25シクロアルキル;1個以上のX2で中断されたC2〜C250アルキル;1個以上のX2で中断されたC2〜C24アルケニル;1個以上のX2で中断されたC3〜C25シクロアルキル(ここで前記基C1〜C50アルキル、C2〜C24アルケニル、C3〜C25シクロアルキル;1個以上のX2で中断されたC2〜C250アルキル;1個以上のX2で中断されたC2〜C24アルケニル;1個以上のX2で中断されたC3〜C25シクロアルキルは;場合により1個以上のAで置換されている)であるか;
又はR1は、場合によりA1で置換されているフェニルであるか;
又は、XがNR5である場合、R5及びR1は、N−原子と一緒になって、場合によりN−原子のほかに別の基NR5を含んでいる環を形成していてもよく;
nが2である場合、R1は、二価の結合基であり;
nが3である場合、R1は、三価の結合基であり;
nが4である場合、R1は、四価の結合基であり;
Mは、n価のカチオンであり;
Aは、
A1は、C1〜C24アルキル、1個以上のX2で中断されたC2〜C24アルキル;C2〜C24アルケニル、1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;1個以上のX2で中断されたC3〜C25シクロアルキル(ここで前記基C1〜C24アルキル、1個以上のX2で中断されたC2〜C24アルキル、C2〜C24アルケニル;1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;及び1個以上のX2で中断されたC3〜C25シクロアルキルは;場合により1個以上のC2〜C24アルキニル、フェニル、OR9、SR9、−COR9、COOR9、
あるいはA1は、
R2、R3、及びR4は、互いに独立に、水素、ハロゲン、CN、C1〜C24アルキル、1個以上のX2で中断されたC2〜C24アルキル;C2〜C24アルケニル、1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;1個以上のX2で中断されたC3〜C25シクロアルキル(ここで前記基C1〜C24アルキル、1個以上のX2で中断されたC2〜C24アルキル、C2〜C24アルケニル、1個以上のX2で中断されたC2〜C24アルケニル、C3〜C25シクロアルキル、及び1個以上のX2で中断されたC3〜C25シクロアルキルは;場合により1個以上のC2〜C24アルキニル、フェニル、ハロゲン、OR9、SR9、NR10R11、COR9、COOR9、OCOR9、N(R5)COR9、CON(R5)R9、
あるいはR2、R3、及びR4は、
あるいはR2及びR3は、一緒になってC1〜C6アルキレンを形成するか、又はR2及びR3は一緒になって、これらが結合したフェニル環に縮合したベンゼン環を形成し;
R5は、nが1である場合のR1について示した意味の一つを有するか;又はR5は、
X1は、直接結合、O、S、又はNR12であり;
X2は、O、S、NR12、CO、COO、OCO、CONR12、NR12CO、OCONR12、NR12COO、NR12CONR13、SO、SO2、CR12=CR13、C≡C、N=C−R12、R12C=N、
R6、R7、及びR8は、互いに独立に、R2、R3、及びR4について示したのと同じ意味を有し;
R9、R10、及びR11は、互いに独立に、水素、C1〜C24アルキル;1個以上のX2で中断されたC2〜C24アルキル;C2〜C24アルケニル;1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;1個以上のX2で中断されたC3〜C25シクロアルキル(ここで前記基C1〜C24アルキル;1個以上のX2で中断されたC2〜C24アルキル;C2〜C24アルケニル;1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;及び1個以上のX2で中断されたC3〜C25シクロアルキルは;場合により1個以上のC2〜C24アルキニル、フェニル、ハロゲン、CN、OR12、SR12、COR12、COOR12、
あるいはR9、R10、及びR11は、互いに独立に、非置換フェニル、又は1個以上のCOR12、COOR12、OCOR12、CONR13R14、OCONR13R14、C1〜C24アルキル、C2〜C24アルケニル、C3〜C25シクロアルキル、C2〜C24アルキニル、フェニル、OR12、SR12、
あるいはR9、R10、及びR11は、互いに独立に、非置換フェニル−C1〜C4−アルキル、又は1個以上のCOR12、COOR12、OCOR12、CONR13R14、OCONR13R14、C1〜C24アルキル、C3〜C25シクロアルキル、C2〜C24アルケニル、C2〜C24アルキニル、フェニル、OR12、SR12、
R12、R13、及びR14は、互いに独立に、水素、フェニル、C1〜C24アルキル;1個以上のX3で中断されたC2〜C24アルキル;C2〜C24アルケニル;1個以上のX3で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;1個以上のX3で中断されたC3〜C25シクロアルキル(ここで前記基、フェニル、C1〜C24アルキル;1個以上のX3で中断されたC2〜C24アルキル;C2〜C24アルケニル;1個以上のX3で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;及び1個以上のX3で中断されたC3〜C25シクロアルキルは、場合により1個以上のOH又はハロゲンで置換されている)であり;
X3は、O、S、又はNR5であり;そして
R15、R16、及びR17は、互いに独立に、水素、C1〜C24アルキル、CH2−COOH、COOH、又はフェニルである〕の光開始剤を少なくとも1種用いることを特徴とする方法に関する。
d)更なるコーティング、例えばインク、ラッカー、又は金属層、又は接着性層、又は離型層を塗布し、そして乾燥又は硬化させる、
上記した方法に関する。
a)フリーラジカル重合(通常高い圧力及び高い温度で)により;
b)通常IVb、Vb、VIb、又はVIII族の金属を1個以上含有する触媒により製造することができる。これらの金属は通常、π−又はσ−配位のいずれかが可能な配位子、例えば酸化物、ハロゲン化物、アルコラート、エステル、エーテル、アミン、アルキル、アルケニル及び/又はアリールを1つ以上有する。このような金属錯体は、フリーであっても、又はキャリヤに、例えば活性化塩化マグネシウム、塩化チタン(III)、酸化アルミニウム、又は酸化ケイ素に固定されていてもよい。このような触媒は重合媒体に可溶性でも不溶性でもよい。触媒は、それ自体で重合中に活性であってもよく、あるいは、例えば金属アルキル、金属水素化物、金属アルキルハライド、金属アルキル酸化物、又は金属アルキルオキサンで、金属はIa、IIa及び/又はIIIa族の元素であるような別の活性化剤を用いてもよい。活性化剤は、例えば、別のエステル、エーテル、アミン、又はシリルエーテル基で変性されていてもよい。このような触媒系を通常、フィリップス、スタンダードオイルインディアナ、チグラー(−ナッタ)、TNZ(デュポン)、メタロセン、又はシングルサイト触媒(SSC)と呼ぶ。
M4は、酸化状態+4の金属カチオン;例えばSn4+又はTi4+である。
あるいは、nが2である場合、R1は、Z、CO−Z−CO、
あるいは、nが2でありかつXがNR5である場合、R1はR5と一緒になって、ヘテロ原子として2個のN−原子を含む脂肪族環を形成し;
xは、0〜3の整数、好ましくは0又は1、特に0であり;
Zは、C2〜C250アルキレン;Oで中断されたC2〜C250アルキレン(ここでC2〜C250アルキレン及びOで中断されたC2〜C250アルキレンの両方は、場合によりA2で置換されている)であり;
Z1及びZ2は、互いに独立に、水素又はC1〜C20アルキル、好ましくはH又はC1〜C4アルキル、特にH又はメチルであり;
A2は、OR9、SR9、NR10R11、COOR9、COR9、OCOR9、CONR10R11、OCONR10R11、CN、ハロゲン、C5〜C12シクロアルキル、フェニル、フェニル−C1〜C4アルキル;C1〜C12アルキル、ハロゲン、CN、OR12、SR12、又はNR13R14で置換されたフェニルであるか;又はA2は、
X2は、上で示した意味の一つを有し;
R1’は、nが1である場合、R1について示した意味の一つを有し;そして
X1’は、上でX1について示した意味の一つを有する。
nが4である場合、R1は、四価の結合基として、例えばアルカンテトライル、例えば
(式中、nは、1又は2の数であり;
Xは、O又はNR5であり;
Zは、Oであり;
nが1である場合、R1は、水素、C1〜C50アルキル、1個以上のX2で中断されたC2〜C50アルキル;C2〜C24アルケニル、1個以上のX2で中断されたC2〜C24アルケニル(ここで前記基C1〜C50アルキル、1個以上のX2で中断されたC2〜C50アルキル、C2〜C24アルケニル、及び1個以上のX2で中断されたC2〜C24アルケニルは、場合により1個以上のAで置換されている)であるか;
あるいは、XがNR5である場合、R5及びR1は、N−原子と一緒になって、場合によりN−原子のほかに別の基NR5を含んでいる環を形成していてもよく;
nが2である場合、二価の結合基として、R1はC1〜C50アルキレン又はX2で中断されたC2〜C250アルキレンであるか;あるいは、
nが2でありかつXがNR5である場合、R1はR5と一緒になって、ヘテロ原子として2個のN−原子を含む脂肪族環を形成し;
Mは、n価のカチオンであり;
Aは、
R2、R3、及びR4は、互いに独立に、水素、C1〜C24アルキル、OR9、SR9、又はNR10R11であり;
R5は、nが1である場合R1について示した意味の一つを有するか;又はR5は、
X1は、直接結合又はOであり;
X2はOであり;
R6及びR7は、R2、R3、及びR4について示した意味の一つを有し;
R9、R10、及びR11は、互いに独立に、水素、C1〜C24アルキル、C2〜C24アルケニル;
あるいはR9、R10、及びR11は、互いに独立に、非置換フェニル−C1〜C4−アルキル;又は
R15、R16、及びR17は、互いに独立に、水素又はC1〜C24アルキルである)が対象となる。
Tは、NR12COR9、NR10R11、
a、b、cは、互いに独立に、0〜50、好ましくは0〜10の整数であり、
ここでa+b+cの合計は2以上であり;そして
R2、R3、R4、R6、R7、R8、R9、R10、R11、R12、R15、R16、及びR17は、前記定義の通りである)の化合物である。
aは、4〜50、好ましくは4〜20の整数であり;
Tは、
R2、R3、R4、R6、R7、R8、R9、R10、R11、R12、X1、R15、R16、及びR17は、前記定義の通りである)の化合物が対象となる。
R2、R3、及びR4は、前記定義の通りである)の化合物である。
T13は、水素又はC1〜C4アルキル、好ましくは水素又はエチルであり;
Tx、Ty、Tzは、互いに独立に、NR12COR9、NR10R11、
ただし、Tx、Ty、又はTzの少なくとも1つは、
uは、0〜10、好ましくは0〜1の整数であり;
x、y、zは、互いに独立に、0〜50、好ましくは4〜50の整数であり;そして
R6、R7、R8、R9、R10、R11、R12、R15、R16、及びR17は、前記定義の通りである)の化合物である。
式Ic中のTは、好ましくは、OR9、
工程d1.1)において、少なくとも1種のエチレン性不飽和モノマー及び/又はオリゴマーと、少なくとも1種の光開始剤及び/又は共開始剤とを含む光重合性組成物を、工程a)、b)、及びc)で前処理した基材に塗布し、次いでUV/VIS放射線又は電子ビーム、好ましくはUV/VIS放射線で硬化する方法である。
チオキサントン、2−イソプロピルチオキサントン、2−クロロチオキサントン、2−ドデシルチオキサントン、2,4−ジエチルチオキサントン、2,4−ジメチルチオキサントン、1−メトキシカルボニルチオキサントン、2−エトキシカルボニルチオキサントン、3−(2−メトキシエトキシカルボニル)−チオキサントン、4−ブトキシカルボニルチオキサントン、3−ブトキシカルボニル−7−メチルチオキサントン、1−シアノ−3−クロロチオキサントン、1−エトキシカルボニル−3−クロロチオキサントン、1−エトキシカルボニル−3−エトキシチオキサントン、1−エトキシカルボニル−3−アミノチオキサントン、1−エトキシカルボニル−3−フェニルスルフリルチオキサントン、3,4−ジ[2−(2−メトキシエトキシ)エトキシカルボニル]チオキサントン、1−エトキシカルボニル−3−(1−メチル−1−モルホリノエチル)−チオキサントン、2−メチル−6−ジメトキシメチル−チオキサントン、2−メチル−6−(1,1−ジメトキシベンジル)−チオキサントン、2−モルホリノメチルチオキサントン、2−メチル−6−モルホリノメチルチオキサントン、N−アリルチオキサントン−3,4−ジカルボキシイミド、N−オクチルチオキサントン−3,4−ジカルボキシイミド、N−(1,1,3,3−テトラメチルブチル)−チオキサントン−3,4−ジカルボキシイミド、1−フェノキシチオキサントン、6−エトキシカルボニル−2−メトキシチオキサントン、6−エトキシカルボニル−2−メチルチオキサントン、チオキサントン−2−ポリエチレングリコール エステル、2−ヒドロキシ−3−(3,4−ジメチル−9−オキソ−9H−チオキサントン−2−イルオキシ)−N,N,N−トリメチル−1−プロパンアミニウムクロリド;
2. ベンゾフェノン類
ベンゾフェノン、4−フェニルベンゾフェノン、4−メトキシベンゾフェノン、4,4’−ジメトキシベンゾフェノン、4,4’−ジメチルベンゾフェノン、4,4’−ジクロロベンゾフェノン、4,4’−ジメチルアミノベンゾフェノン、4,4’−ジエチルアミノベンゾフェノン、4−メチルベンゾフェノン、2,4,6−トリメチルベンゾフェノン、4−(4−メチルチオフェニル)−ベンゾフェノン、3,3’−ジメチル−4−メトキシベンゾフェノン、メチル−2−ベンゾイルベンゾアート、4−(2−ヒドロキシエチルチオ)−ベンゾフェノン、4−(4−トリルチオ)ベンゾフェノン、4−ベンゾイル−N,N,N−トリメチルベンゼンメタンアミニウムクロリド、2−ヒドロキシ−3−(4−ベンゾイルフェノキシ)−N,N,N−トリメチル−1−プロパンアミニウムクロリド一水和物、4−(13−アクリロイル−1,4,7,10,13−ペンタオキサトリデシル)−ベンゾフェノン、4−ベンゾイル−N,N−ジメチル−N−[2−(1−オキソ−2−プロペニル)オキシ]エチル−ベンゼンメタンアミニウムクロリド;
3. 3−アシルクマリン類
3−ベンゾイルクマリン、3−ベンゾイル−7−メトキシクマリン、3−ベンゾイル−5,7−ジ(プロポキシ)クマリン、3−ベンゾイル−6,8−ジクロロクマリン、3−ベンゾイル−6−クロロクマリン、3,3’−カルボニル−ビス[5,7−ジ(プロポキシ)クマリン]、3,3’−カルボニル−ビス(7−メトキシクマリン)、3,3’−カルボニル−ビス(7−ジエチルアミノクマリン)、3−イソブチイロイルクマリン、3−ベンゾイル−5,7−ジメトキシクマリン、3−ベンゾイル−5,7−ジエトキシクマリン、3−ベンゾイル−5,7−ジブトキシクマリン、3−ベンゾイル−5,7−ジ(メトキシエトキシ)−クマリン、3−ベンゾイル−5,7−ジ(アリルオキシ)クマリン、3−ベンゾイル−7−ジメチルアミノクマリン、3−ベンゾイル−7−ジエチルアミノクマリン、3−イソブチイロイル−7−ジメチルアミノクマリン、5,7−ジメトキシ−3−(1−ナフトイル)−クマリン、5,7−ジメトキシ−3−(1−ナフトイル)−クマリン、3−ベンゾイルベンゾ[f]クマリン、7−ジエチルアミノ−3−チエノイルクマリン、3−(4−シアノベンゾイル)−5,7−ジメトキシクマリン;
4. 3−(アロイルメチレン)−チアゾリン類
3−メチル−2−ベンゾイルメチレン−β−ナフトチアゾリン、3−メチル−2−ベンゾイルメチレン−ベンゾチアゾリン、3−エチル−2−プロピオニルメチレン−β−ナフトチアゾリン;
5. 他のカルボニル化合物
アセトフェノン、3−メトキシアセトフェノン、4−フェニルアセトフェノン、ベンジル、2−アセチルナフタレン、2−ナフトアルデヒドナフトアルデヒド、9,10−アントラキノン、9−フルオレノン、ジベンゾスベロン、キサントン、2,5−ビス(4−ジエチルアミノベンジリデン)シクロペンタノン、α−(パラ−ジメチルアミノベンジリデン)ケトン類、例えば2−(4−ジメチルアミノ−ベンジリデン)−インダン−1−オン又は3−(4−ジメチルアミノ−フェニル)−1−インダン−5−イル−プロペノン、3−フェニルチオフタルイミド、N−メチル−3,5−ジ(エチルチオ)フタルイミド、N−メチル−3,5−ジ(エチルチオ)フタルイミド。
1. 2−(2’−ヒドロキシフェニル)−ベンゾチアゾール類、例えば2−(2’−ヒドロキシ−5’−メチルフェニル)−ベンゾトリアゾール、2−(3’,5’−ジ−tert−ブチル−2’−ヒドロキシフェニル)−ベンゾトリアゾール、2−(5’−tert−ブチル−2’−ヒドロキシフェニル)−ベンゾ−トリアゾール、2−(2’−ヒドロキシ−5’−(1,1,3,3−テトラメチルブチル)−フェニル)−ベンゾトリアゾール、2−(3’,5’−ジ−tert−ブチル−2’−ヒドロキシフェニル)−5−クロロベンゾトリアゾール、2−(3’−tert−ブチル−2’−ヒドロキシ−5’−メチルフェニル)−5−クロロベンゾトリアゾール、2−(3’−sec−ブチル−5’−tert−ブチル−2’−ヒドロキシフェニル)−ベンゾトリアゾール、2−(2’−ヒドロキシ−4’−オクチルオキシフェニル)−ベンゾトリアゾール、2−(3’,5’−ジ−tert−アミル−2’−ヒドロキシフェニル)−ベンゾトリアゾール、2−(3’,5’−ビス(α,α−ジメチルベンジル)−2’−ヒドロキシフェニル)ベンゾトリアゾール、2−(3’−tert−ブチル−2’−ヒドロキシ−5’−(2−オクチルオキシカルボニルエチル)フェニル)−5−クロロベンゾトリアゾールの混合物、2−(3’−tert−ブチル−5’−[2−(2−エチルヘキシルオキシ)カルボニルエチル]−2’−ヒドロキシフェニル)−5−クロロベンゾトリアゾール、2−(3’−tert−ブチル−2’−ヒドロキシ−5’−(2−メトキシカルボニルエチル)フェニル)−5−クロロベンゾトリアゾール、2−(3’−tert−ブチル−2’−ヒドロキシ−5’−(2−メトキシカルボニルエチル)フェニル)−ベンゾトリアゾール、2−(3’−tert−ブチル−2’−ヒドロキシ−5’−(2−オクチルオキシカルボニルエチル)フェニル)−ベンゾトリアゾール、2−(3’−tert−ブチル−5’−[2−(2−エチルヘキシルオキシ)カルボニルエチル]−2’−ヒドロキシフェニル)−ベンゾトリアゾール、2−(3’−ドデシル−2’−ヒドロキシ−5’−メチルフェニル)−ベンゾトリアゾール及び2−(3’−tert−ブチル−2’−ヒドロキシ−5’−(2−イソオクチルオキシカルボニルエチル)−フェニル−ベンゾトリアゾール、2,2’−メチレン−ビス[4−(1,1,3,3−テトラメチルブチル)−6−ベンゾトリアゾール−2−イル−フェノール];2−[3’−tert−ブチル−5’−(2−メトキシカルボニルエチル)−2’−ヒドロキシフェニル]−ベンゾトリアゾールとポリエチレングリコール300とのエステル交換生成物;[R−CH2CH2−COO(CH2)3]2−(ここで、R=3’−tert−ブチル−4’−ヒドロキシ−5’−2H−ベンゾトリアゾール−2−イル−フェニル)。
2. 2−ヒドロキシベンゾフェノン類、例えば4−ヒドロキシ、4−メトキシ、4−オクチルオキシ、4−デシルオキシ、4−ドデシルオキシ、4−ベンジルオキシ、4,2’,4’−トリヒドロキシ又は2’−ヒドロキシ−4,4’−ジメトキシ誘導体。
3. 置換又は非置換の安息香酸のエステル類、例えば4−tert−ブチル−フェニルサリチラート、フェニルサリチラート、オクチルフェニルサリチラート、ジベンゾイルレゾルシノール、ビス(4−tert−ブチルベンゾイル)レゾルシノール、ベンゾイルレゾルシノール、3,5−ジ−tert−ブチル−4−ヒドロキシ安息香酸2,4−ジ−tert−ブチルフェニルエステル、3,5−ジ−tert−ブチル−4−ヒドロキシ安息香酸ヘキサデシルエステル、3,5−ジ−tert−ブチル−4−ヒドロキシ安息香酸オクタデシルエステル、3,5−ジ−tert−ブチル−4−ヒドロキシ安息香酸2−メチル−4,6−ジ−tert−ブチルフェニルエステル。
4. アクリラート類、例えばα−シアノ−β,β−ジフェニルアクリル酸エチルエステル又はイソオクチルエステル、α−メトキシカルボニルケイ皮酸メチルエステル、α−シアノ−β−メチル−p−メトキシケイ皮酸メチルエステル又はブチルエステル、α−メトキシカルボニル−p−メトキシケイ皮酸メチルエステル、N−(β−メトキシカルボニル−β−シアノビニル)−2−メチル−インドリン。
5. 立体障害アミン類、例えばビス(2,2,6,6−テトラメチルピペリジル)セバケート、ビス(2,2,6,6−テトラメチルピペリジル)スクシナート、ビス(1,2,2,6,6−ペンタメチルピペリジル)セバケート、n−ブチル−3,5−ジ−tert−ブチル−4−ヒドロキシベンジルマロン酸ビス(1,2,2,6,6−ペンタメチルピペリジル)エステル、1−ヒドロキシエチル−2,2,6,6−テトラメチル−4−ヒドロキシピペリジン及びコハク酸の縮合物、N,N’−ビス(2,2,6,6−テトラメチル−4−ピペリジル)ヘキサメチレンジアミン及び4−tert−オクチルアミノ−2,6−ジクロロ−1,3,5−s−トリアジンの縮合物、トリス(2,2,6,6−テトラメチル−4−ピペリジル)ニトリロトリアセタート、テトラキス(2,2,6,6−テトラメチル−4−ピペリジル)−1,2,3,4−ブタンテトラオアート、1,1’−(1,2−エタンジイル)ビス(3,3,5,5−テトラメチルピペラジノン)、4−ベンゾイル−2,2,6,6−テトラメチルピペリジン、4−ステアリルオキシ−2,2,6,6−テトラメチルピペリジン、ビス(1,2,2,6,6−ペンタメチルピペリジル)−2−n−ブチル−2−(2−ヒドロキシ−3,5−ジ−tert−ブチルベンジル)マロナート、3−n−オクチル−7,7,9,9−テトラメチル−1,3,8−トリアザスピロ[4.5]デカン−2,4−ジオン、ビス(1−オクチルオキシ−2,2,6,6−テトラメチルピペリジル)セバケート、ビス(1−オクチルオキシ−2,2,6,6−テトラメチルピペリジル)スクシナート、N,N’−ビス(2,2,6,6−テトラメチル−4−ピペリジル)ヘキサメチレンジアミン及び4−モルホリノ−2,6−ジクロロ−1,3,5−トリアジンの縮合物、2−クロロ−4,6−ジ(4−n−ブチルアミノ−2,2,6,6−テトラメチルピペリジル)−1,3,5−トリアジン及び1,2−ビス(3−アミノプロピルアミノ)エタンの縮合物、2−クロロ−4,6−ジ(4−n−ブチルアミノ−1,2,2,6,6−ペンタメチルピペリジル)−1,3,5−トリアジン及び1,2−ビス(3−アミノプロピルアミノ)エタンの縮合物、8−アセチル−3−ドデシル−7,7,9,9−テトラメチル−1,3,8−トリアザスピロ[4.5]デカン−2,4−ジオン、3−ドデシル−1−(2,2,6,6−テトラメチル−4−ピペリジル)ピロリジン−2,5−ジオン、3−ドデシル−1−(1,2,2,6,6−ペンタメチル−4−ピペリジル)ピロリジン−2,5−ジオン。
6. シュウ酸ジアミド類、例えば4,4’−ジオクチルオキシオキサニリド、2,2’−ジエトキシオキサニリド、2,2’−ジオクチルオキシ−5,5’−ジ−tert−ブチルオキサニリド、2,2’−ジドデシルオキシ−5,5’−ジ−tert−ブチルオキサニリド、2−エトキシ−2’−エチルオキサニリド、N,N’−ビス(3−ジメチルアミノプロピル) オキサニリド、2−エトキシ−5−tert−ブチル−2’−エチルオキサニリド及び2−エトキシ−2’−エチル−5,4’−ジ−tert−ブチルオキサニリドとの混合物、o−及びp−メトキシ−並びにo−及びp−エトキシ−ジ−置換オキサニリド類の混合物。
7. 2−(2−ヒドロキシフェニル)−1,3,5−トリアジン類、例えば2,4,6−トリス(2−ヒドロキシ−4−オクチルオキシフェニル)−1,3,5−トリアジン、2−(2−ヒドロキシ−4−オクチルオキシフェニル)−4,6−ビス(2,4−ジメチルフェニル)−1,3,5−トリアジン、2−(2,4−ジヒドロキシフェニル)−4,6−ビス(2,4−ジメチルフェニル)−1,3,5−トリアジン、2,4−ビス(2−ヒドロキシ−4−プロピルオキシフェニル)−6−(2,4−ジメチルフェニル)−1,3,5−トリアジン、2−(2−ヒドロキシ−4−オクチルオキシフェニル)−4,6−ビス(4−メチルフェニル)−1,3,5−トリアジン、2−(2−ヒドロキシ−4−ドデシルオキシフェニル)−4,6−ビス(2,4−ジメチルフェニル)−1,3,5−トリアジン、2−[2−ヒドロキシ−4−(2−ヒドロキシ−3−ブチルオキシプロピルオキシ)フェニル]−4,6−ビス(2,4−ジメチルフェニル)−1,3,5−トリアジン、2−[2−ヒドロキシ−4−(2−ヒドロキシ−3−オクチルオキシプロピルオキシ)フェニル]−4,6−ビス(2,4−ジメチルフェニル)−1,3,5−トリアジン、2−[4−(ドデシルオキシ/トリデシルオキシ−2−ヒドロキシプロピル)オキシ−2−ヒドロキシフェニル]−4,6−ビス(2,4−ジメチルフェニル)−1,3,5−トリアジン
である。
z=1である場合、R50は非置換又はC1〜C12アルキル−置換フェニル、ナフチル、アントラシル、ビフェニリル、C1〜C20アルキル、又は1個以上の酸素原子で中断されたC2〜C20アルキルであるか、あるいは
z=2である場合、R50は1,3−フェニレン、1,4−フェニレン、C6〜C10シクロアルキレン、非置換又はハロ−置換C1〜C40アルキレン、1個以上の酸素原子で中断されたC2〜C40アルキレン、又は基:
z=3である場合、R50は、基:
yは、1〜10の数であり;そしてR60は、C1〜C20アルキレン、酸素、又は
a)ヒドロキシル含有ポリアクリラート、ポリエステル及び/又はポリエーテルと、脂肪族若しくは芳香族のポリイソシアナートとを含む2成分系;
b)チオール、アミノ、カルボキシル及び/又は無水物基を含有する官能ポリアクリラートと、ポリエポキシドとを含む2成分系(例えば、EP 898202に記載されているような);
c)(ポリ)ケチミンと、脂肪族又は芳香族ポリイソシアナートとを含む2成分系;
d)(ポリ)ケチミンと、不飽和アクリル樹脂又はアセトアセタート樹脂又はメチルα−アクリルアミドメチルグリコラートとを含む2成分系;
e)ポリオキサゾリジンと、無水物基を含有するポリアクリラート又は不飽和アクリル樹脂又はポリイソシアナートとを含む2成分系;
f)エポキシ−官能ポリアクリラートと、カルボキシル含有又はアミノ含有ポリアクリラートとを含む2成分系;
g)アリルグリシジルエーテルをベースとするポリマー;
h)(ポリ)アルコール及び/又は(ポリ)チオールと、(ポリ)イソシアナートとを含む2成分系;
i)α,β−エチレン性不飽和カルボニル化合物と、活性化されたCH2基を含有するポリマーとを含む2成分系であって、活性化されたCH2基は主鎖又は側鎖又は両方に存在する2成分系(例えば、EP 161697にポリマロナート基について記載されている)。活性化されたCH2基を含有する他の化合物は、(ポリ)アセトアセタート及び(ポリ)シアノアセタートである;
k)活性化されたCH2基が主鎖又は側鎖又は両方に存在する、活性化されたCH2基を含有するポリマー、すなわち活性化されたCH2基を含有するポリマー、例えばポリアセトアセタート及びポリシアノアセタートと、ポリアルデヒド架橋剤、例えばテレフタルアルデヒドとを含む2成分系。このような系は、例えば、Urankar et al. , Polym. Prepr. (1994), 35, 933に記載されている。
例A1
2枚の異なる二軸延伸ポリプロピレン(BOPP)フィルム及びポリエチレン(PE)フィルムを、コロナ(セラミック電極;基材より0.8mm離間;ベルト速度3m/分でコロナ放電1×500W)で処理した。
IRGACURE(登録商標)754(Ciba Specialty Chemicalsより供給)は、
放射線で硬化可能なフレキソシアンインク(Gemini flexo cyan、UFG 50080-408、Akzoより供給)を、前処理したプラスチックフィルム基板に1.5μmの厚さで印刷機("Prufbau Probedruckmaschine")で塗布した。印刷した試料を、水銀ランプを備えたUV処理装置で、出力120W/cm、ベルト速度50m/分で硬化した。
Tesa EUテープを硬化面に貼り付けた。1分後、テープを除去した。粘着結果を0〜5のランクで測定した。値“0”は、0%のインクを除去したことを意味し、値“5”は、100%、すなわち完全に、インクを除去したことを意味する。
本発明に従って光開始混合剤で前処理した全3つの試料(BOPP及びPE)において[すなわち工程a)、b)、c)及びd)を実施]、インクは除去されなかった(0)。
例A1の手順を繰り返すが、フレキソシアンインクの代わりに放射線で硬化可能な白色のスクリーンインク(985-UV-1125、Rucoより供給)を使用した。インクを前処理したプラスチックフィルム基板にT140スクリーン(厚さ〜10μm)で塗布し、印刷した試料を水銀ランプを備えたUV処理装置で出力200W/cm、ベルト速度50m/分で硬化した。接着強度をテープテストにより測定した。
例A1の手順を繰り返すが、イソプロパノール中のIRGACURE(登録商標)754及びSARTOMER(登録商標)259の溶液の代わりに、イソプロパノール中の
例A2の手順を繰り返すが、イソプロパノール中のIRGACURE(登録商標)754及びSARTOMER(登録商標)259の溶液の代わりに、光開始混合剤を例A3に従って使用した。
例A1の手順をポリエチレン(PE)フィルムを用いて繰り返すが、イソプロパノール中のIRGACURE(登録商標)754及びSARTOMER(登録商標)259の溶液の代わりに、イソプロパノール中の
フレキソシアンインクのための例A1及び白色のスクリーンインクのための例A2の手順を、全3つのプラスチックホイル(2枚の異なるBOPP及び1枚のPE)に繰り返すが、イソプロパノール中のIRGACURE(登録商標)754及びSARTOMER(登録商標)259の溶液の代わりに、イソプロパノール中の
例A1(フレキソシアンインク)の手順を繰り返すが、イソプロパノール中のIRGACURE(登録商標)754及びSARTOMER(登録商標)259の溶液の代わりに、イソプロパノール中の
例A1の手順(フレキソシアンインク)を繰り返すが、イソプロパノール中のIRGACURE(登録商標)754及びSARTOMER(登録商標)259の溶液の代わりに、イソプロパノール中の
例A1(フレキソシアンインク)の手順を二軸延伸ポリプロピレン(BOPP)フィルムで繰り返すが、イソプロパノール中のIRGACURE(登録商標)754及びSARTOMER(登録商標)259の溶液の代わりに、イソプロパノール中の
2枚の異なる二軸延伸ポリプロピレン(BOPP)フィルム及びポリエチレン(PE)フィルムを、コロナ(セラミック電極;基板より0.8mm離間;ベルト速度3m/分でコロナ放電1×500W)で処理した。
例A10の手順を繰り返すが、光開始剤の溶液を、水中にフェニルグリオキシル酸及びSARTOMER(登録商標)344の1:3分子混合物を4%、界面活性剤を0.3%含む溶液に代えた。
例A10の手順を繰り返すが、光開始剤の溶液を、水中にフェニルグリオキシル酸及びSARTOMER(登録商標)610(ポリエチレングリコール600−ジアクリラート)の1:1分子混合物を4%、界面活性剤を0.3%含む溶液に代えた。
2枚の異なる二軸延伸ポリプロピレン(BOPP)フィルム及びポリエチレン(PE)フィルムを、コロナ(セラミック電極;基板より0.8mm離間;ベルト速度3m/分でコロナ放電1×500W)で処理した。
例A3に従った手順を繰り返すが、光開始剤の溶液の溶媒としてイソプロパノールの代わりに水を使用した。この場合、更なる界面活性剤を0.3%、水溶液に加えた。処理した基板のインクの接着強度をテープテストにより測定した。未処理の試料の場合[すなわち、工程a)及びd)のみを実施]、インクは完全に剥がれた(4〜5)。本発明に従って光開始剤の溶液で前処理した全3つの試料(BOPP及びPE)において[すなわち、工程a)、b)、c)及びd)を実施]、インクは除去されなかった(0〜1)。
例A4に従った手順を繰り返すが、光開始剤の溶液の溶媒としてイソプロパノールの代わりに水を使用した。この場合、更なる界面活性剤を0.3%、水溶液に加えた。処理した基板のインクの接着強度をテープテストにより測定した。未処理の試料の場合[すなわち、工程a)及びd)のみを実施]、インクは完全に剥がれた(4〜5)。本発明に従って光開始剤の溶液で前処理した全3つの試料(BOPP及びPE)において[すなわち、工程a)、b)、c)及びd)を実施]、インクは除去されなかった(0〜1)。
ポリエチレンフィルム(PE)を、コロナ(セラミック電極;基板より0.8mm離間;ベルト速度3m/分でコロナ放電1×500W)で処理した。
Claims (19)
- 無機又は有機基材上への強接着性コーティングの製造方法であって、
a)無機又は有機基材上に、低温プラズマ処理、コロナ放電処理、オゾン化、又は紫外線照射、又は火炎処理を行い、
b)1種以上の光開始剤、又は光開始剤と少なくとも1個のエチレン性不飽和基を含有するモノマー若しくは/及びオリゴマーとの混合物、あるいは前述の物質の溶液、懸濁液、又はエマルションを、無機又は有機基材に塗布し、そして
c)場合により、適切な方法を用いて、これら前述の物質を乾燥するか、かつ/又は電磁波を照射し、
工程b)において、式I又はIa:
〔式中、nは、1〜4の数であり;
Xは、O、S、又はNR5であり;
Zは、O又はSであり;
nが1である場合、R1は、水素、C1〜C50アルキル、C2〜C24アルケニル、C3〜C25シクロアルキル;1種以上のX2で中断されたC2〜C250アルキル;1個以上のX2で中断されたC2〜C24アルケニル;1個以上のX2で中断されたC3〜C25シクロアルキル(ここで前記基C1〜C50アルキル、C2〜C24アルケニル、C3〜C25シクロアルキル;1個以上のX2で中断されたC2〜C250アルキル;1個以上のX2で中断されたC2〜C24アルケニル;1個以上のX2で中断されたC3〜C25シクロアルキルは;場合により1個以上のAで置換されている)であるか;
又はR1は、場合によりA1で置換されているフェニルであるか;
又は、XがNR5である場合、R5及びR1は、N−原子と一緒になって、場合によりN−原子のほかに別の基NR5を含んでいる環を形成していてもよく;
nが2である場合、R1は、二価の結合基であり;
nが3である場合、R1は、三価の結合基であり;
nが4である場合、R1は、四価の結合基であり;
Mは、n価のカチオンであり;
Aは、
、OR9、SR9、NR10R11、ハロゲン、非置換フェニル、又は1個以上のC1〜C24アルキル、C3〜C25シクロアルキル、C2〜C24アルケニル、C2〜C24アルキニル、フェニル、OR9、SR9、COR9、COOR9、OCOR9、CON10R11、OCONR10R11、
で置換されたフェニルであり、
A1は、C1〜C24アルキル、1個以上のX2で中断されたC2〜C24アルキル;C2〜C24アルケニル、1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;1個以上のX2で中断されたC3〜C25シクロアルキル(ここで前記基C1〜C24アルキル、1個以上のX2で中断されたC2〜C24アルキル、C2〜C24アルケニル;1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;及び1個以上のX2で中断されたC3〜C25シクロアルキルは;場合により1個以上のC2〜C24アルキニル、フェニル、OR9、SR9、−COR9、COOR9、
で置換されている)であるか;
あるいはA1は、
、OR9、SR9、NR10R11、非置換フェニル、又は1個以上のC1〜C24アルキル、C2〜C24アルケニル、C3〜C25シクロアルキル、C2〜C24アルキニル、フェニル、OR9、SR9、COR9、COOR9、OCOR9、CON10R11、OCONR10R11、
で置換されたフェニルであり;
R2、R3、及びR4は、互いに独立に、水素、ハロゲン、CN、C1〜C24アルキル、1個以上のX2で中断されたC2〜C24アルキル;C2〜C24アルケニル、1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;1個以上のX2で中断されたC3〜C25シクロアルキル(ここで前記基C1〜C24アルキル、1個以上のX2で中断されたC2〜C24アルキル、C2〜C24アルケニル、1個以上のX2で中断されたC2〜C24アルケニル、C3〜C25シクロアルキル、及び1個以上のX2で中断されたC3〜C25シクロアルキルは;場合により1個以上のC2〜C24アルキニル、フェニル、ハロゲン、OR9、SR9、NR10R11、COR9、COOR9、OCOR9、N(R5)COR9、CON(R5)R9、
で置換されている)であるか;
あるいはR2、R3、及びR4は、
、OR9、SR9、NR10R11、COR9、COOR9、OCOR9、N(R5)COR9、CON(R5)R9、非置換フェニル、又は1個以上のOR9、SR9、NR10R11、COR9、COOR9、OCOR9、N(R5)COR9、CONR10R11、OCONR10R11、C1〜C24アルキル、C2〜C24アルケニル、C3〜C25シクロアルキル、C2〜C24アルキニル、フェニル、
で置換されたフェニルであるか;
あるいはR2及びR3は、一緒になってC1〜C6アルキレンを形成するか、又はR2及びR3は一緒になって、これらが結合したフェニル環に縮合したベンゼン環を形成し;
R5は、nが1である場合のR1について示した意味の一つを有するか;又はR5は、
であり、
X1は、直接結合、O、S、又はNR12であり;
X2は、O、S、NR12、CO、COO、OCO、CONR12、NR12CO、OCONR12、NR12COO、NR12CONR13、SO、SO2、CR12=CR13、C≡C、N=C−R12、R12C=N、
、フェニレン;又はA1で置換されたフェニレンであり;
R6、R7、及びR8は、互いに独立に、R2、R3、及びR4について示したのと同じ意味を有し;
R9、R10、及びR11は、互いに独立に、水素、C1〜C24アルキル;1個以上のX2で中断されたC2〜C24アルキル;C2〜C24アルケニル;1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;1個以上のX2で中断されたC3〜C25シクロアルキル(ここで前記基C1〜C24アルキル;1個以上のX2で中断されたC2〜C24アルキル;C2〜C24アルケニル;1個以上のX2で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;及び1個以上のX2で中断されたC3〜C25シクロアルキルは;場合により1個以上のC2〜C24アルキニル、フェニル、ハロゲン、CN、OR12、SR12、COR12、COOR12、
で置換されている)であるか;
あるいはR9、R10、及びR11は、互いに独立に、非置換フェニル、又は1個以上のCOR12、COOR12、OCOR12、CONR13R14、OCONR13R14、C1〜C24アルキル、C2〜C24アルケニル、C3〜C25シクロアルキル、C2〜C24アルキニル、フェニル、OR12、SR12、
で置換されたフェニルであるか;
あるいはR9、R10、及びR11は、互いに独立に、非置換フェニル−C1〜C4−アルキル、又は1個以上のCOR12、COOR12、OCOR12、CONR13R14、OCONR13R14、C1〜C24アルキル、C3〜C25シクロアルキル、C2〜C24アルケニル、C2〜C24アルキニル、フェニル、OR12、SR12、
で置換されたフェニル−C1〜C4アルキルであり;
R12、R13、及びR14は、互いに独立に、水素、フェニル、C1〜C24アルキル;1個以上のX3で中断されたC2〜C24アルキル;C2〜C24アルケニル;1個以上のX3で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;1個以上のX3で中断されたC3〜C25シクロアルキル(ここで前記基フェニル、C1〜C24アルキル;1個以上のX3で中断されたC2〜C24アルキル;C2〜C24アルケニル;1個以上のX3で中断されたC2〜C24アルケニル;C3〜C25シクロアルキル;及び1個以上のX3で中断されたC3〜C25シクロアルキルは、場合により1個以上のOH又はハロゲンで置換されている)であり;
X3は、O、S、又はNR5であり;そして
R15、R16、及びR17は、互いに独立に、水素、C1〜C24アルキル、CH2−COOH、COOH、又はフェニルである〕の光開始剤を少なくとも1種用いることを特徴とする、方法。 - d)更なるコーティングを塗布し、そして乾燥又は硬化させる、請求項1記載の方法。
- 更なるコーティングd)が、
d1)UV/VIS放射線若しくは電子ビームで硬化する、少なくとも1種の重合性モノマー、又はエチレン性不飽和のモノマー若しくはオリゴマーを含む、溶剤又は水系の組成物;あるいは
d2)溶剤又は水系の通常の乾燥コーティング、例えば印刷インク又はラッカー;あるいは
d3)金属層
である、請求項2記載の方法。 - 式I及びIaの化合物において、
nが、1又は2の数であり;
Xが、O又はNR5であり;
Zが、Oであり;
nが1である場合、R1が水素、C1〜C50アルキル、1個以上のX2で中断されたC2〜C50アルキル;C2〜C24アルケニル、1個以上のX2で中断されたC2〜C24アルケニル(ここで前記基C1〜C50アルキル、1個以上のX2で中断されたC2〜C50アルキル、C2〜C24アルケニル、及び1個以上のX2で中断されたC2〜C24アルケニルは、場合により1個以上のAで置換されている)であるか;
あるいは、XがNR5である場合、R5及びR1が、N−原子と一緒になって、場合によりN−原子のほかに別の基NR5を含んでいる環を形成していてもよく;
nが2である場合、二価の結合基として、R1がC1〜C50アルキレン又はX2で中断されたC2〜C250アルキレンであるか;あるいは、nが2でありかつXがNR5である場合、R1がR5と一緒になって、ヘテロ原子として2個のN−原子を含む脂肪族環を形成し;
Mが、n価のカチオンであり;
Aが、
、OR9、又はNR10R11であり;
R2、R3、及びR4が、互いに独立に、水素、C1〜C24アルキル、OR9、SR9、又はNR10R11であり;
R5が、nが1である場合R1について示した意味の一つを有するか;又はR5が、
であり;
X1が、直接結合又はOであり;
X2が、Oであり;
R6及びR7が、R2、R3、及びR4について示した意味の一つを有し;
R9、R10、及びR11が、互いに独立に、水素、C1〜C24アルキル、C2〜C24アルケニル;
で置換されたC2〜C24アルケニルであるか;
あるいはR9、R10、及びR11が、互いに独立に、非置換フェニル−C1〜C4−アルキル;又は
で置換されたフェニル−C1〜C4−アルキルであり;そして
R15、R16、及びR17が、互いに独立に、水素又はC1〜C24アルキルである、
請求項1記載の方法。 - 工程b)において、光開始剤(1種又は複数種)又はそのモノマー若しくはオリゴマーとの混合物を、1種以上の液体と組み合わせて、溶液、懸濁液、及びエマルションの形態で用いる、請求項1〜4のいずれか1項記載の方法。
- 工程a)において、不活性ガス、又は不活性ガスと反応性ガスとの混合物をガスとして用いる、請求項1〜5のいずれか1項記載の方法。
- 式Ic:
(式中、T1、T2、T3、T4、T5、T6、T7、T8は、互いに独立に、水素又はC1〜C4アルキルであり;
aは、4〜50、好ましくは4〜20の整数であり;
Tは、
、OR9、SR9、NR10R11、ハロゲン、非置換フェニル、又は1個以上のC1〜C24アルキル、C3〜C25シクロアルキル、C2〜C24アルケニル、C2〜C24アルキニル、フェニル、OR9、SR9、COR9、COOR9、OCOR9、CON10R11、OCONR10R11、
で置換されたフェニルであり;そして
R2、R3、R4、R6、R7、R8、R9、R10、R11、R12、X1、R15、R16、及びR17は、
請求項1の定義の通りである)の化合物。 - 工程b)において塗布した光開始剤層の層厚さが10ミクロンまでである、請求項1〜6のいずれか1項記載の方法。
- 工程c)を行った後の光開始剤層の層厚さが1ミクロンまでである、請求項1〜6のいずれか1項記載の方法。
- 方法の工程b)を、方法の工程a)の直後に又は方法の工程a)の後24時間内に実施する、請求項1〜6のいずれか1項記載の方法。
- 方法の工程b)における、光開始剤又は複数の光開始剤の濃度が、全配合物に基づいて0.0001〜100%である、請求項1〜6のいずれか1項記載の方法。
- 方法の工程c)における乾燥を、オーブン中で、熱ガス、熱ローラー、又はIR若しくはマイクロ波ラジエータを用いて行うか、又は吸収により行う、請求項1〜6のいずれか1項記載の方法。
- 方法の工程c)及び/又はd)において、波長200nm〜700nmの範囲の電磁波を発光する光源を用いて、又は電子ビームにより、又はコロナ放電により照射を行う、請求項1〜6のいずれか1項記載の方法。
- 方法の工程b)において塗布した、光開始剤又はそのモノマー及び/若しくはオリゴマーとの混合物の、方法の工程c)での照射の後に架橋していない部分を、溶剤及び/又は水を用いる処理により除去するか、並びに/又は機械的に除去する、請求項1記載の方法。
- 方法の工程d)における照射の後、コーティングの一部を、溶剤及び/若しくは水を用いる処理により除去するか、並びに/又は機械的に除去する、請求項2記載の方法。
- 請求項1〜6のいずれか1項記載の方法により得た、強接着性コーティング。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04106822 | 2004-12-22 | ||
EP04106822.2 | 2004-12-22 | ||
PCT/EP2005/056683 WO2006067061A2 (en) | 2004-12-22 | 2005-12-12 | Process for the production of strongly adherent coatings |
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EP (1) | EP1836002B1 (ja) |
JP (1) | JP5421533B2 (ja) |
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JP2016527074A (ja) * | 2013-05-29 | 2016-09-08 | シーマ ナノテック イスラエル リミテッド | 光開始剤を使用した基材前処理の方法 |
KR20170090015A (ko) * | 2016-01-27 | 2017-08-07 | 대진대학교 산학협력단 | 마이크로웨이브를 이용한 표면처리 방법 |
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Cited By (8)
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JP2010505977A (ja) * | 2006-10-03 | 2010-02-25 | チバ ホールディング インコーポレーテッド | フェニルグリオキシレート型の光開始剤を含む光硬化性組成物 |
JP2016527074A (ja) * | 2013-05-29 | 2016-09-08 | シーマ ナノテック イスラエル リミテッド | 光開始剤を使用した基材前処理の方法 |
KR20170090015A (ko) * | 2016-01-27 | 2017-08-07 | 대진대학교 산학협력단 | 마이크로웨이브를 이용한 표면처리 방법 |
KR101860188B1 (ko) * | 2016-01-27 | 2018-06-28 | 대진대학교 산학협력단 | 마이크로웨이브를 이용한 3d 프린트물의 표면처리 방법 |
JP2018023927A (ja) * | 2016-08-10 | 2018-02-15 | ダイセルポリマー株式会社 | 熱可塑性樹脂組成物の成形体の塗装方法 |
JP7057058B2 (ja) | 2016-08-10 | 2022-04-19 | ダイセルポリマー株式会社 | 熱可塑性樹脂組成物の成形体の塗装方法 |
JP2019044156A (ja) * | 2017-08-31 | 2019-03-22 | ゼロックス コーポレイションXerox Corporation | 導電性銀印刷のための分子有機反応性インク |
JP7235453B2 (ja) | 2017-08-31 | 2023-03-08 | ゼロックス コーポレイション | 導電性銀印刷のための分子有機反応性インク |
Also Published As
Publication number | Publication date |
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EP1836002A2 (en) | 2007-09-26 |
WO2006067061A2 (en) | 2006-06-29 |
TWI392712B (zh) | 2013-04-11 |
US8414982B2 (en) | 2013-04-09 |
TW200632057A (en) | 2006-09-16 |
US20090092768A1 (en) | 2009-04-09 |
WO2006067061A3 (en) | 2007-06-14 |
JP5421533B2 (ja) | 2014-02-19 |
EP1836002B1 (en) | 2012-08-29 |
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