JP2007501111A5 - - Google Patents

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Publication number
JP2007501111A5
JP2007501111A5 JP2006522345A JP2006522345A JP2007501111A5 JP 2007501111 A5 JP2007501111 A5 JP 2007501111A5 JP 2006522345 A JP2006522345 A JP 2006522345A JP 2006522345 A JP2006522345 A JP 2006522345A JP 2007501111 A5 JP2007501111 A5 JP 2007501111A5
Authority
JP
Japan
Prior art keywords
photoinitiator
compound
irradiation
treatment
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006522345A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007501111A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2004/051600 external-priority patent/WO2005021824A2/en
Publication of JP2007501111A publication Critical patent/JP2007501111A/ja
Publication of JP2007501111A5 publication Critical patent/JP2007501111A5/ja
Pending legal-status Critical Current

Links

JP2006522345A 2003-08-04 2004-07-26 強く付着しているコーティングの製造方法 Pending JP2007501111A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03102424 2003-08-04
PCT/EP2004/051600 WO2005021824A2 (en) 2003-08-04 2004-07-26 Process for the production of strongly adherent coatings

Publications (2)

Publication Number Publication Date
JP2007501111A JP2007501111A (ja) 2007-01-25
JP2007501111A5 true JP2007501111A5 (https=) 2007-09-13

Family

ID=34259190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006522345A Pending JP2007501111A (ja) 2003-08-04 2004-07-26 強く付着しているコーティングの製造方法

Country Status (11)

Country Link
US (1) US20070128441A1 (https=)
EP (1) EP1658391A2 (https=)
JP (1) JP2007501111A (https=)
KR (1) KR20060132540A (https=)
CN (1) CN1829819A (https=)
BR (1) BRPI0413348A (https=)
CA (1) CA2532365C (https=)
MX (1) MXPA06001070A (https=)
TW (1) TW200508345A (https=)
WO (1) WO2005021824A2 (https=)
ZA (1) ZA200600205B (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8414982B2 (en) * 2004-12-22 2013-04-09 Basf Se Process for the production of strongly adherent coatings
ATE537195T1 (de) * 2008-09-09 2011-12-15 Agfa Graphics Nv Strahlungshärtbare zusammensetzungen
EP2161264B1 (en) * 2008-09-09 2019-11-27 Agfa Nv Polymerizable photoinitiators and radiation curable compositions
EP2246330A1 (en) * 2009-04-30 2010-11-03 Siegwerk Benelux SA New photoinitiators
JP5773564B2 (ja) * 2009-10-13 2015-09-02 三菱樹脂株式会社 表面処理ポリアミド系積層フィルム及びその製造方法
US9062082B2 (en) * 2010-06-30 2015-06-23 Dsm Ip Assets B.V. D1479 stable liquid BAP photoinitiator and its use in radiation curable compositions
KR101996684B1 (ko) * 2011-07-28 2019-07-04 도판 인사츠 가부시키가이샤 적층체, 가스 배리어 필름, 및 이들의 제조 방법
EP2744649B1 (en) 2011-08-15 2021-04-21 DuPont Safety & Construction, Inc. A breathable product for protective mass transportation and cold chain applications
DE102012104357A1 (de) * 2012-05-21 2013-11-21 Rehau Ag + Co. Verfahren zur Beschichtung eines Formteils
GB2527764B (en) * 2014-06-30 2017-02-22 Innovia Films Ltd Process for producing a security film
FR3043679B1 (fr) * 2015-11-12 2021-07-23 Aptar Stelmi Sas Procede de traitement d'un element de conditionnement en elastomere, et element de conditionnement ainsi traite.
CN105568216A (zh) * 2016-01-27 2016-05-11 太仓捷公精密金属材料有限公司 一种金属制品的表面处理工艺
CN108795168A (zh) * 2018-07-17 2018-11-13 合肥雅克丽新型建材有限公司 一种高稳定性的防辐射内墙装饰涂料
DE102021203505A1 (de) 2021-04-09 2022-10-13 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Abscheiden mindestens einer Schicht, optisches Element und optische Anordnung
SE2450915A1 (en) * 2024-09-17 2025-11-11 Mercene Coatings Ab Method for laminating a substrate comprising acrylate groups on a surface

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4233130A (en) * 1973-03-22 1980-11-11 Union Carbide Corporation Ink and coating compositions and method
TW322613B (en) * 1997-03-10 1997-12-11 guang-long Lin Continuous method of implementing solder bump on semiconductor wafer electrode
SK5642001A3 (en) * 1998-10-28 2001-09-11 Ciba Sc Holding Ag Method for producing adhesive surface coatings
SE9904080D0 (sv) * 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
DE19953433A1 (de) * 1999-11-06 2001-05-10 Michael Bauer Verfahren zur Herstellung haftfester, strukturierbarer Metallbeschichtungen
US7112351B2 (en) * 2002-02-26 2006-09-26 Sion Power Corporation Methods and apparatus for vacuum thin film deposition
JP2005175321A (ja) * 2003-12-12 2005-06-30 Hitachi Ltd エッチングレジスト前駆体組成物及びそれを用いた配線基板の製造方法、並びに配線基板

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