JP2008516889A5 - - Google Patents

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Publication number
JP2008516889A5
JP2008516889A5 JP2007538024A JP2007538024A JP2008516889A5 JP 2008516889 A5 JP2008516889 A5 JP 2008516889A5 JP 2007538024 A JP2007538024 A JP 2007538024A JP 2007538024 A JP2007538024 A JP 2007538024A JP 2008516889 A5 JP2008516889 A5 JP 2008516889A5
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JP
Japan
Prior art keywords
silylamine
silica particles
treating agent
alkyl
dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2007538024A
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English (en)
Japanese (ja)
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JP2008516889A (ja
JP5032328B2 (ja
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Publication date
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Priority claimed from PCT/US2005/037728 external-priority patent/WO2006045012A2/en
Publication of JP2008516889A publication Critical patent/JP2008516889A/ja
Publication of JP2008516889A5 publication Critical patent/JP2008516889A5/ja
Application granted granted Critical
Publication of JP5032328B2 publication Critical patent/JP5032328B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007538024A 2004-10-20 2005-10-20 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 Expired - Lifetime JP5032328B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US62058904P 2004-10-20 2004-10-20
US60/620,589 2004-10-20
PCT/US2005/037728 WO2006045012A2 (en) 2004-10-20 2005-10-20 Method of preparing hydrophobic silica directly from an aqueous colloidal silica dispersion

Publications (3)

Publication Number Publication Date
JP2008516889A JP2008516889A (ja) 2008-05-22
JP2008516889A5 true JP2008516889A5 (OSRAM) 2008-12-11
JP5032328B2 JP5032328B2 (ja) 2012-09-26

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007538024A Expired - Lifetime JP5032328B2 (ja) 2004-10-20 2005-10-20 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法

Country Status (4)

Country Link
US (1) US7811540B2 (OSRAM)
EP (1) EP1807347B1 (OSRAM)
JP (1) JP5032328B2 (OSRAM)
WO (1) WO2006045012A2 (OSRAM)

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CN106414329B (zh) * 2014-07-24 2020-03-03 电化株式会社 硅石微粉末及其用途
JP6507655B2 (ja) * 2015-01-14 2019-05-08 リコーイメージング株式会社 多孔質膜用塗工液及びその製造方法
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CN106185964B (zh) * 2016-07-20 2018-03-06 福建远翔新材料股份有限公司 一种超级绝热材料用二氧化硅的制备方法
US11091631B2 (en) 2016-11-04 2021-08-17 Cabot Corporation Nanocomposites containing crystalline polyester and organosilica
CN110234483B (zh) * 2017-01-24 2022-01-28 智能材料科技有限公司 具有缺口指示功能的抗损害手套
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JP7044889B2 (ja) 2018-01-25 2022-03-30 キャボット コーポレイション 水性疎水性シリカ分散体
JP7155046B2 (ja) 2019-03-06 2022-10-18 扶桑化学工業株式会社 疎水性シリカ粉末及びトナー樹脂粒子
CN117777543A (zh) * 2020-02-04 2024-03-29 卡博特公司 用于基于液体的增材制造的组合物
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CA3253844A1 (en) 2022-05-27 2023-11-30 Cabot Corporation Aerogel composition for thermal insulation

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