JP2008502012A5 - - Google Patents

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Publication number
JP2008502012A5
JP2008502012A5 JP2007526253A JP2007526253A JP2008502012A5 JP 2008502012 A5 JP2008502012 A5 JP 2008502012A5 JP 2007526253 A JP2007526253 A JP 2007526253A JP 2007526253 A JP2007526253 A JP 2007526253A JP 2008502012 A5 JP2008502012 A5 JP 2008502012A5
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JP
Japan
Prior art keywords
projection objective
optical element
objective according
optical
optical elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007526253A
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English (en)
Japanese (ja)
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JP2008502012A (ja
JP5629050B2 (ja
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Priority claimed from PCT/EP2005/005930 external-priority patent/WO2005121899A1/en
Publication of JP2008502012A publication Critical patent/JP2008502012A/ja
Publication of JP2008502012A5 publication Critical patent/JP2008502012A5/ja
Application granted granted Critical
Publication of JP5629050B2 publication Critical patent/JP5629050B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007526253A 2004-06-10 2005-06-02 マイクロリソグラフィ投影露光装置のための投影対物レンズ Expired - Fee Related JP5629050B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US57852204P 2004-06-10 2004-06-10
US60/578,522 2004-06-10
PCT/EP2005/005930 WO2005121899A1 (en) 2004-06-10 2005-06-02 Projection objective for a microlithographic projection exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013127604A Division JP5681236B2 (ja) 2004-06-10 2013-06-18 マイクロリソグラフィ投影露光装置のための投影対物レンズ

Publications (3)

Publication Number Publication Date
JP2008502012A JP2008502012A (ja) 2008-01-24
JP2008502012A5 true JP2008502012A5 (enExample) 2013-08-08
JP5629050B2 JP5629050B2 (ja) 2014-11-19

Family

ID=34970291

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007526253A Expired - Fee Related JP5629050B2 (ja) 2004-06-10 2005-06-02 マイクロリソグラフィ投影露光装置のための投影対物レンズ
JP2013127604A Expired - Fee Related JP5681236B2 (ja) 2004-06-10 2013-06-18 マイクロリソグラフィ投影露光装置のための投影対物レンズ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013127604A Expired - Fee Related JP5681236B2 (ja) 2004-06-10 2013-06-18 マイクロリソグラフィ投影露光装置のための投影対物レンズ

Country Status (6)

Country Link
US (6) US8064041B2 (enExample)
EP (1) EP1754110B1 (enExample)
JP (2) JP5629050B2 (enExample)
KR (2) KR101500052B1 (enExample)
DE (1) DE602005008591D1 (enExample)
WO (1) WO2005121899A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5629050B2 (ja) 2004-06-10 2014-11-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置のための投影対物レンズ
EP1746463A2 (de) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
JP5174810B2 (ja) 2006-06-16 2013-04-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の投影対物器械
US9715214B2 (en) 2010-09-24 2017-07-25 The Arizona Board Of Regents On Behalf Of The University Of Arizona Confocal rainbow volume holographic imaging system
US9436158B2 (en) * 2011-10-21 2016-09-06 The Arizona Board Of Regents On Behalf Of The University Of Arizona Volume holographic imaging system (VHIS) endoscope
DE102012112773B4 (de) 2012-12-20 2020-04-30 Jenoptik Optical Systems Gmbh Verfahren zur Herstellung einer wellenfrontkorrigierten optischen Anordnung aus mindestens zwei optischen Elementen und Verwendung des Verfahrens
JP6360825B2 (ja) * 2013-04-03 2018-07-18 オリンパス株式会社 結像光学系、照明装置および観察装置
CN107076974A (zh) * 2014-10-03 2017-08-18 奥林巴斯株式会社 光轴方向扫描型显微镜装置

Family Cites Families (38)

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Publication number Priority date Publication date Assignee Title
FI81898C (fi) * 1988-06-23 1990-12-10 Partek Ab Anordning foer rullning av isolermaterialskikt.
US5117255A (en) 1990-09-19 1992-05-26 Nikon Corporation Projection exposure apparatus
US5148314A (en) 1991-06-06 1992-09-15 Chen Chungte W Optical systems employing refractive and diffractive optical elements to correct for chromatic aberration
US5592259A (en) 1991-08-09 1997-01-07 Nikon Corporation Photomask, an exposure method and a projection exposure apparatus
US5392119A (en) 1993-07-13 1995-02-21 Litel Instruments Plate correction of imaging systems
JP3341269B2 (ja) 1993-12-22 2002-11-05 株式会社ニコン 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法
US6333776B1 (en) 1994-03-29 2001-12-25 Nikon Corporation Projection exposure apparatus
JP3893626B2 (ja) 1995-01-25 2007-03-14 株式会社ニコン 投影光学装置の調整方法、投影光学装置、露光装置及び露光方法
US6545746B1 (en) * 1996-03-04 2003-04-08 Nikon Corporation Projection exposure apparatus
EP0824721B1 (en) 1996-03-07 2000-07-26 Koninklijke Philips Electronics N.V. Imaging system and apparatus for ultraviolet lithography
US6157498A (en) 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
DE19639586A1 (de) 1996-09-26 1998-04-02 Zeiss Carl Fa Katadioptrisches Mikrolithographie-Reduktionsobjektiv
JP4192279B2 (ja) 1996-09-27 2008-12-10 株式会社ニコン 投影光学系の製造方法、該製造方法によって製造された投影光学系、投影露光装置および方法、並びに半導体装置の製造方法
US6522386B1 (en) 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
JPH1145842A (ja) 1997-07-24 1999-02-16 Nikon Corp 投影露光装置と露光方法、該露光装置の調整方法、及び回路デバイス製造方法
JP2000091209A (ja) 1998-09-14 2000-03-31 Nikon Corp 露光装置の製造方法、露光装置、及びデバイス製造方法
US6396067B1 (en) 1998-05-06 2002-05-28 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
DE19827603A1 (de) 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
US6867922B1 (en) * 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
JP4717974B2 (ja) 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
US6366389B1 (en) 1999-08-17 2002-04-02 Michael Wraback High contrast, ultrafast optically-addressed ultraviolet light modulator based upon optical anisotropy
JP2001168000A (ja) * 1999-12-03 2001-06-22 Nikon Corp 露光装置の製造方法、および該製造方法によって製造された露光装置を用いたマイクロデバイスの製造方法
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
JP2002250865A (ja) 2000-06-14 2002-09-06 Nikon Corp 投影光学系、露光装置、およびそれらの製造方法
JP4245286B2 (ja) 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP4552337B2 (ja) 2000-12-28 2010-09-29 株式会社ニコン 投影光学系の製造方法及び露光装置の製造方法
DE10120446C2 (de) * 2001-04-26 2003-04-17 Zeiss Carl Projektionsbelichtungsanlage sowie Verfahren zur Kompensation von Abbildungsfehlern in einer Projektionsbelichtungsanlage, insbesondere für die Mikro-Lithographie
WO2002093230A1 (en) 2001-05-15 2002-11-21 Industrial Research Limited High etendue optical imaging system
EP1306698A1 (en) 2001-10-26 2003-05-02 Nikon Corporation Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for the same, and EUV optical systems comprising the same
EP1369608A3 (en) 2002-05-23 2005-06-01 Nsk Ltd Linear guide apparatus
JP2005533285A (ja) 2002-07-18 2005-11-04 カール・ツァイス・エスエムティー・アーゲー 反射屈折投影対物レンズ
TWI249082B (en) * 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
DE10258715B4 (de) 2002-12-10 2006-12-21 Carl Zeiss Smt Ag Verfahren zur Herstellung eines optischen Abbildungssystems
SG10201405231YA (en) 2003-05-06 2014-09-26 Nippon Kogaku Kk Projection optical system, exposure apparatus, and exposure method
JP2005064310A (ja) 2003-08-18 2005-03-10 Nikon Corp 光学系の収差調整方法、光学系、露光装置および露光方法
JP5629050B2 (ja) 2004-06-10 2014-11-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置のための投影対物レンズ
EP1746463A2 (de) 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv

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