JP2008286881A5 - - Google Patents
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- Publication number
- JP2008286881A5 JP2008286881A5 JP2007129699A JP2007129699A JP2008286881A5 JP 2008286881 A5 JP2008286881 A5 JP 2008286881A5 JP 2007129699 A JP2007129699 A JP 2007129699A JP 2007129699 A JP2007129699 A JP 2007129699A JP 2008286881 A5 JP2008286881 A5 JP 2008286881A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist stripping
- weight
- stripping composition
- group
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000203 mixture Substances 0.000 claims 9
- 229920002120 photoresistant polymer Polymers 0.000 claims 8
- 150000001412 amines Chemical class 0.000 claims 3
- ISAKRJDGNUQOIC-UHFFFAOYSA-N Uracil Chemical compound O=C1C=CNC(=O)N1 ISAKRJDGNUQOIC-UHFFFAOYSA-N 0.000 claims 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- 239000003495 polar organic solvent Substances 0.000 claims 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- JPIGSMKDJQPHJC-UHFFFAOYSA-N 1-(2-aminoethoxy)ethanol Chemical compound CC(O)OCCN JPIGSMKDJQPHJC-UHFFFAOYSA-N 0.000 claims 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-Amino-2-propanol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 claims 1
- KODLUXHSIZOKTG-UHFFFAOYSA-N 1-aminobutan-2-ol Chemical compound CCC(O)CN KODLUXHSIZOKTG-UHFFFAOYSA-N 0.000 claims 1
- XXJWXESWEXIICW-UHFFFAOYSA-N 2-(2-Ethoxyethoxy)ethanol Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 claims 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-Methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 claims 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N 3-aminopropanol Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 claims 1
- SHVCSCWHWMSGTE-UHFFFAOYSA-N 6-methyluracil Chemical compound CC1=CC(=O)NC(=O)N1 SHVCSCWHWMSGTE-UHFFFAOYSA-N 0.000 claims 1
- 229910000838 Al alloy Inorganic materials 0.000 claims 1
- 229910000881 Cu alloy Inorganic materials 0.000 claims 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 claims 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 claims 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N DMA Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N Diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims 1
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-Methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 claims 1
- 229960004063 Propylene glycol Drugs 0.000 claims 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N Triethylenetetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims 1
- 229940035893 Uracil Drugs 0.000 claims 1
- HEBKCHPVOIAQTA-SCDXWVJYSA-N Xylitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)CO HEBKCHPVOIAQTA-SCDXWVJYSA-N 0.000 claims 1
- 229960002675 Xylitol Drugs 0.000 claims 1
- 150000003973 alkyl amines Chemical group 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 claims 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 claims 1
- 229960001760 dimethyl sulfoxide Drugs 0.000 claims 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N ethanolamine Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims 1
- 150000002391 heterocyclic compounds Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- SECXISVLQFMRJM-UHFFFAOYSA-N n-methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims 1
- 239000000600 sorbitol Substances 0.000 claims 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 claims 1
- 239000000811 xylitol Substances 0.000 claims 1
- 235000010447 xylitol Nutrition 0.000 claims 1
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007129699A JP4716225B2 (ja) | 2007-05-15 | 2007-05-15 | フォトレジスト剥離剤組成物 |
TW097116444A TWI434150B (zh) | 2007-05-15 | 2008-05-05 | 光阻剝離劑組成物 |
CN2008800160126A CN101681129B (zh) | 2007-05-15 | 2008-05-13 | 光致抗蚀剂剥离剂组合物 |
PCT/JP2008/058750 WO2008140076A1 (ja) | 2007-05-15 | 2008-05-13 | フォトレジスト剥離剤組成物 |
KR1020097024223A KR101420471B1 (ko) | 2007-05-15 | 2008-05-13 | 포토레지스트 박리제조성물 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007129699A JP4716225B2 (ja) | 2007-05-15 | 2007-05-15 | フォトレジスト剥離剤組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008286881A JP2008286881A (ja) | 2008-11-27 |
JP2008286881A5 true JP2008286881A5 (no) | 2011-03-31 |
JP4716225B2 JP4716225B2 (ja) | 2011-07-06 |
Family
ID=40002266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007129699A Active JP4716225B2 (ja) | 2007-05-15 | 2007-05-15 | フォトレジスト剥離剤組成物 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4716225B2 (no) |
KR (1) | KR101420471B1 (no) |
CN (1) | CN101681129B (no) |
TW (1) | TWI434150B (no) |
WO (1) | WO2008140076A1 (no) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102124414B (zh) * | 2009-04-17 | 2014-04-02 | 长瀬化成株式会社 | 光致抗蚀剂剥离剂组合物以及光致抗蚀剂剥离方法 |
CN102639686B (zh) * | 2009-07-29 | 2014-09-03 | 东友Fine-Chem股份有限公司 | 清洁组成物及使用该组成物清洁面板的方法 |
JP5023128B2 (ja) * | 2009-10-07 | 2012-09-12 | 東京エレクトロン株式会社 | 塗布現像装置及び塗布現像方法 |
JP5709075B2 (ja) * | 2010-09-10 | 2015-04-30 | ナガセケムテックス株式会社 | リン酸及び/又はリン酸塩の水溶液のパーティクル数経時安定化方法及びレジスト残渣剥離剤組成物 |
KR101089211B1 (ko) * | 2010-12-02 | 2011-12-02 | 엘티씨 (주) | 1차 알칸올 아민을 포함하는 lcd 제조용 포토레지스트 박리액 조성물 |
JP5885046B1 (ja) * | 2015-03-24 | 2016-03-15 | パナソニックIpマネジメント株式会社 | レジスト剥離液 |
CN106547177A (zh) * | 2015-09-16 | 2017-03-29 | 东友精细化工有限公司 | 抗蚀剂剥离液组合物、平板显示器基板及其制造方法 |
JPWO2017065153A1 (ja) * | 2015-10-13 | 2018-07-26 | ナガセケムテックス株式会社 | フォトレジスト剥離液 |
WO2018061064A1 (ja) * | 2016-09-30 | 2018-04-05 | パナソニックIpマネジメント株式会社 | レジスト剥離液 |
KR20210024187A (ko) | 2018-07-20 | 2021-03-04 | 엔테그리스, 아이엔씨. | 부식 억제제를 갖는 세정 조성물 |
JP7247038B2 (ja) | 2019-07-02 | 2023-03-28 | 株式会社カネカ | 被覆導体およびその製造方法 |
KR102334425B1 (ko) * | 2019-11-21 | 2021-12-01 | 엘티씨 (주) | 디스플레이 제조용 포토레지스트 박리액 조성물 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08262746A (ja) * | 1995-03-28 | 1996-10-11 | Mitsubishi Gas Chem Co Inc | フォトレジスト剥離剤組成物および剥離方法 |
JP2001350276A (ja) * | 2000-06-05 | 2001-12-21 | Nagase Kasei Kogyo Kk | フォトレジスト剥離剤組成物及びその使用方法 |
JP4692799B2 (ja) * | 2001-05-22 | 2011-06-01 | ナガセケムテックス株式会社 | レジスト剥離用組成物 |
JP2004287288A (ja) * | 2003-03-24 | 2004-10-14 | Nagase Chemtex Corp | レジスト剥離用組成物及びレジスト剥離方法 |
JP4628209B2 (ja) * | 2004-11-18 | 2011-02-09 | 花王株式会社 | 剥離剤組成物 |
JP4692497B2 (ja) * | 2007-02-28 | 2011-06-01 | ナガセケムテックス株式会社 | フォトレジスト剥離剤組成物 |
-
2007
- 2007-05-15 JP JP2007129699A patent/JP4716225B2/ja active Active
-
2008
- 2008-05-05 TW TW097116444A patent/TWI434150B/zh active
- 2008-05-13 WO PCT/JP2008/058750 patent/WO2008140076A1/ja active Application Filing
- 2008-05-13 KR KR1020097024223A patent/KR101420471B1/ko active IP Right Grant
- 2008-05-13 CN CN2008800160126A patent/CN101681129B/zh active Active
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