JP2008270571A - 照明光学装置、引き回し光学系、露光装置及びデバイス製造方法 - Google Patents

照明光学装置、引き回し光学系、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP2008270571A
JP2008270571A JP2007112299A JP2007112299A JP2008270571A JP 2008270571 A JP2008270571 A JP 2008270571A JP 2007112299 A JP2007112299 A JP 2007112299A JP 2007112299 A JP2007112299 A JP 2007112299A JP 2008270571 A JP2008270571 A JP 2008270571A
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JP
Japan
Prior art keywords
optical system
illumination
light source
light beam
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007112299A
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English (en)
Japanese (ja)
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JP2008270571A5 (enExample
Inventor
Hiromi Suda
広美 須田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007112299A priority Critical patent/JP2008270571A/ja
Priority to US12/061,854 priority patent/US8436980B2/en
Priority to TW097113680A priority patent/TW200907603A/zh
Priority to KR1020080035405A priority patent/KR101009076B1/ko
Publication of JP2008270571A publication Critical patent/JP2008270571A/ja
Publication of JP2008270571A5 publication Critical patent/JP2008270571A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2007112299A 2007-04-20 2007-04-20 照明光学装置、引き回し光学系、露光装置及びデバイス製造方法 Pending JP2008270571A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007112299A JP2008270571A (ja) 2007-04-20 2007-04-20 照明光学装置、引き回し光学系、露光装置及びデバイス製造方法
US12/061,854 US8436980B2 (en) 2007-04-20 2008-04-03 Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method
TW097113680A TW200907603A (en) 2007-04-20 2008-04-15 Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method
KR1020080035405A KR101009076B1 (ko) 2007-04-20 2008-04-17 조명광학장치, 릴레이 광학계, 노광장치 및 디바이스제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007112299A JP2008270571A (ja) 2007-04-20 2007-04-20 照明光学装置、引き回し光学系、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2008270571A true JP2008270571A (ja) 2008-11-06
JP2008270571A5 JP2008270571A5 (enExample) 2010-06-03

Family

ID=39871911

Family Applications (1)

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JP2007112299A Pending JP2008270571A (ja) 2007-04-20 2007-04-20 照明光学装置、引き回し光学系、露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US8436980B2 (enExample)
JP (1) JP2008270571A (enExample)
KR (1) KR101009076B1 (enExample)
TW (1) TW200907603A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014511574A (ja) * 2011-02-28 2014-05-15 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101961893B1 (ko) * 2012-02-21 2019-03-26 삼성디스플레이 주식회사 노광기 및 노광기 제어 방법

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6380243A (ja) * 1986-09-24 1988-04-11 Nikon Corp 露光装置用照明光学装置
JPH096009A (ja) * 1995-06-23 1997-01-10 Nikon Corp 露光装置
JPH0933852A (ja) * 1995-07-19 1997-02-07 Nikon Corp 照明装置および該装置を備えた投影露光装置
JPH10153866A (ja) * 1996-11-22 1998-06-09 Nikon Corp 照明装置および該照明装置を備えた露光装置
JPH1187236A (ja) * 1997-09-09 1999-03-30 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2005150541A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2005150542A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2005203760A (ja) * 2003-12-18 2005-07-28 Nikon Corp 照明光学装置、露光装置、および露光方法
JP2007085876A (ja) * 2005-09-22 2007-04-05 Nikon Corp 干渉計装置、露光装置、およびデバイスの製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120358A (enExample) * 1974-03-04 1975-09-20
US4318594A (en) * 1977-02-15 1982-03-09 Canon Kabushiki Kaisha Beam shaping optical system
JP2569711B2 (ja) * 1988-04-07 1997-01-08 株式会社ニコン 露光制御装置及び該装置による露光方法
US5986744A (en) * 1995-02-17 1999-11-16 Nikon Corporation Projection optical system, illumination apparatus, and exposure apparatus
US5724122A (en) * 1995-05-24 1998-03-03 Svg Lithography Systems, Inc. Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
JPH10209028A (ja) * 1997-01-16 1998-08-07 Nikon Corp 照明光学装置及び半導体素子の製造方法
US6727981B2 (en) * 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
TW546699B (en) * 2000-02-25 2003-08-11 Nikon Corp Exposure apparatus and exposure method capable of controlling illumination distribution
US6842293B1 (en) * 2002-04-13 2005-01-11 Yusong Yin Beam expander
JP2004354909A (ja) * 2003-05-30 2004-12-16 Orc Mfg Co Ltd 投影露光装置および投影露光方法
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6380243A (ja) * 1986-09-24 1988-04-11 Nikon Corp 露光装置用照明光学装置
JPH096009A (ja) * 1995-06-23 1997-01-10 Nikon Corp 露光装置
JPH0933852A (ja) * 1995-07-19 1997-02-07 Nikon Corp 照明装置および該装置を備えた投影露光装置
JPH10153866A (ja) * 1996-11-22 1998-06-09 Nikon Corp 照明装置および該照明装置を備えた露光装置
JPH1187236A (ja) * 1997-09-09 1999-03-30 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2005150541A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2005150542A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2005203760A (ja) * 2003-12-18 2005-07-28 Nikon Corp 照明光学装置、露光装置、および露光方法
JP2007085876A (ja) * 2005-09-22 2007-04-05 Nikon Corp 干渉計装置、露光装置、およびデバイスの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014511574A (ja) * 2011-02-28 2014-05-15 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
US9280055B2 (en) 2011-02-28 2016-03-08 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus

Also Published As

Publication number Publication date
KR20080094579A (ko) 2008-10-23
US20080259450A1 (en) 2008-10-23
TW200907603A (en) 2009-02-16
KR101009076B1 (ko) 2011-01-18
US8436980B2 (en) 2013-05-07

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