TW200907603A - Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method - Google Patents

Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method Download PDF

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Publication number
TW200907603A
TW200907603A TW097113680A TW97113680A TW200907603A TW 200907603 A TW200907603 A TW 200907603A TW 097113680 A TW097113680 A TW 097113680A TW 97113680 A TW97113680 A TW 97113680A TW 200907603 A TW200907603 A TW 200907603A
Authority
TW
Taiwan
Prior art keywords
optical system
illumination
light source
light
disposed
Prior art date
Application number
TW097113680A
Other languages
English (en)
Chinese (zh)
Inventor
Hiromi Suda
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200907603A publication Critical patent/TW200907603A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
TW097113680A 2007-04-20 2008-04-15 Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method TW200907603A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007112299A JP2008270571A (ja) 2007-04-20 2007-04-20 照明光学装置、引き回し光学系、露光装置及びデバイス製造方法

Publications (1)

Publication Number Publication Date
TW200907603A true TW200907603A (en) 2009-02-16

Family

ID=39871911

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097113680A TW200907603A (en) 2007-04-20 2008-04-15 Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method

Country Status (4)

Country Link
US (1) US8436980B2 (enExample)
JP (1) JP2008270571A (enExample)
KR (1) KR101009076B1 (enExample)
TW (1) TW200907603A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101758958B1 (ko) * 2011-02-28 2017-07-17 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 노광 장치의 조명 시스템
KR101961893B1 (ko) * 2012-02-21 2019-03-26 삼성디스플레이 주식회사 노광기 및 노광기 제어 방법

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120358A (enExample) * 1974-03-04 1975-09-20
US4318594A (en) * 1977-02-15 1982-03-09 Canon Kabushiki Kaisha Beam shaping optical system
JPH07104563B2 (ja) * 1986-09-24 1995-11-13 株式会社ニコン 露光装置用照明光学装置
JP2569711B2 (ja) * 1988-04-07 1997-01-08 株式会社ニコン 露光制御装置及び該装置による露光方法
US5986744A (en) * 1995-02-17 1999-11-16 Nikon Corporation Projection optical system, illumination apparatus, and exposure apparatus
JPH0933852A (ja) * 1995-07-19 1997-02-07 Nikon Corp 照明装置および該装置を備えた投影露光装置
US5724122A (en) * 1995-05-24 1998-03-03 Svg Lithography Systems, Inc. Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
JP3491212B2 (ja) * 1995-06-23 2004-01-26 株式会社ニコン 露光装置、照明光学装置、照明光学系の設計方法及び露光方法
JPH10153866A (ja) * 1996-11-22 1998-06-09 Nikon Corp 照明装置および該照明装置を備えた露光装置
JPH10209028A (ja) * 1997-01-16 1998-08-07 Nikon Corp 照明光学装置及び半導体素子の製造方法
JPH1187236A (ja) * 1997-09-09 1999-03-30 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
US6727981B2 (en) * 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
TW546699B (en) * 2000-02-25 2003-08-11 Nikon Corp Exposure apparatus and exposure method capable of controlling illumination distribution
US6842293B1 (en) * 2002-04-13 2005-01-11 Yusong Yin Beam expander
JP2004354909A (ja) * 2003-05-30 2004-12-16 Orc Mfg Co Ltd 投影露光装置および投影露光方法
JP2005150542A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2005150541A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2005203760A (ja) * 2003-12-18 2005-07-28 Nikon Corp 照明光学装置、露光装置、および露光方法
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography
JP2007085876A (ja) * 2005-09-22 2007-04-05 Nikon Corp 干渉計装置、露光装置、およびデバイスの製造方法

Also Published As

Publication number Publication date
KR20080094579A (ko) 2008-10-23
US20080259450A1 (en) 2008-10-23
KR101009076B1 (ko) 2011-01-18
US8436980B2 (en) 2013-05-07
JP2008270571A (ja) 2008-11-06

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