KR101009076B1 - 조명광학장치, 릴레이 광학계, 노광장치 및 디바이스제조방법 - Google Patents

조명광학장치, 릴레이 광학계, 노광장치 및 디바이스제조방법 Download PDF

Info

Publication number
KR101009076B1
KR101009076B1 KR1020080035405A KR20080035405A KR101009076B1 KR 101009076 B1 KR101009076 B1 KR 101009076B1 KR 1020080035405 A KR1020080035405 A KR 1020080035405A KR 20080035405 A KR20080035405 A KR 20080035405A KR 101009076 B1 KR101009076 B1 KR 101009076B1
Authority
KR
South Korea
Prior art keywords
optical system
illumination
light source
light beam
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020080035405A
Other languages
English (en)
Korean (ko)
Other versions
KR20080094579A (ko
Inventor
히로미 스다
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20080094579A publication Critical patent/KR20080094579A/ko
Application granted granted Critical
Publication of KR101009076B1 publication Critical patent/KR101009076B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
KR1020080035405A 2007-04-20 2008-04-17 조명광학장치, 릴레이 광학계, 노광장치 및 디바이스제조방법 Expired - Fee Related KR101009076B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007112299A JP2008270571A (ja) 2007-04-20 2007-04-20 照明光学装置、引き回し光学系、露光装置及びデバイス製造方法
JPJP-P-2007-00112299 2007-04-20

Publications (2)

Publication Number Publication Date
KR20080094579A KR20080094579A (ko) 2008-10-23
KR101009076B1 true KR101009076B1 (ko) 2011-01-18

Family

ID=39871911

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080035405A Expired - Fee Related KR101009076B1 (ko) 2007-04-20 2008-04-17 조명광학장치, 릴레이 광학계, 노광장치 및 디바이스제조방법

Country Status (4)

Country Link
US (1) US8436980B2 (enExample)
JP (1) JP2008270571A (enExample)
KR (1) KR101009076B1 (enExample)
TW (1) TW200907603A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5787382B2 (ja) 2011-02-28 2015-09-30 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
KR101961893B1 (ko) * 2012-02-21 2019-03-26 삼성디스플레이 주식회사 노광기 및 노광기 제어 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH097941A (ja) * 1995-05-24 1997-01-10 Svg Lithography Syst Inc ホトリソグラフィ用の照明装置
KR20040104396A (ko) * 2003-05-30 2004-12-10 가부시키가이샤 오크세이사쿠쇼 투영 노광장치 및 투영 노광방법
JP2005203760A (ja) 2003-12-18 2005-07-28 Nikon Corp 照明光学装置、露光装置、および露光方法
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120358A (enExample) * 1974-03-04 1975-09-20
US4318594A (en) * 1977-02-15 1982-03-09 Canon Kabushiki Kaisha Beam shaping optical system
JPH07104563B2 (ja) * 1986-09-24 1995-11-13 株式会社ニコン 露光装置用照明光学装置
JP2569711B2 (ja) * 1988-04-07 1997-01-08 株式会社ニコン 露光制御装置及び該装置による露光方法
US5986744A (en) * 1995-02-17 1999-11-16 Nikon Corporation Projection optical system, illumination apparatus, and exposure apparatus
JPH0933852A (ja) * 1995-07-19 1997-02-07 Nikon Corp 照明装置および該装置を備えた投影露光装置
JP3491212B2 (ja) * 1995-06-23 2004-01-26 株式会社ニコン 露光装置、照明光学装置、照明光学系の設計方法及び露光方法
JPH10153866A (ja) * 1996-11-22 1998-06-09 Nikon Corp 照明装置および該照明装置を備えた露光装置
JPH10209028A (ja) * 1997-01-16 1998-08-07 Nikon Corp 照明光学装置及び半導体素子の製造方法
JPH1187236A (ja) * 1997-09-09 1999-03-30 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
US6727981B2 (en) * 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
KR20010085493A (ko) * 2000-02-25 2001-09-07 시마무라 기로 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법
US6842293B1 (en) * 2002-04-13 2005-01-11 Yusong Yin Beam expander
JP2005150542A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2005150541A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2007085876A (ja) * 2005-09-22 2007-04-05 Nikon Corp 干渉計装置、露光装置、およびデバイスの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH097941A (ja) * 1995-05-24 1997-01-10 Svg Lithography Syst Inc ホトリソグラフィ用の照明装置
KR20040104396A (ko) * 2003-05-30 2004-12-10 가부시키가이샤 오크세이사쿠쇼 투영 노광장치 및 투영 노광방법
JP2005203760A (ja) 2003-12-18 2005-07-28 Nikon Corp 照明光学装置、露光装置、および露光方法
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography

Also Published As

Publication number Publication date
US8436980B2 (en) 2013-05-07
TW200907603A (en) 2009-02-16
US20080259450A1 (en) 2008-10-23
JP2008270571A (ja) 2008-11-06
KR20080094579A (ko) 2008-10-23

Similar Documents

Publication Publication Date Title
US6259512B1 (en) Illumination system and exposure apparatus having the same
JP5500454B2 (ja) オプティカルインテグレータ、照明光学装置、露光装置、露光方法、およびデバイス製造方法
US6903801B2 (en) Illumination optical system for use in projection exposure apparatus
US6762823B2 (en) Illumination system and scanning exposure apparatus using the same
KR100585461B1 (ko) 마이크로리소그래피 투영장치
KR20040101089A (ko) 투영광학계, 노광장치 및 디바이스의 제조방법
KR20080056094A (ko) 노광 장치 및 디바이스 제조 방법
US6999157B2 (en) Illumination optical system and method, and exposure apparatus
JP2006222222A (ja) 投影光学系及びそれを有する露光装置
KR100823405B1 (ko) 노광장치 및 디바이스 제조 방법
US7489387B2 (en) Exposure apparatus and device fabrication method
JP4337067B2 (ja) ズーム光学系および該ズーム光学系を備えた露光装置および露光方法
KR20080049673A (ko) 노광장치 및 디바이스의 제조방법
JPWO2009022506A1 (ja) 照明光学装置、露光装置、およびデバイス製造方法
US7236239B2 (en) Illumination system and exposure apparatus
KR20020046932A (ko) 콘덴서 광학계, 및 그 광학계를 구비한 조명 광학 장치그리고 노광 장치
KR101009076B1 (ko) 조명광학장치, 릴레이 광학계, 노광장치 및 디바이스제조방법
US7518707B2 (en) Exposure apparatus
JP3984950B2 (ja) 照明光学系及びそれを有する露光装置
US11762298B2 (en) Exposure apparatus and method of manufacturing article
JP2006119490A (ja) 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
US6753943B2 (en) Scanning exposure apparatus and device manufacturing method using the same
JP7646402B2 (ja) 照明光学系、露光装置、および物品の製造方法
US20020097758A1 (en) Projection exposure apparatus and device manufacturing method using the same
KR20220115051A (ko) 조명 광학계, 노광장치 및 물품의 제조방법

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20131226

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20141226

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20151224

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20161227

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20171226

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

FPAY Annual fee payment

Payment date: 20200103

Year of fee payment: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20210112

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20210112