JP2008185672A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2008185672A5 JP2008185672A5 JP2007017498A JP2007017498A JP2008185672A5 JP 2008185672 A5 JP2008185672 A5 JP 2008185672A5 JP 2007017498 A JP2007017498 A JP 2007017498A JP 2007017498 A JP2007017498 A JP 2007017498A JP 2008185672 A5 JP2008185672 A5 JP 2008185672A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- cured film
- siloxane composition
- carbon atoms
- polysiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 polysiloxane Polymers 0.000 claims 7
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 5
- 125000004432 carbon atom Chemical group C* 0.000 claims 4
- 229920001296 polysiloxane Polymers 0.000 claims 4
- 125000000962 organic group Chemical group 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 229910000077 silane Inorganic materials 0.000 claims 2
- 206010034972 Photosensitivity reaction Diseases 0.000 claims 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000008065 acid anhydrides Chemical class 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 229940125904 compound 1 Drugs 0.000 claims 1
- 229940126214 compound 3 Drugs 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 239000011162 core material Substances 0.000 claims 1
- 125000005462 imide group Chemical group 0.000 claims 1
- 239000011229 interlayer Substances 0.000 claims 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 230000036211 photosensitivity Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000002834 transmittance Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007017498A JP4967687B2 (ja) | 2007-01-29 | 2007-01-29 | 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007017498A JP4967687B2 (ja) | 2007-01-29 | 2007-01-29 | 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008185672A JP2008185672A (ja) | 2008-08-14 |
| JP2008185672A5 true JP2008185672A5 (https=) | 2010-03-11 |
| JP4967687B2 JP4967687B2 (ja) | 2012-07-04 |
Family
ID=39728789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007017498A Expired - Fee Related JP4967687B2 (ja) | 2007-01-29 | 2007-01-29 | 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4967687B2 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101542394B (zh) * | 2006-11-30 | 2012-10-31 | 东丽株式会社 | 感光性硅氧烷组合物、由其形成的固化膜及具有固化膜的元件 |
| TW200927794A (en) * | 2007-10-26 | 2009-07-01 | Toagosei Co Ltd | Curing type composition containing alkoxysilane condensation compound |
| TWI521300B (zh) * | 2008-11-18 | 2016-02-11 | Sumitomo Chemical Co | Photosensitive resin composition and display device |
| JP5210201B2 (ja) * | 2009-02-24 | 2013-06-12 | 東京応化工業株式会社 | 感光性樹脂組成物、ドライフィルム、及びパターン形成方法 |
| JP5803635B2 (ja) * | 2011-12-07 | 2015-11-04 | Jsr株式会社 | ポジ型感放射線性組成物、硬化膜、硬化膜の形成方法 |
| US20220177651A1 (en) * | 2019-03-08 | 2022-06-09 | Merck Patent Gmbh | Crosslinkable siloxane compounds for the preparation of dielectric materials |
| TWI875833B (zh) * | 2019-10-10 | 2025-03-11 | 德商馬克專利公司 | 使用可交聯矽氧烷化合物之正型光阻調配物 |
| CN112028923B (zh) * | 2020-08-21 | 2023-08-22 | 齐齐哈尔大学 | 硅氧烷3-邻苯二甲酰亚胺丙基三乙氧基硅烷及制备方法 |
| CN120380424A (zh) * | 2023-01-30 | 2025-07-25 | 东丽株式会社 | 感光性组合物、固化物、显示装置及固化物的制造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0346663A (ja) * | 1989-07-14 | 1991-02-27 | Fuji Photo Film Co Ltd | 感光性組成物 |
| WO1999019771A1 (en) * | 1997-10-13 | 1999-04-22 | Pi R & D Co., Ltd. | Positive photosensitive polyimide composition |
| JP4466855B2 (ja) * | 2005-03-23 | 2010-05-26 | 信越化学工業株式会社 | ポジ型レジスト組成物 |
| CN101542394B (zh) * | 2006-11-30 | 2012-10-31 | 东丽株式会社 | 感光性硅氧烷组合物、由其形成的固化膜及具有固化膜的元件 |
-
2007
- 2007-01-29 JP JP2007017498A patent/JP4967687B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2008185672A5 (https=) | ||
| JP6610643B2 (ja) | ポリイミド前駆体樹脂組成物 | |
| US8389649B2 (en) | Siloxane-based resin composition | |
| KR100821069B1 (ko) | 무용제형 폴리이미드 실리콘계 수지 조성물 및 이를사용한 수지 피막 | |
| KR101682006B1 (ko) | 감광성 수지 조성물 | |
| US9080077B2 (en) | Methods for fabricating flexible waveguides using alkyl-functional silsesquioxane resins | |
| KR20100039454A (ko) | 감광성 수지 조성물 | |
| WO2010047248A1 (ja) | ポジ型感光性組成物及び永久レジスト | |
| JP2011145659A5 (https=) | ||
| JPWO2009113459A1 (ja) | 感光性ポリオルガノシロキサン組成物 | |
| WO2008102890A1 (ja) | 感光性樹脂組成物、硬化膜、保護膜、絶縁膜およびそれを用いた半導体装置、表示体装置 | |
| JP2020097722A (ja) | 接着促進剤 | |
| KR20130045172A (ko) | 포지티브형 감광성 조성물 | |
| JP2006269402A (ja) | 絶縁材料形成用組成物および絶縁膜 | |
| KR101810836B1 (ko) | 실리콘 함유 폴리아믹산 전구체 화합물, 이로부터 제조된 폴리아믹산 및 유무기 하이브리드 폴리이미드 필름 | |
| KR20160064780A (ko) | 감광성 수지 조성물 및 이로부터 제조된 경화막 | |
| US8828640B2 (en) | Photo-curing polysiloxane composition and application thereof | |
| JP2011150276A (ja) | ポジティブ型感光性組成物 | |
| JP2015113429A (ja) | ポリイミド前駆体樹脂組成物 | |
| JP2007046008A5 (https=) | ||
| JP2008116785A5 (https=) | ||
| JP2674415B2 (ja) | 感光性樹脂組成物及び電子部品用保護膜 | |
| CN101907828B (zh) | 放射线敏感性组合物、保护膜、层间绝缘膜以及它们的形成方法 | |
| TWI833329B (zh) | 塗覆膜、塗覆組成物以及顯示元件 | |
| US5573886A (en) | Photosensitive resin composition comprising a polyimide precursor and method for making a polyimide film pattern from the same |