JP2008022009A5 - - Google Patents
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- Publication number
- JP2008022009A5 JP2008022009A5 JP2007182659A JP2007182659A JP2008022009A5 JP 2008022009 A5 JP2008022009 A5 JP 2008022009A5 JP 2007182659 A JP2007182659 A JP 2007182659A JP 2007182659 A JP2007182659 A JP 2007182659A JP 2008022009 A5 JP2008022009 A5 JP 2008022009A5
- Authority
- JP
- Japan
- Prior art keywords
- memory cell
- line
- word line
- arrangement interval
- ground selection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004888 barrier function Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060065040A KR100777348B1 (ko) | 2006-07-11 | 2006-07-11 | 비휘발성 기억 장치의 셀 어레이 구조 및 그 형성방법 |
| US11/729,169 US8045383B2 (en) | 2006-07-11 | 2007-03-28 | Non-volatile memory devices including dummy word lines and related structures and methods |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008022009A JP2008022009A (ja) | 2008-01-31 |
| JP2008022009A5 true JP2008022009A5 (enExample) | 2010-08-19 |
Family
ID=38830888
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007182659A Pending JP2008022009A (ja) | 2006-07-11 | 2007-07-11 | 不揮発性メモリー素子及びその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2008022009A (enExample) |
| DE (1) | DE102007031278B4 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8692310B2 (en) | 2009-02-09 | 2014-04-08 | Spansion Llc | Gate fringing effect based channel formation for semiconductor device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04212472A (ja) * | 1990-07-13 | 1992-08-04 | Toshiba Corp | 不揮発性半導体記憶装置の製造方法 |
| JP3808569B2 (ja) * | 1996-11-14 | 2006-08-16 | 三星電子株式会社 | 不揮発性メモリ装置 |
| JP4005895B2 (ja) * | 2002-09-30 | 2007-11-14 | 株式会社東芝 | 不揮発性半導体メモリ装置 |
| JP2004241558A (ja) * | 2003-02-05 | 2004-08-26 | Toshiba Corp | 不揮発性半導体記憶装置及びその製造方法、半導体集積回路及び不揮発性半導体記憶装置システム |
| DE102005058601A1 (de) * | 2004-12-27 | 2006-07-06 | Hynix Semiconductor Inc., Icheon | Flash-Speicherbauelement |
-
2007
- 2007-07-05 DE DE102007031278A patent/DE102007031278B4/de active Active
- 2007-07-11 JP JP2007182659A patent/JP2008022009A/ja active Pending
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