JP2008014849A5 - - Google Patents

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Publication number
JP2008014849A5
JP2008014849A5 JP2006187351A JP2006187351A JP2008014849A5 JP 2008014849 A5 JP2008014849 A5 JP 2008014849A5 JP 2006187351 A JP2006187351 A JP 2006187351A JP 2006187351 A JP2006187351 A JP 2006187351A JP 2008014849 A5 JP2008014849 A5 JP 2008014849A5
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JP
Japan
Prior art keywords
defect
digital data
foreign matter
inspection
electrical signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006187351A
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English (en)
Japanese (ja)
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JP2008014849A (ja
JP4875936B2 (ja
Filing date
Publication date
Priority claimed from JP2006187351A external-priority patent/JP4875936B2/ja
Priority to JP2006187351A priority Critical patent/JP4875936B2/ja
Application filed filed Critical
Priority to US11/822,330 priority patent/US7456948B2/en
Publication of JP2008014849A publication Critical patent/JP2008014849A/ja
Priority to US12/266,079 priority patent/US7619729B2/en
Publication of JP2008014849A5 publication Critical patent/JP2008014849A5/ja
Priority to US12/574,185 priority patent/US8094298B2/en
Publication of JP4875936B2 publication Critical patent/JP4875936B2/ja
Application granted granted Critical
Priority to US13/743,245 priority patent/USRE44840E1/en
Priority to US13/743,315 priority patent/USRE44977E1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006187351A 2006-07-07 2006-07-07 異物・欠陥検出方法および異物・欠陥検査装置 Expired - Fee Related JP4875936B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006187351A JP4875936B2 (ja) 2006-07-07 2006-07-07 異物・欠陥検出方法および異物・欠陥検査装置
US11/822,330 US7456948B2 (en) 2006-07-07 2007-07-05 Method for detecting particles and defects and inspection equipment thereof
US12/266,079 US7619729B2 (en) 2006-07-07 2008-11-06 Method for detecting particles and defects and inspection equipment thereof
US12/574,185 US8094298B2 (en) 2006-07-07 2009-10-06 Method for detecting particles and defects and inspection equipment thereof
US13/743,315 USRE44977E1 (en) 2006-07-07 2013-01-16 Method for detecting particles and defects and inspection equipment thereof
US13/743,245 USRE44840E1 (en) 2006-07-07 2013-01-16 Method for detecting particles and defects and inspection equipment thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006187351A JP4875936B2 (ja) 2006-07-07 2006-07-07 異物・欠陥検出方法および異物・欠陥検査装置

Publications (3)

Publication Number Publication Date
JP2008014849A JP2008014849A (ja) 2008-01-24
JP2008014849A5 true JP2008014849A5 (enExample) 2009-02-19
JP4875936B2 JP4875936B2 (ja) 2012-02-15

Family

ID=38918830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006187351A Expired - Fee Related JP4875936B2 (ja) 2006-07-07 2006-07-07 異物・欠陥検出方法および異物・欠陥検査装置

Country Status (2)

Country Link
US (5) US7456948B2 (enExample)
JP (1) JP4875936B2 (enExample)

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JP2012137350A (ja) * 2010-12-27 2012-07-19 Hitachi High-Technologies Corp 欠陥検査方法および欠陥検査装置
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CN102642155B (zh) * 2012-05-02 2013-12-11 哈尔滨工业大学 一种基于图像辅助的微小零件回转调心方法
JP5686394B1 (ja) * 2014-04-11 2015-03-18 レーザーテック株式会社 ペリクル検査装置
CN107407552B (zh) * 2015-03-06 2019-11-12 株式会社富士 识别装置及识别方法
CN105203383B (zh) * 2015-09-08 2018-08-28 西宁特殊钢股份有限公司 一种简单可行的发蓝断口检验方法
DE102020102419A1 (de) * 2020-01-31 2021-08-05 Carl Zeiss Microscopy Gmbh Partikelanalyse mit Lichtmikroskop und Mehrpixelpolarisationsfilter
US11544838B2 (en) * 2020-03-21 2023-01-03 Kla Corporation Systems and methods of high-resolution review for semiconductor inspection in backend and wafer level packaging
DE102021205001B4 (de) * 2021-05-18 2023-07-27 Carl Zeiss Microscopy Gmbh Verfahren zum Positionieren von Objekten in einem Teilchenstrahlmikroskop mithilfe einer flexiblen Teilchenstrahlschranke sowie Computerprogrammprodukt
KR102804207B1 (ko) * 2022-10-04 2025-05-09 세메스 주식회사 기판 검사 장치 및 방법

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