ATE489619T1 - Verfahren zur abbildung der strahlung eines objekts auf einer detektorvorrichtung und inspektionsvorrichtung zur inspektion eines objekts - Google Patents

Verfahren zur abbildung der strahlung eines objekts auf einer detektorvorrichtung und inspektionsvorrichtung zur inspektion eines objekts

Info

Publication number
ATE489619T1
ATE489619T1 AT08723915T AT08723915T ATE489619T1 AT E489619 T1 ATE489619 T1 AT E489619T1 AT 08723915 T AT08723915 T AT 08723915T AT 08723915 T AT08723915 T AT 08723915T AT E489619 T1 ATE489619 T1 AT E489619T1
Authority
AT
Austria
Prior art keywords
radiation
imaging
inspecting
inspection device
detector device
Prior art date
Application number
AT08723915T
Other languages
English (en)
Inventor
Robert Snel
Arno Jan Bleeker
Brug Hedser Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Application granted granted Critical
Publication of ATE489619T1 publication Critical patent/ATE489619T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT08723915T 2007-03-23 2008-03-21 Verfahren zur abbildung der strahlung eines objekts auf einer detektorvorrichtung und inspektionsvorrichtung zur inspektion eines objekts ATE489619T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/727,165 US7697128B2 (en) 2007-03-23 2007-03-23 Method of imaging radiation from an object on a detection device and an inspection device for inspecting an object
PCT/NL2008/050164 WO2008118012A1 (en) 2007-03-23 2008-03-21 A method of imaging radiation from an object on a detection device and an inspection device for inspecting an object

Publications (1)

Publication Number Publication Date
ATE489619T1 true ATE489619T1 (de) 2010-12-15

Family

ID=39512780

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08723915T ATE489619T1 (de) 2007-03-23 2008-03-21 Verfahren zur abbildung der strahlung eines objekts auf einer detektorvorrichtung und inspektionsvorrichtung zur inspektion eines objekts

Country Status (9)

Country Link
US (1) US7697128B2 (de)
EP (1) EP2130030B1 (de)
JP (1) JP4966382B2 (de)
KR (1) KR101155067B1 (de)
CN (1) CN101641588A (de)
AT (1) ATE489619T1 (de)
DE (1) DE602008003681D1 (de)
TW (1) TWI438423B (de)
WO (1) WO2008118012A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7697128B2 (en) * 2007-03-23 2010-04-13 Asml Netherlands B.V. Method of imaging radiation from an object on a detection device and an inspection device for inspecting an object
TWI421485B (zh) * 2008-12-30 2014-01-01 Ind Tech Res Inst 量測液體中懸浮顆粒沉澱特性的系統及方法
US9122178B2 (en) * 2009-08-04 2015-09-01 Asml Netherlands B.V. Object inspection systems and methods
NL2004949A (en) 2009-08-21 2011-02-22 Asml Netherlands Bv Inspection method and apparatus.
KR20140061544A (ko) * 2011-09-16 2014-05-21 에이에스엠엘 네델란즈 비.브이. 리소그래피 패터닝 디바이스를 모니터링하는 장치
CN102507596B (zh) * 2011-11-18 2014-04-02 中国工程物理研究院激光聚变研究中心 一种基于激光束主动扫描的光学元件表面疵病检测系统
KR101277698B1 (ko) 2012-02-22 2013-06-21 한국과학기술연구원 마스크 패턴 검사용 광선 자동차단 영상 획득 시스템 및 그 방법
CN102645437A (zh) * 2012-04-11 2012-08-22 法国圣戈班玻璃公司 光学测量装置和光学测量方法
US8736831B2 (en) * 2012-05-15 2014-05-27 Kla-Tencor Corp. Substrate inspection
DE102012022966A1 (de) * 2012-11-21 2014-05-22 Friedrich-Schiller-Universität Jena Verfahren zur Auswertung von durch schmalbandige, kurzwellige, kohärente Laserstrahlung erzeugten Streubildern von Objektiven, insbesondere zur Verwendung in der XUV-Mikroskopie
KR101991418B1 (ko) 2014-06-10 2019-06-20 에이에스엠엘 네델란즈 비.브이. 컴퓨터를 이용한 웨이퍼 검사
GB2543753B (en) * 2015-10-21 2020-07-29 Smiths Heimann Sas Vehicle cabin inspection system and method
EP3279736A1 (de) 2016-08-01 2018-02-07 ASML Netherlands B.V. Vorrichtung und verfahren zur verarbeitung eines kohärenten strahlenbündels
US10845470B2 (en) 2016-11-16 2020-11-24 Waymo Llc Methods and systems for protecting a light detection and ranging (LIDAR) device
WO2019238363A1 (en) 2018-06-13 2019-12-19 Asml Netherlands B.V. Metrology apparatus
US11314164B2 (en) 2019-12-31 2022-04-26 Taiwan Semiconductor Manufacturing Company Ltd. Structure and method of reticle pod having inspection window
US11366307B2 (en) 2020-08-27 2022-06-21 Kla Corporation Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection
EP4239111A4 (de) * 2020-10-28 2024-07-17 Kwansei Gakuin Educational Foundation Verfahren zur bewertung von siliciumcarbidsubstraten

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Publication number Priority date Publication date Assignee Title
JPH0587527A (ja) * 1991-09-27 1993-04-06 Canon Inc 光ヘテロダイン干渉計測方法及び計測装置
JPH08152430A (ja) * 1994-11-29 1996-06-11 Seiko Instr Inc 位置合わせ機能付き顕微鏡
US6104481A (en) 1997-11-11 2000-08-15 Kabushiki Kaisha Topcon Surface inspection apparatus
US6621570B1 (en) 1999-03-04 2003-09-16 Inspex Incorporated Method and apparatus for inspecting a patterned semiconductor wafer
US6879391B1 (en) 1999-05-26 2005-04-12 Kla-Tencor Technologies Particle detection method and apparatus
US6853446B1 (en) 1999-08-16 2005-02-08 Applied Materials, Inc. Variable angle illumination wafer inspection system
KR100416660B1 (ko) 2001-12-20 2004-01-31 동부전자 주식회사 노광시스템의 페리클 검사장치
AU2002367044A1 (en) * 2002-01-17 2003-07-30 Koninklijke Philips Electronics N.V. A camera with a delayed shutter release function
CN1771456A (zh) * 2002-09-30 2006-05-10 应用材料以色列股份有限公司 用于光学检测的照射系统
JP2006162500A (ja) * 2004-12-09 2006-06-22 Hitachi High-Technologies Corp 欠陥検査装置
US7697128B2 (en) * 2007-03-23 2010-04-13 Asml Netherlands B.V. Method of imaging radiation from an object on a detection device and an inspection device for inspecting an object

Also Published As

Publication number Publication date
KR101155067B1 (ko) 2012-06-11
JP4966382B2 (ja) 2012-07-04
EP2130030B1 (de) 2010-11-24
WO2008118012A1 (en) 2008-10-02
TWI438423B (zh) 2014-05-21
EP2130030A1 (de) 2009-12-09
TW200846651A (en) 2008-12-01
JP2010522351A (ja) 2010-07-01
KR20090127937A (ko) 2009-12-14
CN101641588A (zh) 2010-02-03
US20080230695A1 (en) 2008-09-25
US7697128B2 (en) 2010-04-13
DE602008003681D1 (de) 2011-01-05

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