JP2008010823A - 半導体パッケージ及びその製造方法 - Google Patents
半導体パッケージ及びその製造方法 Download PDFInfo
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- JP2008010823A JP2008010823A JP2007031207A JP2007031207A JP2008010823A JP 2008010823 A JP2008010823 A JP 2008010823A JP 2007031207 A JP2007031207 A JP 2007031207A JP 2007031207 A JP2007031207 A JP 2007031207A JP 2008010823 A JP2008010823 A JP 2008010823A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 186
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 239000010410 layer Substances 0.000 claims description 74
- 238000000034 method Methods 0.000 claims description 22
- 239000011241 protective layer Substances 0.000 claims description 17
- 239000003990 capacitor Substances 0.000 claims description 16
- 230000000149 penetrating effect Effects 0.000 claims description 7
- 230000001681 protective effect Effects 0.000 claims description 7
- 229910000679 solder Inorganic materials 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims 1
- 238000009413 insulation Methods 0.000 abstract 3
- 230000005764 inhibitory process Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000414 obstructive effect Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
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Abstract
【解決手段】半導体パッケージ300は、ベース基板200と、ベース基板200上に第1面がベース基板200と向き合うように配置され第1面付近の内部に回路部112が具備された半導体チップ110と、半導体チップ110の第1面とは反対側の第2面上に形成された絶縁層120と、絶縁層120上に形成された受動素子130と、絶縁層120内に貫通し、受動素子130と連結されたビアパターン140と、半導体チップ110内に貫通するように形成され、回路部112と連結されると共にビアパターン140及びベース基板200と連結されたビア配線152と、ベース基板200の半導体チップ110が配置された面とは反対側の面に付着された外部接続端子250を含む。
【選択図】図1
Description
前記受動素子は、抵抗、インダクター及びキャパシターを含む。
前記外部接続端子ははんだボールである。
前記受動素子は、抵抗、インダクター及びキャパシターを含む。
前記半導体パッケージの製造方法は、前記第4ステップの後、そして、第5ステップの前、前記絶縁層、ビアパターン、受動素子、ビア配線及び半導体チップを含んだ半導体チップユニットを少なくとも2つ以上積層する第7ステップをさらに含み、前記第7ステップはウェハレベルで遂行する。
前記外部接続端子ははんだボールで形成する。
110 半導体チップ
112 回路部
114 連結配線
120 絶縁層
126 保護層
130 受動素子
140 ビアパターン
148 ホール
152 ビア配線
200 ベース基板
250 外部接続端子
300,400 半導体パッケージ
Claims (20)
- ベース基板と、
前記ベース基板上に第1面が前記ベース基板と向き合うように配置され、第1面付近の内部に回路部が具備された半導体チップと、
前記半導体チップの第1面とは反対側の第2面上に形成された絶縁層と、
前記絶縁層上に形成された受動素子と、
前記絶縁層内に貫通するように形成され、前記受動素子と連結されたビアパターンと、
前記半導体チップ内に貫通するように形成され、回路部と連結されると共にビアパターン及びベース基板と連結されたビア配線と、
前記ベース基板の前記半導体チップが配置された面とは反対側の面に付着された外部接続端子と、
を含むことを特徴とする半導体パッケージ。 - 前記絶縁層、前記受動素子及び前記ビアパターンは複層で形成されたことを特徴とする請求項1に記載の半導体パッケージ。
- 前記受動素子は、抵抗、インダクター及びキャパシターの少なくともいずれか1つを含むことを特徴とする請求項1に記載の半導体パッケージ。
- 前記絶縁層上に受動素子を保護するように形成された保護層をさらに含むことを特徴とする請求項1に記載の半導体パッケージ。
- 前記保護層はビアパターンを露出させるホールが具備されたことを特徴とする請求項4に記載の半導体パッケージ。
- 前記ビア配線は半導体チップの第1面から突出されるように形成されたことを特徴とする請求項1に記載の半導体パッケージ。
- 前記半導体チップ、絶縁層、ビアパターン及びビア配線を含んだ半導体チップユニットが少なくとも2つ以上積層されたことを特徴とする請求項1に記載の半導体パッケージ。
- 前記積層された半導体チップユニットは下部半導体チップユニットのビアパターンと上部半導体チップユニットのビア配線間接触により相互間に電気的連結が成されることを特徴とする請求項7に記載の半導体パッケージ。
- 前記外部接続端子ははんだボールであることを特徴とする請求項1に記載の半導体パッケージ。
- 第1面に回路部が形成された半導体チップの前記第1面とは反対側の第2面上に絶縁層を形成する第1ステップと、
前記絶縁層上に受動素子を形成すると共に前記絶縁層内に前記受動素子と連結され前記絶縁層を貫通するビアパターンを形成する第2ステップと、
前記半導体チップ内に、貫通し、前記ビアパターンと連結されるビア配線を形成する第3ステップと、
前記第2面上に受動素子及び絶縁層が形成された半導体チップを前記ベース基板上に前記半導体チップの第1面が向き合うように実装する第4ステップと、及び
前記ベース基板の前記半導体チップが付着された面とは反対側の面に外部接続端子を付着する第5ステップと、
を含むことを特徴とする半導体パッケージの製造方法。 - 前記絶縁層を形成するステップは前記半導体チップの第1面上に保護膜を形成した状態で遂行することを特徴とする請求項10に記載の半導体パッケージの製造方法。
- 前記第1ステップ〜第3ステップは少なくとも2回以上繰り返し遂行することを特徴とする請求項10に記載の半導体パッケージの製造方法。
- 前記第1ステップ〜第3ステップはウェハレベルで遂行することを特徴とする請求項10に記載の半導体パッケージの製造方法。
- 前記受動素子は、抵抗、インダクタンス及びキャパシターの少なくともいずれか1つを含むことを特徴とする請求項10に記載の半導体パッケージの製造方法。
- 前記第3ステップの後、そして、第4ステップの前、前記受動素子及びビアパターンが形成された絶縁層上に保護層を形成する第6ステップをさらに含むことを特徴とする請求項10に記載の半導体パッケージの製造方法。
- 前記保護層は前記ビアパターンを露出させるホールを具備するように形成することを特徴とする請求項15に記載の半導体パッケージの製造方法。
- 前記第4ステップの後、そして、第5ステップの前、
前記絶縁層、ビアパターン、受動素子、ビア配線及び半導体チップを含んだ半導体チップユニットを少なくとも2つ以上積層する第7ステップをさらに含むことを特徴とする請求項10に記載の半導体パッケージの製造方法。 - 前記第7ステップはウェハレベルで遂行することを特徴とする請求項17に記載の半導体パッケージの製造方法。
- 前記第7ステップはビアパターン及びビア配線により半導体チップユニット間電気的連結が成されるように遂行することを特徴とする請求項17に記載の半導体パッケージの製造方法。
- 前記外部接続端子ははんだボールで形成することを特徴とする請求項10に記載の半導体パッケージの製造方法。
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US7989895B2 (en) * | 2006-11-15 | 2011-08-02 | Avx Corporation | Integration using package stacking with multi-layer organic substrates |
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US7648911B2 (en) * | 2008-05-27 | 2010-01-19 | Stats Chippac, Ltd. | Semiconductor device and method of forming embedded passive circuit elements interconnected to through hole vias |
US8263437B2 (en) | 2008-09-05 | 2012-09-11 | STATS ChiPAC, Ltd. | Semiconductor device and method of forming an IPD over a high-resistivity encapsulant separated from other IPDS and baseband circuit |
US7858441B2 (en) | 2008-12-08 | 2010-12-28 | Stats Chippac, Ltd. | Semiconductor package with semiconductor core structure and method of forming same |
TWI581384B (zh) * | 2009-12-07 | 2017-05-01 | 英特希爾美國公司 | 堆疊式電子電感封裝組件及其製造技術 |
US8987830B2 (en) | 2010-01-12 | 2015-03-24 | Marvell World Trade Ltd. | Attaching passive components to a semiconductor package |
FR2961345A1 (fr) * | 2010-06-10 | 2011-12-16 | St Microelectronics Tours Sas | Circuit integre passif |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0267752A (ja) * | 1988-09-01 | 1990-03-07 | Nec Corp | 半導体装置 |
JPH0888319A (ja) * | 1994-09-16 | 1996-04-02 | Toshiba Corp | 半導体集積回路 |
JP2001060664A (ja) * | 1999-08-23 | 2001-03-06 | Mitsubishi Electric Corp | 半導体装置 |
JP2002057037A (ja) * | 2000-08-09 | 2002-02-22 | Fuji Electric Co Ltd | 複合集積回路およびその製造方法 |
JP2002184933A (ja) * | 2000-12-15 | 2002-06-28 | Mitsubishi Electric Corp | 半導体装置 |
JP2005032763A (ja) * | 2003-07-07 | 2005-02-03 | Seiko Epson Corp | 半導体装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004186422A (ja) * | 2002-12-03 | 2004-07-02 | Shinko Electric Ind Co Ltd | 電子部品実装構造及びその製造方法 |
JP2004221176A (ja) * | 2003-01-10 | 2004-08-05 | Matsushita Electric Ind Co Ltd | 固体電解コンデンサ内蔵配線基板およびその製造方法 |
KR100886292B1 (ko) * | 2003-09-09 | 2009-03-04 | 산요덴키가부시키가이샤 | 회로 소자를 포함하는 반도체 모듈과 반도체 장치, 그들의 제조 방법 및 표시 장치 |
JP4340517B2 (ja) * | 2003-10-30 | 2009-10-07 | Okiセミコンダクタ株式会社 | 半導体装置及びその製造方法 |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0267752A (ja) * | 1988-09-01 | 1990-03-07 | Nec Corp | 半導体装置 |
JPH0888319A (ja) * | 1994-09-16 | 1996-04-02 | Toshiba Corp | 半導体集積回路 |
JP2001060664A (ja) * | 1999-08-23 | 2001-03-06 | Mitsubishi Electric Corp | 半導体装置 |
JP2002057037A (ja) * | 2000-08-09 | 2002-02-22 | Fuji Electric Co Ltd | 複合集積回路およびその製造方法 |
JP2002184933A (ja) * | 2000-12-15 | 2002-06-28 | Mitsubishi Electric Corp | 半導体装置 |
JP2005032763A (ja) * | 2003-07-07 | 2005-02-03 | Seiko Epson Corp | 半導体装置 |
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US20080001285A1 (en) | 2008-01-03 |
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