JP2007538376A - イオン源のための置き換え可能な陽極ライナー - Google Patents

イオン源のための置き換え可能な陽極ライナー Download PDF

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Publication number
JP2007538376A
JP2007538376A JP2007527397A JP2007527397A JP2007538376A JP 2007538376 A JP2007538376 A JP 2007538376A JP 2007527397 A JP2007527397 A JP 2007527397A JP 2007527397 A JP2007527397 A JP 2007527397A JP 2007538376 A JP2007538376 A JP 2007538376A
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JP
Japan
Prior art keywords
anode
liner
ion source
electron
region
Prior art date
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Pending
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JP2007527397A
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English (en)
Japanese (ja)
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JP2007538376A5 (enExample
Inventor
イー エレフソン ロバート
シー フリーズ ルイス
Original Assignee
インフィコン インコーポレイティッド
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Application filed by インフィコン インコーポレイティッド filed Critical インフィコン インコーポレイティッド
Publication of JP2007538376A publication Critical patent/JP2007538376A/ja
Publication of JP2007538376A5 publication Critical patent/JP2007538376A5/ja
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/36Solid anodes; Solid auxiliary anodes for maintaining a discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/20Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/14Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Tubes For Measurement (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2007527397A 2004-05-20 2005-05-18 イオン源のための置き換え可能な陽極ライナー Pending JP2007538376A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/849,765 US7041984B2 (en) 2004-05-20 2004-05-20 Replaceable anode liner for ion source
PCT/US2005/017340 WO2005114701A2 (en) 2004-05-20 2005-05-18 Replaceable anode liner for ion source

Publications (2)

Publication Number Publication Date
JP2007538376A true JP2007538376A (ja) 2007-12-27
JP2007538376A5 JP2007538376A5 (enExample) 2008-07-10

Family

ID=35150670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007527397A Pending JP2007538376A (ja) 2004-05-20 2005-05-18 イオン源のための置き換え可能な陽極ライナー

Country Status (5)

Country Link
US (1) US7041984B2 (enExample)
JP (1) JP2007538376A (enExample)
DE (1) DE112005001120T5 (enExample)
GB (1) GB2434027B (enExample)
WO (1) WO2005114701A2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007157529A (ja) * 2005-12-06 2007-06-21 Ulvac Japan Ltd 四極子形質量分析計用イオン源
JP2014086137A (ja) * 2012-10-19 2014-05-12 Ran Technical Service Kk コールドカソード型イオン源

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090014644A1 (en) * 2007-07-13 2009-01-15 Inficon, Inc. In-situ ion source cleaning for partial pressure analyzers used in process monitoring
US7709790B2 (en) * 2008-04-01 2010-05-04 Thermo Finnigan Llc Removable ion source that does not require venting of the vacuum chamber
US8117987B2 (en) * 2009-09-18 2012-02-21 Applied Materials, Inc. Hot wire chemical vapor deposition (CVD) inline coating tool
JP5856964B2 (ja) * 2009-10-08 2016-02-10 パーキンエルマー・ヘルス・サイエンシーズ・インコーポレイテッドPerkinelmer Health Sciences, Inc. 結合装置
KR101366781B1 (ko) 2012-11-12 2014-02-21 한국표준과학연구원 이온원 및 이를 구비하는 질량분석장치
TWI654695B (zh) 2012-12-06 2019-03-21 英福康公司 真空工具及測量該真空工具的客真空室中的氛圍的方法
TWI539154B (zh) 2012-12-19 2016-06-21 英福康公司 雙重偵測殘餘氣體分析器
GB201810823D0 (en) 2018-06-01 2018-08-15 Micromass Ltd An inner source assembly and associated components
US20250360603A1 (en) * 2024-05-21 2025-11-27 Thermo Finnigan Llc Module installation tools and associated methods

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54139000A (en) * 1978-04-05 1979-10-27 Atomic Energy Authority Uk Improvement of ion source
JPH0855602A (ja) * 1994-08-16 1996-02-27 Jeol Ltd 質量分析装置用イオン源チャンバ
JPH08236065A (ja) * 1994-12-16 1996-09-13 Varian Assoc Inc 質量スペクトロメータリーク検出器のイオンソースの汚染を削減するための手段
JPH09219169A (ja) * 1996-02-09 1997-08-19 Nissin Electric Co Ltd イオン源
JPH1131473A (ja) * 1997-03-21 1999-02-02 Leybold Inficon Inc 質量分光計において分圧の測定を訂正する方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2610165C2 (de) * 1976-03-11 1983-11-10 Gesellschaft für Schwerionenforschung mbH, 6100 Darmstadt Duoplasmatron-Ionenquelle zur Erzeugung mehrfach geladener Ionen
GB9722649D0 (en) * 1997-10-24 1997-12-24 Univ Nanyang Cathode ARC source for metallic and dielectric coatings
US6064156A (en) * 1998-09-14 2000-05-16 The United States Of America As Represented By The Administrator Of Nasa Process for ignition of gaseous electrical discharge between electrodes of a hollow cathode assembly
EP1049133A3 (en) * 1999-04-30 2001-05-16 Applied Materials, Inc. Enhancing adhesion of deposits on exposed surfaces in process chamber
US6765216B2 (en) * 2002-03-04 2004-07-20 Atomic Hydrogen Technologies Ltd. Method and apparatus for producing atomic flows of molecular gases

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54139000A (en) * 1978-04-05 1979-10-27 Atomic Energy Authority Uk Improvement of ion source
JPH0855602A (ja) * 1994-08-16 1996-02-27 Jeol Ltd 質量分析装置用イオン源チャンバ
JPH08236065A (ja) * 1994-12-16 1996-09-13 Varian Assoc Inc 質量スペクトロメータリーク検出器のイオンソースの汚染を削減するための手段
JPH09219169A (ja) * 1996-02-09 1997-08-19 Nissin Electric Co Ltd イオン源
JPH1131473A (ja) * 1997-03-21 1999-02-02 Leybold Inficon Inc 質量分光計において分圧の測定を訂正する方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007157529A (ja) * 2005-12-06 2007-06-21 Ulvac Japan Ltd 四極子形質量分析計用イオン源
JP2014086137A (ja) * 2012-10-19 2014-05-12 Ran Technical Service Kk コールドカソード型イオン源

Also Published As

Publication number Publication date
WO2005114701A2 (en) 2005-12-01
GB0622336D0 (en) 2006-12-20
WO2005114701A3 (en) 2006-10-19
DE112005001120T5 (de) 2007-04-26
US7041984B2 (en) 2006-05-09
US20050258374A1 (en) 2005-11-24
GB2434027B (en) 2010-09-01
GB2434027A (en) 2007-07-11

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