JP2007533856A5 - - Google Patents

Download PDF

Info

Publication number
JP2007533856A5
JP2007533856A5 JP2007508949A JP2007508949A JP2007533856A5 JP 2007533856 A5 JP2007533856 A5 JP 2007533856A5 JP 2007508949 A JP2007508949 A JP 2007508949A JP 2007508949 A JP2007508949 A JP 2007508949A JP 2007533856 A5 JP2007533856 A5 JP 2007533856A5
Authority
JP
Japan
Prior art keywords
layers
substrate
layer
target
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007508949A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007533856A (ja
Filing date
Publication date
Priority claimed from FR0404204A external-priority patent/FR2869324B1/fr
Application filed filed Critical
Publication of JP2007533856A publication Critical patent/JP2007533856A/ja
Publication of JP2007533856A5 publication Critical patent/JP2007533856A5/ja
Pending legal-status Critical Current

Links

JP2007508949A 2004-04-21 2005-04-15 真空蒸着方法 Pending JP2007533856A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0404204A FR2869324B1 (fr) 2004-04-21 2004-04-21 Procede de depot sous vide
PCT/FR2005/050250 WO2005106070A2 (fr) 2004-04-21 2005-04-15 Procede de depot sous vide

Publications (2)

Publication Number Publication Date
JP2007533856A JP2007533856A (ja) 2007-11-22
JP2007533856A5 true JP2007533856A5 (enExample) 2008-05-22

Family

ID=34944951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007508949A Pending JP2007533856A (ja) 2004-04-21 2005-04-15 真空蒸着方法

Country Status (9)

Country Link
US (1) US20090226735A1 (enExample)
EP (1) EP1743048A2 (enExample)
JP (1) JP2007533856A (enExample)
KR (1) KR20070004042A (enExample)
CN (1) CN1950540A (enExample)
AR (1) AR049884A1 (enExample)
FR (1) FR2869324B1 (enExample)
RU (1) RU2006141003A (enExample)
WO (1) WO2005106070A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2950878B1 (fr) 2009-10-01 2011-10-21 Saint Gobain Procede de depot de couche mince
JP2011100111A (ja) * 2009-10-09 2011-05-19 Seiko Epson Corp 光学物品、光学物品の製造方法、電子機器
US8758580B2 (en) * 2010-08-23 2014-06-24 Vaeco Inc. Deposition system with a rotating drum
US9365450B2 (en) * 2012-12-27 2016-06-14 Intermolecular, Inc. Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
US20150364626A1 (en) * 2014-06-11 2015-12-17 Electronics And Telecommunications Research Institute Transparent electrode and solar cell including the same
EP3728685B1 (en) 2017-12-22 2024-04-17 Institute Of Geological And Nuclear Sciences Limited Ion beam sputtering apparatus and method
US10544499B1 (en) * 2018-08-13 2020-01-28 Valeo North America, Inc. Reflector for vehicle lighting
CN112745038B (zh) * 2019-10-30 2022-12-06 传奇视界有限公司 电控变色玻璃制备方法
FR3133057B1 (fr) * 2022-02-25 2024-05-24 Saint Gobain Matériau comprenant un revêtement contrôle solaire

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4250009A (en) * 1979-05-18 1981-02-10 International Business Machines Corporation Energetic particle beam deposition system
AU616736B2 (en) * 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
JPH0626877B2 (ja) * 1988-06-14 1994-04-13 旭硝子株式会社 熱線遮断ガラス
DE3880135T2 (de) * 1988-09-08 1993-09-16 Asahi Glass Co Ltd Zerstaeubungsverfahren mittels eines bandfoermigen plasmaflusses und geraet zur handhabung dieses verfahrens.
DE3834318A1 (de) * 1988-10-08 1990-04-12 Leybold Ag Vorrichtung zum aufbringen dielektrischer oder metallischer werkstoffe
DE3904991A1 (de) * 1989-02-18 1990-08-23 Leybold Ag Kathodenzerstaeubungsvorrichtung
JP2896193B2 (ja) * 1989-07-27 1999-05-31 株式会社東芝 酸化物結晶配向膜の製造方法及び酸化物結晶配向膜並びに光磁気記録媒体
DE4324576C1 (de) * 1993-07-22 1995-01-26 Ver Glaswerke Gmbh Verfahren zur Herstellung einer mit einer Mehrfachschicht versehenen Glasscheibe
US6416880B1 (en) * 1993-12-09 2002-07-09 Seagate Technology, Llc Amorphous permalloy films and method of preparing the same
JPH08127869A (ja) * 1994-10-27 1996-05-21 Japan Aviation Electron Ind Ltd イオンビームスパッタリング装置
JP4370650B2 (ja) * 1998-12-28 2009-11-25 旭硝子株式会社 積層体およびその製造方法
DE69935166T2 (de) * 1998-12-28 2007-10-31 Asahi Glass Co., Ltd. Schichtprodukt
US6214183B1 (en) * 1999-01-30 2001-04-10 Advanced Ion Technology, Inc. Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials

Similar Documents

Publication Publication Date Title
KR20080032132A (ko) 스크래치 방지 코팅의 증착 방법
KR101947861B1 (ko) 성막 방법 및 성막 장치
US11655347B2 (en) Organic-inorganic hybrid membrane
KR20120092619A (ko) 기판 코팅 방법 및 코팅 장치
US20140120315A1 (en) Flexible multilayer hermetic laminate
JP4434949B2 (ja) 薄い、安定した、フッ素ドープ処理シリカ層を得る方法、得られた薄い層、およびこれらの眼科光学における応用
WO2015097898A1 (ja) 多層反射防止膜の成膜方法
JP2007533856A5 (enExample)
JP2020060657A (ja) 反射防止ガラス
KR20080059248A (ko) 기판 처리 방법
WO2008007180A1 (en) Glass with scratch-resistant coating
JP2009075325A (ja) 反射防止フィルム
KR101245324B1 (ko) 알루미늄 코팅 강판 및 그 제조 방법
WO2015087534A1 (en) Optical multilayer coating, optical lens, and method of manufacturing optical multilayer coating
JP2007533856A (ja) 真空蒸着方法
KR102520744B1 (ko) 적층체
TWI615494B (zh) 鍍製光學硬膜之封閉式高能磁控濺鍍裝置及其製造方法
JP5506275B2 (ja) 熱線遮蔽フィルム
US20140272290A1 (en) Polymer Anti-glare Coatings and Methods for Forming the Same
JP7594760B2 (ja) 光学薄膜の製造方法
JPS63205609A (ja) 熱線反射膜
JP2011131574A (ja) 高耐久性低放射積層体
JP7479905B2 (ja) 反射材およびその製造方法
JP2024075826A (ja) 透明導電性膜の製造方法、及び透明導電性フィルムの製造方法
JP2005342976A (ja) バリア性積層体及びそれを用いたディスプレイ用部材並びにディスプレイ