JP2007530487A - レチノイドと組み合せたhdacインヒビターを含む組成物 - Google Patents
レチノイドと組み合せたhdacインヒビターを含む組成物 Download PDFInfo
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- JP2007530487A JP2007530487A JP2007504354A JP2007504354A JP2007530487A JP 2007530487 A JP2007530487 A JP 2007530487A JP 2007504354 A JP2007504354 A JP 2007504354A JP 2007504354 A JP2007504354 A JP 2007504354A JP 2007530487 A JP2007530487 A JP 2007530487A
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- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
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Abstract
Description
−マークス(Marks),P.A.,Richon,V.M.,Breslow,R.,Rifkind,R.A.,新規癌治療薬としてのヒストンデアセチラーゼインヒビター(Histone deacetylase inhibitors as new cancer drugs),Current Opinion in Oncology,2001,13,477−483頁;
−Jung,M.,新規抗癌剤としてのヒストンデアセチラーゼのインヒビター(Inhibitors of histone deacetylase as new anticancer agents),Current Medicinal Chemistry,2001,8,1505−1511頁;
−Vigushin,D.M.,Coombes,R.C.,癌治療におけるヒストンデアセチラーゼインヒビター(Histone deacetylase inhibitors in cancer treatment),Anti−Cancer Drugs,2002,13,1−13頁;
−Remiszewski,S.W.,小分子ヒストンデアセチラーゼインヒビターの発見における最近の進歩(Recent advances in the discovery of small molecule histone deacetylase inhibitors),Current Opinion in Drug Discovery & Development,2002,5,487−499頁;
−Meinke,P.T.,Liberator,P.,ヒストンデアセチラーゼ:増殖抑制薬および抗原虫薬の標的(Histone Deacetylase: A target for antiproliferative and antiprotozoal agents),Current Medicinal Chemistry,2001,8,211−235頁;
−Marks,P.A.,Rifkind,R.A.,Richon,V.M.,Breslow,R.,Miller,T.,Kelly,W.K.,ヒストンデアセチラーゼおよび癌:原因および治療法(Histone Deacetylase and Cancer: Causes and Therapies),Nature Reviews Cancer,2001,1,194−202頁;
−Marks,P.A.,Richon,V.M.,Rifkind,R.A.,ヒストンデアセチラーゼインヒビター:形質転換細胞の分化またはアポトーシスのインデューサー(Histone deacetylase inhibitors: inducer of differentiation or apoptosis of transformed cells),J.Nat.Cancer Inst.,2000,92,1210−1216頁
−Jung,M.,ヒストンデアセチラーゼ,癌化学療法の標的:転写因子および他の核タンパク質(Histone Deacetylases, Targets for Cancer Chemotherapy: Transcription Factors and Other Nuclear Proteins)(編集:La Thangue,N.B.,Bandara,L.B.),2002,123−144頁;
−De Ruijter,A.J.M.,van Gennip,A.H.,Caron,H.N.,Kemp,S.,van Kuilenburg,A.B.P.,ヒストンデアセチラーゼ(HDAC):古典的HDACファミリーの特性決定(Histone Deacetylases (HDACs): Characterization of the classical HDAC family),Biochemical Journal,2003,370,737−749頁;
−Kelly,W.K.,O’Connor,O.,Marks,P.A.,ヒストンデアセチラーゼインヒビター:標的から臨床治験まで(Histone deacetylase inhibitors: from target to clinical trials),Expert Opin.Investig.Drugs,2002,11,1695−1713頁。
−Curtin,M.,新規ヒドロキサマートおよび非ヒドロキサマートヒストンデアセチラーゼインヒビターの合成(Synthesis of novel hydroxamate and non−hydroxamate histone deacetylase inhibitors),Curr.Opinion in Drug Discovery & Development,2004,7(6),848−868頁。
−Monneret,C.,ヒストンデアセチラーゼインヒビター(Histone Deacetylase Inhibitors),Eur.J.Med.Chem.,2005,40,1−13頁。
−Suzuki,T.,Nagano,Y.,Kouketru,A.,Matsumura,A.,Marayama,S.,Kurotaki,M.,Nakagawa,H.,Miyata,N.,ヒト、ヒストンデアセチラーゼの新規インヒビター:SAHAベースの非ヒドロキサマートのデザイン、合成、酵素阻害、および癌細胞増殖インヒビター(Novel Inhibitors of Human, Histone Deacetylase: Design, Synthesis, Enzyme Inhibition, and cancer cell growth inhibitors of SAHA−based non−hydroxamates),J.Med.Chem.,2005,48,1019−1032頁。
(式中Rは、水素、またはC1〜C30炭化水素、好ましくはC1〜C20炭化水素である。好ましくはRは、水素、C1〜C20アルキル、C2〜C20アルケニル、C6〜C20アリール、C7〜C20アルキルアリール、C7〜C20アリールアルキル、C8〜C20アルキルアリールアルキル、C8〜C20アルケニルアリール、C8〜C20アリールアルケニル、C9〜C20アルケニルアリールアルキル、C9〜C20アルキルアリールアルケニル、C10〜C20アルケニルアリールアルケニルであり、上記好ましい各残基は、未置換であってもよく、C1〜C6アルキルまたはC2〜C6アルケニルで置換されていてもよく、
nは、1〜5の整数である)
を有する。
(R1は、−OEt、−NH2、または−OHであり、R2は、−H、−NHCH2Ph、−CH(CH3)2でありR3はHまたは−NHCH2Phである)
を有する分子が特に好ましい。
(Rは、−CH2CH2CH3、−CH2Ph、−CH2(CH2)2Phであり、mは、0または1であり、nは、0である)を有する分子が特に好ましい。バルプロ酸の誘導体は全て、好ましくない。
R=OMeまたはHであり、n=5である分子が、特に適する。
を有する分子は、特に有用である。好ましい実施形態では、m=1〜3およびn=2を有するシクロヘキサン誘導体は、本発明による最も適するHDACインヒビターである。
(式中Xは、CORを表し、ここでRは、平均1〜20個、好ましくは1〜10個の炭素原子を有する、分岐したまたは分岐していない、アルキル基、アリール基、アルキルアリール基またはアルケニル基から選択され、平均約15個(パルミチル残基)の炭素原子も特に好ましい)のレチノールのエステル類もまたレチノールの好ましい誘導体である。上式は、レチノール誘導体の全ての立体異性体、特に1つまたは複数のC=C二重結合がシスである化合物を含むと理解すべきである。
(式中R6およびR7は互いに独立して、水素またはヒドロキシであるか、またはR6およびR7は一緒に酸素原子を形成し、
R8およびR9は、水素であるか、またはR8およびR9一緒に酸素原子を形成し、
R10は、水素、ヒドロキシまたは残基OR11であるが、ただしR8およびR9が一緒に酸素を形成するとき、R10はヒドロキシではない。
R11は、C1〜C20アルキル(好ましくはC1〜C6アルキル)、C2〜C20アルケニル(好ましくはC2〜C6アルケニル)またはC7〜C10アルキルアリール(好ましくはフェニル−(C1〜C4)−アルキル)残基−C(O)−R12であり、
R12は、C1〜C20アルキル(好ましくはC1〜C6アルキル)またはC2〜C20アルケニル(好ましくはC2〜C6アルケニルである))
を有する。
酢酸レチニル
フェニル酪酸レチニル
プロピオン酸レチニル
オクタン酸レチニル
ラウリン酸レチニル
パルミチン酸レチニル
オレイン酸レチニル
リノール酸レチニル
アルキル炭酸レチニル
レチンオキシトリメチルシラン
オールトランス−レチナール
メトキシPEG−12レチンアミド。
鉱油類およびミネラルワックス類;
油類たとえばカプリニック酸またはカプリル酸のトリグリセリド類およびヒマシ油等;
油類またはワックス類および他の天然または合成の油類、好ましい実施形態では、脂肪酸とアルコール類たとえばイソプロパノール、プロピレングリコール、グリセリンとのエステル類または脂肪アルコール類とカルボン酸または脂肪酸とのエステル類;
安息香酸アルキル類;および/または
シリコーンオイル類たとえばジメチルポリシロキサン、ジエチルポリシロキサン、ジフェニルポリシロキサン、シクロメチコンおよびそれらの混合物。
アクリレート類たとえば2−エチルヘキシル2−シアノ−3,3−ジフェニルアクリレート(オクトクリレン、パーソル(PARSOL)(登録商標)340)、エチル2−シアノ−3,3−ジフェニルアクリレート等;
−−−ショウノウ誘導体たとえば4−メチルベンジリデンショウノウ(パーソル(PARSOL)(登録商標)5000)、3−ベンジリデンショウノウ、ショウノウベンザルコニウムメトサルフェート、ポリアクリルアミドメチルベンジリデンショウノウ、スルホベンジリデンショウノウ、スルホメチルベンジリデンショウノウ、テレフタリデンジショウノウスルホン酸等々;
−−−ケイヒ酸誘導体たとえばオクチルメトキシケイ皮酸(パーソル(PARSOL)(登録商標)MCX)、エトキシエチルメトキシケイ皮酸、ジエタノールアミンメトキシケイ皮酸(パーソル(PARSOL)(登録商標)ヒドロ(Hydro))、イソアミルメトキシケイ皮酸等々ならびにシロキサン類に結合したケイ皮酸誘導体;
−−−p−アミノ安息香酸誘導体、たとえばp−アミノ安息香酸、2−エチルヘキシルp−ジメチルアミノ安息香酸、N−オキシプロピレン化エチルp−アミノ安息香酸、グリセリルp−アミノ安息香酸、
−−−ベンゾフェノン類たとえばベンゾフェノン−3、ベンゾフェノン−4、2,2’,4,4’−テトラヒドロキシ−ベンゾフェノン、2,2’−ジヒドロキシ−4,4’−ジメトキシベンゾフェノン等々;
−−−ベンザルマロン酸のエステル類たとえばジ−(2−エチルヘキシル)4−メトキシマロン酸ベンザル等;
−−−2−(4−エトキシ−アニリノメチレン)プロパン二酸のエステル類たとえば欧州特許公報EP 0895 776号明細書に記載の2−(4−エトキシアニリノメチレン)プロパン二酸ジエチルエステル等;
−−−欧州特許公報欧州特許第0358584 B1号明細書、欧州特許第0538431 B1号明細書および欧州特許出願公開第0709080 A1号明細書に記載のベンズマロネート基を含むオルガノシロキサン化合物;
−−−ドロメトリゾールトリシロキサン(メキソリル(Mexoryl)XL);
−−−顔料たとえば微粒子化TiO2、等々。用語「微粒子化」は、約5nm〜約200nm、特に約15nm〜約100nmの粒径を指す。該TiO2粒子はまた、金属酸化物たとえば酸化アルミニウムまたは酸化ジルコニウム等で被覆されていてもよく、または有機コーティングたとえばポリオール類、メチコン、ステアリン酸アルミニウム、アルキルシラン等で、被覆されていてもよい。このようなコーティングは、当該技術分野で周知である。
−−−イミダゾール誘導体たとえば2−フェニルベンズイミダゾールスルホン酸およびその塩類(パーソル(PARSOL)(登録商標)HS)。2−フェニルベンズイミダゾールスルホン酸の塩類は、たとえばアルカリ塩類たとえばナトリウム−またはカリウム塩類、アンモニウム塩類、モルホリン塩類、モノエタノールアミン塩、ジエタノールアミン塩等々のような第一級、第二級および第三級アミンの塩類。
−−−サリチレート誘導体たとえばサリチル酸イソプロピルベンジル、サリチル酸ベンジル、サリチル酸ブチル、サリチル酸オクチル(ネオヘリオパン(NEO HELIOPAN)OS)、サリチル酸イソオクチルまたはサリチル酸ホモメンチル(ホモサラート、ヘリオパン(HELIOPAN))等。
−−−トリアジン誘導体たとえばオクチルトリアゾン(ユビヌル(UVINUL)T−150)、ジオクチルブタミドトリアゾン(ユバソーブ(UVASORB)HEB)、ビスエトキシフェノールメトキシフェニルトリアジン(チノソーブ(TINOSORB)S)等。
−−−カプセル封入された紫外線フィルターたとえばカプセル封入されたオクチルメトキシケイ皮酸(ユーソレクス(Eusolex)紫外線−パール)等。
−−−ジベンゾイルメタン誘導体たとえば4−tert.ブチル−4’−メトキシジベンゾイル−メタン(パーソル(PARSOL)(登録商標)1789)、ジメトキシジベンゾイルメタン、イソプロピルジベンゾイルメタン等である;
−−−ベンゾトリアゾール誘導体たとえば2,2’−メチレン−ビス−(6−(2H−ベンゾトリアゾール−2−イル)−4−(1,1,3,3,−テトラメチルブチル)−フェノール(チノソーブ(TINOSORB)M)等;
−−−フェニレン−1,4−ビス−ベンズイミダゾールスルホン酸または塩類たとえば2,2−(1,4−フェニレン)ビス−(1H−ベンズイミダゾール−4,6−ジスルホン酸)(ネオヘリパン(Neoheliopan)AP);
−−−アミノ置換ヒドロキシベンゾフェノンたとえば欧州特許公報EP1046391号明細書に記載の2−(4−ジエチルアミノ−2−ヒドロキシ−ベンゾイル)−安息香酸ヘキシルエステル;
−−−顔料たとえば微粒子化ZnOまたはTiO2等。用語「微粒子化」は、約5nm〜約200nm、特に約15nm〜約100nmの粒径を指す。該TiO2粒子はまた、金属酸化物たとえば酸化アルミニウムまたは酸化ジルコニウム等で被覆されていてもよく、または有機コーティングたとえばポリオール類、メチコン、ステアリン酸アルミニウム、アルキルシラン等で、被覆されていてもよい。かかるコーティングは、当該技術分野で周知である。
−−−欧州特許公開EP−A 0 514 491号明細書およびEP−A 0 780 119号明細書に記載の3,3−ジフェニルアクリレート誘導体;
−−−米国特許第5,605,680号明細書に記載のベンジリデンショウノウ誘導体;
−−−欧州特許公報EP−A 0 358 584号明細書、EP−A 0538431号明細書およびEP−A 0709080号明細書に記載のベンズマロネート基を含有するオルガノシロキサン類;
で安定化したパーソル(PARSOL)(登録商標)1789等の、ジベンゾイルメタン誘導体も指す。
ヒトケラチノサイトに対するレチノールおよびトリコスタチンAとの間の生物学的相乗作用
この実施例は、該HDACインヒビター・トリコスタチンAおよびレチノールが、いかにして相乗的に働くかを、例を挙げて説明する。ヒト初代ケラチノサイトのin vitro細胞培養を、テスト系として選択した。このin vitro細胞培養モデルは、分化過程を研究するのに有用であり、ヒトの皮膚におけるin vivo状況をシミュレートすることができる(Poumayら、1999)。in vitroおよびin vivoで分化過程をモニターするために、トランスグルタミナーゼ1は、周知のマーカー分子である(Polakowskaら、1999)。
表皮ケラチノサイトを、ヒト包皮生検から単離し、37℃および5%CO2の培養チャンバ内、ケラチノサイト無血清培地(GIBCO製KSFM)で培養した。第2継代で、細胞を6ウェル平板に移し、およそ50%表面集密に到達させた。
レチノールおよびTSAを、それぞれ、エタノールまたはエタノール/テトラヒドロフランに可溶化した。レチノール溶液は、黄色灯条件下のみで扱った。ケラチノサイト培養が適切な集密に達したとき、ケラチノサイト分化を誘導し、したがってTG1発現も誘導するために、1.3mMカルシウムをKSFM培地を加え、1×10−10Mの濃度のレチノールか10−9MのTSAのいずれか、または該2物質併用で、処理を開始した。各サンプルごとに、培地および処理物質を毎日2回変えた。
コラーゲン産生改善につながる相乗作用を、培養線維芽細胞で評価することができる。メラニン形成に対する影響を、培養メラニン細胞で調査することができ、また脂肪分解と脂質生成とのバランスの変化(リポスタシス)は、培養脂肪細胞で検出することができる。
本発明の化合物および組成物が、育毛を刺激または保護できる能力は、たとえば国際公開第9817273号パンフレットに記載のマウス・モデルで調査することができる。毛包を損傷させるためにシクロホスファミド(ファルマシアのネオスター(Neostar,Pharmacia))を使用する代わりに、マイトマイシン(Mitomycin)またはメトトレキサート(Methotrexate)を使用することができる。新生マウスで育毛加速を検出することも可能である。新生マウスは、同期化された毛髪周期を有し、およそ3週後に、全ての毛包が休止期に入る。次いで、該動物を処理し、いかに速く、またどの程度まで、毛髪が成長しているかを評価する。in vitroまたはin vivo設定を使用した同様のテストは、J.Invest.Dermato,Hair Research Societiesの第3回国際会議、シンポジウム会議録、8/1,39〜45頁(2003)にも見られる。
Claims (13)
- レチノイドと組み合せた少なくとも1つのHDACインヒビターおよび美容上または薬学的に許容可能な賦形剤または希釈剤を含む組成物。
- 前記Rは、水素、C4〜C20アルキル基またはC4〜C20アルケニル基である、請求項2に記載の組成物。
- 前記レチノイドは、式
(式中R6およびR7は互いに独立して、水素またはヒドロキシであるか、またはR6およびR7は一緒に酸素原子を形成し、
R8およびR9は、水素であるか、またはR8およびR9は一緒に酸素原子を形成し、
R10は、水素、ヒドロキシまたは残基OR11であり、
R11は、C1〜C20アルキル(好ましくはC1〜C6アルキル)、C2〜C20アルケニル(好ましくはC2〜C6アルケニル)、C6〜C20アリール、C7〜C20アルキルアリールまたは残基−C(O)−R12であり、
R12は、C1〜C20アルキル(好ましくはC1〜C6アルキル)またはC2〜C20アルケニル(好ましくはC2〜C6アルケニルである)
の化合物である、請求項1〜3のいずれか一項に記載の組成物。 - 局所用組成物である、請求項1〜4のいずれか一項に記載の組成物。
- 前記組成物は、前記組成物の重量を基準にして、0.001〜50重量%の濃度でHDACインヒビターを含む、請求項1〜5のいずれか一項に記載の組成物。
- 前記HDACインヒビターは、前記組成物の重量を基準にして、0.01〜1重量%の濃度で存在する、請求項6に記載の組成物。
- 前記レチノイドは、前記組成物の重量を基準にして、0.001〜50重量%の濃度で存在する、請求項1〜7のいずれか一項に記載の組成物。
- 前記レチノイドは、前記組成物の重量を基準にして、0.1〜15重量%の濃度で存在する、請求項8に記載の組成物。
- 記HDACインヒビターとレチノイドとの比率は、重量基準で、30:1〜1:30である、請求項1〜9のいずれか一項に記載の組成物。
- 化粧品組成物である、請求項1〜10のいずれか一項に記載の組成物。
- 化粧品効果を提供するための組成物を調製するための、HDACインヒビターおよびレチノイドの組合せの使用。
- 前記化粧品効果は、しわまたは乾燥肌または敏感肌または健康な皮膚の生理的恒常性の消極的な現れに起因する症状の治療または予防、育毛促進、抜け毛防御、表皮の肥厚、にきび予防、皮膚細胞の老化阻止、光損傷の予防または治療、酸化的ストレス現象の予防または治療、セルライトの予防または治療、色素異常症および/またはさらに肌の色の予防または治療、セラミドおよび脂質合成の障害の予防および治療、過剰な皮脂産生の予防、マトリクス・メタロプロテアーゼまたは皮膚における他のプロテアーゼの活性低下、アトピー性湿疹、多形日光疹、乾癬、尋常性白斑を含む炎症性皮膚病の治療および予防、痒いまたはひりひりする皮膚の予防および治療である、請求項12に記載の使用。
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PCT/EP2005/003115 WO2005092283A1 (en) | 2004-03-26 | 2005-03-23 | Composition comprising an hdac inhibitor in combination with a retinoid |
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US20100286278A1 (en) | 2010-11-11 |
US20080227868A1 (en) | 2008-09-18 |
CN1933802B (zh) | 2011-07-06 |
KR20130050395A (ko) | 2013-05-15 |
CN1933802A (zh) | 2007-03-21 |
JP4921351B2 (ja) | 2012-04-25 |
EP1727516A1 (en) | 2006-12-06 |
WO2005092283A1 (en) | 2005-10-06 |
EP1727516B1 (en) | 2014-05-14 |
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