JP2007526944A5 - - Google Patents
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- Publication number
- JP2007526944A5 JP2007526944A5 JP2007501784A JP2007501784A JP2007526944A5 JP 2007526944 A5 JP2007526944 A5 JP 2007526944A5 JP 2007501784 A JP2007501784 A JP 2007501784A JP 2007501784 A JP2007501784 A JP 2007501784A JP 2007526944 A5 JP2007526944 A5 JP 2007526944A5
- Authority
- JP
- Japan
- Prior art keywords
- nitrogen
- formula
- sulfur atom
- interrupted
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 12
- 125000002947 alkylene group Chemical group 0.000 claims 6
- 229910052757 nitrogen Inorganic materials 0.000 claims 6
- 229910052760 oxygen Inorganic materials 0.000 claims 6
- 239000001301 oxygen Substances 0.000 claims 6
- 229910052717 sulfur Inorganic materials 0.000 claims 6
- 125000004434 sulfur atom Chemical group 0.000 claims 6
- 238000004140 cleaning Methods 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 3
- 150000003973 alkyl amines Chemical class 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 125000004103 aminoalkyl group Chemical group 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 150000001768 cations Chemical class 0.000 claims 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 3
- 239000004094 surface-active agent Substances 0.000 claims 3
- 238000000034 method Methods 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000007800 oxidant agent Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/792,456 US7294610B2 (en) | 2004-03-03 | 2004-03-03 | Fluorinated sulfonamide surfactants for aqueous cleaning solutions |
| PCT/US2005/002907 WO2005095567A1 (en) | 2004-03-03 | 2005-02-01 | Fluorinated sulfonamide surfactants for aqueous cleaning solutions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007526944A JP2007526944A (ja) | 2007-09-20 |
| JP2007526944A5 true JP2007526944A5 (enExample) | 2008-03-06 |
Family
ID=34911857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007501784A Pending JP2007526944A (ja) | 2004-03-03 | 2005-02-01 | 水性クリーニング溶液のためのフッ素化スルホンアミド界面活性剤 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US7294610B2 (enExample) |
| EP (1) | EP1743014B1 (enExample) |
| JP (1) | JP2007526944A (enExample) |
| KR (1) | KR101146389B1 (enExample) |
| CN (1) | CN1926227B (enExample) |
| TW (1) | TWI370175B (enExample) |
| WO (1) | WO2005095567A1 (enExample) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7294610B2 (en) * | 2004-03-03 | 2007-11-13 | 3M Innovative Properties Company | Fluorinated sulfonamide surfactants for aqueous cleaning solutions |
| KR100606187B1 (ko) * | 2004-07-14 | 2006-08-01 | 테크노세미켐 주식회사 | 반도체 기판 세정용 조성물, 이를 이용한 반도체 기판세정방법 및 반도체 장치 제조 방법 |
| US7179159B2 (en) * | 2005-05-02 | 2007-02-20 | Applied Materials, Inc. | Materials for chemical mechanical polishing |
| KR100650828B1 (ko) * | 2005-06-16 | 2006-11-27 | 주식회사 하이닉스반도체 | 반도체 소자의 리세스 게이트 형성 방법 |
| KR100673228B1 (ko) * | 2005-06-30 | 2007-01-22 | 주식회사 하이닉스반도체 | 낸드 플래쉬 메모리 소자의 제조방법 |
| US7393787B2 (en) * | 2005-08-22 | 2008-07-01 | Texas Instruments Incorporated | Formation of nitrogen containing dielectric layers having a uniform nitrogen distribution therein using a high temperature chemical treatment |
| US7572848B2 (en) * | 2005-12-21 | 2009-08-11 | 3M Innovative Properties Company | Coatable composition |
| US7425374B2 (en) * | 2005-12-22 | 2008-09-16 | 3M Innovative Properties Company | Fluorinated surfactants |
| US8084367B2 (en) * | 2006-05-24 | 2011-12-27 | Samsung Electronics Co., Ltd | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods |
| US7684332B2 (en) * | 2006-08-22 | 2010-03-23 | Embarq Holdings Company, Llc | System and method for adjusting the window size of a TCP packet through network elements |
| US20080125342A1 (en) * | 2006-11-07 | 2008-05-29 | Advanced Technology Materials, Inc. | Formulations for cleaning memory device structures |
| JP5029686B2 (ja) * | 2007-03-16 | 2012-09-19 | 富士通株式会社 | シリコン系絶縁膜のエッチング後処理剤、半導体装置の製造方法および半導体装置 |
| JP4947393B2 (ja) * | 2007-07-24 | 2012-06-06 | 信越半導体株式会社 | 半導体基板の製造方法 |
| US7638650B2 (en) * | 2007-08-06 | 2009-12-29 | E.I. Du Pont De Nemours And Company | Fluoroalkyl surfactants |
| US8153019B2 (en) | 2007-08-06 | 2012-04-10 | Micron Technology, Inc. | Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices |
| US7728163B2 (en) * | 2007-08-06 | 2010-06-01 | E.I. Du Pont De Nemours And Company | Mixed fluoroalkyl-alkyl surfactants |
| JP2009050920A (ja) * | 2007-08-23 | 2009-03-12 | Asahi Glass Co Ltd | 磁気ディスク用ガラス基板の製造方法 |
| US8212064B2 (en) * | 2008-05-14 | 2012-07-03 | E.I. Du Pont De Nemours And Company | Ethylene tetrafluoroethylene intermediates |
| US8318877B2 (en) * | 2008-05-20 | 2012-11-27 | E.I. Du Pont De Nemours And Company | Ethylene tetrafluoroethylene (meth)acrylate copolymers |
| EP2246324A1 (en) * | 2009-04-21 | 2010-11-03 | Maflon S.R.L. | Sulphonic function fluorine compounds and their use |
| US7910393B2 (en) * | 2009-06-17 | 2011-03-22 | Innovalight, Inc. | Methods for forming a dual-doped emitter on a silicon substrate with a sub-critical shear thinning nanoparticle fluid |
| US9040393B2 (en) * | 2010-01-14 | 2015-05-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of forming semiconductor structure |
| WO2012032854A1 (ja) * | 2010-09-08 | 2012-03-15 | 三菱瓦斯化学株式会社 | 微細構造体のパターン倒壊抑制用処理液及びこれを用いた微細構造体の製造方法 |
| BR112013015923A2 (pt) | 2010-12-21 | 2018-06-05 | 3M Innovative Properties Co | método para tratamento de formações contendo hidrocarbonetos com amina fluorada. |
| EP2666833A1 (en) * | 2012-05-23 | 2013-11-27 | Basf Se | A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (cmp) of iii-v material in the presence of a cmp composition comprising a specific non-ionic surfactant |
| JP5943195B2 (ja) * | 2012-05-25 | 2016-06-29 | 東亞合成株式会社 | 導電性高分子のエッチング液、およびエッチング液を用いた導電性高分子パターンの形成方法。 |
| US8809577B2 (en) * | 2012-07-20 | 2014-08-19 | E I Du Pont De Nemours And Company | Process to produce fluorinated betaines |
| DE102012022441A1 (de) | 2012-11-15 | 2014-05-28 | Merck Patent Gmbh | Neue Phosphinsäureamide, deren Herstellung und Verwendung |
| EP2951217B1 (en) * | 2013-01-29 | 2017-08-16 | 3M Innovative Properties Company | Surfactants and methods of making and using same |
| US10767143B2 (en) * | 2014-03-06 | 2020-09-08 | Sage Electrochromics, Inc. | Particle removal from electrochromic films using non-aqueous fluids |
| JP2017528568A (ja) * | 2014-09-11 | 2017-09-28 | スリーエム イノベイティブ プロパティズ カンパニー | フッ素化界面活性剤含有組成物 |
| US11193059B2 (en) | 2016-12-13 | 2021-12-07 | Current Lighting Solutions, Llc | Processes for preparing color stable red-emitting phosphor particles having small particle size |
| TW202035361A (zh) * | 2018-12-12 | 2020-10-01 | 美商3M新設資產公司 | 氟化胺氧化物界面活性劑 |
| US11261375B2 (en) | 2019-05-22 | 2022-03-01 | General Electric Company | Method to enhance phosphor robustness and dispersability and resulting phosphors |
| EP4136187A4 (en) | 2020-04-14 | 2024-06-19 | General Electric Company | GREEN-EMMITTING PHOSPHORS AND DEVICES THEREFOR |
| US11254864B2 (en) | 2020-04-14 | 2022-02-22 | General Electric Company | Films with narrow band emission phosphor materials |
| EP4208521A4 (en) | 2020-09-01 | 2024-10-09 | General Electric Company | DEVICES COMPATIBLE WITH NIGHT VISION EQUIPMENT |
| JP7495317B2 (ja) * | 2020-09-25 | 2024-06-04 | 株式会社フジミインコーポレーテッド | 表面処理組成物、表面処理組成物の製造方法、表面処理方法、および半導体基板の製造方法 |
| CN117296162A (zh) | 2021-04-13 | 2023-12-26 | 通用电气公司 | 用于显示器和照明应用的铀基磷光体和组合物 |
| CN113980748B (zh) * | 2021-11-15 | 2024-01-26 | 安徽冠宇光电科技有限公司 | 一种太阳能单多晶硅片清洗液及其制备方法 |
| CN115011348B (zh) * | 2022-06-30 | 2023-12-29 | 湖北兴福电子材料股份有限公司 | 一种氮化铝蚀刻液及其应用 |
| CN116590700A (zh) * | 2023-05-19 | 2023-08-15 | 温州昊驰环保材料科技有限公司 | 一种用于炮膛挂铜挂塑的清洁剂组合物及其制备方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2806990A (en) | 1953-08-21 | 1957-09-17 | North American Aviation Inc | Regulator for an alternator |
| US2809990A (en) | 1955-12-29 | 1957-10-15 | Minnesota Mining & Mfg | Fluorocarbon acids and derivatives |
| US2803615A (en) | 1956-01-23 | 1957-08-20 | Minnesota Mining & Mfg | Fluorocarbon acrylate and methacrylate esters and polymers |
| US2803656A (en) | 1956-01-23 | 1957-08-20 | Minnesota Mining & Mfg | Fluorocarbonsulfonamidoalkanols and sulfates thereof |
| DE2024909B2 (de) | 1970-05-22 | 1977-09-29 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von n-hydroxyalkyl-perfluoralkansulfonamiden und einige n,n-bis-(hydroxyalkyl)-perfluor-alkansulfonamide |
| DE2424243A1 (de) * | 1974-05-18 | 1975-11-27 | Bayer Ag | Perfluoralkansulfonamidoalkanphosphonsaeure- bzw. -phosphinsaeurederivate |
| GB1599414A (en) | 1977-04-18 | 1981-09-30 | Unilever Ltd | Shampoo with anti-grease properties |
| DE2921142A1 (de) | 1979-05-25 | 1980-12-11 | Bayer Ag | Verwendung von perfluoralkansulfonamid- salzen als tenside |
| DE3171226D1 (en) | 1981-09-08 | 1985-08-08 | Dainippon Ink & Chemicals | Fluorine-containing aminosulfonate |
| JPS62109985A (ja) * | 1985-11-08 | 1987-05-21 | Asahi Glass Co Ltd | エツチング用組成物 |
| JP2894717B2 (ja) * | 1989-03-15 | 1999-05-24 | 日産化学工業株式会社 | 低表面張力硫酸組成物 |
| US5227493A (en) * | 1990-08-31 | 1993-07-13 | Air Products And Chemicals, Inc. | Fluorinated sulfonamide derivatives |
| JP3217116B2 (ja) | 1992-03-06 | 2001-10-09 | 日産化学工業株式会社 | 低表面張力洗浄用組成物 |
| JPH05275406A (ja) | 1992-03-24 | 1993-10-22 | Mitsubishi Kasei Corp | 硫酸組成物 |
| US5466389A (en) * | 1994-04-20 | 1995-11-14 | J. T. Baker Inc. | PH adjusted nonionic surfactant-containing alkaline cleaner composition for cleaning microelectronics substrates |
| DE4435840C1 (de) | 1994-10-07 | 1996-03-21 | Bayer Ag | Verwendung von alkylsubstituierten Perfluoralkylsulfonamiden als Sprühnebelinhibitoren für basische Elektrolysebäder |
| US5688884A (en) | 1995-08-31 | 1997-11-18 | E. I. Du Pont De Nemours And Company | Polymerization process |
| JP3783047B2 (ja) * | 1995-12-15 | 2006-06-07 | スリーエム カンパニー | クリーニング方法および組成物 |
| JPH09286999A (ja) * | 1996-04-19 | 1997-11-04 | Kanto Chem Co Inc | シリコンウェハ洗浄用組成物 |
| WO2001030873A1 (en) * | 1999-10-27 | 2001-05-03 | 3M Innovative Properties Company | Fluorochemical sulfonamide surfactants |
| US6753380B2 (en) * | 2001-03-09 | 2004-06-22 | 3M Innovative Properties Company | Water-and oil-repellency imparting ester oligomers comprising perfluoroalkyl moieties |
| US7169323B2 (en) * | 2002-11-08 | 2007-01-30 | 3M Innovative Properties Company | Fluorinated surfactants for buffered acid etch solutions |
| US6890452B2 (en) * | 2002-11-08 | 2005-05-10 | 3M Innovative Properties Company | Fluorinated surfactants for aqueous acid etch solutions |
| US6858124B2 (en) * | 2002-12-16 | 2005-02-22 | 3M Innovative Properties Company | Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
| US6752380B1 (en) * | 2003-02-12 | 2004-06-22 | Dasco Pro, Inc. | Pry bar |
| US7294610B2 (en) * | 2004-03-03 | 2007-11-13 | 3M Innovative Properties Company | Fluorinated sulfonamide surfactants for aqueous cleaning solutions |
-
2004
- 2004-03-03 US US10/792,456 patent/US7294610B2/en not_active Expired - Lifetime
-
2005
- 2005-02-01 WO PCT/US2005/002907 patent/WO2005095567A1/en not_active Ceased
- 2005-02-01 CN CN2005800068893A patent/CN1926227B/zh not_active Expired - Fee Related
- 2005-02-01 JP JP2007501784A patent/JP2007526944A/ja active Pending
- 2005-02-01 KR KR1020067020667A patent/KR101146389B1/ko not_active Expired - Lifetime
- 2005-02-01 EP EP05712369A patent/EP1743014B1/en not_active Expired - Lifetime
- 2005-02-18 TW TW094104882A patent/TWI370175B/zh not_active IP Right Cessation
-
2007
- 2007-10-03 US US11/866,671 patent/US7811978B2/en not_active Expired - Fee Related
-
2010
- 2010-08-30 US US12/871,275 patent/US7985723B2/en not_active Expired - Fee Related