CN1926227B - 用于水性清洗溶液的氟化磺酰胺表面活性剂 - Google Patents

用于水性清洗溶液的氟化磺酰胺表面活性剂 Download PDF

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Publication number
CN1926227B
CN1926227B CN2005800068893A CN200580006889A CN1926227B CN 1926227 B CN1926227 B CN 1926227B CN 2005800068893 A CN2005800068893 A CN 2005800068893A CN 200580006889 A CN200580006889 A CN 200580006889A CN 1926227 B CN1926227 B CN 1926227B
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CN
China
Prior art keywords
mixture
added
mole
water
etching
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN2005800068893A
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English (en)
Chinese (zh)
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CN1926227A (zh
Inventor
帕特里西亚·M·萨武
威廉姆·M·拉曼纳
迈克尔·J·帕伦特
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN1926227A publication Critical patent/CN1926227A/zh
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Anticipated expiration legal-status Critical
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D11/00—Special methods for preparing compositions containing mixtures of detergents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • C11D3/048—Nitrates or nitrites
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
CN2005800068893A 2004-03-03 2005-02-01 用于水性清洗溶液的氟化磺酰胺表面活性剂 Expired - Fee Related CN1926227B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/792,456 US7294610B2 (en) 2004-03-03 2004-03-03 Fluorinated sulfonamide surfactants for aqueous cleaning solutions
US10/792,456 2004-03-03
PCT/US2005/002907 WO2005095567A1 (en) 2004-03-03 2005-02-01 Fluorinated sulfonamide surfactants for aqueous cleaning solutions

Publications (2)

Publication Number Publication Date
CN1926227A CN1926227A (zh) 2007-03-07
CN1926227B true CN1926227B (zh) 2010-06-23

Family

ID=34911857

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800068893A Expired - Fee Related CN1926227B (zh) 2004-03-03 2005-02-01 用于水性清洗溶液的氟化磺酰胺表面活性剂

Country Status (7)

Country Link
US (3) US7294610B2 (enExample)
EP (1) EP1743014B1 (enExample)
JP (1) JP2007526944A (enExample)
KR (1) KR101146389B1 (enExample)
CN (1) CN1926227B (enExample)
TW (1) TWI370175B (enExample)
WO (1) WO2005095567A1 (enExample)

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US7179159B2 (en) * 2005-05-02 2007-02-20 Applied Materials, Inc. Materials for chemical mechanical polishing
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KR100673228B1 (ko) * 2005-06-30 2007-01-22 주식회사 하이닉스반도체 낸드 플래쉬 메모리 소자의 제조방법
US7393787B2 (en) * 2005-08-22 2008-07-01 Texas Instruments Incorporated Formation of nitrogen containing dielectric layers having a uniform nitrogen distribution therein using a high temperature chemical treatment
US7572848B2 (en) * 2005-12-21 2009-08-11 3M Innovative Properties Company Coatable composition
US7425374B2 (en) * 2005-12-22 2008-09-16 3M Innovative Properties Company Fluorinated surfactants
US8084367B2 (en) * 2006-05-24 2011-12-27 Samsung Electronics Co., Ltd Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods
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US8212064B2 (en) * 2008-05-14 2012-07-03 E.I. Du Pont De Nemours And Company Ethylene tetrafluoroethylene intermediates
US8318877B2 (en) * 2008-05-20 2012-11-27 E.I. Du Pont De Nemours And Company Ethylene tetrafluoroethylene (meth)acrylate copolymers
EP2246324A1 (en) * 2009-04-21 2010-11-03 Maflon S.R.L. Sulphonic function fluorine compounds and their use
US7910393B2 (en) * 2009-06-17 2011-03-22 Innovalight, Inc. Methods for forming a dual-doped emitter on a silicon substrate with a sub-critical shear thinning nanoparticle fluid
US9040393B2 (en) * 2010-01-14 2015-05-26 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming semiconductor structure
CN103098181B (zh) * 2010-09-08 2015-08-26 三菱瓦斯化学株式会社 用于抑制微细结构体的图案倒塌的处理液和使用其的微细结构体的制造方法
US9499737B2 (en) 2010-12-21 2016-11-22 3M Innovative Properties Company Method for treating hydrocarbon-bearing formations with fluorinated amine
EP2666833A1 (en) * 2012-05-23 2013-11-27 Basf Se A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (cmp) of iii-v material in the presence of a cmp composition comprising a specific non-ionic surfactant
JP5943195B2 (ja) * 2012-05-25 2016-06-29 東亞合成株式会社 導電性高分子のエッチング液、およびエッチング液を用いた導電性高分子パターンの形成方法。
US8809577B2 (en) * 2012-07-20 2014-08-19 E I Du Pont De Nemours And Company Process to produce fluorinated betaines
DE102012022441A1 (de) 2012-11-15 2014-05-28 Merck Patent Gmbh Neue Phosphinsäureamide, deren Herstellung und Verwendung
JP6444316B2 (ja) * 2013-01-29 2018-12-26 スリーエム イノベイティブ プロパティズ カンパニー 界面活性剤並びにその製造及び使用方法
US10767143B2 (en) * 2014-03-06 2020-09-08 Sage Electrochromics, Inc. Particle removal from electrochromic films using non-aqueous fluids
KR102462889B1 (ko) * 2014-09-11 2022-11-02 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화 계면활성제를 함유하는 조성물
US11193059B2 (en) 2016-12-13 2021-12-07 Current Lighting Solutions, Llc Processes for preparing color stable red-emitting phosphor particles having small particle size
TW202035361A (zh) * 2018-12-12 2020-10-01 美商3M新設資產公司 氟化胺氧化物界面活性劑
US11261375B2 (en) 2019-05-22 2022-03-01 General Electric Company Method to enhance phosphor robustness and dispersability and resulting phosphors
WO2021211600A1 (en) 2020-04-14 2021-10-21 General Electric Company Green-emitting phosphors and devices thereof
US11254864B2 (en) 2020-04-14 2022-02-22 General Electric Company Films with narrow band emission phosphor materials
KR20230059803A (ko) 2020-09-01 2023-05-03 제네럴 일렉트릭 컴퍼니 야간 투시 장비와 호환성인 소자
JP7495317B2 (ja) * 2020-09-25 2024-06-04 株式会社フジミインコーポレーテッド 表面処理組成物、表面処理組成物の製造方法、表面処理方法、および半導体基板の製造方法
CN117296162A (zh) 2021-04-13 2023-12-26 通用电气公司 用于显示器和照明应用的铀基磷光体和组合物
CN113980748B (zh) * 2021-11-15 2024-01-26 安徽冠宇光电科技有限公司 一种太阳能单多晶硅片清洗液及其制备方法
CN115011348B (zh) * 2022-06-30 2023-12-29 湖北兴福电子材料股份有限公司 一种氮化铝蚀刻液及其应用

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Also Published As

Publication number Publication date
JP2007526944A (ja) 2007-09-20
WO2005095567A1 (en) 2005-10-13
US20050197273A1 (en) 2005-09-08
KR101146389B1 (ko) 2012-05-17
EP1743014B1 (en) 2012-06-27
CN1926227A (zh) 2007-03-07
TWI370175B (en) 2012-08-11
US7811978B2 (en) 2010-10-12
US7985723B2 (en) 2011-07-26
TW200606248A (en) 2006-02-16
US20080078747A1 (en) 2008-04-03
KR20070004022A (ko) 2007-01-05
EP1743014A1 (en) 2007-01-17
US7294610B2 (en) 2007-11-13
US20100320416A1 (en) 2010-12-23

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Granted publication date: 20100623

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