TWI370175B - Fluorinated sulfonamide surfactants for aqueous cleaning solutions - Google Patents

Fluorinated sulfonamide surfactants for aqueous cleaning solutions

Info

Publication number
TWI370175B
TWI370175B TW094104882A TW94104882A TWI370175B TW I370175 B TWI370175 B TW I370175B TW 094104882 A TW094104882 A TW 094104882A TW 94104882 A TW94104882 A TW 94104882A TW I370175 B TWI370175 B TW I370175B
Authority
TW
Taiwan
Prior art keywords
aqueous cleaning
cleaning solutions
fluorinated sulfonamide
sulfonamide surfactants
surfactants
Prior art date
Application number
TW094104882A
Other languages
English (en)
Other versions
TW200606248A (en
Inventor
Patricia Marie Savu
William Mario Lamanna
Michael Joseph Parent
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of TW200606248A publication Critical patent/TW200606248A/zh
Application granted granted Critical
Publication of TWI370175B publication Critical patent/TWI370175B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D11/00—Special methods for preparing compositions containing mixtures of detergents ; Methods for using cleaning compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • C11D3/048—Nitrates or nitrites
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C11D2111/22—
TW094104882A 2004-03-03 2005-02-18 Fluorinated sulfonamide surfactants for aqueous cleaning solutions TWI370175B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/792,456 US7294610B2 (en) 2004-03-03 2004-03-03 Fluorinated sulfonamide surfactants for aqueous cleaning solutions

Publications (2)

Publication Number Publication Date
TW200606248A TW200606248A (en) 2006-02-16
TWI370175B true TWI370175B (en) 2012-08-11

Family

ID=34911857

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094104882A TWI370175B (en) 2004-03-03 2005-02-18 Fluorinated sulfonamide surfactants for aqueous cleaning solutions

Country Status (7)

Country Link
US (3) US7294610B2 (zh)
EP (1) EP1743014B1 (zh)
JP (1) JP2007526944A (zh)
KR (1) KR101146389B1 (zh)
CN (1) CN1926227B (zh)
TW (1) TWI370175B (zh)
WO (1) WO2005095567A1 (zh)

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KR100673228B1 (ko) * 2005-06-30 2007-01-22 주식회사 하이닉스반도체 낸드 플래쉬 메모리 소자의 제조방법
US7393787B2 (en) * 2005-08-22 2008-07-01 Texas Instruments Incorporated Formation of nitrogen containing dielectric layers having a uniform nitrogen distribution therein using a high temperature chemical treatment
US7572848B2 (en) * 2005-12-21 2009-08-11 3M Innovative Properties Company Coatable composition
US7425374B2 (en) * 2005-12-22 2008-09-16 3M Innovative Properties Company Fluorinated surfactants
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US7638650B2 (en) * 2007-08-06 2009-12-29 E.I. Du Pont De Nemours And Company Fluoroalkyl surfactants
US7728163B2 (en) * 2007-08-06 2010-06-01 E.I. Du Pont De Nemours And Company Mixed fluoroalkyl-alkyl surfactants
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US8212064B2 (en) * 2008-05-14 2012-07-03 E.I. Du Pont De Nemours And Company Ethylene tetrafluoroethylene intermediates
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US9040393B2 (en) * 2010-01-14 2015-05-26 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming semiconductor structure
US20130161284A1 (en) * 2010-09-08 2013-06-27 Mitsubishi Gas Chemical Company, Inc. Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquid
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EP2666833A1 (en) * 2012-05-23 2013-11-27 Basf Se A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (cmp) of iii-v material in the presence of a cmp composition comprising a specific non-ionic surfactant
JP5943195B2 (ja) * 2012-05-25 2016-06-29 東亞合成株式会社 導電性高分子のエッチング液、およびエッチング液を用いた導電性高分子パターンの形成方法。
US8809577B2 (en) * 2012-07-20 2014-08-19 E I Du Pont De Nemours And Company Process to produce fluorinated betaines
DE102012022441A1 (de) 2012-11-15 2014-05-28 Merck Patent Gmbh Neue Phosphinsäureamide, deren Herstellung und Verwendung
EP3263611B1 (en) * 2013-01-29 2019-04-10 3M Innovative Properties Company Surfactants and methods of making and using same
US10767143B2 (en) * 2014-03-06 2020-09-08 Sage Electrochromics, Inc. Particle removal from electrochromic films using non-aqueous fluids
CN106715485B (zh) * 2014-09-11 2019-11-12 3M创新有限公司 包含氟化表面活性剂的组合物
US11193059B2 (en) 2016-12-13 2021-12-07 Current Lighting Solutions, Llc Processes for preparing color stable red-emitting phosphor particles having small particle size
TW202035361A (zh) * 2018-12-12 2020-10-01 美商3M新設資產公司 氟化胺氧化物界面活性劑
US11261375B2 (en) 2019-05-22 2022-03-01 General Electric Company Method to enhance phosphor robustness and dispersability and resulting phosphors
WO2021211181A1 (en) 2020-04-14 2021-10-21 General Electric Company Ink compositions and films with narrow band emission phosphor materials
CN113980748B (zh) * 2021-11-15 2024-01-26 安徽冠宇光电科技有限公司 一种太阳能单多晶硅片清洗液及其制备方法
CN115011348B (zh) * 2022-06-30 2023-12-29 湖北兴福电子材料股份有限公司 一种氮化铝蚀刻液及其应用

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Also Published As

Publication number Publication date
KR20070004022A (ko) 2007-01-05
CN1926227B (zh) 2010-06-23
EP1743014A1 (en) 2007-01-17
US20050197273A1 (en) 2005-09-08
KR101146389B1 (ko) 2012-05-17
EP1743014B1 (en) 2012-06-27
WO2005095567A1 (en) 2005-10-13
US20100320416A1 (en) 2010-12-23
JP2007526944A (ja) 2007-09-20
US7985723B2 (en) 2011-07-26
TW200606248A (en) 2006-02-16
CN1926227A (zh) 2007-03-07
US7294610B2 (en) 2007-11-13
US20080078747A1 (en) 2008-04-03
US7811978B2 (en) 2010-10-12

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees