JP2007524763A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2007524763A5 JP2007524763A5 JP2007500861A JP2007500861A JP2007524763A5 JP 2007524763 A5 JP2007524763 A5 JP 2007524763A5 JP 2007500861 A JP2007500861 A JP 2007500861A JP 2007500861 A JP2007500861 A JP 2007500861A JP 2007524763 A5 JP2007524763 A5 JP 2007524763A5
- Authority
- JP
- Japan
- Prior art keywords
- container
- heating
- opening
- conductance
- vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 15
- 238000010438 heat treatment Methods 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 4
- 238000000151 deposition Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 238000005240 physical vapour deposition Methods 0.000 claims 2
- 238000007740 vapor deposition Methods 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000011364 vaporized material Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/786,859 US6893939B1 (en) | 2004-02-25 | 2004-02-25 | Thermal physical vapor deposition source with minimized internal condensation effects |
| US10/786,859 | 2004-02-25 | ||
| PCT/US2005/004394 WO2005083145A2 (en) | 2004-02-25 | 2005-02-11 | Vapor deposition source with minimized condensation effects |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007524763A JP2007524763A (ja) | 2007-08-30 |
| JP2007524763A5 true JP2007524763A5 (enExample) | 2008-03-21 |
| JP4718538B2 JP4718538B2 (ja) | 2011-07-06 |
Family
ID=34574859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007500861A Expired - Lifetime JP4718538B2 (ja) | 2004-02-25 | 2005-02-11 | 凝縮効果が最少にされた蒸着源 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6893939B1 (enExample) |
| JP (1) | JP4718538B2 (enExample) |
| KR (1) | KR101136879B1 (enExample) |
| CN (1) | CN1922339B (enExample) |
| TW (1) | TWI394854B (enExample) |
| WO (1) | WO2005083145A2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7364772B2 (en) * | 2004-03-22 | 2008-04-29 | Eastman Kodak Company | Method for coating an organic layer onto a substrate in a vacuum chamber |
| KR101106289B1 (ko) * | 2006-08-04 | 2012-01-18 | 순천향대학교 산학협력단 | 증착 공정을 위한 선형 증착 소스 |
| EP2109899A4 (en) * | 2006-12-19 | 2012-12-12 | Veeco Instr Inc | SOURCES OF VAPOR DEPOSITION AND METHODS |
| WO2010080109A1 (en) * | 2008-12-18 | 2010-07-15 | Veeco Instruments Inc. | Vacuum deposition sources having heated effusion orifices |
| US9062369B2 (en) * | 2009-03-25 | 2015-06-23 | Veeco Instruments, Inc. | Deposition of high vapor pressure materials |
| US20110195187A1 (en) * | 2010-02-10 | 2011-08-11 | Apple Inc. | Direct liquid vaporization for oleophobic coatings |
| US8715779B2 (en) | 2011-06-24 | 2014-05-06 | Apple Inc. | Enhanced glass impact durability through application of thin films |
| JP2014189807A (ja) * | 2013-03-26 | 2014-10-06 | Canon Tokki Corp | 蒸発源装置 |
| CN104099570B (zh) * | 2013-04-01 | 2016-10-05 | 上海和辉光电有限公司 | 单点线性蒸发源系统 |
| KR102096049B1 (ko) * | 2013-05-03 | 2020-04-02 | 삼성디스플레이 주식회사 | 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치 |
| CN104213077A (zh) * | 2013-05-30 | 2014-12-17 | 海洋王照明科技股份有限公司 | 一种用于有机电致发光器件的蒸发设备 |
| WO2018114373A1 (en) * | 2016-12-22 | 2018-06-28 | Flisom Ag | Linear source for vapor deposition with at least three electrical heating elements |
| JP7011521B2 (ja) * | 2018-04-17 | 2022-01-26 | 株式会社アルバック | 真空蒸着装置用の蒸着源 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4356429A (en) | 1980-07-17 | 1982-10-26 | Eastman Kodak Company | Organic electroluminescent cell |
| US4539507A (en) | 1983-03-25 | 1985-09-03 | Eastman Kodak Company | Organic electroluminescent devices having improved power conversion efficiencies |
| EP0134280A1 (de) * | 1983-08-29 | 1985-03-20 | idn inventions and development of novelties ag | Magazin für Tonaufzeichnungsträger |
| US4720432A (en) | 1987-02-11 | 1988-01-19 | Eastman Kodak Company | Electroluminescent device with organic luminescent medium |
| US4769292A (en) | 1987-03-02 | 1988-09-06 | Eastman Kodak Company | Electroluminescent device with modified thin film luminescent zone |
| JPH07118839A (ja) * | 1993-10-22 | 1995-05-09 | Mitsubishi Heavy Ind Ltd | 金属蒸気発生装置 |
| US5550066A (en) | 1994-12-14 | 1996-08-27 | Eastman Kodak Company | Method of fabricating a TFT-EL pixel |
| US5532102A (en) * | 1995-03-30 | 1996-07-02 | Xerox Corporation | Apparatus and process for preparation of migration imaging members |
| US6337102B1 (en) | 1997-11-17 | 2002-01-08 | The Trustees Of Princeton University | Low pressure vapor phase deposition of organic thin films |
| US6037241A (en) * | 1998-02-19 | 2000-03-14 | First Solar, Llc | Apparatus and method for depositing a semiconductor material |
| JPH11246963A (ja) * | 1998-03-05 | 1999-09-14 | Nikon Corp | 蒸着用ボートとそれを用いて成膜した光学薄膜 |
| US6237529B1 (en) * | 2000-03-03 | 2001-05-29 | Eastman Kodak Company | Source for thermal physical vapor deposition of organic electroluminescent layers |
| JP2001279428A (ja) * | 2000-03-31 | 2001-10-10 | Matsushita Electric Ind Co Ltd | 蒸着ボート |
| US20030101937A1 (en) * | 2001-11-28 | 2003-06-05 | Eastman Kodak Company | Thermal physical vapor deposition source for making an organic light-emitting device |
| US20030168013A1 (en) | 2002-03-08 | 2003-09-11 | Eastman Kodak Company | Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device |
| CN1444423A (zh) * | 2002-03-08 | 2003-09-24 | 伊斯曼柯达公司 | 用于制造有机发光器件的长条形热物理蒸汽淀积源 |
| US6749906B2 (en) * | 2002-04-25 | 2004-06-15 | Eastman Kodak Company | Thermal physical vapor deposition apparatus with detachable vapor source(s) and method |
| ATE326555T1 (de) * | 2002-07-19 | 2006-06-15 | Lg Electronics Inc | Quelle zur thermischen pvd-beschichtung für organische elektrolumineszente schichten |
| US20040144321A1 (en) * | 2003-01-28 | 2004-07-29 | Eastman Kodak Company | Method of designing a thermal physical vapor deposition system |
-
2004
- 2004-02-25 US US10/786,859 patent/US6893939B1/en not_active Expired - Lifetime
-
2005
- 2005-02-11 WO PCT/US2005/004394 patent/WO2005083145A2/en not_active Ceased
- 2005-02-11 CN CN2005800056114A patent/CN1922339B/zh not_active Expired - Lifetime
- 2005-02-11 KR KR1020067017022A patent/KR101136879B1/ko not_active Expired - Lifetime
- 2005-02-11 JP JP2007500861A patent/JP4718538B2/ja not_active Expired - Lifetime
- 2005-02-24 TW TW094105633A patent/TWI394854B/zh not_active IP Right Cessation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2007524763A5 (enExample) | ||
| JP5140382B2 (ja) | 蒸気放出装置、有機薄膜蒸着装置及び有機薄膜蒸着方法 | |
| JP2009531549A5 (enExample) | ||
| WO2004105095A3 (en) | Thin-film deposition evaporator | |
| JP2004307976A5 (ja) | マスクおよび製造装置 | |
| JP2008163457A5 (ja) | 成膜装置 | |
| KR20180016693A (ko) | 선형 증착원 및 이를 포함하는 증착 장치 | |
| JP2008522038A5 (enExample) | ||
| JP2003257614A5 (enExample) | ||
| JP2010080614A5 (enExample) | ||
| JP2007530786A5 (enExample) | ||
| JP2008254331A5 (enExample) | ||
| JP2010094673A (ja) | 二相熱交換用の滴状凝縮が促進されるハイブリッド表面 | |
| DE60305246D1 (de) | Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten | |
| JP2008513964A5 (enExample) | ||
| CN101454478A (zh) | 沉积材料的热蒸发设备、用途和方法 | |
| JP2017072362A5 (enExample) | ||
| JP2012519950A5 (enExample) | ||
| WO2005083145A3 (en) | Vapor deposition source with minimized condensation effects | |
| US20080092820A1 (en) | Evaporator having multi-layered conical slit nozzles for vacuum thermal evaporation | |
| US20160208374A1 (en) | Imc evaporator boat-thermal insulation cartridge assembly | |
| JP7572475B2 (ja) | 真空チャンバ内で基板をコーティングするための気相堆積装置及び方法 | |
| CN108474103A (zh) | 用于高速涂覆的真空沉积装置 | |
| CN109355628A (zh) | 蒸镀坩埚 | |
| WO2006130298A3 (en) | Deposition methods, and deposition apparatuses |